Hole Mobility Characteristics of Biaxially Strained SiGe/Si Channel Structure with High Ge Content (고농도의 Ge 함량을 가진 Biaxially Strained SiGe/Si Channel Structure의 정공 이동도 특성)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.21 no.1
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- pp.44-48
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- 2008