• 제목/요약/키워드: film crystallinity

검색결과 642건 처리시간 0.029초

Electrical, Optical, and Electrochemical Corrosion Resistance Properties of Aluminum-Doped Zinc Oxide Films Depending on the Hydrogen Content

  • Cho, Soo-Ho;Kim, Sung-Joon;Jeong, Woo-Jun;Kim, Sang-Ho
    • 한국표면공학회지
    • /
    • 제51권2호
    • /
    • pp.116-125
    • /
    • 2018
  • Aluminum-doped zinc oxide (AZO) is a commonly used material for the front contact layer of chalcopyrite $CuInGaSe_2$ (CIGS) based thin film solar cells since it satisfies the requisite optical and electrical properties with low cost and abundant elemental availability. Low-resistivity and high-transmission front contacts have been developed for high-performance CIGS solar cells, and nearly meet the required performance. However, the durability of the cell especially for the corrosion resistance of AZO films has not been studied intensively. In this work, AZO films were prepared on Corning glass 7059 substrates by radio frequency magnetron sputtering depending on the hydrogen content. The electrical and optical properties and electrochemical corrosion resistance of the AZO films were evaluated as a function of the hydrogen content. With increasing hydrogen content to 6 wt%, the crystallinity, crystal size, and surface roughness of the films increased, and the resistivity decreased with increased carrier concentration, Hall mobility, oxygen vacancies, and $Zn(OH)_2$ binding on the AZO surface. At a hydrogen content of 6 wt%, the corrosion resistance was also relatively high with less columnar morphology, shallow pore channels, and lower grain boundary angles.

절삭 공구용 다이아몬드 복합체의 저온 저압 소결 합성 및 후속 도전형 박막 공정 특성 연구 (A Study on the Sintering of Diamond Composite at Low Temperature Under Low Pressure and its Subsequent Conductive PVD Process for a Cutting Tool)

  • 조민영;반갑수
    • 한국산업융합학회 논문집
    • /
    • 제23권1호
    • /
    • pp.25-32
    • /
    • 2020
  • Generally, high-temperature, high-pressure, high-priced sintering equipment is used for diamond sintering, and conductivity is a problem for improving the surface modification of the sintered body. In this study, to improve the efficiency of diamond sintering, we identified a new process and material that can be sintered at low temperature, and attempted to develop a composite thin film that can be discharged by doping boron gas to improve the surface modification of the sintered body. Sintered bodies were sintered by mixing Si and two diamonds in different particle sizes based on CIP molding and HIP molding. In CVD deposition, CVD was performed using WC-Co cemented carbide using CH4 and H2 gas, and the specimen was made conductive using boron gas. According to the experimental results of the sintered body, as the Si content is increased, the Vickers hardness decreases drastically, and the values of tensile strength, Young's modulus and fracture toughness greatly increase. Conductive CVD deposited diamond was boron deposited and discharged. As the amount of boron added increased, the strength of diamond peaks decreased and crystallinity improved. In addition, considering the release processability, tool life and adhesion of the deposition surface according to the amount of boron added, the appropriate amount of boron can be confirmed. Therefore, by solving the method of low temperature sintering and conductivity problem, the possibility of solving the existing sintering and deposition problem is presented.

라디오파 마그네트론 스퍼터링으로 증착된 AZO 박막의 특성에 대한 급속 열처리 효과 (Effects of Rapid Thermal Annealing on the Properties of AZO Thin Films Grown by Radio-frequency Magnetron Sputtering)

  • 조신호
    • 한국진공학회지
    • /
    • 제18권5호
    • /
    • pp.377-383
    • /
    • 2009
  • 라디오파 마그네트론 스퍼터링 방법을 사용하여 사파이어 기판 위에 Al 도핑된 ZnO (AZO) 박막을 성장시킨 후에 온도 범위 $600-900^{\circ}C$에서 급속 열처리를 수행하였다. 박막의 결정 구조와 표면 형상은 각각 X-선 회절법과 주사전자현미경으로 조사하였다. 급속 열처리 온도가 증가함에 따라 박막의 결정성은 향상되었고, 평균 50 nm의 크기를 갖는 육각형 형태의 결정 입자가 관측되었다. 증착된 모든 박막은 파장 영역 400-1100 nm에서 92%의 평균 투과율을 나타내었다. 열처리 온도가 증가함에 따라 박막의 밴드갭 에너지는 감소하였고, 광여기 발광 신호의 경우에 자외선 발광 신호의 세기가 감소하면서 400 nm에 중심을 둔 보라색 발광 신호가 주된 피크를 형성하였다. 박막의 전기적 특성은 열처리 온도에 현저한 의존성을 보였다.

태양전지모듈용 고내구성 저가형 백시트 (Low-costBacksheet Materials with Excellent Resistance to Chemical Degradation for Photovoltaic Modules)

  • 표세연;이창현
    • 멤브레인
    • /
    • 제25권3호
    • /
    • pp.287-294
    • /
    • 2015
  • 태양전지는 태양복사에너지를 반도체의 광전효과를 통해 전기에너지로 변환시키는 친환경 에너지변환장치를 의미한다. 수분을 포함하는 다양한 화학물질들에 대한 높은 차단성을 갖는 다층형 필름인 백시트는 태양전지의 중요한 요소이다. 대표적인 백시트는 polyvinyl fluoride (PVF)와 poly(ethylene terephthalate) (PET)의 다층필름으로 구성된다. PVF는 높은 내후성을 가지는 반면, 가격이 상대적으로 비싼 단점을 보인다. 따라서, 백시트의 제조가격을 낮출 수 있으면서, 동시에 실제 태양전지모듈에 적용할만한 수명특성을 만족시킬 수 있는 대체소재의 개발이 필수적이다. 본 연구에서는 일정수준의 결정성을 갖는 PET 필름을 PVF 필름 대신 사용하였다. 그러나, PET 소재는 다양한 pH 조건에서 trans-esterification 및 가수분해에 의해 분해될 수 있기 때문에, 태양전지의 구동조건에서 PET의 분해거동을 이해할 필요가 있다. 단시간 내 화학적 분해거동을 평가하기 위해서, 가속화된 PET 분해실험 프로토콜이 개발되었다. 마지막으로, 제안 개념의 효용성은 태양전지모듈의 장기운전성능 평가를 통해 확인하였다.

RTCVD 법으로 성장한 실리콘 에피막의 특성 (Characteristics of the Silicon Epitaxial Films Grown by RTCVD Method)

  • 정욱진;권영규;배영호;김광일;강봉구;손병기
    • 센서학회지
    • /
    • 제5권1호
    • /
    • pp.63-70
    • /
    • 1996
  • RTCVD (rapid thermal chemical vapor deposition) 법을 이용하여 급준한 불순물 농도분포를 갖는 서브마이크론 두께의 실리콘 에피막을 성장하였다. 실리콘 에피막 성장은 $SiH_{2}Cl_{2}\;/\;H_{2}$ 혼합가스를 사용하고, $H_{2}$ probating 공정을 포함하는 여러 가지 공정변수들을 변화하면서 성장계면에서의 불순물 농도 분포의 계면특성 및 성장율, 결정성등을 평가하였다. 실리콘 에피막의 결정성은 $900^{\circ}C$ 에서 $H_{2}$ prebaking 공정 후 동일한 온도에서 성장한 경우에 전위등의 결함이 보이지 않았으며, $SiH_{2}Cl_{2}$ 원료가스의 부피비에 따라 실리콘 에피막의 성장율을 선택함으로서 에피막 두께를 서브마이크론 까지 조절할 수 있었다. 실리콘에피막의 불순물 농도분포는 성장 계면에서 약 $200{\AA}/decade$ 로 급격하게 조절될 수 있음을 SIMS 법에 의한 분석으로 확인하였다.

  • PDF

AlN 버퍼층위에 성장된 M/NEMS용 다결정 3C-SiC 박막의 특성 (Characteristics of polycrystalline 3C-SiC thin films grown on AlN buffer layer for M/NEMS applications)

  • 정귀상;김강산;이종화
    • 센서학회지
    • /
    • 제16권6호
    • /
    • pp.457-461
    • /
    • 2007
  • This paper describes the characteristics of poly (polycrystalline) 3C-SiC grown on $SiO_{2}$ and AlN substrates, respectively. The crystallinity and the bonding structure of poly 3C-SiC grown on each substrate were investigated according to various growth temperatures. The crystalline quality of poly 3C-SiC was improved from resulting in decrease of FWHM (full width half maximum) of XRD and FT-IR by increasing the growth temperature. The minimum growth temperature of poly 3C-SiC was $1100^{\circ}C$. The surface chemical composition and the electron mobility of poly 3C-SiC grown on each substrate were investigated by XPS and Hall Effect, respectively. The chemical compositions of surface of poly 3C-SiC films grown on $SiO_{2}$ and AlN were not different. However, their electron mobilities were $7.65{\;}cm^{2}/V.s$ and $14.8{\;}cm^{2}/V.s$, respectively. Therefore, since the electron mobility of poly 3C-SiC films grown on AlN buffer layer was two times higher than that of 3C-SiC/$SiO_{2}$, a AlN film is a suitable material, as buffer layer, for the growth of poly 3C-SiC thin films with excellent properties for M/NEMS applications.

직접패턴형 SnO2 박막의 전도성 나노구조체 첨가연구 (Direct-Patternable SnO2 Thin Films Incorporated with Conducting Nanostructure Materials)

  • 김현철;박형호
    • 한국재료학회지
    • /
    • 제20권10호
    • /
    • pp.513-517
    • /
    • 2010
  • There have been many efforts to modify and improve the properties of functional thin films by hybridization with nano-sized materials. For the fabrication of electronic circuits, micro-patterning is a commonly used process. For photochemical metal-organic deposition, photoresist and dry etching are not necessary for microscale patterning. We obtained direct-patternable $SnO_2$ thin films using a photosensitive solution containing Ag nanoparticles and/or multi-wall carbon nanotubes (MWNTs). The optical transmittance of direct-patternable $SnO_2$ thin films decreased with introduction of nanomaterials due to optical absorption and optical scattering by Ag nanoparticles and MWNTs, respectively. The crystallinity of the $SnO_2$ thin films was not much affected by an incorporation of Ag nanoparticles and MWNTs. In the case of mixed incorporation with Ag nanoparticles and MWNTs, the sheet resistance of $SnO_2$ thin films decreased relative to incorporation of either single component. Valence band spectral analyses of the nano-hybridized $SnO_2$ thin films showed a relation between band structural change and electrical resistance. Direct-patterning of $SnO_2$ hybrid films with a line-width of 30 ${\mu}m$ was successfully performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated, and the electrical properties of $SnO_2$ films can be improved by incorporating Ag nanoparticles and MWNTs.

RF스퍼터링법으로 성장시킨 n-ZnO 박막과 n-ZnO/p-GaN 이종접합 LED의 특성 (Properties of the RF Sputter Deposited n-ZnO Thin-Film and the n-ZnO/p-GaN heterojunction LED)

  • 신동휘;변창섭;김선태
    • 한국재료학회지
    • /
    • 제23권3호
    • /
    • pp.161-167
    • /
    • 2013
  • The ZnO thin films were grown on GaN template substrates by RF magnetron sputtering at different RF powers and n-ZnO/p-GaN heterojunction LEDs were fabricated to investigate the effect of the RF power on the characteristics of the n-ZnO/p-GaN LEDs. For the growth of the ZnO thin films, the substrate temperature was kept constant at $200^{\circ}C$ and the RF power was varied within the range of 200 to 500W at different growth times to deposit films of 100 nm thick. The electrical, optical and structural properties of ZnO thin films were investigated by ellipsometry, X-ray diffraction (XRD), atomic force microscopy (AFM), photoluminescence (PL) and by assessing the Hall effect. The characteristics of the n-ZnO/p-GaN LEDs were evaluated by current-voltage (I-V) and electroluminescence (EL) measurements. ZnO thin films were grown with a preferred c-axis orientation along the (0002) plane. The XRD peaks shifted to low angles and the surface roughness became non-uniform with an increase in the RF power. Also, the PL emission peak was red-shifted. The carrier density and the mobility decreased with the RF power. For the n-ZnO/p-GaN LED, the forward current at 20 V decreased and the threshold voltage increased with the RF power. The EL emission peak was observed at approximately 435 nm and the luminescence intensity decreased. Consequently, the crystallinity of the ZnO thin films grown with RF sputtering powers were improved. However, excess Zn affected the structural, electrical and optical properties of the ZnO thin films when the optimal RF power was exceeded. This excess RF power will degrade the characteristics of light emitting devices.

Effects of Lanthanides-Substitution on the Ferroelectric Properties of Bismuth Titanate Thin Films Prepared by MOCVD Process

  • Kim, Byong-Ho;Kang, Dong-Kyun
    • 한국세라믹학회지
    • /
    • 제43권11호
    • /
    • pp.688-692
    • /
    • 2006
  • Ferroelectric lanthanides-substituted $Bi_4Ti_3O_{12}$ $(Bi_{4-x}Ln_xTi_3O_{12}, BLnT)$ thin films approximately 200 nm in thickness were deposited by metal organic chemical vapor deposition onto Pt(111)/Ti/SiO$_2$/Si(100) substrates. Many researchers reported that the lanthanides substitution for Bi in the pseudo-perovskite layer caused the distortion of TiO$_6$ octahedron in the a-b plane accompanied with a shift of the octahedron along the a-axis. In this study, the effect of lanthanides (Ln=Pr, Eu, Gd, Dy)-substitution and crystallization temperature on their ferroelectric properties of bismuth titanate $(Bi_4Ti_3O_{12}, BIT)$ thin films were investigated. As BLnT thin films were substituted to lanthanide elements (Pr, Eu, Gd, Dy) with a smaller ionic radius, the remnant polarization (2P$_r$) values had a tendency to increase and made an exception of the Eu-substituted case because $Bi_{4-x}Eu_xTi_3O_{12}$ (BET) thin films had the smaller grain sizes than the others. In this study, we confirmed that better ferroelectric properties can be expected for films composed of larger grains in bismuth layered peroskite materials. The crystallinity of the thin films was improved and the average grain size increased as the crystallization temperature,increased from 600 to 720$^{\circ}C$. Moreover, the BLnT thin film capacitor is characterized by well-saturated polarization-electric field (P-E) curves with an increase in annealing temperature. The BLnT thin films exhibited no significant degradation of switching charge for at least up to $1.0\times10^{11}$ switching cycles at a frequency of 1 MHz. From these results, we can suggest that the BLnT thin films are the suitable dielectric materials for ferroelectric random access memory applications.

RF 마그네트론 스퍼터링 공정으로 PET 기판 위에 제조한 Ga-doped ZnO 투명전도막의 특성 (Properties of Ga-doped ZnO transparent conducting oxide fabricated on PET substrate by RF magnetron sputtering)

  • 김정연;김병국;이용구;김재화;우덕현;권순용;임동건;박재환
    • 마이크로전자및패키징학회지
    • /
    • 제17권1호
    • /
    • pp.19-24
    • /
    • 2010
  • 산소 플라즈마 전처리에 의한 PET 기판 위에 Ga이 도핑된 ZnO 투명전극 (GZO)의 특성변화를 고찰하였다. GZO 박막은 RF 마그네트론 스퍼터링 공정에 의해 합성하였으며 GZO 증착 이전에 PET 기판의 표면에너지를 높이고 GZO 박막과의 접촉특성을 향상시키기 위해 산소플라즈마 공정을 적용하였다. 산소 플라즈마 처리공정을 시행함에 따라 GZO 박막의 결정성과 전기적 특성이 향상하였다. RF 파워를 100 W로 하고, 플라즈마 처리시간을 600초로 하였을 때 GZO 박막의 최저 비저항 값인 $1.90{\times}10^{-3}{\Omega}-cm$의 양호한 특성을 확인되었다.