• Proceedings of the KSME Conference
• /
• 2001.06e
• /
• pp.530-535
• /
• 2001

Variations of temperature field in a Hele-Shaw convection cell (HSC) were measured using a holographic interferometry with varying Rayleigh number. Experimental results show a steady flow pattern at low Rayleigh numbers and a time-dependent periodic flow at high Rayleigh numbers. Especially, the period of oscillation at $Ra = 6.35{\times}10^6$ was 62 seconds. Two different measurement methods of holographic interferometry, double-exposure method and real-time method, were employed to measure the temperature field variations of HSC convective flow. In the double-exposure method, unwanted waves can be eliminated and reconstruction images are clear, but transient flow structure cannot be observed clearly. On the other hand, transient flow can be observed and reconstructed well using the real-time method. However, the fringe patterns reconstructed by the real-time method contain more noise, compared with the double-exposure method. The two holographic interferometer techniques employed complementary in this study were proved to be useful for analyzing the temperature field variations of unsteady thermal fluid flows.

• Transactions of the Korean Society of Mechanical Engineers B
• /
• v.25 no.11
• /
• pp.1624-1631
• /
• 2001

Variations of temperature field in a Hele-Shaw convection cell (HSC) were measured using a holographic interferometry with varying Rayleigh number. Experimental results show a steady flow pattern at low Rayleigh numbers and a time-dependent periodic flow at high Rayleigh numbers. Especially, the period of oscillation at Ra = 6.35 $\times$ 10$^{6}$ was 62 seconds. Two different measurement methods of holographic interferometry, double-exposure method and real-time method, were employed to measure the temperature field variations of HSC convective flow. In the double-exposure method, unwanted waves can be eliminated and reconstruction images are clear, but transient flow structure cannot be observed clearly. On the other hand, transient flow can be observed and reconstructed well using the real-time method. However, the fringe patterns reconstructed by the real-time method contain more noise, compared with the double-exposure method. The two holographic interferometer techniques employed complementary in this study were proved to be useful fur analyzing the temperature field variations of unsteady thermal fluid flows.

• Transactions of the Korean Society of Mechanical Engineers A
• /
• v.24 no.9 s.180
• /
• pp.2371-2380
• /
• 2000

In this paper, we developed the proximity exposure system with the vertical structure of glass and mask stage to minimize the mask's warp caused by the pull of gravity. This system, which canirradiate the ultra violet through 1440 H 850 $\textrm{mm}^2$ and 1330X 1015 $\textrm{mm}^2$ exposure area, has the followingcharacteristics. The glass stage can be inclined by 80 degrees at vertical structure to load substrate withsafety on it. When the glass stage is the vertical state, the gap control, alignment control and exposureof ultra violet are executed. So, it enhances the pattern uniformity by minimizing the mask's warp. Theglass stage can also control the gap between the mask and the substrate by the coarse and fine motioncontrol. The mask stage can adjust the posture of photomask to the position of substrate by imageprecessing method. The galss stage for the gap control and the mask stage for the alignment aredesigned independently for each function.

• Korean Journal of Optics and Photonics
• /
• v.9 no.5
• /
• pp.315-320
• /
• 1998

The characteristics and structures of photopolymer are analyzed in this paper, which recently have various applications in optical information processing and optical memory, Especially, Du Pont's photopolymer OmniDex 706 reflection film is used in many experiments of different exposures and incident angles, and analyzed by the diffraction pattern generated by glass plate's reflection beam. With the dark reaction of the monomer in photopolymerization, dynamic parameters are considered due to the variation of exposure time and diffusion time delay after exposure. The performance of diffraction efficiency is improved by 10%, when an exposure time is 6.25 sec, and a diffusion time delay is 2 minute.

• Proceedings of the KIEE Conference
• /
• 1994.07b
• /
• pp.1246-1249
• /
• 1994

Thin amorphous film of $a-Se_{75}Ge_{25}$ acts as a positive resist in ion beam lithography. Previously, we reported the optical characteristics of amorphous $Se_{75}Ge_{25}$ thin film by the low-energy ion beam exposure and presented analytically calculated values such as ion range, ion concentration and ion transmission coefficient, etc. As the calculated results of analytical calculation, the energy loss per unit distance by $Ga^+$ ion is about $10^3[keV/{\mu}m]$ and nearly constant for all energy range. Especially, the projected range and struggling for 80 [KeV] $Ga^+$ ion energy are 0.0425[${\mu}m$] and 0.020[${\mu}m$], respectively. Hear, we present the results of Monte-Carlo computer simulation of Ga ion scattering, exposure and development in $a-Se_{75}Ge_{25}$ resist film for focused ion beam(FIB) lithography. Monte-Carlo method is based on the simulation of individual particles through their successive collisions with resist atoms. By the summation of the scattering events occurring in a large number N(N>10000) of simulated trajectories within the resist, the distribution for the range parameters is obtained. Also, the deposited energy density and the development pattern by a Gaussian or a rectangular ion beam exposure can be obtained.

• Environmental Analysis Health and Toxicology
• /
• v.11 no.1_2
• /
• pp.19-29
• /
• 1996

Human exposure to volatile compounds in tap water can occur from inhalation and dermal absorption as well as direct ingestion. The relative contribution to total human exposure from these pathways has been considered to be important especially for VOC's (volatile organic compounds). In an attempt to reduce the uncertainty of the risk assessment, it has been suggested that the exposure assessment process could be significantly improved by adopting Monte-Carlo simulation. However, there is no actual data in Korea for each exposure parameter to determine the level of exposure, and the distributional pattern. Therefore, we surveyed water use patterns and behavior related to multi-route exposure to VOC's in household tap water in Korea, and compared these values to the those in western countries. In the first survey, we calculated daily water intake using data from a sample of 1322 persons of several cities in Korea. In the second survey, we obtained questionnaire data on exposure time for showering, bathing and household activities, and tap water intake from 851households in Korea. In the last survey, we measured the exposure parameters (exposure time, water use rate etc.) related to showers, baths, toilets, dish washing, washing and cooking, and tap water intake was surveyed. Also, the subjects were measured their body weight, height and tidal volume, etc. A diary, a flow meter and a measuring cup were used to measure these values as precisely as possible. Average daily water intake was ranged 0.79-1.71 L/day for adults in three surveys. Tap water intake measured by log-sheet during one week in third survey was 1.26 (average), 1.98 L/day (90 percentlie), respectively. These results were comparable with results from EPA (1.4, 2L/day). The average amount of water used by housewives in the third survey was 515.0 $\pm$ 564.6L/day. In usual activity, the amount of water used in the bathroom, the laundry and the kitchen was 140.0 $\pm$ 538.9, 148.0 $\pm$ 174.5, 229.3 $\pm$ 205.4 L/day, respectively. Exposure parameters such as water intake rate, exposure duration, body weight, inhalation rates in surveyed data of Korean people differed from those published from western countries. This could be attributed to variations in lifestyle, dietary habits and physiological characteristics.

• The Transactions of the Korean Institute of Electrical Engineers C
• /
• v.48 no.8
• /
• pp.598-604
• /
• 1999

This paper describes the research to minimize the film stress and maximize the aspect ratio of photoresist structure, especially about SU-8 for electroplating mold. UV LIGA process using SU-8 allows fabricating high aspect ratio polymer structures. However, it is hard to get fine patterns in the high aspect ratio structures because of high internal stress and difficulty of removing SU-8. The purpose of this paper is to setup the process condition for the obtainment of both low film stress and high aspect ratio and to find design rules that make the pattern be less dependent on stress problem. Firstly, the process of heat treatment and exposure of SU-8 are proposed. These two conditions control the amount of cross-linkage in polymer structure, which is the most important parameter of both pattern generation and remaining stress. Heat treatment is dealed with soft bake and post-exposure-bake. Temperature and time duration of each step are varied with heat treatment condition. Some test patterns are fabricated to evaluate the proposed process. Nickel electroplating is performed with the mold fabricated through the proposed process to confirm the SU-8 as a good electroplating mold.

• Journal of Environmental Health Sciences
• /
• v.27 no.1
• /
• pp.20-26
• /
• 2001

personal nitrogen dioxide(NO$_2$) exposures for 31 professional drivers were measured using passive sampler and time activity diary in Asan and Chunan area, and were estimated using time-weighted average model. Mean concentrations of driver’s indoor and outdoor were 24.7$\pm$10.7 ppb and 23.3$\pm$8.3 ppb, respectively with indoor/outdoor of 1.1. Mean personal NO$_2$ exposure was 30.3$\pm$9.7 ppb. Personal NO$_2$ exposures were strongly correlated with indoor car NO$_2$ levels ($R^2$=0.80) rather than residential indoor NO$_2$ level ($R^2$=0.55). and outdoor NO$_2$ level ($R^2$=0.50). The driver’s NO$_2$ exposure using LP-gas with 24.4$\pm$8.0 ppb were statistically different from those using diesel with 36.3$\pm$14.1 ppb(p<0.01). The effect of driver’s smoking for personal NO$_2$ exposure was not found. It was considered that the main NO$_2$in driver is transportation. Since drivers mostly spent their times in indoor and inside car, time-weighted average model could be used to estimated personal NO$_2$ exposure using time activity diary, Though we did not measure all microenvironments, the estimated personal NO$_2$ exposures with 26.9$\pm$10.2 ppb were statistically correlated with measured personal NO $_2$ exposures30.3$\pm$9.7 ppb ($R^2$=0.89). The mean and standard deviation of personal NO$_2$ exposure using Mote-Carlo simulation were 26.6$\pm$7.2 ppb.

• Nuclear Engineering and Technology
• /
• v.5 no.4
• /
• pp.291-309
• /
• 1973

Exposure rates due to leakage gamma-rays from operating reactors TRIGA Mark II and III were measured in a horizontal plane by means of scintillation spectrometry using a 3"$\times$3" cylindrical Nal(T1) detector associated with a 400 channel pulse height analyzer under varied conditions of reactor operation. In determining exposure rate due to the leakage gamma-rays at each point of measurement, Moriuchi's spectrum-exposure rate conversion theory was applied instead of using conventional responce matrix method which necessitates very complicated procedures to convert a spectrum into exposure rate. The results show that a basic pattern of "typical" spectrum of the reactor leakage gamma-rays is neither affected by thermal output of the reactor, nor influenced by overall attenuation in radiation intensity. It was indicated that he attenuation of the leakage gamma-rays in air in terms of exposure rate as a whole follows an exponential law, and the total exposure rate due to the leakage gamma-rays at a certain point is nearly proportional to thermal output of the reactor. The complexity in spectrum measured for a movable core reactor, TRIGA Mark III, was analyzed through spectrum resolution, and proper judgement of the leakage gamma-rays in a complex spectrum was discussed.ctrum was discussed.

• Korean Journal of Optics and Photonics
• /
• v.20 no.3
• /
• pp.175-181
• /
• 2009

Holographic lithography is one of the potential technologies for next generation lithography which can print large areas (6") as well as very fine patterns ($0.35{\mu}m$). Usually, photolithography has been developed with two target purposes. One was for LCD applications which require large areas (over 6") and micro pattern (over $1.5{\mu}m$) exposure. The other was for semiconductor applications which require small areas (1.5") and nano pattern (under $0.2{\mu}m$) exposure. However, holographic lithography can print fine patterns from $0.35{\mu}m$ to $1.5{\mu}m$ keeping the exposure area inside 6". This is one of the great advantages in order to realize high speed fine pattern photolithography. How? It is because holographic lithography is taking holographic optics instead of projection optics. A hologram mask is the key component of holographic optics, which can perform the same function as projection optics. In this paper, Surface-Relief TIR Hologram Mask technology is introduced, and enables more robust hologram masks than those previously reported that were formed in photopolymer recording materials. We describe the important parameters in the fabrication process and their optimization, and we evaluate the patterns printed from the surface-relief TIR hologram masks.