• Journal of the Korean Society for Precision Engineering
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• v.24 no.4 s.193
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• pp.153-158
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• 2007

Recently nano imprint lithography to fabricate photonic crystal on polymer is preferred because of its simplicity and short process time and ease of precise manufacturing. But, the technique requires the precise mold as an imprinting tool for good replication. These molds are made of the silicon, nickel and quartz. But this is not desirable due to complex fabrication process, high cost. So, we describe a simple, precise and low cost method of fabricating PDMS stamp to make the photonic crystals. In order to fabricate the PDMS mold, we make the original pattern with designed hole array by finding the optimal electron beam writing condition. And then, we have tried to fabricate PDMS mold by the replica molding with ultrasonic vibration and pressure system. We have used the cleaning process to solve the detaching problem on the interface. Using these methods, we acquired the PDMS mold for photonic crystals with characteristics of a good replication. And the accuracy of replication shows below 1% in 440nm at diameter and in 610nm at lattice constant by dimensional analysis by SEM and AFM.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.18 no.6
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• pp.697-701
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• 2009

A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• Bulletin of the Korean Chemical Society
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• v.32 no.9
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• pp.3348-3354
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• 2011

Oleanolic acid (OA) as template molecule, polyamide-6 (PA6) as basement membrane and poly(styrene-comaleic acid) (PSMA) were used to prepare PA6/PSMA-OA molecularly imprinted composite membranes by phase inversion method in supercritical $CO_2$ ($ScCO_2$). The template molecule (OA), [poly(styrene-co-maleic anhydride) (PSMAH), PSMA, molecularly imprinted membranes (MIMs) imprinting OA and MIMs after elution were all characterized by Fourier transform infrared spectroscopy (FTIR). The conditions that were the mass ratio between PSMA and OA from 3:1 to 8:1, temperature of $ScCO_2$ from $35^{\circ}C$ to $50^{\circ}C$ and pressure of $ScCO_2$ 12 MPa to 17 MPa were studied. It was obtained the largest adsorption rate and purity of OA after adsorption of the resultant MIMs, 50.41% and 96.15% respectively. After using PA6 film and non-woven fabrics as basement membrane respectively, it was found that smaller aperture of PA6 was used as basement membrane, a higher adsorption rate and a higher purity of OA after adsorption of the MIMs were obtained, and so were the stability and reproducibility of the resultant MIMs. After template molecules being removed, the MIMs had effective selectivity hydrogen bonding to separately bind in the binary components to the template molecules-oleanolic acid.