• 제목/요약/키워드: extreme ultraviolet

검색결과 78건 처리시간 0.023초

irrE, an Exogenous Gene from Deinococcus radiodurans, Improves the Growth of and Ethanol Production by a Zymomonas mobilis Strain Under Ethanol and Acid Stresses

  • Zhang, Ying;Ma, Ruiqiang;Zhao, Zhonglin;Zhou, Zhengfu;Lu, Wei;Zhang, Wei;Chen, Ming
    • Journal of Microbiology and Biotechnology
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    • 제20권7호
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    • pp.1156-1162
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    • 2010
  • During ethanol fermentation, bacterial strains may encounter various stresses, such as ethanol and acid shock, which adversely affect cell viability and the production of ethanol. Therefore, ethanologenic strains that tolerate abiotic stresses are highly desirable. Bacteria of the genus Deinococcus are extremely resistant to ionizing radiation, ultraviolet light, and desiccation, and therefore constitute an important pool of extreme resistance genes. The irrE gene encodes a general switch responsible for the extreme radioresistance of D. radiodurans. Here, we present evidence that IrrE, acting as a global regulator, confers high stress tolerance to a Zymomonas mobilis strain. Expression of the gene protected Z. mobilis cells against ethanol, acid, osmotic, and thermal shocks. It also markedly improved cell viability, the expression levels and enzyme activities of pyruvate decarboxylase and alcohol dehydrogenase, and the production of ethanol under both ethanol and acid stresses. These data suggest that irrE is a potentially promising gene for improving the abiotic stress tolerance of ethanologenic bacterial strains.

인공위성 탑재용 극자외선 태양망원경(EUVT) EM 개발 (DEVELOPMENT OF THE SOLAR EUV TELESCOPE ENGINEERING MODEL FOR A SATELLITE)

  • 이선민;장민환;이은석
    • Journal of Astronomy and Space Sciences
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    • 제20권4호
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    • pp.327-338
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    • 2003
  • 본 논문은 인공위성에 탑재될 것을 감안한 극자외선 태양망원경의 제작을 통한 연구 결과를 기술한다. 극자외선은 지상에서는 관측되지 않는 영역으로 인공위성이나 로켓 등에 탑재되어 관측하게 된다. 본 연구의 극자외선 태양망원경(EUVT; Extreme-Ultra-Violet solar Telescope)의 설계는 '인공위성 탑재용 극자외선 태양망원경 공학모형 설계'(한정훈 등 2001)를 기반으로 인공위성에 탑재할 만한 크기와 위성 입력전압에 따른 전자부 설계 등 기본적인 요구사항에 맞추었으며, 특히 EVUT의 관측 파장대인 58.4㎚에서 62.9㎚의 검출 가능성에 중점을 두었다. 본 논문에서는 부경으로 인한 차폐율을 줄이기 위한 광학계 설계 변경과 공학모형(Engineering Model)을 제작하는데 사용된 검출기와 광학 기술에 대해 논의한다. 또한, EUVT의 검출기가 받는 태양 복사량을 산출하기 위한 검출효율 프로그램과 차후 관측 자료 처리에 대해 기술한다.

Algorithm for Detection of Solar Filaments in EUV

  • Joshi, Anand D.;Cho, Kyung-Suk
    • 천문학회보
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    • 제40권1호
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    • pp.66.2-66.2
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    • 2015
  • In today's age when telecommunications using satellite has become part of our daily lives, one has to be employ preventive measures to avert any possible danger, of which solar activity is the major cause. Coronal mass ejections (CMEs) heading towards the Earth can lead to disturbances in the Earth's magnetosphere, if their magnetic field is oriented southward. Monitoring of solar filaments in this case becomes very very crucial, as their eruption is associated with most of the CMEs. Monitoring of solar filaments in this case becomes very very crucial, as their eruption is associated with most of the CMEs. Also, filaments show activation up to a few hours prior to launch of a CME and thus can provide advance warning. In this study, we present an algorithm for the detection of solar filaments seen in the extreme ultraviolet (EUV) from Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory (SDO). Various morphological operations are employed to identify and extract the filaments. These filaments are then tracked in order to determine their size and location continuously.

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극자외선 노광공정용 Mo/Si 다층 박막 미러의 구조 분석 (Structural Characterization of Mo-Si Multilayer Mirror for Extreme Ultraviolet Lithography)

  • 허성민;김형준;이승윤;윤종승;강인용;정용재;안진호
    • 한국마이크로전자및패키징학회:학술대회논문집
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    • 한국마이크로전자및패키징학회 2001년도 추계 기술심포지움
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    • pp.213-216
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    • 2001
  • 극자외선영역의 빛에대한 Mo/Si 반사형 다층 박막 미러를 스퍼터링 시스템으로 증착하여, 특성을 평가한 결과 3mTorr의 낮은 공정 압력에서 최적의 구조인자를 가진 다층 박막을 증착할 수 있었다. TEM, low angle XRD peak, 반사도 그래프로부터 다층 박막의 구조인자를 분석하였으며, 특히 low angle XRD peak로부터 다층박막의 d-spacing, 층간 두께 uniformity에 대한 정보 및 광학적 정보를 간접적으로 분석할 수 있었다. 최대 반사도는 12.7nm 파장에서 약 53%였으며, low angle XRD에서 추출한 d-spacing 값이 TEM 이미지에서 측정한 값보다 더 정확한 값을 얻을 수 있었다.

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MERGERS, COSMIC RAYS, AND NONTHERMAL PROCESSES IN CLUSTERS OF GALAXIES

  • SARAZIN CRAIG L.
    • 천문학회지
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    • 제37권5호
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    • pp.433-438
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    • 2004
  • Clusters of galaxies generally form by the gravitational merger of smaller clusters and groups. Major cluster mergers are the most energetic events in the Universe since the Big Bang. The basic properties of cluster mergers and their effects are discussed. Mergers drive shocks into the intracluster gas, and these shocks heat the intracluster gas. As a result of the impulsive heating and compression associated with mergers, there is a large transient increase in the X-ray luminosities and temperatures of merging clusters. These merger boost can affect X-ray surveys of clusters and their cosmological interpretation. Similar boosts occur in the strong lensing cross-sections and Sunyaev-Zeldovich effect in merging clusters. Merger shock and turbulence associated with mergers should also (re)accelerate nonthermal relativistic particles. As a result of particle acceleration in shocks and turbulent acceleration following mergers, clusters of galaxies should contain very large populations of relativistic electrons and ions. Observations and models for the radio, extreme ultraviolet, hard X-ray, and gamma-ray emission from nonthermal particles accelerated in these shocks will also be described. Gamma-ray observations with GLAST seem particularly promising.

5 nm 급 반도체 배선 공정 기술 개발 (Development of Interconnect Process Technology for 5 nm Technology Nodes)

  • 최은미;표성규
    • 마이크로전자및패키징학회지
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    • 제23권4호
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    • pp.25-29
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    • 2016
  • The semiconductor industry has been developed mainly by micronization process due to many advantages of miniaturization of devices. Mass production of semiconductors of 10 nm class has been started recently, and it is expected that the technology generation of 5 nm & 7 nm technology will come. However, excessive linewidth reduction affects physical limits and device reliability. To solve these problems, new process technology development and new concept devices are being studied. In this review, we introduce the next generation technology and introduce the advanced research for the new concept device.

Deterministic Estimation of Stripe Type Defects and Reconstruction of Mask Pattern in L/S Type Mask Inspection

  • Kim, Wooshik;Park, Min-Chul
    • Journal of the Optical Society of Korea
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    • 제19권6호
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    • pp.619-628
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    • 2015
  • In this paper, we consider a method for estimating a stripe-type defect and the reconstruction of a defect-free L/S type mask used in lithography. Comparing diffraction patterns of defected and defect-free masks, we derive equations for the estimation of the location and size of the defect. We construct an analytical model for this problem and derive closed form equations to determine the location and size using phase retrieval problem solving techniques. Consequently, we develop an algorithm that determines a defect-free mask pattern. An example shows the validity of the equations.

생물분야 적용위한 플라즈마 집속장치의 전극별 극자외선 특징 분석

  • 김진한;이진영;최은하
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.518-518
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    • 2013
  • 자외선이 생체를 파괴하거나 탄생시킬 수 있는 중요한 요소라는 것은 잘 알려져있다. 이 때문에 생체 시료를 보통 자외선 파장대인 250~350 nm보다 짧은 10 nm 영역에 있는 극자외선에 노출되었을 때 그 상호작용 및 변화를 찾아서 분석하는 것을 목표로 삼는다. 먼저 이에 대한 기초내용으로, 앞으로 활용하게 될 플라즈마 집속장치에서의 전극형태에 따른 EUV 광원의 특성을 알아보는 실험을 진행하였다. 이 실험은 집속 플라즈마 발진장치의 2가지 전극인 마테르 (Mather) 형태의 전극과, 초사이클로이달 핀치(Hypercycloidal pinch) 핀치 형태의 전극에서 발진된 극자외선(Extreme Ultraviolet : EUV) 집속 플라즈마의 전자온도와, 전자밀도, power를 분석하였다. 그리고 EUV 광원 발생장치에 Ar 가스와, Ne-Xe 가스내 환경에서 2 종류의 전극에 의해 만들어진 고밀도 플라즈마로부터 발생된 EUV의 특성을 알아보았다.

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