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Electrical and Material Characteristics of HfO2 Film in HfO2/Hf/Si MOS Structure (HfO2/Hf/Si MOS 구조에서 나타나는 HfO2 박막의 물성 및 전기적 특성)

  • Bae, Kun-Ho;Do, Seung-Woo;Lee, Jae-Sung;Lee, Yong-Hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.2
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    • pp.101-106
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    • 2009
  • In this paper, Thin films of $HfO_2$/Hf were deposited on p-type wafer by Atomic Layer Deposition (ALD). We studied the electrical and material characteristics of $HfO_2$/Hf/Si MOS capacitor depending on thickness of Hf metal layer. $HfO_2$ films were deposited using TEMAH and $O_3$ at $350^{\circ}C$. Samples were then annealed using furnace heating to $500^{\circ}C$. Round-type MOS capacitors have been fabricated on Si substrates with $2000\;{\AA}$-thick Pt top electrodes. The composition rate of the dielectric material was analyzed using TEM (Transmission Electron Microscopy), XRD (X-ray Diffraction) and XPS (X-ray Photoelectron Spectroscopy). Also the capacitance-voltage (C-V), conductance-voltage (G-V), and current-voltage (I-V) characteristics were measured. We calculated the density of oxide trap charges and interface trap charges in our MOS device. At the interface between $HfO_2$ and Si, both Hf-Si and Hf-Si-O bonds were observed, instead of Si-O bond. The sandwiched Hf metal layer suppressed the growing of $SiO_x$ layer so that $HfSi_xO_y$ layer was achieved. And finally, the generation of both oxide trap charge and interface trap charge in $HfO_2$ film was reduced effectively by using Hf metal layer.

The Changes of Forest Vegetation and Soil Environmental after Forest Fire (산불 후 산림식생 및 토양환경의 변화)

  • Oh, Ki-Cheol;Kim, Jong-Kab;Jung, Won-Ok;Min, Jae-Ki
    • Journal of the Korean Society of Environmental Restoration Technology
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    • v.4 no.3
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    • pp.19-29
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    • 2001
  • This study was carried out to examine the recovery of forest ecosystem at the burned areas of coniferous (Mt. Chosdae) and broad leaved forest (Samsinbong in Mt. Chiri) by investigating the changes of forest vegetation. The results obtained are summarized as follows; 1. In the Samsinbong, the total number of species appeared at the burned area were 5 species at tree layer, 11 species at sub-tree layer and 24 species at herb layer, and at the unburned area were 5 species at tree layer, 14 species at sub-tree layer, 18 species at shrub layer and 23 species at herb layer, respectively. In the Mt. Chosdae, the total number of species appeared at the burned area only showed to 83 species at herb layer, and at the unburned area were 7 species at tree layer, 13 species at sub-tree layer, 21 species at shrub layer and 46 species at herb layer, respectively. 2. In the soil chemical properties of the burned area of Samsinbong, pH was 5.8, and contents of Organic matter, Total nitrogen, Available $P_2O_5$, Exchangeable $K^+$, Exchange $Ca^{{+}{+}}$ and Exchange $Mg^{{+}{+}}$ were 7.42%, 0.73%, 28.5mg/kg, 1.3me/100g, 13.3me/100g and 2.2me/100g, respectively. But they showed a tendency to decrease by passing the time. In the soil chemical properties of the burned area of Mt. Chosdae, pH was 5.3, and contents of Organic matter, Total nitrogen, Available $P_2O_5$, Exchangeable $K^+$, Exchange $Ca^{{+}{+}}$ and Exchange $Mg^{{+}{+}}$ were 6.42%, 0.25%, 24.4mg/kg, 0.7me/100g, 3.7me/100g and 2.1me/100g, respectively, and they also showed a tendency to decrease by passing the time. 3. An the burned and unburned areas of Samsinbong, the total evolved amounts of soil respiration were $4,049.1mg/m^2/h$ and $9,950.0mg/m^2/h$, respectively. An the burned and unburned areas of Mt. Chosdae, the total evolved amounts of soil respiration were $4,392.4mg/m^2/h$ and $8,286.5mg/m^2/h$, respectively.

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Evaluating Properties for Bi-layer PZT thin film Fabricated by RF-Magnetron Sputtering System (RF-마그네트론 스퍼터링법으로 제작한 이층형 PZT의 특성평가)

  • Lim, Sil-Mook
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.21 no.8
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    • pp.222-227
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    • 2020
  • Pb(Zr,Ti)O3(denoted as PZT) in the perovskite phase is used as a dielectric, piezoelectric, and super appetizer material owing to its ferroelectric properties. A PZT film was formed by an RF magnetron sputtering process by preparing a target composed of Pb1.3(Zr0.52Ti0.48)O3. The PZT film was formed by dividing the material into a mono-layer PZT produced continuously with the same sputtering power and a bi-layer PZT produced with two-stage sputtering power. The bi-layer PZT consisted of a lower layer produced under low-power sputtering conditions and an upper layer produced under the same conditions as the mono-layer PZT. XRD revealed small amounts of pyrochlore phase in the mono-layer PZT, but only the perovskite phase was detected in the bi-layer PZT. SEM and AFM revealed the upper part of the bi-layer PZT to be more compact and smooth. Moreover, the bi-layered PZT showed superior symmetry polarization and a significantly reduced leakage current of less than 1×10-5 A/cm2. This phenomenon observed in bi-layer PZT was attributed to the induction of growth into a pure perovskite phase by suppressing the formation of a pyrochlore phase in the upper PZT layer where the densely formed lower PZT layer was produced sequentially.

Magnetoresistance of IrMn-Based Spin Filter Specular Spin Valves (IrMn 스핀필터 스페큘라 스핀밸브의 자기저항 특성)

  • Hwang, J.Y.;Rhee, J.R.
    • Journal of the Korean Magnetics Society
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    • v.14 no.6
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    • pp.236-239
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    • 2004
  • We studied the specular spin valve (SSV) having the spin filter layer (SFL) in contact with the ultrathin free layer composed of Ta3/NiFe2/IrMn7/CoFel/(NOLl)/CoFe2/Cu1.8/CoFe( $t_{F}$)/Cu( $t_{SF}$ )/(NOL2)/Ta3.5 (in nm) by the magnetron sputtering system. For this antiferromagnetic I $r_{22}$M $n_{78}$-pinned spin filter specular spin valve (SFSSV) films, an optimal magnetoresistance (MR) ratio of 11.9% was obtained when both the free layer thickness ( $t_{F}$) and the SFL thickness ( $t_{SF}$ ) were 1.5 nm, and the MR ratio higher than 11% was maintained even when the $t_{F}$ was reduced to 1.0 nm. It was due to increase of specular electron by the nano-oxide layer (NOL) and of current shunting through the SFL. Moreover, the interlayer coupling field ( $H_{int}$) between free layer and pinned layer could be explained by considering the RKKY and magnetostatic coupling. The coercivity of the free layer ( $H_{cf}$ ) was significantly reduced as compared to the traditional spin valve (TSV), and was remained as low as 4 Oe when the $t_{F}$ varied from 1 nm to 4 urn. It was found that the SFL made it possible to reduce the free layer thickness and enhance the MR ratio without degrading the soft magnetic property of the free layer.

Electroluminescent Properties of Anthracene-Based Dye with ${\alpha}-Naphthylethenyl$ Subsituent ((${\alpha}-Naphthyl$ Group이 치환된 안트라센 염료의 전계발광 특성)

  • Kim, Hong-Soo;Lee, Dong-Kyu;Nam, Ki-Dae
    • Journal of the Korean Applied Science and Technology
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    • v.16 no.2
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    • pp.127-133
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    • 1999
  • New electroluminescent materials base on anthracene chromophore, [9.10-bis(${\alpha}$-naph -thylethenyl) anthracene (${\alpha}$-BNA)] were newly synthesized. The anthracene derivatives with bulky substituent possessed high melting point and they gave stable amorphous films through vacuum - sublimation methods. Three types of electroluminescent devices were fabricated with double layer and triple layer structure : ITO/TPD/emission layer/MgAg, ITO/emission layer/ OXD-7 and ITO/ TPD/ emission layer/OXD-7/MgAg, respectively. In three types of devices with the emissive layer of ${\alpha}$-BNA, efficient orange electroluminescence was observed. In the triple layer device whit a emitting layer of 20 nm thickness , maximum luminance was about 10000 cd/ $m^2$ at an applied voltage of 10v and maximum external quantum efficiency was 1.0%.

Adhesive improvement of the Polyimide/Buffer layer/Cu at the COF(Chip On Film) (COF(Chip On Film)에서의 Polyimide/Buffer layer/Cu 접착력 향상)

  • 이재원;김상호;이지원;홍순성
    • Journal of the Semiconductor & Display Technology
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    • v.3 no.3
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    • pp.11-17
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    • 2004
  • This research has been progressed for adhesive improvement of the Polyimide/Buffer layer/Cu at the COF(Chip On Film) which induced as the alternative plan about high concentration of a circuit or substrates according to demands of miniaturization and high efficiency of various electronic equipment. RF plasma equipment was applied to when plama pretreatment was performed for improvement of adhesive strength of PI and Cr as the buffer layer. Experimental fluents were a species of the buffer layer, depositied time and the ratio of $O_2$/Ar when performed to plasma pretreatment. The results are that Ni was superior to Cr at peel test according to a species of the buffer layer, peel strength and Cu THK were showed proportional relation to deposition structure of the same buffer layer and sample of the Cr depositied time(30 sec) and Cu depositied time(20 min) was showed good adhesion to peel test according to Cr's depositied time and Cu's depositied time. When perform PI's plasma pretreatment peel strength and $O_2$/Ar ratio were showed proportional relation. But $O_2$/Ar(2/5) was best condition since then decreased.

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Improvement of Color Purity Using Hole Blocking Layer in Hybrid White OLED (Hole Blocking Layer 사용에 따른 하이브리드 백색 OLED의 색순도 향상에 관한 연구)

  • Kim, Nam-Kyu;Shin, Hoon-Kyu;Kwon, Young-Soo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.12
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    • pp.837-840
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    • 2014
  • Novel materials of $Zn(HPB)_2$ and Ir-complexes were respectively synthesized as blue or red emitting material. White Organic Light Emitting Diodes (OLED) were fabricated by using $Zn(HPB)_2$ for a blue emitting layer, Ir-complexes for a red emitting layer and $Alq_3$ for a green emitting layer. White OLED was fabricated by using double emitting layers of $Zn(HPB)_2$ and $Alq_3:Ir$-complexes, and hole blocking layer of BCP. We also varied the thickness of BCP. When the thickness of BCP layer was 5 nm, white emission was achieved. We obtained a maximum luminance of $3,500cd/m^2$. The CIE coordinates was (0.375, 0.331). From this study, we could propose that the hybrid structure is efficient in lighting application of white OLED by improvement of color purity.

A Comparative Study on the Various Blocking Layers for Performance Improvement of Dye-sensitized Solar Cells

  • Woo, Jong-Su;Jang, Gun-Eik
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.6
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    • pp.312-316
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    • 2013
  • In this study, short-circuit preventive layer (blocking layer) was deposited between conductive transparent electrode and porous $TiO_2$ film in the DSSCs. As blocking layer, we selected the metal-oxide such as $TiO_2$, $Nb_2O_5$ and ZnO. The sheet resistance with each different blocking layers were 18 ${\Omega}/sq.$ for the $TiO_2$, 10 ${\Omega}/sq.$ for the $Nb_2O_5$ and 8 ${\Omega}/sq.$ for the ZnO, while the RMS (Root Mean Square) roughness value of DSSCs were 39.61 nm for the $TiO_2$, 41.84 nm for the $Nb_2O_5$ and 36.14 nm for the ZnO respectively. From the results of photocurrent-voltage curves, a sputtered $Nb_2O_5$ blocking layer showed higher performance on 2.64% of photo-electrochemical properties. The maximum of conversion efficiency which was achieved under 1 sun irradiation by depositing the blocking layer increased up to 0.56%.

Luminance Characteristics of a Novel Red-Light-Emitting Device Based on Znq2 and Dye

  • Cho, min-Jeong;Park, Wan-Ji;Lee, Jeong-Gu;Lim, In-Su;Lim, Kee-Joe;Kim, Hyun-Hoo
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.2
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    • pp.16-19
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    • 2002
  • In this study, a novel red emitting organic electroluminescent (EL) device was fabricated with the bis(8-oxyquinolino)zinc II (Znq2) doped dye as an emitting layer. The Znq2 was synthesized successfully from zinc chloride (ZnC1$_2$) as an initial material. Then, we fabricated the red organic EL device with a dye (DCJTB) doped and inserted Znq2 between emission layer and cathode for increasing EL efficiency. The hole transporting layer is a N,N'-diphenyl-N,N'-bis-(3-methylphenyl)-1,1'-diphenyl-4,4-diamine (TPD), and the host material of emission layer is Znq2. And the electrical and luminance characteristics of the device were measured. We found that the EL device with Znq2 inserting layer results in the increasing luminance efficiency.

Effect of TiO2 buffer layer on the electrical and optical properties of IGZO/TiO2 bi-layered films

  • Gong, Tae-Kyung;joo, Moon hyun;Choi, Dong-Hyuk;Son, Dong-Il;Kim, Daeil
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.178.1-178.1
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    • 2015
  • In and Ga doped ZnO (IGZO) thin films were prepared by radio frequency magnetron sputtering without intentional substrate heating on glass substrate and TiO2-deposited glass substrates to consider the effect of a thin TiO2 buffer layer on the optical and electrical properties of the films. The thicknesses of the TiO2 buffer layer and IGZO films were kept constant at 5 and 100 nm, respectively. Since the IGZO/TiO2 bi-layered films show the higher FOM value than that of the IGZO single layer films, it is supposed that the IGZO/TiO2 bi-layered films will likely perform better in TCO applications than IGZO single layer films.

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