• Proceedings of the Optical Society of Korea Conference
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• 2006.07a
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• pp.481-482
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• 2006

• Proceedings of the Optical Society of Korea Conference
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• 2002.11a
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• pp.300-301
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• 2002

• Journal of the Optical Society of Korea
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• v.13 no.1
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• pp.80-85
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• 2009

An experimental study of energy absorption and x-ray emission from ultrashort laser pulse irradiation of in-situ produced solid clusters has been performed. Silver clusters produced by a 30 mJ, 300 ps laser pulse were irradiated up to an intensity of $3{\times}10^{17}\;W/cm^2$ by a 70 mJ, 45 fs compressed laser pulse from the same Ti:sapphire laser. Absorption of the laser light exceeding 70% was observed, resulting in an x-ray yield (>1 keV) of ${\sim}60{\mu}J$ pulse. This may constitute a much simpler means of intense x-ray generation using ultrashort laser pulses as compared to the irradiation of structured / pre-deposited cluster targets, and it offers higher x-ray conversion efficiency than that from gas clusters and planar solid targets.

• Journal of the Optical Society of Korea
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• v.7 no.3
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• pp.166-173
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• 2003

This paper presents micromachining results on planar-lightwave-circuit (PLC) chips with Si substrate and the quartz substrate by using Ti:Sapphire femtosecond-pulsed laser. The ablation process with femtosecond laser pulses generates nothing of contamination, molten zone, microcracks, shock wave, delamination and recast layer. We also showed that the micromachine for PLC using femtosecond pulsed lasers is superior to that using nanosecond pulsed lasers. The insertion loss and the optical return loss of the 1 ${\times}$ 8 optical power splitters packaged with micromachined input- and output-port U-grooves were less than 11.0 ㏈ and more than 55 ㏈, respectively. The wavelength dependent loss (WDL) was distributed within $\pm$0.6 ㏈ and the polarization dependent loss (PDL) was less than 0.2 ㏈.

• Laser Solutions
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• v.16 no.1
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• pp.5-9
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• 2013

We have successfully formed filament inside of a transparent soda-lime glass using a Ti:sapphire based femtosecond laser. To make filament form, keeping the laser intensity higher than critical intensity is essential. Also each of the machining parameters plays an important role for the formation of filament. In this paper, we study what parameter can possibly influence for formation of filament, and we introduce an application using filamentation by femtosecond laser for transparent material.

• Design & Manufacturing
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• v.14 no.3
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• pp.44-49
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• 2020

One of display trends today is development of high pixel density. To get high PPI, a small size of pixel must be developed. RGB pixel is arranged by evaporation process which determines pixel size. Normally, a fine metal mask (FMM; Invar alloy) has been used for evaporation process and it has advantages such as good strength, and low thermal expansion coefficient at low temperature. A FMM has been manufactured by chemical etching which has limitation to controlling the pattern shape and size. One of alternative method for patterning FMM is laser micromachining. Femtosecond laser is normally considered to improve those disadvantages for laser micromachining process due to such short pulse duration. In this paper, a femtosecond laser drilling for thickness of 16 ㎛ FMM is examined. Additionally, we introduce experimental results for controlling taper angle of hole by vibration module adapted in laser system. We used Ti:Sapphire based femtosecond laser with attenuating optics, co-axial illumination, vision system, 3-axis linear stage and vibration module. By controlling vibration amplitude, entrance and exit diameters are controllable. Using vibrating objective lens, we can control taper angle when femtosecond laser hole drilling by moving focusing point. The larger amplitude of vibration we control, the smaller taper angle will be carried out.

• Journal of the Optical Society of Korea
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• v.2 no.2
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• pp.50-53
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• 1998

We report on the spectroscopic investigation of optical-field ionized plasmas in the soft X-ray spectral region. The experiment was carried out by focusing pulses of the high-power Ti:Sapphire laser with an energy of ~ 40 mJ and time duration of ~30 fs into a gas jet of krypton, xenon, and argon from a pulsed nozzle. Strong soft X-ray emission on lines from ionic stages of $Kr^{7+} , Kr^{8+} , Xe^{7+} , Ar^{7+} , and Ar^{8+}$ is reported. The experimental result was found to be in good agreement with theoretical prediction.

• Laser Solutions
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• v.17 no.2
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• pp.19-25
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• 2014

Optical embedded diffraction gratings with the bulk modification in BK-7 glass plates excited by tightly focused high-intensity femtosecond (130fs) Ti: sapphire laser (peak wavelength = 790nm) were demonstrated. The structural modifications with diameters ranging from 400nm to $4{\mu}m$ were photo-induced after plasma formation occurred upon irradiation with peak intensities of more than $1{\times}1013W/cm^2$. The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred. The maximum refractive index change was estimated to be $1.5{\times}10^{-2}$. The two optical embedded gratings in BK-7 glass plate were demonstrated with refractive index modification induced by the scanning of low-density plasma formation.

• Journal of the Korean Physical Society
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• v.73 no.12
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• pp.1834-1839
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• 2018

A tabletop ultrafast soft x-ray has been generated from the laser-produce plasma with a femtosecond pulsed Ti:Sapphire laser. The estimated total flux of Al $K{\alpha}$ is of $2.2{\times}10^9photons/sec$ in $4{\pi}$ radian and the parameters related to the optical performance were obtained. The tungsten/silicon multilayer, flat quartz and bent thallium acid phthalate (TLAP) crystal were used for monochromatization of soft x-ray to refine the aluminum $K{\alpha}$ radiation and compared the respective value of $E/{\Delta}E$. To estimate the size of the x-ray source beam generated by a fs laser, the approximation using the FWHM obtained from the x-ray beam scan near the focal point was discussed, and the size of the diameter was about $9.76{\mu}m$.

• Journal of the Optical Society of Korea
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• v.7 no.3
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• pp.131-134
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• 2003

We demonstrated an optical frequency synthesizer based on a femtosecond (fs) mode-locked Ti:sapphire (Ti:s) laser by simultaneously stabilizing the carrier-offset frequency, $f_{ceo}$, and repetition rate, $f_{ rep}$, referenced to the Cs atomic frequency standard. By using two wide-band digital phase-detectors we realized a phase-coherent link between $f_{rep} and f_{ceo} with the relation f_{ceo} = f_{AOM} 5/6f_{rep} ≡ 0, where f_{AOM} = 5/6f_{rep}$ is the phase-locked driving frequency of an acousto-optic modulator (AOM) in a self-referencing interferometer and $f_{rep}$ = 100 MHz. As a result, we could stabilize all components of the fs laser comb at once with an equal frequency separation $f_{rep}$ = 100 MHz with $f_{ceo}$ = 0. In our optical frequency synthesizer, the frequency of the nth component ($f_{n}$) is given exactly by the simple relation $f_n = nf_{rep}$, enabling us to use the fs laser comb as a frequency ruler in the optical frequency metrology.