• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제53권2호
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• pp.62-66
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• 2004

This paper investigated the characteristics of a newly developed high density hollow cathode plasma (HCP) system and its application for the etching of silicon wafers. We used SF$_{6}$ and $O_2$ gases in the HCP dry etch process. Silicon etch rate of $0.5\mu\textrm{m}$/min was achieved with $SF_6$$O_2$plasma conditions having a total gas pressure of 50mTorr, and RF power of 100 W. This paper presents surface etching characteristics on a crystalline silicon wafer and large area cast type multicrystlline silicon wafer. The results of this experiment can be used for various display systems such as thin film growth and etching for TFT-LCDs, emitter tip formations for FEDs, and bright plasma discharge for PDP applications.s.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1996년도 춘계학술대회 논문집
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• pp.59-62
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• 1996

Plasma displays (PDP) as a large area wall-hanging display device are rabidly developed with flat CRT, TPT LCD and etc. Especially, AC Plasma Display Panels(AC PDPs) have the inherent memory function which is effective for large area displays. The memory function in AC PDPs is caused by the accumulation of the electrical charge on the protecting layer formed on the dielectric layer. This MgO protective layer prevents the dielectric layer from sputtering by ion in discharge plasma and also has the additional important roll in lowering the firing voltage due to the large secondary electron emission coefficient). Until now, the MgO Protective layer is mainly formed by E-Beam evaporation. With increasing the panel size, this process is difficult to attain cost reduction, and are not suitable for large quantity of production. To the contrary, the methode of shuttering are easy to apply on mass production and to enlarge the size of the panel and shows the superior adhesion and uniformity of thin film. In this study, we have prepared MgO protective layer on AC PDP Cell by reactive magnetron sputtering and studied the effect of MgO layer on the surface discharge characteristics of ac PDP.

• International Journal of Automotive Technology
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• 제3권1호
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• pp.9-16
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• 2002

In plasma jet ignition, combustion enhancement effects occur toward the plasma jet issuing direction. Therefore, when the igniter is attached at the center of a cylindrically shaped combustion chamber, plasma jet should issue toward the round combustion chamber wall. The plasma jet igniter that had an annular circular orifice has been developed. The purpose of this study is to elucidate the relationship between the newly developed plasma Jet igniter configuration and combustion enhancement effects. In this newly developed plasma Jet igniter, flame front wrinkle appears on the flame front and flame propagates rapidly. Plasma Jet influences on the flame propagation far long period when the plasma jet igniter has issuing angle 90 degrees and large cavity volume, because the plasma jet only lasts several ms. However, in the early stage of combustion, flame front area of issuing angle 45 degrees is larger than that of 90 degrees, because the initial flame kernel is formed by the plasma jet.

• 반도체디스플레이기술학회지
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• 제9권2호
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• pp.111-116
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• 2010

In a large area magnetron sputtering system, which is under the influence of high heat load from the plasma, it is necessary to use the effective water cooling in order to maintain the proper deposition performance and the economic use of target materials. A series of three-dimensional numerical simulations are carried out on the simplified model of the large area magnetron sputtering system with the cooling plate that includes the U-shaped water channel. The analysis is focused on the effects of water channel geometry, cooling water flowrate, thermal conductivity of target material, and the degree of target erosion on the cooling performance of cooling plate, which is represented by the temperature distribution of target material.

• 진공이야기
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• 제1권2호
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• pp.9-18
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• 2014

In this article, we present a brief explanation of simulation for magnetic confined fusion plasma. Devices for nuclear fusion experiment become large, complex, and expensive these days, so the simulation can be a valuable tool for understanding and expecting the fusion plasma physics. Research areas presented here are plasma equilibrium and instability, turbulence study, heating and current driving, boundary and divertor area plasma physics, and integrated operation scenario study. Traditionally, many foreign codes have been used because those are verified and stable, however our own MHD and gyrokinetic codes with better performance are under developing recently. While researchers have devoted their effort to make and use a simulation code in individual areas, many ones also endeavor to integrate the simulation codes in different areas for thorough understanding of fusion plasma physics.

• 진공이야기
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• 제2권4호
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• pp.16-26
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• 2015

Carbon nanomaterials including nanocrystalline diamond and graphene films are expected to play a core role in $21^{st}$ century industries due to their amazing physicochemical properties. To achieve their practical utilization and industrialization, the development of their mass production technologies is strongly required. Recently, a surface wave excited plasma (SWP) which is produced using microwaves has been attracting special attentions as a candidate for the mass production technology of carbon nanomaterials. SWP can allow a low-temperature large-area plasma chemical vapor deposition (CVD) system. Here, this article introduces the promising SWP-CVD technology. Plasma characteristics in a SWP will be introduced in detail to help understanding how to use and control a SWP as a plasma source for CVD applications.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 춘계학술대회 논문집
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• pp.697-698
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• 2010

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.146-146
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• 2016

Zinc Oxide (ZnO) was known as a promising material for surface acoustic wave devices, gas sensors, optical devices and solar cells due to piezoelectric material, large band gap of 3.37 eV and large exciton binding energy of 60 meV at room temperature. In particular, the alignment of ZnO nanostructures into ordered nanoarrays can bring about improved sensitivity of devices due to widen the surface area to catch a lot of gas particle. Oxygen plasma treatment is used to specify the nucleation site of round patterned ZnO nanorods growth. Therefore ZnO nanorods were grown on a quartz substrate with patterned polystyrene monolayer by hydrothermal method after oxygen plasma treatment. And then, we carried out nanostructures by adjusting the diameter of the arranged ZnO nanorods according to polystyrene spheres of various sizes. The obtained ZnO nanostructures was characterized by X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM).

• Journal of Astronomy and Space Sciences
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• 제7권2호
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• pp.113-123
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• 1990

전자 beam이 중성 plasma계에 들어왔을 때의 상호작용을 이차원 정전 model을 사용하여 수치계산을 한 결과 beam의 밀도변화에 따라 상호작용이 큰 변화를 보이는 것으로 나타났다. beam 전자의 밀도가 주변 전자의 밀도보다 낮을 때는 많은 양의 beam들이 주변 plasma와의 상호작용을 통해 위상공간에서 vortex 구조를 보이며 입사지역으로부터 멀리 진행할 수 있었던 반면 beam 전자들의 밀도가 높을 때는 대부분의 beam 전자들이 입사지역으로 되돌아오는 희귀전류를 형성하였다. 이 때 자기장의 게기에 따라 전자보다 훨씬 질랴이 큰 ion들이 가속될 수도 있으며 전자들의 전파와 상호작용의 양상이 크게 바뀔 수 있는 것으로 나타났다.

• 전력전자학회논문지
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• 제15권4호
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• pp.274-281
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• 2010

본 논문에서는 반도체 플라즈마 식각 시스템의 균일도 향상을 위한 CCP와 ICP 결합 임피던스정합 장치를 제안한다. 이중주파수 전원공급 장치는 CCP와 ICP로 구성되어 있고 첫 번째 구성은 고집적화를 위해 페라이트 코어를 사용한 유도 결합 플라즈마(ICP : Inductively Coupled Plasma)방식이며, 두 번째 구성은 셀 전체의 균일도 향상을 위한 용량 결합 플라즈마(CCP : Capacitively Coupled Plasma)방식이다. 제안된 시스템은 반도체 장비 산업에서 요구되는 높은 생산성을 실현할 수 있다. 본 논문에서는 제안된 시스템의 타당성을 검증하기 위해 CCP와 ICP 결합 임피던스정합 장치를 제작하였고, 이론적 분석과 27.12MHz 와 400kHz의 조건에서 시뮬레이션 및 실험을 진행하였다