• Title/Summary/Keyword: high $I_c$

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Epitaxial Growth of $Y_2O_3$ films by Ion Beam Assisted Deposition

  • Whang, C.N.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.26-26
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    • 2000
  • High quality epitaxial Y2O3 thin films were prepared on Si(111) and (001) substaretes by using ion beam assisted deposition. As a substrate, clean and chemically oxidized Si wafers were used and the effects of surface state on the film crystallinity were investigated. The crystalline quality of the films were estimated by x-ray scattering, rutherford backscattering spectroscopy/channeling, and high-resolution transmission electron microscopy (HRTEM). The interaction between Y and Si atoms interfere the nucleation of Y2O3 at the initial growth stage, it could be suppressed by the interface SiO2 layer. Therefore, SiO2 layer of the 4-6 layers, which have been known for hindering the crystal growth, could rather enhance the nucleation of the Y2O3 , and the high quality epitaxial film could be grown successfully. Electrical properties of Y2O3 films on Si(001) were measured by C-V and I-V, which revealed that the oxide trap charge density of the film was 1.8$\times$10-8C/$\textrm{cm}^2$ and the breakdown field strength was about 10MV/cm.

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Molecular Cloning and Characterization of a cDNA for the PSI-H Subunit Homolog of Photosystem I in Chinese Cabbage (배추로부터 광계 I의 PSI-H Subunit Homolog의 클로닝 및 분자생물학적 특성 연구)

  • Cha, Joon-Yung;Choi, Young-Jin;Lee, Hyo-Shin;Kim, Ki-Yong;Park, Geun-Je;Jo, Jin-Ki;Son, Dae-Young
    • Journal of The Korean Society of Grassland and Forage Science
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    • v.22 no.1
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    • pp.51-58
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    • 2002
  • PSI-H is an intrinsic membrane protein known to be essential for efficient electron flow in PSI complex. We isolated a cDNA clone encoding a PSI-H subunit homolog from Chinese cabbage (Brassica campestris L.). The cDNA, designated bpsaH, had an insert of 435 bp and a full open reading frame that would encode a protein of 145 amino acids. The amino acid sequence deduced from the cDNA sequence is 79.3% identical to that of spinach, suggesting the cDNA most likely encodes Chinese cabbage PSI-H subunit. The bpasH was expressed at high level in leaf tissue and low level in flower bud, whereas it was undetectable in root tissue.

Uniformity of Bi2212 Tubes Depending on Cooling Conditions (냉각 속도에 따른 Bi-2212 초전도 튜브의 균일성)

  • Lee, Nam-Il;Jnag, Gun-Eik;Park, Gwon-Bae;Oh, Il-Sung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.259-260
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    • 2006
  • This study was progressed to value of Bi2212 tubes uniformity depend on cooling conditions. The tube from 150 mm in length, 30 mm in O.D., 20 mm in I.D., 5 mm in thickness was combined with electrodes by 3 sections. The tube from 60, 70 mm in length, 30, 50 mm in O.D., 20.4, 40.4 mm in I.D., 4.8 mm in thickness was in controled of cooling rate by a heat exchanger. Bi2212 tubes were fabricated by Centrifugal Forming Process (CFP) and they were annealed at $840^{\circ}C$ for 80 h in oxygen atmosphere. The tube from 150 mm in length was analyzed by EFDLab of NIKA to show cooling rate and temperature distributions. When the tube was cooled for 100s, the temperature distributions was $663^{\circ}C$ in the middle, $500{\sim}647^{\circ}C$ in inlet, $598{\sim}647^{\circ}C$ in the other side. Electric characteristics from $I_c$ was 450 A in the middle, 650 A in inlet, 600 A in the other side. Electric characteristics by a heat exchanger showed the more fast cooling rate, the more high $I_c$.

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Effect of High-Temperature Post-Oxidation Annealing in Diluted Nitric Oxide Gas on the SiO2/4H-SiC Interface (4H-SiC와 산화막 계면에 대한 혼합된 일산화질소 가스를 이용한 산화 후속 열처리 효과)

  • In kyu Kim;Jeong Hyun Moon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.37 no.1
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    • pp.101-105
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    • 2024
  • 4H-SiC power metal-oxide-semiconductor field effect transistors (MOSFETs) have been developed to achieve lower specific-on-resistance (Ron,sp), and the gate oxides have been thermally grown. The poor channel mobility resulting from the high interface trap density (Dit) at the SiO2/4H-SiC interface significantly affects the higher switching loss of the power device. Therefore, the development of novel fabrication processes to enhance the quality of the SiO2/4H-SiC interface is required. In this paper, NO post-oxidation annealing (POA) by using the conditions of N2 diluted NO at a high temperature (1,300℃) is proposed to reduce the high interface trap density resulting from thermal oxidation. The NO POA is carried out in various NO ambient (0, 10, 50, and 100% NO mixed with 100, 90, 50, and 0% of high purity N2 gas to achieve the optimized condition while maintaining a high temperature (1,300℃). To confirm the optimized condition of the NO POA, measuring capacitance-voltage (C-V) and current-voltage (I-V), and time-of-flight secondary-ion mass spectrometry (ToF-SIMS) are employed. It is confirmed that the POA condition of 50% NO at 1,300℃ facilitates the equilibrium state of both the oxidation and nitridation at the SiO2/4H-SiC interface, thereby reducing the Dit.

Simulation and analysis of DC characteristics in AlGaN/GaN HEMTs on sapphire, SiC and Si substrates (Sapphire SiC, Si 기판에 따른 AlGaN/GaN HEMT의 DC 전기적 특성의 시뮬레이션과 분석)

  • Kim, Su-Jin;Kim, Dong-Ho;Kim, Jae-Moo;Choi, Hong-Goo;Hahn, Cheol-Koo;Kim, Tae-Geun
    • Journal of IKEEE
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    • v.11 no.4
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    • pp.272-278
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    • 2007
  • In this paper, we report on the 2D (two-dimensional) simulation result of the DC (direct current) electrical and thermal characteristics of AlGaN/GaN HEMTs (high electron mobility transistors) grown on Si substrate, in comparison with those grown on sapphire and SiC (silicon carbide) substrate, respectively. In general, the electrical properties of HEMT are affected by electron mobility and thermal conductivity, which depend on substrate material. For this reason, the substrates of GaN-based HEMT have been widely studied today. The simulation results are compared and studied by applying general Drift-Diffusion and thermal model altering temperature as 300, 400 and 500 K, respectively. With setting T=300 K and $V_{GS}$=1 V, the $I_{D,max}$ (drain saturation current) were 189 mA/mm for sapphire, 293 mA/mm for SiC, and 258 mA/mm for Si, respectively. In addition, $G_{m,max}$ (maximum transfer conductance) of sapphire, SiC, Si was 38, 50, 31 mS/mm, respectively, at T=500 K.

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Phenotypic Stability of a Temperature-Controllable Expression Vector on Phenylalanine Production by Escherichia coli (대장균을 이용한 Phenylalanine 생산에 있어서 온도조절형 발현 Vector의 안정성)

  • 강상모;박인숙
    • Microbiology and Biotechnology Letters
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    • v.19 no.5
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    • pp.433-438
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    • 1991
  • The plasmid pSY130-14 for the high production of phenylalanine is a temperaturecontrollable expression vector composed of the $P_R$ and the $P_L$ promoter and a temperature sensitive repressor, $cI_{857}$ of bacteriophage lambda. Strain AT2471 harbouring plasmid pSY13O- 14 is induced the phenylalanine production by shifting up the incubation temperaure to $38.5^{\circ}C$. Plasmid stability of E. coli AT2471 harbouring pSY130-14 was very low, it was about 30% after 48 h cultivation at $38.5^{\circ}C$ without kanamycin. The plasmid disappeared immediately at $40^{\circ}C$ without kanamycin, and at $40^{\circ}C$ adding kanamycin, the plasmid stability decreased at the beginning, but rose with the extension of the culture time. For the improvement of plasmid stability, the plasmid obtaind was designated as pSY15O-1 by changing origin region (ori) pACYC 177 of pSY130-14 for ori pSC101. E. coli AT2471 harbouring pSY150-1 was stable at $38.5^{\circ}C$ without tetracycline, and the plasrnid stability was about 40% after 48 h cultivation at $40^{\circ}C$.

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Development of Pilot-Scale Manufacturing Process of SiC Fiber from Polycarbosilane Precursor with Excellent Mechanical Property at Highly Oxidation Condition and High Temperature (폴리카보실란 전구체로부터 고온 산화성분위기서 기계적물성이 우수한 파이롯-규모의 탄화규소섬유 제조공정 개발)

  • Yoon, B.I.;Choi, W.C.;Kim, J.I.;Kim, J.S.;Kang, H.G.;Kim, M.J.
    • Composites Research
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    • v.30 no.2
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    • pp.116-125
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    • 2017
  • The purpose of this study is to develop silicon carbide fiber showing an excellent mechanical properties under highly oxidative conditions at high temperature. Polycarbosilane(PCS) as a preceramic precursor was used for making the SiC fiber. PCS fiber was taken by melt spinning method followed by melting the PCS at $300{\sim}350^{\circ}C$ in N2 gas. The Curing of PCS fiber was carried out in air oxygen chamber, prior to high temperature pyrolysis. Degree of cure was calculated by characteristic peak's ratio of Si-H to $Si-CH_3$ in FT-IR spectra before and after curing of PCS fiber. The properties of SiC fiber was affected greatly by the degree of cure. The SiC fiber produced by controlling fiber tension during heat treatment showed good properties. The SiC fiber exposed to $1000^{\circ}C$ at air from 1 min. up to maximum 50 hrs showed around 60% reduction in tensile strength. We found that large amount of carbon content on the fiber surface after long-term exposure has resulted in lower tensile strength.

Kinetics of Pholopolymerization of Acrylonitrile Using Sensitizer (광증감제에 의한 Acrylonitrile의 광중합 속도 (I))

  • Seul, Soo-Duk
    • Elastomers and Composites
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    • v.34 no.1
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    • pp.3-10
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    • 1999
  • Kinetics of solution photopolymerization of acrylonitrile(AN) with sensitizer, such as $NaSCN,\;KSCN,\;Ba(SCN)_2,\;NH_4SCN,\;ZnCl_2$ and $Na_2SeO_3$, were studied using UV crosslinker at various monomer concentrations($1.8{\sim}7.58mo1/1$), sensitizer concentrations($10{\sim}60%$), reaction temperature($10{\sim}70^{\circ}C$), energy intensities($1,000{\sim}9,900{\mu}J/cm^2$) at isothermal condition under nitrogen atmosphere. Under the irradiation of high pressure mercury lamp(${\lambda}=365nm$). High conversion and uniform molecular weight were obtained compare to thermal polymerization at reaction temperature of $50^{\circ}C$, reaction time of 3hr and 50% NaSCN without any initiator. Their kinetic model was as follows : $R_p=0.0142[M]^{0.82}[I]^{0.49}[S]^{0.52}$ exp(-1.33/RT).

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The Study on the Preparation of PSZ from the Domestic Zircon Sand its Applications I. Preparation of the High Purity Zirconia Powder form Domestic Zircon Sand (국산 지르콘사로부터 부분 안정화 지르코니아의 제조 및 그 응용에 관한 연구 I. 국산 지르콘사로부터 고순도 지르코니아 분말의 제조)

  • Kim. H.;Sunwoo, S.;Shin, K.C.;Hwang, K.H.
    • Journal of the Korean Ceramic Society
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    • v.24 no.2
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    • pp.186-192
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    • 1987
  • ZrO2 powders having high purity were prepared from domestic zircon sand using the caustic fusion method and the soda ash sintering process. In the caustic fusion method, ZrO2 recovery was reached to 96% when 100/140 mesh zircon was reacted with NaOH at the NaOH/Zircon mole ratio 6 and at 650$^{\circ}C$ for 2 hours. And in the soda ash sintering process, ZrO2 was recovered to 88.5% when -325 mesh zircon was reacted with Na2CO3 at the Na2CO3/Zircon mole ratio 1.1 and 1050$^{\circ}C$ for 2 hours. In both cases, Zr component was extracted to ZrOCl2, subsequently crystallized to ZrOCl2$.$8H2O to increase the purity, and converted to ZrO2 by precipitation. And to increase the sinter ability of powder, Cl- ion was removed and strong agglomeration was avoided by methanol distribution of Zr(OH)4 precipitates.

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Effects of the Heat-Treatment on the Nutritional Quality of Milk - I. Historical Development of the Heat-Treatment Technology in Milk - (우유의 열처리가 우유품질과 영양가에 미치는 영향 - I. 우유 열처리 기술의 발달사 -)

  • Jung, Anna;Oh, Sejong
    • Journal of Dairy Science and Biotechnology
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    • v.34 no.4
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    • pp.271-278
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    • 2016
  • The main purpose of milk heat-treatment is to improve milk safety for consumer by destroying foodborne pathogens. Secondly, heat-treatment of milk is to increase maintaining milk quality by inactivating spoilage microorganisms and enzymes. Pasteurization is defined by the International Dairy Federation (IDF, 1986) as a process applied with the aim of avoiding public health hazards arising from pathogens associated with milk, by heat treatment which is consistent with minimal chemical, physical and organoleptic changes in the product. Milk pasteurization were adjusted to $63{\sim}65^{\circ}C$ for 30 minutes (Low temperature long time, LTLT) or $72{\sim}75^{\circ}C$ for 15 seconds (High temperature short time, HTST) to inactivate the pathogens such as Mycobacterium bovis, the organism responsible for tuberculosis. Ultra-high temperature processing (UHT) sterilizes food by heating it above $135^{\circ}C$ ($275^{\circ}F$) - the temperature required to destroy the all microorganisms and spores in milk - for few seconds. The first LTLT system (batch pasteurization) was introduced in Germany in 1895 and in the USA in 1907. Then, HTST continuous processes were developed between 1920 and 1927. UHT milk was first developed in the 1960s and became generally available for consumption in the 1970s. At present, UHT is most commonly used in milk production.