• Journal of Wetlands Research
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• v.8 no.4
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• pp.41-47
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• 2006

Global climatic changes are expected to influence various biogeochemical processes in wetland ecosystems. In particular, coastal mud flat is anticipated to be affected directly by temperature increase as well as indirectly by a sea level rise and changes in precipitation. This study aimed to determine changes in methane production under different temperature and salinity by employing a laboratory-scale manipulation experiment. Soil samples were collected from a mud flat in Dong-Gum Kang-Hwa island in winter and two types of experiments were conducted. In the first experiment soil samples at 0-5 cm, 5-10 cm depth were incubated under same salinity with pore water and diluted salinity to 50 % of natural condition for 20 days and methane production was measured every other days. In the second experiment, soil samples at 5-10 cm depth were incubated in different temperature, $5^{\circ}C$ and $15^{\circ}C$, under same salinity conditions with first experiment for 31 days and methane production was measured. Results of the first experiment revealed that higher amount of methane was produced at 5-10 cm depth, and salinity effect was predominant at the end of the experiment. The second experiment showed that methane production was higher in $15^{\circ}C$ than $5^{\circ}C$. In addition, methane production was higher when sea water diluted to 50 % compared to control. Global climatic changes are expected to influence various biogeochemical processes in wetland ecosystems. In particular, coastal mud flat is anticipated to be affected directly by temperature increase as well as indirectly by a sea level rise and changes in precipitation. This study aimed to determine changes in methane production under different temperature and salinity by employing a laboratory-scale manipulation experiment. Soil samples were collected from a mud flat in Dong-Gum Kang-Hwa island in winter and two types of experiments were conducted. In the first experiment soil samples at 0-5 cm, 5-10 cm depth were incubated under same salinity with pore water and diluted salinity to 50 % of natural condition for 20 days and methane production was measured every other days. In the second experiment, soil samples at 5-10 cm depth were incubated in different temperature, $5^{\circ}C$ and $15^{\circ}C$, under same salinity conditions with first experiment for 31 days and methane production was measured. Results of the first experiment revealed that higher amount of methane was produced at 5-10 cm depth, and salinity effect was predominant at the end of the experiment. The second experiment showed that methane production was higher in $15^{\circ}C$ than $5^{\circ}C$. In addition, methane production was higher when sea water diluted to 50 % compared to control. These results suggest that methane production is highly influenced by changes in temperature and salinity in coastal mud flat. And that global climatic change may induce biological feedback by affecting production of another greenhouse gas, namely methane from coastal mud flat.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.454-454
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• 2014

Silicon microwire array is one of the promising platforms as a means for developing highly efficient solar cells thanks to the enhanced light trapping efficiency. Among the various fabrication methods of microstructures, deep reactive ion etching (DRIE) process has been extensively used in fabrication of high aspect ratio microwire arrays. In this presentation, we show precisely controlled Si microwire arrays by tuning the DRIE process conditions. A periodic microdisk arrays were patterned on 4-inch Si wafer (p-type, $1{\sim}10{\Omega}cm$) using photolithography. After developing the pattern, 150-nm-thick Al was deposited and lifted-off to leave Al microdisk arrays on the starting Si wafer. Periodic Al microdisk arrays (diameter of $2{\mu}m$ and periodic distance of $2{\mu}m$) were used as an etch mask. A DRIE process (Tegal 200) is used for anisotropic deep silicon etching at room temperature. During the process, $SF_6$ and $C_4F_8$ gases were used for the etching and surface passivation, respectively. The length and shape of microwire arrays were controlled by etching time and $SF_6/C_4F_8$ ratio. By adjusting $SF_6/C_4F_8$ gas ratio, the shape of Si microwire can be controlled, resulting in the formation of tapered or vertical microwires. After DRIE process, the residual polymer and etching damage on the surface of the microwires were removed using piranha solution ($H_2SO_4:H_2O_2=4:1$) followed by thermal oxidation ($900^{\circ}C$, 40 min). The oxide layer formed through the thermal oxidation was etched by diluted hydrofluoric acid (1 wt% HF). The surface morphology of a Si microwire arrays was characterized by field-emission scanning electron microscopy (FE-SEM, Hitachi S-4800). Optical reflection measurements were performed over 300~1100 nm wavelengths using a UV-Vis/NIR spectrophotometer (Cary 5000, Agilent) in which a 60 mm integrating sphere (Labsphere) is equipped to account for total light (diffuse and specular) reflected from the samples. The total reflection by the microwire arrays sample was reduced from 20 % to 10 % of the incident light over the visible region when the length of the microwire was increased from $10{\mu}m$ to $30{\mu}m$.