• Korean Journal of Soil Science and Fertilizer
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• v.49 no.4
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• pp.375-380
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• 2016

The use of polyethylene film has a problem such as increasing rural environmental contamination, collection costs and farmers' workload. The objective of this study was to evaluate bio-degradable films in terms of yield of maize and soil environment. Treatments were bio-degradable film A (BDF A), bio-degradable film B (BDF B), high density polyethylene (HDPE), and non-mulched (NM) soil. Daily mean values of soil temperature (10 cm depth) under BDF A, BDF B, and HDPE were higher than in NM soil by 2.2, 2.8, $3.1^{\circ}C$ respectively. In the mulching cultivation of maize, bio-degradable film began to degrade from 50~60days after the planting. The degradation was much progressed in the harvest time and almost decomposed in the following spring. The weight of ear of maize was not shown significantly by mulching treatments. There were little changes of soil chemical properties for the bio-degradable film mulching. After using bio-degradable films, the contents of biomass-C and dehydrogenase activity increased from 92 to $137{\sim}147mg\;kg^{-1}$, and from 87 to $123{\sim}168mg\;kg^{-1}$ respectively.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.36 no.6
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• pp.588-593
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• 2023

The advantage of OTFT technology is that large-area circuits can be manufactured on flexible substrates using a low-cost solution process such as inkjet printing. Compared to silicon-based inorganic semiconductor processes, the process temperature is lower and the process time is shorter, so it can be widely applied to fields that do not require high electron mobility. Materials that have utility as electrode materials include carbon that can be solution-processed, transparent carbon thin films, and metallic nanoparticles, etc. are being studied. Recently, a technology has been developed to facilitate charge injection by coating the surface of the Al electrode with solution-processable titanium oxide (TiOx), which can greatly improve the performance of OTFT. In order to commercialize OTFT technology, an appropriate method is to use a complementary circuit with excellent reliability and stability. For this, insulators and channel semiconductors using organic materials must have stability in the air. In this study, carbon-doped Mo (MoC) thin films were fabricated with different graphite target power densities via unbalanced magnetron sputtering (UBM). The influence of graphite target power density on the structural, surface area, physical, and electrical properties of MoC films was investigated. MoC thin films deposited by the unbalanced magnetron sputtering method exhibited a smooth and uniform surface. However, as the graphite target power density increased, the rms surface roughness of the MoC film increased, and the hardness and elastic modulus of the MoC thin film increased. Additionally, as the graphite target power density increased, the resistivity value of the MoC film increased. In the performance of an organic thin film transistor using a MoC gate electrode, the carrier mobility, threshold voltage, and drain current on/off ratio (I_on/I_off) showed 0.15 cm²/V·s, -5.6 V, and 7.5×10⁴, respectively.

• 한국초전도학회:학술대회논문집
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• v.14
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• pp.18-18
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• 2004

• Tribology and Lubricants
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• v.32 no.4
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• pp.119-124
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• 2016

In the sapphire wafering process, lapping is a crucial operation in order to reduce the damaged layer and achieve the target thickness. Many parameters, such as pressure, velocity, abrasive, slurry and plate, affect lapping characteristics. This paper presents an experimental investigation on the effect of the plate groove on the material removal rate and roughness of the wafer. We select the spiral pattern and rectangular type as the groove shapes. We vary the groove density by controlling the groove shape dimension, i.e., the groove width and pitch. As the groove density increases to 0.4, the material removal rate increases and gradually reaches a saturation point. When the groove density is low, the pressing load is mostly supported by the thick film, and only a small amount acts on the abrasives resulting to a low material removal rate. The roughness decreases on increasing the groove density up to 0.3 because thick film makes partial participations of large abrasives which make deep scratches. From these results, we could conclude that the groove affects the contact condition between the wafer and plate. At the same groove density, the pitch has more influence on reducing the film thickness than the groove width. By decreasing the groove density with a smaller pitch and larger groove width, we could achieve a high material removal rate and low roughness. These results would be helpful in understanding the groove effects and determining the appropriate groove design.

• Proceedings of the Korean Society of Medical Physics Conference
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• 2002.09a
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• pp.260-262
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• 2002

An accurate measurement of dose distribution is indispensable to perform radiation therapy planning. A measurement technique using a radiographic film, which is called a film dosimetry, is widely used because it is easy to obtain a dose distribution with a good special resolution. In this study, we tried to develop an analyzing system for the film dosimetry using usual office automation equipments such as a personal computer and an image scanner. A film was sandwiched between two solid water phantom blocks (30 ${\times}$ 30 ${\times}$ 15cm). The film was exposed with Cobalt-60 ${\gamma}$-ray whose beam axis was parallel to the film surface. The density distribution on the exposed film was stored in a personal computer through an image scanner (8bits) and the film density was shown as the digital value with NIH-image software. Isodose curves were obtained from the relationship between the digital value and the absorbed dose calculated from percentage depth dose and absorbed dose at the reference point. The isodose curves were also obtained using an Isodose plotter, for reference. The measurements were carried out for 31cGy (exposure time: 120seconds) and 80cGy (exposure time: 300seconds) at the reference point. While the isodose curves obtained with our system were drawn up to 60% dose range for the case of 80cGy, the isodose curves could be drawn up to 80% dose range for the case of 31cGy. Furthermore, the isodose curves almost agreed with that obtained with the isodose plotter in low dose range. However, further improvement of our system is necessary in high dose range.

• Journal of Biomedical Engineering Research
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• v.34 no.2
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• pp.73-79
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• 2013

Purpose: The purposes of this study were to measure the dose distribution of Photodynamic therapy(PDT) laser with 635 nm wavelength using GafChromic film. Method & Result: We made each output 300 J by changing mW and sec using the laser beam radiation mode such as C.W(Continuous Wave) mode, Pulse mode and Burst Pulse mode and measured the does at 0 mm and 5 mm of distance from optic fiber catheter end to the film, and at 5 mm distance by changing the angle of the end of the optic fiber catheter as $0^{\circ}$ and $0.5^{\circ}$. The radiated film was scanned and OD(Optical Density) was compared. And two-dimensional isodose curves were obtained and the consistency of shapes was compared. It was confirmed that there was consistency between optic density and the dose radiated on the film when we radiated GafChromic film by changing distance and angle of 300 J output in each radiation mode coordinating mW and sec. Conclusion: In this study, we could identify the stability according to changes in laser beam modes, changes in output according to distance, changes in uniformity according to angle, and beam profiles using GafChromic film, and we could also get two-dimensional isodose curve. It was found that small change in the distance and angle that is made when optic fiber catheter was contacted on the treatment area did not make big effects on the output of beam and the uniformity of dose, and it was also found that GafChromic film could be utilized for the purpose of QA of PDT laser beam.

• Journal of Korean Society of Water and Wastewater
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• v.30 no.5
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• pp.553-559
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• 2016

There has been increasing global interest in the environmental pollution problems produced by fossil fuel consumption and greenhouse gas emissions. In order to tackle these issues, new renewable energy such as solar, wind, bio gas, fuel cell and pressure retarded osmosis(PRO) have been developed extensively. Among these energy sources, PRO is one of the salinity gradient power generation methods. In PRO, energy is obtained by the osmotic pressure generated from the concentration difference between high and low concentration solutions separated by a semipermeable membrane. The development for high power density PRO membranes is imperative with the purpose of commercialization. This study investigates development of thin film composite PRO membrane and spiral wound module for high power density. Also, the influence of membrane backing layer on power density was identified, and the characteristic factors of PRO membranes was determined. Different backing layers were used to improve power density. As expected, the PRO membrane with more porous backing layer showed higher power density.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.68-68
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• 2011

As feature size is smaller, new technology are needed in semiconductor factory such as gap-fill technology for sub 100nm, development of ALD equipment for Cu barrier/seed, oxide trench etcher technology for 25 nm and beyond, development of high throughput Cu CMP equipment for 30nm and development of poly etcher for 25 nm and so on. We are focus on gap-fill technology for sub-30nm. There are many problems, which are leaning, over-hang, void, micro-pore, delaminate, thickness limitation, squeeze-in, squeeze-out and thinning phenomenon in sub-30 nm gap fill. New gap-fill processes, which are viscous oxide-SOD (spin on dielectric), O3-TEOS, NF3 Based HDP and Flowable oxide have been attempting to overcome these problems. Some groups investigated SOD process. Because gap-fill performance of SOD is best and process parameter is simple. Nevertheless these advantages, SOD processes have some problems. First, material cost is high. Second, density of SOD is too low. Therefore annealing and curing process certainly necessary to get hard density film. On the other hand, film density by Flowable oxide process is higher than film density by SOD process. Therefore, we are focus on Flowable oxide. In this work, dielectric film were deposited by PECVD with TSA(Trisilylamine - N(SiH3)3) and NH3. To get flow-ability, the effect of plasma treatment was investigated as function of O2 plasma power. QMS (quadruple mass spectrometry) and FTIR was used to analysis mechanism. Gap-filling performance and flow ability was confirmed by various patterns.

• Journal of the Korean Vacuum Society
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• v.1 no.1
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• pp.190-197
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• 1992

In this study we have investigated physical and electrical properties of high temperature oxide (HTO) thin film using dichlorosilane (DCS) gas. This film had low etch rate and excellent step coverage, and its characteristics of Si-O bond were similar to those of thermal oxide. I-V curves also showed similar electrical properties to those of thermally grown oxide (SiO2) while time dependent dielectric breakdown (TDDB) results revealed 1/4 value of thermal oxide. However, defect density was measured to be much lower value than that of thermal oxide.

• Proceedings of the KIEE Conference
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• 2007.11a
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• pp.126-127
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• 2007

In this study, the fabrication technique of a plannar field emission structure with DLC were studied Electric properties of carbon film on silicon substrate in methanol solution was carried out with various current density, solution temperature and electrode spacing between anode and cathode. The DLC film deposited on the Si substrate, plannar $SiO_2$ was obtained due to the shape of bottom electrode.