• Transactions of Materials Processing
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• v.28 no.2
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• pp.63-70
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• 2019

This study investigates the effects of multi-axial diagonal forging (MADF) processing number on the microstructures of AA1100 fabricated using MADF processes. The cast AA1100 was annealed at $400^{\circ}C$ for 3hrs in $N_2$ atmosphere and cut into $25mm^3$ cubes for the MADF processes. The MADF process consist of plane forging with a thickness reduction of 30% and a diagonal forging with a diagonal forging angle of 135 degrees. In order to analyze the microstructural variations based on the number of repetitions, 1, 2, 3 and 4 cycles of the MADF process were performed. AA1100 specimens were successfully deformed without cracking of the surface for up to 4 cycles of MADF. The grain size, average misorientation and average grain orientation spread (GOS) of MADF processed materials were analyzed using EBSD technique. The results showed that MADF process effectively refined the microstructure of AA1100 with an initial average grain size of $337.4{\mu}m$. The average grain sizes of specimens which were MADF processed for 2, 3, 4 cycles were refined to be $1.9{\mu}m$, $1.6{\mu}m$, $1.4{\mu}m$, respectively. The grain refinement appeared saturated when AA1100 got MADF processed over 2 cycles. When the specimen was subjected to two or more cycles of MADF, the degree of decrease in the average grain size drastically decreased with an increase in the number of cycle due to the softening phenomena such as dynamic recovery or dynamic recrystallization during processing.

• Journal of the Korean Vacuum Society
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• v.8 no.3B
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• pp.333-339
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• 1999

$RuO_2$ thin films were prepared with various deposition conditions by rf magnetron sputtering. The films were annealed in vacuum, air, and air-vacuum, after that, the structural and electrical properties of the films were investigated. As the substrate temperature increases, the preferred orientation of the films changes from (101) to (200), and the grain size increases; especially, at $500^{\circ}C$, the size considerably increases. The preferred orientation of the films changes from (200) to (101) and the roughness of surface increase with the increase in oxygen partial pressure. The lowest value of resistivity of $RuO_2$ we prepared is $1.5\times 10^{-5}\Omega\codt\textrm{cm}$ at the conditions of $400^{\circ}C$ and 10% of oxygen partial pressure. After the processes of annealing, the films deposited at $400^{\circ}C$ and a oxygen partial pressure of 10% were relatively stable. The films deposited at $500^{\circ}C$ have denser structure and smoother surface when the films are annealed in vacuum after annealing in air.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.100-103
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• 2001

In order to investigate the magnetic properties of CoCr-based bilayered thin films on kind of underlayer, we introduced amorphous Si layer to Co-Cr(-Ta) magnetic layer as underlayer. With the thickness of CoCr, CoCrTa single layer, crystalline orientation and perpendicular coercivity was improved. It was revealed that by introducing the Si underlayer, the c-axis orientation of CoCr, CoCrTa magnetic layer was improved largely. However, with increasing Si film thickness, perpendicular coercivity and saturation magnetization of Cocr/si, CoCrTa/Si bilayered thin films was decreased. Grain size of bilayered thin films became larger.

• Proceedings of the Polymer Society of Korea Conference
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• 2006.10a
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• pp.189-189
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• 2006

The self-assembly of supramolecular dendrimers allows the rapid construction of nanosized structures with regularly ordered features that depend on the shape of the molecules and the relative strength of the intra-and intermolecular interactions. Here we report on a dramatic improvement in the degree of control and selectivity in the orientation of fan-shaped supramolecular molecules over a large area, which has been achieved by confined geometries and applied fields. The order and orientation of supramolecular dendrimers can be controlled by surface anchoring in confined geometries. POM, SEM, TEM, AFM and XRD results show that the molecules form the complicated defect-ordering in the microchannels with different feature sizes. We show that these defect domains are strongly influenced by the boundary and feature size of the surfaces. This technique can be used to create a grain size in the plane of the film that is much larger than that which can be achieved using previously reported soft-material based pattering.

• Korean Journal of Materials Research
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• v.12 no.8
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• pp.676-681
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• 2002

Microstructure, mechanical properties, and oxidation resistance of TiAIN thin films deposited on quenched and tempered STD61 tool steel by arc ion plating were studied using XRD, XPS and micro-balance. The TiAIN film was grown with the (200) orientation. The grain size of TiAIN thin film decreased with increasing Al contents, while chemical binding energy increased with Al contents. When hard coating films were oxidized at $850^{\circ}C$ in air, oxidation resistance of both TiN and TiCN films became relatively lower since the surface of films formed non-protective film such as $TiO_2$. However, oxidation resistance of TiAIN film was excellent because its surface formed protective layer such as $_A12$$O_3$ and $_Al2$$Ti_{7}$$O_{15}$, which suppressed oxygen intrusion.

• Journal of Industrial Technology
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• v.21 no.A
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• pp.221-229
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• 2001

The effect of Mo underlayer on the magnetic properties of CoCrTa/Cr films deposited on glass substrates were investigated. The coercivity increased and the coercivity squareness decreased by introducing Mo underlayer. The coercivity increase was attributed to the increase of in-plane c-axis orientation and magnetic isolation of Co grains deposited on Cr/Mo underlayer. The decrease of coercivity squarenesses seemed to be caused by the increase of magnetic isolation. The increase of magnetic isolation of Co grains was attributed to the diffusion of Mo atoms into grain boundaries of Co films and the physical isolation of Co grains. The coercivity of CoCrTa/Cr/Mo showed maximum values at Mo thickness of $400{\AA}$. The appearance of the maximum coercivity at that thickness was attributed to the development of strong $Co(10{\bar{1}}0)$ and $Co(10{\bar{1}}1)$ preferred orientation.

• Proceedings of the KIEE Conference
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• 1999.11d
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• pp.854-856
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• 1999

We prepared ZnO thin film with Facing Targets Sputtering system that can deposit thin film in plasma-free situation and change the deposition condition in wide range. And prepared thin film's c-axis orientation and grain size were analyzed by XRD(x-ray diffractometer). In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin film with good c-axis orientation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.324-327
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• 2000

ZnO(Zinc Oxide) thin films were deposited on glass substrate by Facing Targets Sputtering. Facing Targets Sputtering system can deposit thin films in plasma-free situation and change the sputtering conditions in wide range. The characteristics of ZnO thin films deposited at variation of sputtering conditions films thickness, power and substrate temperature were evaluated by XRD(x-ray diffractometer), ${\alpha}$-step (Tencor). The excellently c-axis oriented ZnO thin films were obtained at sputter pressure ImTorr, power 150W, substrate temperature 200$^{\circ}C$. In these conditions, the rocking curve of ZnO thin films deposited on glass was 3.3$^{\circ}$.

• Journal of the Korean institute of surface engineering
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• v.26 no.5
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• pp.245-254
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• 1993

The effects of pulse current electrolysis conditions on the composition and the microstructure of Ag-Sn alloy were studied by using a pyrophosphate bath. Both cathode current efficiency and throwing power of alloy deposits formed under pulse plating conditions, decreased with increasing mean current density, and lower than those under D.C. electrolysis condition. Tin content of Ag-Sn alloy decreased noticebly with in-creasing the mean current density, while it increased with the increase of On-time from 1 to 10 ms. The pre-ferred orientation of Ag-Sn alloy changed with increasing cathode overpotential in the sequence of (100)longrightarrow(100)+(111)longrightarrow(111) at $20^{\circ}C$ and (110)longrightarrow(111)longrightarrow(111)+(100) at $30^{\circ}C$. The effective crystal grain size of the alloy was decreased by decreasing temperature from $30^{\circ}C$ to $20^{\circ}C$ and the surface structure of them was related to the preferred orientation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.901-904
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• 2000

In order to investigate the effect of deposition conditions on crystallographic properties of ZnO thin films by Facing Targets Sputtering system which can deposit thin films in plasma-free situation and change the deposition conditions in wide range. The characteristics of zinc oxide thin films on power, inter targets distance, and substrate temperature were investigated by XRD(x-ray diffractometer), alpha-step (Tencor) analyses. The excellently c-axis oriented zinc oxide thin films were obtained at sputter pressure 1mTorr, sputtering current 0.4A, substrate temperature 300$^{\circ}C$, inter target distance 100mm. In these conditions, the rocking curve of zinc oxide thin films deposited on Glass was 3.9$^{\circ}$.