• Title/Summary/Keyword: gas flow ratio

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Effects of hydrogen addition during sputtering on the electrical properties of AIN insulating films for MIS device application (스퍼터링시 수소첨가가 MIS소자용 AIN절연박막의 전기적특성에 미치는 영향)

  • Kwon, Jung-Youl;Lee, Hwan-Chul;Lee, Heon-Yong
    • Journal of Hydrogen and New Energy
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    • v.10 no.1
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    • pp.59-69
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    • 1999
  • AlN thin films were fabricated by reactive sputtering for the application of MIS devices with Al/AlN/Si structure. It has investigated the surface morphology change, I-V characteristics, C-V characteristics, and chemical composition of AlN films with the intriducing time of hydrogen on the fixed deposition condition(RF power: 150W, sputtering pressure: 5mTorr, flow rate ratio of $Ar/N_2=1$, hydrogen concentration: 5%). By addition of the hydrogen the deposition rate decreased drastically whereas the surface morphology changed little. It has been found from the analysis of I-V and C-V characteristics curves that the films deposited with hydrogen addition in initial stage had lower leakage current density, lower flat band voltage and hystersis profile when compared with those with hydrogen addition in last stage. The oxygen concentration in AlN films decreased with addition of hydrogen gas, which suggesting a profitable role in the insulation and C-V characteristics of AlN films.

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Development of Biofilter for Reducing Offensive Odor from Pig House (돈사 악취 저감을 위한 바이오필터 개발)

  • Lee, Seung-Joo;Lim, Song-Soo;Chang, Dong-Il;Chang, Hong-Hee
    • Korean Journal of Environmental Agriculture
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    • v.24 no.4
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    • pp.386-390
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    • 2005
  • This study was conducted to develop the biofilter fur reducing ammonia $(NH_3)$ and hydrogen sulfide $(H_2S)$ gas emission from a pig house. A biofilter was designed and constructed by a type of squeeze air into the column type of air flow upward. Its column size was ${\Phi}260{\times}360mm$. It was used pressure drop gauge, turbo blower, air temperature, velocity sensor and control program that was programed by LabWindows CVI 5.5. Mixing materials were consisted with composted pine tree bark and perlite with 7:3 ratio (volume). The biofilter media inoculated with ammonia (Rhodococcus equi A3) and hydrogen sulfide (Alcaligenes sp. S5-5.2) oxidizing microorganisms was installed in a commercial pig house to analyzed the effectiveness of biogas removal for 10 days. Removal rates of ammonia and hydrogen sulfide gases were 90.8% and 81.5%, respectively. This result suggests that the pine compost-perlite mixture biofilter is effective and economic for reducing ammonia ana hydrogen sulfide gases.

Adsorption Characteristics of CO2 on Activated Carbons Treated with Alkali-metal Salts (알칼리금속염으로 처리된 활성탄에 대한 CO2의 흡착특성)

  • Ryu, Dong Kwan;Kim, Sung Hyun
    • Applied Chemistry for Engineering
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    • v.9 no.2
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    • pp.286-293
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    • 1998
  • Two methods were used to enhance the adsorption capacity of activated carbons. One is to impregnate activated carbons with chemical compounds which have a good affinity for $CO_2$. The other is to activate by heat-treating after impregnation with KOH on activated carbons(AC). The chemical compounds impregnated on AC were alkali metal, alkaline earth metal, and transition metal chlorides. The adsorption capacity of $CO_2$ on AC impregnated with these metals was less than that of pure AC. These compounds have not the chemical affinity for $CO_2$ and obstruct the micropore of AC. The experiment of breakthrough for $CO_2$ on AC impregnated with KOH showed the increase of the adsorbed amount of $CO_2$ in influent gases containing water vapor. This means that KOH adsorbes $CO_2$ gas. However, the adsorbents impregnated with KOH had not the reproducibility because of the production of $K_2CO_3$ by the reaction of KOH with $CO_2$. The amount of $CO_2$ adsorbed on the heat-treated AC at $800^{\circ}C$ increased with the amount of impregnation. The adsorption capacity of $CO_2$ was the largest when the ratio of weight of KOH to AC equal to 4. The isosteric heat of adsorption was calculated by the equation of Clausius-Clapeyron form adsorption capacity data of $CO_2$ for the temperature change. In addition, the characteristics of $CO_2$ breakthrough curve were surveyed for the change of flow rate and concentration.

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The Effect of Filter Media on the Biofiltration of Air Contaminated by Toluene (톨루엔으로 오염된 공기의 생물학적 여과에 대한 필터용 담체의 영향)

  • 홍성도;한희동;명성운;최호석;김인호
    • KSBB Journal
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    • v.16 no.6
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    • pp.603-608
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    • 2001
  • In this study, we studied on the remeval of toluene vapors in a lab-scale biofilter. Biofiltration was performed in a column fed downflow with contaminated air at ambient conditions. The column was packed with mixture of Peat and Calstene(5:3 vol. Ratio), Synthesized media, Bark and Wood chip, which were inoculated with microbial population of selected stains(Pseudomonas. putida, KCCM 11343, ATCC 12633). The microorganisms were immobilized on the bed medium and then biofilm were formed. The biofilter was operated under the conditions of various inlet toluene concentrations for 180 days and treated up to the elimination capacity of maximum 40 g/㎥hr at the inlet load of 30 g/㎥ hr with percentage removals of 20∼90% and gas retention times between 1 and 2 min. The pressure drop was very negligible through the biofilter columps because its value of 0.054 cmH$_2$O/m was much less than others. The effect of operating conditions such as flow rate, inlet toluene concentration and moisture contents on the performance of the biofilter was sequentially investigated in this study.

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Plasma Etching Characteristics of Sapphire Substrate using $BCl_3$-based Inductively Coupled Plasma ($BCl_3$ 계열 유도결합 플라즈마를 이용한 사파이어 기판의 식각 특성)

  • Kim, Dong-Pyo;Woo, Jong-Chang;Um, Doo-Seng;Yang, Xue;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.363-363
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    • 2008
  • The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.

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Vortical Etching Characteristics of SrBi$_2$Ta$_2$O$_9$ thin Films Depending on Ar/Cl$_2$ Ratios and RF/DC Power Densities (SrBi$_2$Ta$_2$O$_9$ 박막에 있어서 Ar/C1$_2$가스의 비율 및 RF/DC Power Density의 변화에 따른 수직 식각의 특성연구)

  • 황광명;이창우;김성일;김용태;권영석;심선일
    • Journal of the Microelectronics and Packaging Society
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    • v.8 no.3
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    • pp.49-53
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    • 2001
  • Vortical etching experiments of ($SrBi_2Ta_2O_9$)/Si thin films have been performed by using the inductively coupled plasma reactive ion etching (ICP-ME) apparatus. The purposes of these experiments are to get the effective area of vertical surface. Because this technology is very important to get good qualities of ferroelectric gate structure, capacitor and the minimum parasitic effects related to the excellent performances of the FRAM (Ferroelectric Random Access Memory) device. The reacting gases were Ar and $Cl_2$gases, and various $Ar/C1_2$flow ratios were used. The etching experiments were carried out at various RF powers such as 700, 700, 500W and at various DC powers such as 200, 150, 100, 50W, respectively. The maximum etch rate of $SrBi_2Ta_2O_9$/Si thin films was 1050 A/min at the $Ar/C1_2$ gas ratio of 20/16, RF power of 700 W and DC power of 200 W. From the SEM (scanning electron microscopy) image of the SBT thin films, the wall angle was as good as about $82^{\circ}$.

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The Electrochemical Characteristics of Hybrid Capacitor Prepared by Chemical Activation of NaOH (NaOH 화학적 활성화로 제조된 하이브리드 커패시터의 전기화학적 특성)

  • Choi, Jeong Eun;Bae, Ga Yeong;Yang, Jeong Min;Lee, Jong Dae
    • Korean Chemical Engineering Research
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    • v.51 no.3
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    • pp.308-312
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    • 2013
  • Active carbons with high specific surface area and micro pore structure were prepared from the coconut shell char using the chemical activation method of NaOH. The preparation process has been optimized through the analysis of experimental variables such as activating chemical agents to char ratio and the flow rate of gas during carbonization. The active carbons with the surface area (2,481 $m^2/g$) and mean pore size (2.32 nm) were obtained by chemical activation with NaOH. The electrochemical performances of hybrid capacitor were investigated using $LiMn_2O_4$, $LiCoO_2$ as the positive electrode and prepared active carbon as the negative electrode. The electrochemical behaviors of hybrid capacitor using organic electrolytes ($LiPF_6$, $TEABF_4$) were characterized by constant current charge/discharge, cyclic voltammetry, cycle and leakage tests. The hybrid capacitor using $LiMn_2O_4$/AC electrodes had better capacitance than other hybrid systems and was able to deliver a specific energy as high as 131 Wh/kg at a specific power of 1,448 W/kg.

Fabrication of Large Area Transmission Electro-Absorption Modulator with High Uniformity Backside Etching

  • Lee, Soo Kyung;Na, Byung Hoon;Choi, Hee Ju;Ju, Gun Wu;Jeon, Jin Myeong;Cho, Yong Chul;Park, Yong Hwa;Park, Chang Young;Lee, Yong Tak
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.220-220
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    • 2013
  • Surface-normal transmission electro-absorption modulator (EAM) are attractive for high-definition (HD) three-dimensional (3D) imaging application due to its features such as small system volume and simple epitaxial structure [1,2]. However, EAM in order to be used for HD 3D imaging system requires uniform modulation performance over large area. To achieve highly uniform modulation performance of EAM at the operating wavelength of 850 nm, it is extremely important to remove the GaAs substrate over large area since GaAs material has high absorption coefficient below 870 nm which corresponds to band-edge energy of GaAs (1.424 eV). In this study, we propose and experimentally demonstrate a transmission EAM in which highly selective backside etching methods which include lapping, dry etching and wet etching is carried out to remove the GaAs substrate for achieving highly uniform modulation performance. First, lapping process on GaAs substrate was carried out for different lapping speeds (5 rpm, 7 rpm, 10 rpm) and the thickness was measured over different areas of surface. For a lapping speed of 5 rpm, a highly uniform surface over a large area ($2{\times}1\;mm^2$) was obtained. Second, optimization of inductive coupled plasma-reactive ion etching (ICP-RIE) was carried out to achieve anisotropy and high etch rate. The dry etching carried out using a gas mixture of SiCl4 and Ar, each having a flow rate of 10 sccm and 40 sccm, respectively with an RF power of 50 W, ICP power of 400 W and chamber pressure of 2 mTorr was the optimum etching condition. Last, the rest of GaAs substrate was successfully removed by highly selective backside wet etching with pH adjusted solution of citric acid and hydrogen peroxide. Citric acid/hydrogen peroxide etching solution having a volume ratio of 5:1 was the best etching condition which provides not only high selectivity of 235:1 between GaAs and AlAs but also good etching profile [3]. The fabricated transmission EAM array have an amplitude modulation of more than 50% at the bias voltage of -9 V and maintains high uniformity of >90% over large area ($2{\times}1\;mm^2$). These results show that the fabricated transmission EAM with substrate removed is an excellent candidate to be used as an optical shutter for HD 3D imaging application.

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Design and Configuration of 200kW Organic Rankine Cycle Turbine (200kW ORC 터빈 개발 및 구성)

  • Han, Sangjo;Seo, JongBeom
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.38 no.12
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    • pp.1057-1064
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    • 2014
  • Recently, there has been a growing interest in sustainable energy. One method that has been used is an organic Rankine cycle using conventional turbine technology with a low-temperature waste heat source. A 200-kW organic Rankine cycle (ORC) system was designed for a waste heat recovery application using R245fa as the working fluid. A radial turbine running at 15,000 rpm was employed to generate more than 200 kW with an expansion ratio of nine. Because an ORC turbine uses a refrigerant as the working fluid, the ideal gas law was not employed to design the turbine. In addition, the complexity of the molecular structure of R245fa made it difficult to design the turbine. Because R245fa has an Ma value of one at a low velocity for the working fluid (about 1/3 of the speed of sound in air) at about $100^{\circ}C$, it easily reaches a supersonic flow condition with a small pressure expansion. To increase the efficiency of the turbine, a dual stage radial-type turbine with a subsonic speed was suggested. This paper will describe the design procedure and performance evaluation of the ORC turbine using R245fa.

Change of Volume of Isoflow in Pneumoconiosis Patients with Small Opacity (소음영 진폐증 환자에서의 등기류용량(Volume of Isoflow)의 변화)

  • Oh, Sang-Yong;Kim, Jee-Won;Jung, Chang-Young;Kim, Kyung-Ah;Yun, Im-Goung
    • Tuberculosis and Respiratory Diseases
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    • v.40 no.5
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    • pp.540-547
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    • 1993
  • Backgrounds: The measurement of volume of isoflow has been considered as a sensitive test for detecting small airway diseases showing normal pulmonary function in a routine pulmonary function test. To evaluate the functions of small airway among dust exposed workers, the changes of volume of isoflow were measured and its applicability of managing early stage pneumoconiosis patients was studied. Method: The subjects were 67 male, pneumoconiosis with small opacity and FEV1>80%, FEV1/FVC>75% in spirometry and the controls were 20 male, no dust-exposed office workers. The maximal epiratory volume curves after inhalation of indoor air and $He-O_2$ gas mixtures were measured and ${\Delta}V_{max50},\;{\Delta}V_{max75},\;V_{iso}V/VC$ between the dust exposed and control workers were compaired. Results: 1) There were no significant differences between two group in ${\Delta}V_{max50}$ and ${\Delta}V_{max75}$. But the ratio of $V_{iso}V/VC$ of the subjects was siginificantly higher than that of the control (p<0.01). This study confirms that $V_{iso}V/VC$ is a very useful index in early detection of small airway dysfunction. 2) The ratio of $V_{iso}V/VC$ of the subjects was signigicantly different between only smoker group and mixed group(smoker and nonsmoker). It suggestes that smoking is an important cousative factor of small airway dysfunction. 3) As the profusion of the chest X-ray increased, the rartio of $V_{iso}V/VC$ increased, but no significant difference of $V_{iso}V/VC$ was found between categories of pneumoconiosis. The categories of pneumoconiosis and small airway dysfunction may not be related. 4) No significant relationship was established between the duration of work and the ratio of $V_{iso}V/VC$. Conclusions : It is concluded that the measurement of $V_{iso}V/VC$ is useful to detect small airway dysfuction of early stage pnuemoconiosis patents with small opacities but showing normal pulmonary function in a routine pulmonary function test.

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