• Tribology and Lubricants
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• v.18 no.2
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• pp.127-132
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• 2002

The Taguchi method, a robust experimental design, was used to optimize manufacturing parameters of a brake lining during hot pressing and heat treatment. A friction material containing 15 ingredients was employed fur this experiment and friction and wear tests were carried out by using a pad-on-disk type tribotester. Sixteen brake linings with different manufacturing conditions were examined according to a parameter design. From the results of the signal-to-noise (S/N) ratio and the analysis of variance (ANOVA), the cause and effect of the manufacturing parameters on physical properties (hardness and porosity) and friction and wear characteristics of brake linings was obtained.

• Journal of the Korean Society for Heat Treatment
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• v.9 no.2
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• pp.121-129
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• 1996

The solubility of Ti in Al matrix was determined by X-ray diffraction method on two different mechanical alloying systems, i.e Al+$Al_3Ti$ and Al+Ti alloys. Starting powder compositions of two systems were chosen for final volume fraction of $Al_3Ti$ phase being 25%. The solubility of Ti in ${\alpha}$-Al was estimated by the lattice parameter measurement of Al. For Al+$Al_3Ti$ mixture, it appeared that some of $Al_3Ti$ particles decomposed during milling and maximum solubility of Ti in Al was about 0.99%. The majority of $Al_3Ti$ particles were dispersed uniformly in Al matrix, having approximate size of 100~200 nm. On the other hand, higher Ti solubility of 1.24 wt.% was found in Al+Ti system, with starting composition of Al+10 wt.%Ti. After 15 hours of milling, Ti phase was identified as 20 nm sized particles embedded in Al matrix. The annealing of mechanically alloyed powders from Al+$Al_3Ti$ and Al+10 wt.%Ti systems was followed in the temperature range of 200 to $600^{\circ}C$ to study thermal stability of supersaturated solution of Al(Ti). After annealing, the lattice parameter of Al reverted back to that of pure Al, and the peak intensity ratio of $Al_3Ti$/Al was increased more than the original value before annealing. These results suggest that Ti dissolve into alpha-Al solutions during milling, and by annealing, $Do_{22}-Al_3Ti$ phase forms from Al(Ti) solution.

• Journal of the Korean Society for Heat Treatment
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• v.15 no.4
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• pp.172-177
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• 2002

The steady-static creep behaviors of Ti-6Al-4V alloy, using the constant stress creep tester, were investigated over the temperature range of $510{\sim}550^{\circ}C$(0.42~0.44Tm) and the stress range of 200~275 MPa($20.41{\sim}28.06kg/mm^2$). The stress exponents(n) for the static creep deformation of this alloy were 9.85, 9.35, 9.24 and 8.85 at the temperature of 510, 525, 535 and $550^{\circ}C$, respectively. The stress exponent(n) decreased with increasing the temperature and became close to about 5. The apparent activation energies(Q) for the static creep deformation were 254.4, 241.8, 234.4 and 221.9 kJ/mole for the stress of 200, 225, 250 and 275MPa, respectively. The activation energy(Q) decreased with increasing the stress. From the above results, it can be concluded that the static creep deformation for Ti-6Al-4V alloy was controlled by the dislocation climb over the ranges of the experimental conditions. Larson-Miller Parameter(P) for the crept specimens of Ti-6Al-4V alloy under the static creep conditions was obtained as $P=(T+460)({\log}\;t_r+21)$. The failure plane observed by SEM showed up dimple phenomenon at all range.

• Journal of the Korean institute of surface engineering
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• v.48 no.6
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• pp.253-259
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• 2015

The test equipment becomes more important with the development of semiconductor industry. MEMS probe is an important testing component to detect the defects from the generated electric signal when it contacts the metal pad of semiconductor devices. Ni-Pd alloy has been paid attention to as a candidate of MEMS probe material because of its high surface hardness and relatively low resistivity. In this study, electroplated Ni-Pd alloy has been prepared by using ethylene diamine as a complexing agent. Solid solution alloy coating could be formed when concentration of palladium chloride and current density were in the ranges of 1~5 mM and $0.2{\sim}1.5A/dm^2$, respectively. The increase of current density brought about an decrease in palladium content, which made both of lattice parameter and grain size smaller. As a result of grain refinement, high hardness could be obtained. However, surface cracking was observed due to residual stress when the current density was above $1.3A/dm^2$. When effects of heat treatment temperature on hardness and sheet resistance were investigated, the accompanied grain growth decreased both of them. The decrease of hardness remained stable at a temperature of $200^{\circ}C$. The sheet resistance was drastically reduced at $100^{\circ}C$. After that, it was found to become constant.

• Journal of the Korean institute of surface engineering
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• v.32 no.6
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• pp.671-676
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• 1999

ITO (indium tin oxide) thin films on PET (polyethylene terephthalate) substrate have been deposited by a dc reactive magnetron sputtering without heat treatments such as substrate heater and post heat treatment. Each sputtering parameter during the sputtering deposition is an important factor for the high quality of ITO thin films deposited on polymeric substrate. Particularly, the material, electrical and optical properties of as-deposited ITO oxide films are dominated by the ratio of oxygen partial pressure. As the experimental results, the excellent ITO films are prepared on PET substrate at the operating conditions as follows : operating pressure of 5 mTorr, target-substrate distance of 45mm, do power of 20~30W, and oxygen gas ratio of 10%. The optical transmittance is above 80% at 550 nm, and the sheet resistance and resistivity of films are 24 Ω/square and $1.5\times$10$^{-3}$ Ωcm, respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.427-431
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• 2000

ITO (indium tin oxide) thin films on PET (polyethylene terephthalate) and glass substrates have been deposited by a dc magnetron sputtering without heat treatments such as substrate heater and post heat treatment. Each sputtering parameter during the sputtering deposition is an important factor for the high quality of ITO thin films deposited on polymeric substrate. Particularly, the material, electrical and optical properties of as-deposited ITO oxide films are dominated by sputtering power, oxygen partial pressure and films thickness. As the experimental results, the XRD patters of ITO films are influenced by sputtering power and pressure. As the power and pressure are increased, (411) peak is grown suddenly. the electrical resistivity is also increased, as the sputteing power and pressure are increased. Transmittance of ITO thin films in visible light ranges is lowered with increasing the sputtering power and film thickness. Reflectance of ITO films in infia-red region is decreased, as the power and pressure is increased.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.555-556
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• 2006

The study examines hardness pattern of SH737-2Cu-.9C samples transient liquid phase sintered at different temperatures viz. $1120^{\circ}C$, $1180^{\circ}C$ and $1250^{\circ}C$, heat treated by various methods and then tempered at different temperatures. Sintered samples were characterized for density and densification parameter, and austenitized at $900^{\circ}C$, subsequently cooled by four different methods viz. annealing, normalizing, oil and brine quenching. Hardness pattern was found minimum for air cooled and maximum for brine quenched, and samples sintered at $1250^{\circ}C$ had relatively higher hardness. The O.Q and B.Q samples were then tempered at $200^{\circ}C$, $400^{\circ}C$, $600^{\circ}C$ and $700^{\circ}C$. Hardness pattern typically showed secondary hardness taking place, with maximum around $600^{\circ}C$.

• Proceedings of the SAREK Conference
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• 2009.06a
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• pp.645-649
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• 2009

Liquid desiccant cooling technology can supply cooling by using waste heat and solar heat which are hard to use effectively. For compact and efficient design of a dehumidifier, it is important to sustain sufficient heat and mass transfer surface area for water vapor diffusion from air to liquid desiccant on heat exchanger. In this study, the plate type heat exchanger is adopted which has extended surface, and hydrophilic coating and porous layer coating are adopted to enhance surface wettedness. PP(polypropylene) plate is coated by porous layer and PET(polyethylene terephthalate) non-woven fabric is coated by hydrophilic polymer. These coated surfaces have porous structure, so that falling liquid film spreads widely on the coated surface foaming thin liquid film by capillary force. The temperature of liquid desiccant increases during dehumidification process by latent heat absorption, which leads to loss of dehumidification capacity. Liquid desiccant is cooled by cooling water flowing in plate heat exchanger. On the plate side, the liquid desiccant can be cooled by internal cooling. However the liquid desiccant on extended surface should be moved and cooled at heat exchanger surface. Optimal mixing and distribution of liquid desiccant between extended surface and plate heat exchanger surface is essential design parameter. The experiment has been conducted to verify effective surface treatment and distribution characteristics by measuring wall side flow rate and visualization test. It is observed that hydrophilic and porous layer coating have excellent wettedness, and the distribution can be regulated by adopting holes on extended surface.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.17 no.1
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• pp.35-40
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• 2007

Cobalt ($Co^{2+}$) doped yttria stabilized cubic zirconia (YSZ, $Y_2O_3\;:\;25{\sim}50wt%$) single crystals grown by a skull melting method were heat-treated in $N_2\;at\;1000^{\circ}C$ for 5 hrs. The reddish brown single crystals were changed into either violet or blue color, respectively. Before and after heat treatment, the Co-doped YSZ crystals cut for wafers (${\phi}6.5{\times}t\;2mm$) and round brilliant (${\phi}10mm$). The optical and structural properties were examined by UV-VIS spectrophotometer and XRD. These results are analyzed absorption by $Co^{2+}\;(^4A_2(^4F)\to{^4P})\;and\;Co^{3+}$, change of energy gap and lattice parameter.

• Journal of the Korean Society for Heat Treatment
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• v.14 no.3
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• pp.151-154
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• 2001

$TiO_2$ thin film has wide application because of its high capacitanca, reflection, and good transmissivity in visible range. $TiO_2$ thin film can be made by thermal deposition method, reactive evaporation method, activated reactive evaporation(ARE) method. In the case of thermal deposition, the oxygen deficiency can occur because the melting point of Ti is very high. While in the case of reactive evaporation, high density $TiO_2$ can not be made, because reactive gas($O_2$) and evaporated material(Ti) are not fully combined, activated reactive evaporation, $TiO_2$ is easily deposited at lower gas pressure compared with reactive evaporation because the ionized reactive gas is made by plasma. Therefore, activated reactive evaporation is very useful to deposit the material having the high melting point. In this work, we formed $TiO_2$ thin film by activated reactive evaporation method. The surface of $TiO_2$ thin film was analyzed by X-ray photoelectron spectroscopy. The surface morphology which was analyzed by atomic force microscopy(AFM) shows that feature of the film surface is uniform. The dielectric capacitance, withstanding voltage were $600{\mu}F/cm^2$, 0.4V respectively. In further work, we can increase the withstanding voltage by improving the deposition parameter of substrates.