• Journal of the Korean Vacuum Society
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• v.6 no.S1
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• pp.59-65
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• 1997

Efficient Si(100) etching by thermal H atoms at low substrate temperatures has been achieved. Gas-phase etching product $SiH_4$(g) upon H atom bombardment resulting from direct abstraction of $SiH_3$(a) by impinging H atoms was detected with a quadrupole mass spectrometer over the substrate temperature range of 105-408 K Facile depletion of all surface silyl ($SiH_3$) groups the dissociative adsorption product of disilane ($Si_2H_6$) at 105K from Si(100)2$\times$1 by D atoms and continuous regeneration and removal of $SiD_3$(a) were all consumed. These results provide direct evidence for efficient silicon surface etching by thermal hydrogen bombardment at cryogenic temperatures as low as 105K We attribute the high etching efficiency to the formation and stability of $SiH_3$(a) on Si(100) at lowered surface temperatures allowing the $SiH_3$(a) abstraction reaction by additional H atom to produce $SiH_4$((g).

• Journal of Biosystems Engineering
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• v.21 no.1
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• pp.72-83
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• 1996

This study was performed to find out drying characteristics and develop drying model for the design of an efficient dryer or drying system of garlic. The basic model which describes drying phenomenon of garlic was first established. A series of drying test were conducted with two varieties of garlic(Uiseong, Namdo) at 9-different drying conditions (drying temperatures ; $40^{\circ}C$, $50^{\circ}C$, $60^{\circ}C$, relative humidities ; 20%, 35%, 50%) and statistical analysis was made to fit the data with exponential equation, approximated diffusion equation, page equation, thompson equation and wang equation, respectively. In this test, the effects of drying air temperature and relative humidity on the drying rate were undertaken. Finally, new drying model based on these experimental results was developed to describe the drying characteristics of garlic. Also, the volatile components of garlic extracts were investigated. For experiment both Uisoeng and Namdo garlic were dried by heated-air-drying, followed by ether extraction. The extracts were analysed by Gas chromatography/Mass spectrometer.

• Bulletin of the Korean Space Science Society
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• 2003.10a
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• pp.94-94
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• 2003

위성체의 유기오염은 광학계 렌즈 등의 오염 민감 표면에 분자단위로 흡착되어 표면에 층을 이루며 존재하는 것으로 위성의 성능저하 및 임무실패를 야기할 수 있는 주요원인이 된다. 유기오염은 단순히 대기에 노출되는 것만으로도 발생할 수 있으며, 특히 고온 고진공 상태에서는 다른 표면들에서 outgassing된 물질들이 흡착될 수 있기 때문에 그 영향이 극대화 된다. 본 연구에서는 이러한 유기오염을 측정하기 위하여 청정실과 열진공챔버 내에 witness plate를 설치하고 이를 적외선분광장비로 분석하였다. 적외선 분광장비를 이용하여 ESA(European Space Agency) 문서를 기준으로 4가지 물질에 대하여 검교정을 수행하였고, 그 결과를 바탕으로 유기오염물을 정량분석 하였다. 또한 유기오염물질의 분별을 통해 보다 정확한 분석을 수행하기 위하여 GC-MS(Gas Chromatograph - Mass Spectrometer)를 사용하여 분석을 시도하였으며, 이를 국제 기준에 적용하기 위한 방안도 모색하였다.

• Proceedings of the IEEK Conference
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• 2001.06b
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• pp.197-200
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• 2001

Novel Enhanced Inductively Coupled Plasma is applied to etch $SiO_2$. Effect of $O_2$ or Ar addition to $C_{4}F_{8}$ gas is monitored by Optical Emission Spectroscopy and Quadrupole Mass Spectrometer. It is fund that Ar or $O_2$ dilution to $C_{4}F_{8}$ increases F emission intensity and decreases $CF_2$ intensity. However, the ac frequency to the Helmholtz coil decreases the F intensity and thus increases $CF_2$/F ratio. By adjusting the ac frequency, the optimum etch rate and PR to $SiO_2$ selectivity can be obtained in E-lCP.

• Asian-Australasian Journal of Animal Sciences
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• v.7 no.2
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• pp.223-229
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• 1994

The metabolic fate of methionine in rumen bacteria was studied by intraruminal administration of $^{15}N$ and $1-^{13}C$ labeled methionine in goats. Time course changes in isotopic abundance of amino acids in the rumen bacteria were determined with a computer-controlled gas-chromatograph mass spectrometer. The results from the transition of peak isotopic abundance in amino acids indicated that in rumen bacteria the $^{15}N$ or $^{13}C$ isotope in the methionine molecule was transferred rapidly to into bacteria, methionine administered intraruminally may not be retained as it is, but would be converted quickly to other metabolites in the bacteria.

• Journal of Korean Society of Environmental Engineers
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• v.29 no.6
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• pp.630-639
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• 2007

• Journal of the Korean Vacuum Society
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• v.10 no.1
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• pp.9-15
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• 2001

The total pressure and partial pressure of small cavity for flat panel display have been successfully measured by using an ultra-high vacuum chamber with mass spectrometer. The total pressure in the panel was in the range of $10^{-6}$ Torr and the major partial pressure affecting increase in total pressure were those of Ar, $CH_4$and He. The baking temperature during evacuation process was very important for high-vacuum package, the total pressure and partial pressure of $CH_4$ were decreased as the increase of baking temperature.

• Journal of the Korean Society of Food Science and Nutrition
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• v.24 no.2
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• pp.208-213
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• 1995

Andong Sikhe in Korea was prepared and fermented at 5$^{\circ}C$ and the taste and flavor compounds were evaluated. Major flavor components were identified by gas chromatography-mass spectrometer as camphene, sabinene, 1-(1, 5-dimethyl-4-hexyl)-4-methyl-benzene, alpha-zingibirene, farnesene, 2, 6-bis(1, 1-dimethylethyl)-4-metethyl-phenol, beta-sesquiphellandrene, calalene, tetradecanoic acid, and 9, 12-octadecanoic acid. The concentration of nonvolatile organic acid such as lactic acid, oxalic acid and citric acid were 18.10mg/100g, 1.04mg/100g and 1.37mg/100g, respectively, and those of other nonvolatile organic acid were a little. The pH and acidity of Andong Sikhe were 4.06 and 0.32 during fermentation and storage.

• Bulletin of the Korean Chemical Society
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• v.22 no.2
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• pp.171-178
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• 2001

A Purge and Trap Concentrator has been used to analyze various volatile organic compounds in water, operating several parameters affecting the extraction efficiencies of these compounds. The object of the present study was to observe the purge efficiencies of 40 volatile organic compounds (VOCs) in water, according to the change of parameters (purge time, dry purge time, sample temperature), and to determine the optimum condition of analysis of VOCs. The Purge and Trap Concentrator was interfaced with a narrow capillary connected to a gas chromatography mass spectrometer. At this condition, the detection limits of VOCs were in the range of 0.1-0.5 ㎍/L.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.30A no.7
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• pp.60-74
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• 1993

Experiments of RIE of tungsten films using SF$_{6}$ plasma were conducted to investigate the effect of process parameters on etch rate, uniformity, anisotropy, and selectivity. As power increased, the etch rate increased. Maximum etch rate was obtained at 200mtorr As interelectrode spacing increased the etch rate increased for P < 200mtorr while it decreased for P> 200mtorr. Etch rate was maximum at 20 sccm gas flow rate. As substrate temperature increased, the etch rate increased and activation energy was 0.046 eV. In addition, maximum etch rate was acquired at 20% $O_{2}$ addition. The etch rate slightly increased when Ar was added up to 20% while it continuously decreased when N$_{2}$ was added. Uniformity got improved as pressure decreased and was less than 4% for P <100mtorr. Mass spectrometer was utilized to analyze gas composition and S and F peaks were observed from XPS analysis with increasing power. The anisotropy was better for smaller power and spacing, and lower pressure and temperature. It improved when CH$_{4}$ was added and anisotropic etch profile was obtained when about 10% $O_{2}$ was added. The selectjvity was better for smaller power larger pressure and spacing, and lower temperature. Especially. low temperature processing was proposed as a novel method to improve the anisotropy and selectivity.