Modeling of silicon carbide etching in a $NF_3/CH_4$ plasma using neural network
($NF_3/CH_4$ 플라즈마를 이용한 실리콘 카바이드 식각공정의 신경망 모델링)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2003.07a
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- pp.58-62
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- 2003