• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.541-541
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• 2012

InP quantum dots capped by myristic acid (InP-MA QDs) were synthesized by a typical hot injection method using MA as stablizing agent. The current density across the InP-MA QDs thin film which was fabricated by spin-coating method is about $10^{-4}A/cm^2$ at the electric field of 0.1 MV/cm from I-V measurement on a metal-insulator-metal (MIM) device. The low conductivity of the InP-MA QDs thin film is interpreted as due to the long interdistances among the dots governed by the MA molecules. Therefore, replacing the MA with thioacetic acid (TAA) by biphasic ligand exchange was conducted in order to obtain TAA capped InP QDs (InP-TAA). InP-TAA QDs were designed due to: 1) the TAA is very short molecule; 2) the thiolate groups on the surface of the InP-TAA QDs are expected to undergo condensation reaction upon thermal annealing which connects the QDs within the QD thin film through a very short linker -S-; and 3) TAA provides better passivation to the QDs both in the solution and thin film states which minimizing the effect of surface trapping states.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.438-438
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• 2012

은(Ag) 또는 금(Au) 입자를 촉매로 이용하여 습식식각을 통해 선택적으로 짧은 시간동안 단결정 실리콘 웨이퍼의 표면을 텍스쳐링하여 반사방지막 특성을 효과적으로 얻을 수 있다. 일반적으로 금속입자는 주로 금속 이온이 포함된 용액이나, 전기증착법을 통해서 실리콘 웨이퍼 표면에 형성시켰지만, 금속입자의 크기와 분포를 조절하기 어려웠다. 하지만, 최근 진공장비를 이용하여 열증발증착법(thermal evaporation)과 급속열처리법(rapid thermal annealing)을 통해서 금속입자를 대면적으로 크기와 분포를 균일하게 조절할 수 있다. 이러한 현상은 열적 비젖음(thermal dewetting) 현상에 의해 실리콘 표면위에 증착된 금속 박막으로부터 나노입자로 형성할 수 있다. 본 연구에서는 실리콘 (100)기판위에 다양한 크기의 은 또는 금 나노입자를 형성시켜 식각용액에 짧은 시간동안 담그어 식각하여, 텍스쳐링 효과와 반사방지(antireflection) 특성을 분석하였다. 실험을 위해 각각 은 또는 금 박막을 열증발증착법을 이용하여 ~3-8 nm의 두께로 형성시켰으며, 급속가열장치를 이용하여 $500^{\circ}C$에서 5분 동안 열처리하였다. 그리고 탈이온수(de-ionized water)에 불화수소와 과산화수소가 혼합된 식각용액에 1-5분 동안 습식식각을 하였다. 각각의 텍스쳐링 된 샘플의 식각의 상태와 깊이를 관찰하기 위해 field emission scanning electron microscopy (FE-SEM)을 이용하여 측정하였으며, UV-vis-NIR spectrophotometer를 이용하여 300 nm에서 1,200 nm의 반사특성을 분석하였다. 또한 RCWA (rigorous coupled wave analysis) 시뮬레이션을 이용하여 텍스쳐링 된 기하학적구조에 대하여 반사방지막 특성을 이론적으로 분석하였다.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.16 no.11
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• pp.1179-1185
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• 1991

Ultrathin Reoxidized Nitrided Oxides were formed by lamp heated rapid thermal annealing in oxyzen at temperatures of $1050^{\circ}C$-$1100^{\circ}C$ for 20, 40 seconds. The electrical characteristics of ultrathin films were evaluated by leakage current breakdown voltage. TDDB. FN tunneling. Nitridation and reoxidition condition dependence of charge trapping properties. i.e.. the flat band voltage shift $({\Delta}V_{FB})$ and the increase of charge-to-breakdown $(Q_{BD})$ induced by a high field stress where studied. As the results of analysis. rapid thermal reoxidation was achieved striking improvement of dielectric integrity, the charge to breakdown was increased and flat band voltage shift was reduced.

• Electrical & Electronic Materials
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• v.11 no.11
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• pp.22-27
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• 1998

We have investigated the effect of an ion shower doping of the laser annealed poly-Si films at an elevated substrate temperatures. The substrate temperature was varied from room temperature to 300$^{\circ}C$ when the poly-Si film was doped with phosphorus by a non-mass-separated ion shower. Optical, structural, and electrical characterizations have been performed in order to study the effect of the ion showering doping. The sheet resistance of the doped poly-Si films was decreased from7${\times}$106 $\Omega$/$\square$ to 700 $\Omega$/$\square$ when the substrate temperature was increased from room temperature to 300$^{\circ}C$. This low sheet resistance is due to the fact that the doped film doesn't become amorphous but remains in the polycrystalline phase. The mildly elevated substrate temperature appears to reduce ion damages incurred in poly-Si films during ion-shower doping. Using the ion-shower doping at 250$^{\circ}C$, the field effect mobility of 120 $\textrm{cm}^2$/(v$.$s) has been obtained for the n-channel poly-Si TFTs.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.87-90
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• 2002

In recent year, BLT($Bi_{3.25}La_{0.75}Ti_{3}O_{12}$) has been one of promising substitute materials at the ferroelectric random access memory applications. We manufactured $Bi_{3.25}La_{0.75}Ti_3O_{12}$ Target with a ceramic process. The BLT target was sintered at ${1100^{\circ}C}$ for 4 hours. Using RF magnetron sputtering, a deposited BLT thin films were estimated about ferroelectric properly as a functions of post annealing temperatures. The BLT thin films showed a promoted ferroelectric characteristics at the post annealied sample of ${700^{\circ}C}$. This sample exhibited the (117) preferred crystal orientation, current density of $3{\times}10^{-8}A/cm^2$, a remanent polarization of $8{\mu}C/cm^2$ and a coercive field of 42.1 KV/cm respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.451-451
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• 2011

적외선 소자의 재료로 쓰이는 액상 에피 성장법(Liquid phase epitaxy: LPE)으로 성장된 HgCdTe (MCT)박막의 Hg 분위기 열처리에 따른 구조적 변화를 고 분해능 투과 전자 현미경으로 관찰하였다. 일반적으로 LPE방법으로 성장된 MCT박막은 성장 방법의 특성상 Te 과다 영역의 성장용액이 사용되므로 상온 냉각 과정에서 박막 내 국부적인 Te 석출물을 형성 시킬 가능성이 높다. 또한, 성장 과정시 높은 Hg 증기압으로 인해 Hg-vacancy가 존재하므로 품질을 저하시키는 요인이 된다. 따라서, 본 실험에서는 Hg-vacancy와 국부적인 Te 석출물의 제거를 위해 Hg 분위기 열처리 공정을 실시하여 박막의 결정성 변화 및 국부적인 조성 변화를 관찰하였다. 실험결과, 열처리에 따른 Hg의 박막 내 공급으로 인한 이차상의 형성 등이 관찰 되었으며 부피 팽창으로 인해 격자의 변형이 관찰 되었다. 이는 투과 전자 현미경의 고 분해능 이미지 와 Gaussian mask filtering 기법으로 보여진 격자 줄무늬상 (lattice fringe)으로 확인 하였다. 또한, 열처리에 따른 국부적인 조성 편기의 해소는 high angle annular dark field scanning TEM(HAADF-STEM)을 이용하여 관찰 하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.270-270
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• 2013

We have investigated the self-assembled structures of glutaric acid (HOOC-(CH2)3-COOH) on the Cu(110) surface as a function of coverage using Scanning Tunneling Microscopy (STM). At low coverage, glutaric acid molecules diffuse freely on Cu(110) surface at room temperature, thus they can't form ordered structures at this coverage. However, when we scanned the same area several times, novel structures have been created during scanning due to the field-induced self-assembly. Also, the induced structures are quite stable during continuous scanning process. At 0.25 ML, glutaric acid adsorbs as a bi-glutarate (-OOC(CH2)3-COO-) after annealing to 450 K producing a racemic conglomerate of coexisting mirror domains. Although the molecule is achiral, it forms chiral domains on the surface from adsorption-induced asymmetrization. At 0.5 ML coverage, zigzag structure is observed, and still gltutaric acid adsorbs as a bidentate configuration. This bi-glutarate structure is stable until 650. Finally, at 1ML, glutaric acid adsorbs as a mono-glutarate at room temperature forming close packed structures.

• Journal of Industrial Technology
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• v.25 no.A
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• pp.157-162
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• 2005

In this study, the fabrication of PZT films was performed from a multilayer structure comprising $TiO_2$, $ZrO_2$ and PbO thin films prepared by rapid themal chemical vapor deposition(RTMOCVD). $TiO_2$, $ZrO_2$ and PbO are the component layers of oxide multilayer system for a single phase PZT thin film. The composition control of PZT thin film was done by the thickness control of individual component layer. The composition ratio of Pb:Ti:Zr with thickness were 1:0.94:0.55. Occurrence of a single-phase of PZT was initiated at around $550^{\circ}C$ and almost completed at $750^{\circ}C$ under the fixed time of 1hr. As the concentration of Pb increased, the roughness and crystallization in the film increased. From the as result of using XPS and TEM, the single phase formation through annealing is evident. The electrical properites of the prepared PZT thin film(Zr/Ti=40/60, 300 nm) on a Pt-coated substrate were as follow: dielectric constant ${\varepsilon}_r=475$, coercive field Ec=320 kV/cm, and remanant polarization $P_r=11{\mu}C/cm^2$ at an applied voltage of 18 V.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.320-321
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• 2008

Ferroelectric $SrBi_2Ta_2O_9$(SBT) ceramics were deposite on Pt/Ti/SiO2/Si substrates using a sintered SBT target and then were annealed in the oxygen atmosphere at $750^{\circ}C$, the most excellent characteristics were shown, and the remnant polarization ($2P_r$) value and the coercive electric field ($E_c$) were respectively about 12.40[${\mu}C/cm^2$] and 30[kV/cm]. Moreover, the excellent fatigue characteristic t was little aged even after $10^{10}$ cycles of switchings. The leakage current density and the dielectric constant of the SBT capacitor annealed in the oxygen atmosphere were respectively approximately $2.13\times10^{-9}$ [A/$cm^2$] and 340.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.06a
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• pp.235-238
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• 1998

Ferroelectric $LiNbO_3$ thin films were grown directly on Si(100) substrates by 13.55MHz RF magnetron sputtering system using a ceramic target ($Nb_2O_5/Li_2C0_3$ = 51.4/48.6). Because high temperature process have to avoided to prevent degradation of the interface (insulator/Si), $LiNbO_3$ thin films were deposited below $300^{\circ}C$. After as-deposited films were performed RTA treatments in an oxygen ambient at $600^{\circ}C$ for 60s, electrical measurements performed films before and after anneal treatment. In high field region, the leakage current density of the films after annealing was deceased about 4order and the resistivity of these was increased to about 5\times 10^{11} \Omega \cdot cm$ at 500kV/cm. In accumulation region of C-V curve, we calculated dielectric constant of thin film $LiNbO_3$ as 27.9 which is close to that of bulk value.