• JSTS:Journal of Semiconductor Technology and Science
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• v.14 no.5
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• pp.508-517
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• 2014

We design and analyze the n-channel junctionless fin-shaped field-effect transistor (JL FinFET) with 10-nm gate length and compare its performances with those of the conventional bulk-type fin-shaped FET (conventional bulk FinFET). A three-dimensional (3-D) device simulations were performed to optimize the device design parameters including the width ($W_{fin}$) and height ($H_{fin}$) of the fin as well as the channel doping concentration ($N_{ch}$). Based on the design optimization, the two devices were compared in terms of direct-current (DC) and radio-frequency (RF) characteristics. The results reveal that the JL FinFET has better subthreshold swing, and more effectively suppresses short-channel effects (SCEs) than the conventional bulk FinFET.

• IEIE Transactions on Smart Processing and Computing
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• v.5 no.5
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• pp.358-365
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• 2016

We propose a novel application of random forest, a machine learning-based general classification algorithm, to analyze the influence of design attributes on the silicon-to-SPICE (S2S) gap. To improve modeling accuracy, we introduce magnification of learning data as well as randomization for the counting of design attributes to be used for each tree in the forest. From the automatically generated decision trees, we can extract the so-called importance and impact indices, which identify the most significant design attributes determining the S2S gap. We apply the proposed method to actual silicon data, and observe that the identified design attributes show a clear trend in the S2S gap. We finally unveil 10nm key fin-shaped field effect transistor (FinFET) structures that result in a large S2S gap using the measurement data from 10nm test vehicles specialized for model-hardware correlation.

• JSTS:Journal of Semiconductor Technology and Science
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• v.10 no.4
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• pp.265-275
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• 2010

In this work, reliable methodology for device design is presented. Based on this method, the underlap length has been optimized for minimizing the gateinduced drain leakage (GIDL) in a 22-nm node 4-terminal (4-T) silicon-on-insulator (SOI) fin-shaped field effect transistor (FinFET) by TCAD simulation. In order to examine the effects of underlap length on GIDL more realistically, doping profile of the source and drain (S/D) junctions, carrier lifetimes, and the parameters for a band-to-band tunneling (BTBT) model have been experimentally extracted from the devices of 90-nm channel length as well as pnjunction test element groups (TEGs). It was confirmed that the underlap length should be near 15 nm to suppress GIDL effectively for reliable low standby power (LSTP) operation.