• Title/Summary/Keyword: halo reduction

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Advanced Frame Rate Conversion without Halo and judder effect for 120Hz LCD Displays

  • Lim, Kyoung-Won;Kim, Han-Soo;Noh, Hyun-Chul;Shin, Hyun-Chul;Jung, Woo-Chul;Koo, Gun-Jae;Park, Ryuk
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1397-1400
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    • 2008
  • Frame rate conversion became key technology due to recent advances in LCD panel refresh rates. Although many FRC algorithms have been developed and applied for LCD TV sets, they still suffer from well-known halo artifact. This paper discusses about the artifacts and method to handle them.

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The Behavior of the Mobility Degradation in Pocket Implanted MOSFETS (Halo 구조의 MOSFET에서 이동도 감소 현상)

  • Lee Byung-Heon;Lee Kie-Young
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.4 s.334
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    • pp.1-8
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    • 2005
  • The increased effective impurity due to the pocket ion implantation is well blown to give rise to a reduction of the effective mobility of halo MOSFETs. However, further decrease of the effective mobility can be observed in pocket implanted MOSFETs above the mobility reduction due to the Coulomb impurity scattering and the gate bias dependency of the effective mobility can also differ from the simple model describing the mobility behavior in terms of the effective impurity. Phonon scattering and surface scattering as well as impurity Coulomb scattering are also shown to be effective in the degradation of the carrier mobility of pocket implanted MOSFETs. Using the 1-D regional approximation the effect of the distribution of the inversion charge density along the channel on the drain current is investigated. The inhomogeneous channel charge distribution due to pocket implantation is also shown to contribute to the further reduction of the effective mobility in halo MOSFETs.

Highly Active Analogs of α-Factor and Their Activities Against Saccharomyces cerevisiae

  • Ahn, Hee Jun;Hong, Eun Young;Jin, Dong Hoon;Hong, Nam Joo
    • Bulletin of the Korean Chemical Society
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    • v.35 no.5
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    • pp.1365-1374
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    • 2014
  • Thirteen analogs of tridecapeptide ${\alpha}$-factor (WHWLQLKPGQPMY) of Saccharomyces cerevisiae with C- or N-terminal Trp extension and isosteric replacement by Aib at position 8 and 11, Trp at position 13, D-Ala at position 9, and Orn and Glu at position 6 were synthesized and assayed for their biological activity. Receptor binding assay was carried out using our newly developed spectrophotometric method with detector peptide 14. C- or N-terminal extended analogs, ${\alpha}$-factor-$[Trp]_n$ (n =1-5) 1-5 and $[N-Trp]_1$-${\alpha}$-factor 6, were all less active than native ${\alpha}$-factor and gradual decreases in both activity and receptor affinity were observed with greater Trp extension. Trp-substituted analog at position 13, $[Trp^{13}]{\alpha}$-factor 7, exhibited about 2-fold reductions in both activity and receptor affinity. Aib-substituted analogs, $[Aib^8]{\alpha}$-factor 8 and $[Aib^{11}]{\alpha}$-factor 9, showed 5- to 10-fold reduction in activity as well as 3-fold reduction in receptor affinity compared to native ${\alpha}$-factor. $[Orn^6]{\alpha}$-factor 10 demonstrated strong potency with a 7.0-fold increase in halo activity as well as 1.8-fold increase in receptor affinity compared to native ${\alpha}$-factor. For two double substituted analogs, [$Glu^6,{\small{D}}-Ala^9$]${\alpha}$-factor 12 showed the slightly decreased potency in halo activity compared to analog 10, whereas [$Orn^6,{\small{D}}-Ala^9$]${\alpha}$-factor 11 exhibited 15-fold higher halo activity as well as nearly 3-fold higher receptor affinity compared to native ${\alpha}$-factor.

Improvement of Boron Penetration and Reverse Short Channel Effect in 130nm W/WNx/Poly-Si Dual Gate PMOSEET for High Performance Embedded DRAM

  • Cho, In-Wook;Lee, Jae-Sun;Kwack, Kae-Dal
    • Proceedings of the IEEK Conference
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    • 2002.06b
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    • pp.193-196
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    • 2002
  • This paper presents the improvement of the boron penetration and the reverse short channel effect (RSCE) in the 130nm W/WNx/Poly-Si dual gate PMOSFET for a high performance embedded DRAM. In order to suppress the boron penetration, we studied a range in the process heat budget. It has shown that the process heat budget reduction results in suppression of the boron penetration. To suppress the RSCE, we experimented with the halo (large tilt implantation of the same type of impurities as those in the device well) implant condition near the source/drain. It has shown that the low angle of the halo implant results in the suppression of the RSCE. The experiment was supported from two-dimensional(2-D) simulation, TSUPREM4 and MEDICI.

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Fast and High-Quality Haze Removal Method Based on Transmission Correction (전달량 보정을 통한 고속 고품질의 안개 제거 방법)

  • Kim, Won-Tae;Bae, Hyun-Woo;Kim, Tae-Hwan
    • Journal of the Institute of Electronics and Information Engineers
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    • v.51 no.11
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    • pp.165-173
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    • 2014
  • This paper presents a fast and high-quality haze removal method by the modification of the conventional transmission estimation process. In the conventional haze removal method, the halo and blocking artifacts arises while estimating the transmission. In order to effectively reduce the artifacts, the proposed method employs the maximum filter after the calculation of the dark channel. Because of the reduction of the artifacts, the proposed method can simplify the transmission refinement process without sacrificing the quality of the results: this paper proposes to use the single-channel guided filter instead of the multi-channel guided filter. The experimental results demonstrate that the quality of the dehazed results by the proposed transmission correction process is improved and the haze removal speed is increased by up to 59.6%, when compared to the conventional ones.

A Study on the Antibacterial and Deodorization of Silk Fabrics Dyed with Natural Dye (II) ― Sappan Wood― (천연염료를 이용한 염색물의 항균, 소취성에 관한 연구(I) ―소 목―)

  • Lee, Sang Rag;Lee, Young Hee;Kim, In Hoi;Nam, Sung Woo
    • Textile Coloration and Finishing
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    • v.7 no.4
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    • pp.74-86
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    • 1995
  • Antibacterial and deodorization properties of silk fabrics dyed with Sappan wood are investigated by Halo, Shake flask, Bioassay and Detection column methods.The results are obtained as follows; 1. Although K/S values increase with Al mordant and concentrate concentrations, these are decreased in 10% Al mordant concentration in case of 4mlg dye concentration. 2. Reduction ratios of bacteria increase with K/S values in various tests. 3. When undyed silk fabrics are treated with Al mordant, reduction ratios of bacteria are not varied with Al mordant concentrations. 4. Deodorization property of Al pre-mordanted dyeing silk fabrics is better than one of unmordanted dyeing and raw silk fabrics. 5. Antibacterial properties of Cu and Cr mordanted dyeing fabrics are better than ones of the dyeing fabrics treated with the other mordants. 6. Natural dyes extracted from Sappan wood show the good antibacterial and deodorization properties, and colorant among various components contained in Sappan wood has a excellent antibacterial and deodorization properties.

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