• Journal of Radiation Protection and Research
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• 제48권4호
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• pp.204-212
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• 2023

Background: Isotopes of the projectile may be produced along the beam path during the irradiation of a target by a heavy ion due to inelastic interactions with the media. This study analyzed the production cross-section of carbon (C) and Helium (He) projectile's isotopes resulting from the interactions of these beams with different materials along the beam path. Materials and Methods: In this study, we transport C and He ion beams through different materials. This transportation was made by the Monte Carlo simulation. Particle and Heavy Ion Transport code System (PHITS) has been used for this calculation. Results and Discussion: It has been found that ¹⁰C, ¹¹C, and ¹³C from the ¹²C ion beam and ³He from the ⁴He ion beam are significant projectile's isotopes that have higher flux than other isotopes of these projectiles. The ⁴He ion beam has a higher projectile's isotope production cross-section along the beam path, which adds more impurities to the beam than the ¹²C ion beam. These projectile's isotopes from both the ¹²C and ⁴He ion beams have higher production cross-sections in hydrogenous materials like water or polyethylene. Conclusion: It is important to distinguish these projectile's isotopes from the primary beam particles to obtain a precise and accurate cross-section result by minimizing the error during measurement with a nuclear track detector. This study will show the trend of the production probability of projectile's isotopes for these ion beams.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2011년도 춘계학술대회 논문집
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• pp.1011-1012
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• 2011

• Journal of Korean Vacuum Science & Technology
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• 제7권1호
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• pp.1-7
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• 2003

The pressure distributions in the test stand built for developing KSTAR NBI ion sources were obtained using a network system composed of conductance elements modeling the ion source, the neutralizer, and other beam line components. The allowable regime was defined on the coordinates of the gas supply rate to the ion source and the neutralizer, considering the proper conditions of the three critical parameters, the ion source pressure for good arc discharge, the pressure integral in the neutralizer for sufficient neutralization, and the chamber pressure for minimum neutral beam loss. The neutral beam evolution along the path from the ion source extraction grid to the calorimeter through the neutralizer, the bending magnet and the vacuum chamber was estimated for typical pressure distributions.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.636-639
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• 2003

It is difficult to machine below 10 micrometers by conventional machining methods, such as micro-EDM. However, ultra micro machining using focused ion beam(FIB) is able to machine to 50 nanometers. In addition, 3 dimensional structures can be made by a combination of FIB and CVD to the level of 10 nanometers. Die ＆ moulds techniques are better than one-to-one machining techniques in the mass production of ultra size structures, in regards to production costs. In this case, the machining precision of die ＆ moulds affects produced parts. Also, it is advantageous to machine die ＆ moulds to the 10 micrometer level by FIB technique rather than other techniques. In this paper, the grooving characteristics for die ＆ mould materials by FIB were carried out experimentally in order to compare the machining characteristics of FIB with conventional machining methods. The results showed that the machining parameters and the scanning path of FIB affects the precision. The machined width and depth of the groove varied depending on the required depth due to the redeposition of the sputtered ion material accumulating on both the bottom and the side of the wall.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.304-304
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• 2012

CIGS(CuInGaSe2) 태양전지의 후면전극(Back contact)으로 널리 사용되는 Mo 박막은 낮은 면저항, 높은 반사율, 광흡수층 Na-path 제공 등의 조건이 요구된다. 일반적으로 Mo 박막 제작은 DC 마그네트론 스퍼터링 방법이 가장 널리 사용되며, 제작조건에 따라 태양전지 효율에 강한 영향을 미치는 것으로 보고되고 있다. 본 연구에서는 DC 마그네트론 스퍼터링 시 기판에 이온빔(Ion-beam)을 동시 조사하는 이온 빔 스퍼터링 증착(Ion-beam sputter deposition)법으로 Mo 박막을 제작하였다. 제작된 박막의 전기적 및 광학적 특성은 4-point probe, UV-Vis-NIR spectrometer로 각각 조사하였으며 Na-path 제어를 위한 구조적 특성은 XRD, FE-SEM으로 분석하였다. 분석결과에 따르면 기존 DC 마그네트론 스퍼터링 방법보다 상대적으로 더 치밀한 구조와 높은 반사율을 가지는 박막이 제작됨을 알 수 있었다. Mo 박막의 최적조건은 DC power 300 W, Ion-gun power 50 W, Ar flow rate 20 sccm 였다.

• Journal of the Korean Association of Oral and Maxillofacial Surgeons
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• 제47권4호
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• pp.315-320
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• 2021

Carbon-ion radiotherapy (CIRT) is on the rise as a treatment choice for malignant tumor. Compared to conventional radiotherapy, particle beams have different physical and biological properties. Particle beam provides a low entry dose, deposits most of the energy at the endpoint of the flight path, and forms an asymptotic dose peak (the "Bragg peak"). Compared to protons, carbon with its larger mass decreases beam scattering, resulting in a sharper dose distribution border. We report a 50-year-old male who underwent CIRT without surgical resection on osteosarcoma of the mandible. After CIRT, the patient's pain was gone, and the malignant mass remained stable with accompanying necrosis. Nine months later, however, magnetic resonance imaging demonstrated progression of the left mandibular osteosarcoma with pulmonary metastases. After multidisciplinary discussion, concurrent chemoradiotherapy was conducted. While necrotic bone segments came out of the mandible during subsequent periodic outpatient visits, the tumor itself was stable. Thirty months after his first visit and diagnosis, the patient is waiting for chemotherapy. Although CIRT is superior in treating radioresistant hypoxic disease, CIRT is in its infancy, so care must be taken for its indications and complications.

• 한국의학물리학회지:의학물리
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• 제7권2호
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• pp.57-65
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• 1996

피부 T 세포림프종에 대하여 4MeV 의 전자선으로 전 피부 방사선 조사를 시행하였다. 피부전체의 균일한 선량분포를 위하여 스탠포드대학의 방법으로 알려져 있는 six dual field 기법을 사용하였다. SSD 는 390cm로 하였으며 방사선 조사시의 gantry 의 각은 환자의 중심을 지나는 수평축에 대하여 상ㆍ하로 14$^{\circ}$가 되도록 하였다. 전자콘을 설치해야만 전자선 조사가 가능하므로 최대의 전자콘인 25$\times$25cm콘을 사용하였다. 치료면에서의 선량분포의 균일성을 확인하기 위하여 치료면에 90$\times$180cm의 폴리스틸렌을 설치하고 Famer type ion chamber와 측정용 필름을 사용하여 측정하였다. 그 결과 치료면에서 10% 정도의 균일함을 보였다. 환자의 자세를 하루에 세가지씩 이틀에 걸쳐 여섯가지 자세를 한 주기로 치료를 시행하였다. 선량이 부족한 정수리, 회음부, 발바닥 등은 따로 추가의 방사선을 조사하였다. 렌즈와 손톱, 발톱은 차폐물을 제작하여 차폐하였다.

• 분석과학
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• 제19권5호
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• pp.400-406
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• 2006

탄성되튐검출(Elastic Recoil Detection)법에 의한 박막시료의 수소 정량은 빔전류 측정의 신뢰성을 전제로 유기물 필름을 정량 비교체로 사용하여 이루어진다. 그러나 탄성되튐검출법에서 일반적으로 사용되는 편향각(tilt angle)인 $75^{\circ}$에서는 시편에 조사되는 일차 이온빔의 조사량을 정확하게 측정하기 어렵다. 시편의 편향각을 바꿔가며 탄성산란 신호를 비교하면 편향각이 커질수록 단위 조사량 당 산란신호는 감소하며 또한 시편의 표면 물질에 따라 이온빔전류 적산의 효율이 달라진다. 이러한 빔전류 적산과정의 오류를 제거하여 정량의 신뢰성을 제고하는 방법으로 되튐스펙트럼과 동시에 측정한 산란스펙트럼을 이용하여 빔 조사량을 결정하였다. 산란스펙트럼에 의한 조사량 결정법은 수 10%에 이르는 전류적산과정의 오차요인을 근본적으로 제거하여 되튐반응에 의한 수소정량의 신뢰성을 향상시켰다. 수소정량의 비교체로 사용해 왔던 폴리이미드 필름과 수소이온주입 시료, 그리고 카본웨이퍼를 대상으로 시험분석하고 기존의 전류적산에 의한 직접정량법과 비교하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.976-979
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• Transactions on Electrical and Electronic Materials
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• 제3권1호
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• pp.30-37
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.