• Title/Summary/Keyword: interfacial thermal resistance

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Research of Diffusion Bonding of Tungsten/Copper and Their Properties under High Heat Flux

  • Li, Jun;Yang, Jianfeng
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.14-14
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    • 2011
  • W (tungsten)-alloys will be the most promising plasma facing armor materials in highly loaded plasma interactive components of the next step fusion reactors due to its high melting point, high sputtering resistance and low deuterium/tritium retention. The bonding technology of tungsten to Cu alloy was one of the key issues. In this paper, W/CuCrZr diffusion bonding has been performed successfully by inserting pure metal interlay. The joint microstructure, interfacial elements migration and phase composition were analyzed by SEM, EDS, XRD, and the joint shear strength and micro-hardness were investigated. The mock-ups were fabricated successfully with diffusion bonding and the cladding technology respectively, and the high heat flux test and thermal fatigue test were carried out under actively cooling condition. When Ni foil was used for the bonding of tungsten to CuCrZr, two reaction layers, Ni4W and Ni(W) layer, appeared between the tungsten and Ni interlayer with the optimized condition. Even though Ni4W is hard and brittle, and the strength of the joint was oppositely increased (217 MPa) due primarily to extremely small thicknesses (2~3 ${\mu}m$). When Ti foil was selected as the interlayer, the Ti foil diffused quickly with Cu and was transformed into liquid phase at $1,000^{\circ}C$. Almost all of the liquid was extruded out of the interface zone under bonding pressure, and an extremely thin residual layer (1~2 ${\mu}m$) of the liquid phase was retained between the tungsten and CuCrZr, which shear strength exceeded 160 MPa. When Ni/Ti/Ni multiple interlayers were used for bonding of tungsten to CuCrZr, a large number of intermetallic compound ($Ni_4W/NiTi_2/NiTi/Ni_3T$) were formed for the interdiffusion among W, Ni and Ti. Therefore, the shear strength of the joint was low and just about 85 MPa. The residual stresses in the clad samples with flat, arc, rectangle and trapezoid interface were estimated by Finite Element Analysis. The simulation results show that the flat clad sample was subjected maximum residual stress at the edge of the interface, which could be cracked at the edge and propagated along the interface. As for the rectangle and trapezoid interface, the residual stresses of the interface were lower than that of the flat interface, and the interface of the arc clad sample have lowest residual stress and all of the residual stress with arc interface were divided into different grooved zones, so the probabilities of cracking and propagation were lower than other interfaces. The residual stresses of the mock-ups under high heat flux of 10 $MW/m^2$ were estimated by Finite Element Analysis. The tungsten of the flat interfaces was subjected to tensile stresses (positive $S_x$), and the CuCrZr was subjected to compressive stresses (negative $S_x$). If the interface have a little microcrack, the tungsten of joint was more liable to propagate than the CuCrZr due to the brittle of the tungsten. However, when the flat interface was substituted by arc interfaces, the periodical residual stresses in the joining region were either released or formed a stress field prohibiting the growth or nucleation of the interfacial cracks. Thermal fatigue tests were performed on the mock-ups of flat and arc interface under the heat flux of 10 $MW/m^2$ with the cooling water velocity of 10 m/s. After thermal cycle experiments, a large number of microcracks appeared at the tungsten substrate due to large radial tensile stress on the flat mock-up. The defects would largely affect the heat transfer capability and the structure reliability of the mock-up. As for the arc mock-up, even though some microcracks were found at the interface of the regions, all microcracks with arc interface were divided into different arc-grooved zones, so the propagation of microcracks is difficult.

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In-situ Synchrotron Radiation Photoemission Spectroscopy Study of Property Variation of Ta2O5 Film during the Atomic Layer Deposition

  • Lee, Seung Youb;Jeon, Cheolho;Kim, Seok Hwan;Lee, Jouhahn;Yun, Hyung Joong;Park, Soo Jeong;An, Ki-Seok;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.362-362
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    • 2014
  • Atomic layer deposition (ALD) can be regarded as a special variation of the chemical vapor deposition method for reducing film thickness. ALD is based on sequential self-limiting reactions from the gas phase to produce thin films and over-layers in the nanometer scale with perfect conformality and process controllability. These characteristics make ALD an important film deposition technique for nanoelectronics. Tantalum pentoxide ($Ta_2O_5$) has a number of applications in optics and electronics due to its superior properties, such as thermal and chemical stability, high refractive index (>2.0), low absorption in near-UV to IR regions, and high-k. In particular, the dielectric constant of amorphous $Ta_2O_5$ is typically close to 25. Accordingly, $Ta_2O_5$ has been extensively studied in various electronics such as metal oxide semiconductor field-effect transistors (FET), organic FET, dynamic random access memories (RAM), resistance RAM, etc. In this experiment, the variations of chemical and interfacial state during the growth of $Ta_2O_5$ films on the Si substrate by ALD was investigated using in-situ synchrotron radiation photoemission spectroscopy. A newly synthesized liquid precursor $Ta(N^tBu)(dmamp)_2$ Me was used as the metal precursor, with Ar as a purging gas and $H_2O$ as the oxidant source. The core-level spectra of Si 2p, Ta 4f, and O 1s revealed that Ta suboxide and Si dioxide were formed at the initial stages of $Ta_2O_5$ growth. However, the Ta suboxide states almost disappeared as the ALD cycles progressed. Consequently, the $Ta^{5+}$ state, which corresponds with the stoichiometric $Ta_2O_5$, only appeared after 4.0 cycles. Additionally, tantalum silicide was not detected at the interfacial states between $Ta_2O_5$ and Si. The measured valence band offset value between $Ta_2O_5$ and the Si substrate was 3.08 eV after 2.5 cycles.

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Hardness and EDM Processing of MoSi$_2$Intermetallics for High Temperature Ship Engine (고온선박엔진용 MoSi$_2$금속간화합물의 경도와 방전가공특성)

  • 윤한기;이상필
    • Journal of Ocean Engineering and Technology
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    • v.16 no.6
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    • pp.60-64
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    • 2002
  • This paper describes the machining characteristics of the MoSi$_2$--based composites through the process of electric discharge drilling with various tubular electrodes. In addition to hardness characteristics, microstructures of Nb/MoSi$_2$laminate composites were evaluated from the variation of fabricating conditions, such as preparation temperature, applied pressure, and pressure holding time. MoSi$_2$-based composites have been developed in new materials for jet engines of supersonic-speed airplanes and gas turbines for high-temperature generators. These high performance engines may require new hard materials with high strength and high temperature-resistance. Also, with the exception of grinding, traditional machining methods are not applicable to these new materials. Electric discharge machining (EDM) is a thermal process that utilizes a spark discharge to melt a conductive material. The tool electrode is almost -unloaded, because there is n direct contact between the tool electrode and the work piece. By combining a non-conducting ceramic with more conducting ceramic, it was possible to raise the electrical conductivity. From experimental results, it was found that the lamination from Nb sheet and MoSi$_2$ powder was an excellent strategy to improve hardness characteristics of monolithic MoSi$_2$. However, interfacial reaction products, like (Nb, Mo)SiO$_2$and Nb$_2$Si$_3$formed at the interface of Nb/MoSi$_2$, and increased with fabricating temperature. MoSi$_2$composites, with which a hole drilling was not possible through the conventional machining process, enhanced the capacity of ED-drilling by adding MbSi$_2$, relative to that of SiC or ZrO$_2$reinforcements.

Shear bond strength of a layered zirconia and porcelain according to treatment of zirconia liner (치과용 지르코니아 이장재 처리에 따른 지르코니아와 도재의 전단결합강도 비교)

  • Seo, Jeong Il;Park, Won Uk;Kim, Yang Geun
    • Journal of Technologic Dentistry
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    • v.39 no.1
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    • pp.43-52
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    • 2017
  • Purpose: Physical and chemical properties of gold is most suitable to be restored of teeth to its original state. Recently zirconia was used instead of gold because of esthetical and intimacy of human body. Because of high strength and high abrasion resistance of zirconia, all zirconia artificial tooth lead to wear the original tooth of opposite site. To preserve this original tooth, zirconia artificial tooth covered with dental ceramic glass was used. When joining the zirconia core and dental ceramic glass, difference of their thermal expansion coefficient and wetting ability is generated the residual stress at interface lead to crack. In order to solve this problem, intermediate layer what is called zir-liner was imported to decrease the residual stress and increase the bonding strength. Methods: In this study, to identify the optimum conditions for manufacturing process, various methods to rough the surface of zirconia core were adopted, and vary the thickness of interlayer, and analyzed bond strength. Results: Bond strength of sanding specimens group showed higher than that of non-sanding specimens group, and once applied intermediate layer with sanding specimens showed highest bond strength with 28 MPa. SEM photomicrographs of zirconia cores fired at $1500^{\circ}C$ showed parallel straight lines in sanding and pockmarked surface in blasting surfaces as abrasion traces. Observation of the destruction section after shear test by SEM were carried out. Liner applied non-sanding group and non-liner applied sanding group all showed interfacial crack. Sandblasting group with non-liner showed remained dental ceramic glass on the surface of zirconia. Sandblasting group with once applied liner showed partially remained liner and dental ceramic glass on the surface of zirconia. XRD analysis revealed that sandblasting group showed higher monoclinic peaks than other specimens group and this result was due to the high collision energy for stress induced phase transformation. Conclusions: A study on the improvement of bonding strength between zirconia and dental ceramic glass steadily carried out for the future to practical use.

Thermal and Electrical Properties of Poly(vinylidenefluoride-hexafluoropropylene)-based Gel-Electrolytes (Poly(vinylidenefluoride-hexafluoropropylene)계 겔-전해질의 열적, 전기적 특성)

  • 김영완;최병구;안순호
    • Polymer(Korea)
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    • v.24 no.3
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    • pp.382-388
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    • 2000
  • Polymer electrolyte films consisting of poly(vinylidenefluoride-hexafluoropropylene) (PVdF-HFP), LiClO$_3$ and a mixture of ethylene carbonate (EC) and ${\gamma}$-butyrolactone (GBL) were examined in order to obtain the best compromise between high ionic conductivity, homogeniety, dimensional and electrochemical stability. Measurements of ionic conductivity, differential scanning calorimetry and linear sweep voltammetry have been carried out for various compositions. The highest conductivity of 3.8$\times$10$^{-3}$ S$cm^{-1}$ / at 3$0^{\circ}C$ were obtained for a film of 30(PVdF-HFP)+7.8LiClO$_4$+62.2EC/GBL. From the DSC study, it has been found that the PVdF-HFP gels are stable up to 10$0^{\circ}C$, and the salt lowers the melting temperature of crystalline part of PVdF by interacting sensitively with polymer segments. When Lithium metal is in contact with the gel films, it tends to undergo corrosion and the reaction products accumulate resulting in the formation of a passive film on Li electrode. As the aging time progresses, the interfacial resistance increases continuously. Anodic stability is measured to extend up to about 4.5 V vs. Li.

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A Study on the Manufacturing and Mechanical Properties of the PA66/EPDM/PP Composites for Enhanced Low Temperature Fracture Resistances (저온 내충격성 향상을 위한 PA66/EPDM/PP 복합체 제조와 기계적 특성 연구)

  • Lee, Tae-Sik;Yoon, Chang-Rok;Bang, Dae-Suk;Ahn, Dae-Young;Kye, Hyoung-San;Shin, Kyung-Chul
    • Elastomers and Composites
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    • v.44 no.2
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    • pp.164-174
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    • 2009
  • PA66/EPDM/PP-g-MA and PA66/EPDM-g-MA/PP-g-MA composites were manufactured by a modular intermeshing twin screw extruder for enhanced low temperature impact resistance with different content of PP-g-MA. The results showed that composite containing 90 wt% of PA66, 8 wt% of EPDM-g-MA, and 2 wt% of PP-g-MA has a optimum value in the thermal and mechanical properties. The characteristics of the composites were analyzed by TGA, DSC, and SEM. From above results, we established that the low interfacial strength and the impact resistance at low temperature shown in a pre-existing PP/EPDM composite were enhanced by grafting with compatibilizer such as maleic anhydride. These results show the possibility of local manufacturing process and cost down with optimum screw configuration for best mixing quality in the twin screw extruder.

A Study on Improved Open-Circuit Voltage Characteristics Through Bi-Layer Structure in Heterojunction Solar Cells (이종접합 태양전지에서의 Bi-Layer 구조를 통한 향상된 개방전압특성에 대한 고찰)

  • Kim, Hongrae;Jeong, Sungjin;Cho, Jaewoong;Kim, Sungheon;Han, Seungyong;Dhungel, Suresh Kumar;Yi, Junsin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.35 no.6
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    • pp.603-609
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    • 2022
  • Passivation quality is mainly governed by epitaxial growth of crystalline silicon wafer surface. Void-rich intrinsic a-Si:H interfacial layer could offer higher resistivity of the c-Si surface and hence a better device efficiency as well. To reduce the resistivity of the contact area, a modification of void-rich intrinsic layer of a-Si:H towards more ordered state with a higher density is adopted by adapting its thickness and reducing its series resistance significantly, but it slightly decreases passivation quality. Higher resistance is not dominated by asymmetric effects like different band offsets for electrons or holes. In this study, multilayer of intrinsic a-Si:H layers were used. The first one with a void-rich was a-Si:H(I1) and the next one a-SiOx:H(I2) were used, where a-SiOx:H(I2) had relatively larger band gap of ~2.07 eV than that of a-Si:H (I1). Using a-SiOx:H as I2 layer was expected to increase transparency, which could lead to an easy carrier transport. Also, higher implied voltage than the conventional structure was expected. This means that the a-SiOx:H could be a promising material for a high-quality passivation of c-Si. In addition, the i-a-SiOx:H microstructure can help the carrier transportation through tunneling and thermal emission.

Autohesion Behavior of Brominated-Isobutylene-Isoprene Gum Nanocomposites with Layered Clay (층상점토 충전 브롬화 이소부틸-이소프렌 검 나노복합체의 점착거동)

  • Mensah, Bismark;Kim, Sungjin;Lee, Dae Hak;Kim, Han Gil;Oh, Jong Gab;Nah, Changwoon
    • Elastomers and Composites
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    • v.49 no.1
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    • pp.43-52
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    • 2014
  • The effect of nanoclay (Cloisite 20A) on the self-adhesion behavior of uncured brominated-isobutylene-isoprene rubber (BIIR) has been studied. The dispersion state of nanoclay into the rubber matrix was examined by SEM, TEM and XRD analysis. The thermal degradation behavior of the filled and unfilled samples was examined by TGA and improvement in the thermal stability of the nanocomposites occurred based on the weight loss (%) measurements. Also, addition of nanoclay enhanced the cohesive strength of the material by reinforcement action thereby reducing the degree of molecular diffusion across the interface of butyl rubber. However, the average depth of penetration of the inter-diffused chains was still adequate to form entanglement on either side of the interface, and thus offered greater resistance to peeling, resulting in high tack strength measurements. The improvement in tack strength was only achieved at critical nanoclay loading above 8 phr. Contact angle measurement was also made to examine the surface characteristics. There was no significant interfacial property change by employing the nanoclay.

The field emission characteristics of an oxidized porous polysilicon field emitter using Pt/Ti emitter-electrode (Pt/Ti 전극을 사용한 산하된 다공질 폴리 실리콘 전계방출소자의 특성)

  • Han Sang-Kug;Park Keun-Yong;Choi Sie-Young
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.6 s.336
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    • pp.23-30
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    • 2005
  • In this paper, OPPS(oxidized porous poly-silicon) field emitters were fabricated by using various emitter-electrode metal and these electron emission characteristics were investigated for different thermal annealing effects. The addressed OPPS field emitter with Pt/Ti emitter electrode annealed at $300^{\circ}C$-1hr showed the efficiency of $2.98\%$ at $V_{ps}$=12 V and one annealed at $350^{\circ}C$-1hr showed the highest efficiency of $3.37\%$at $V_{ps}$=16V. They are resulted from the improvement of interfacial contact characteristics of thin emitter metal to an oxidized porous poly-silicon and the decrease of electrical resistance of emitter metal. The brightness of the OPPS field emitter increases linearly in $V_{ps}$ and after oxidation process for $900^{\circ}C$-50min, the brightness of the OPPS field emitter with the as-deposited Pt/Ti emitter electrode was 3600 cd/$m^2$ at the $V_{ps}$=15 V, 6260 cd/$m^2$ at the $V_{ps}$=20 V. Thermal treatment improved the adhesion between the Ti buffer layer and the oxidized porous poly-silicon and also played an important role in the uniform distribution of electric field to the emitter electrode.

Microstructure and EDM Processing of $MoSi_2$ Intermetallic Composite ($MoSi_2$ 금속간화합물 복합재료의 미세구조와 방전가공특성)

  • Yoon, Han-Ki;Lee, Sang-Pill;Yoon, Kyong-Wok;Kim, Dong-Hyun
    • Proceedings of the Korea Committee for Ocean Resources and Engineering Conference
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    • 2002.05a
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    • pp.23-28
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    • 2002
  • This paper describes the machining characteristics of the $MoSi_2$ based composites by electric discharge drilling with various tubular electrodes, besides, Hardness characteristics and microstructures of $Nb/MoSi_2$ laminate composites were evaluated from the variation of fabricating conditions such as preparation temperature, applied pressure and pressure holding time. $MoSi_2$ -based composites has been developed in new materials for jet engine of supersonic-speed airplanes and gas turbine for high- temperature generator. Achieving this objective may require new hard materials with high strength and high temperature-resistance. However, With the exception of grinding, traditional machining methods are not applicable to these new materials. Electric discharge machining (EDM) is a thermal process that utilizes a spark discharge to melt a conductive material, the tool electrode being almost non-unloaded, because there is no direct contact between the tool electrode and the workpiece. By combining a nonconducting ceramics with more conducting ceramic it was possible to raise the electrical conductivity. From experimental results, it was found that the lamination from Nb sheet and $MoSi_2$ powder was an excellent strategy to improve hardness characteristics of monolithic $MoSi_2$. However, interfacial reaction products like (Nb, Mo)$SiO_2$ and $Nb_2Si_3$ formed at the interface of $Nb/MoSi_2$ and increased with fabricating temperature. $MoSi_2$ composites which a hole drilling was not possible by the conventional machining process, enhanced the capacity of ED-drilling by adding $NbSi_2$ relative to that of SiC or $ZrO_2$ reinforcements.

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