• 제목/요약/키워드: ex-situ process

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Physical Property Change of the Gapless Semiconductor $PbPdO_2$ Thin Film by Ex-situ Annealing

  • Choo, S.M.;Park, S.M.;Lee, K.J.;Jo, Y.H.;Park, G.S.;Jung, M.H.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.371-372
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    • 2012
  • We have studied lead-based gapless semiconductors, $PbPdO_2$, which is very sensitive to external parameters such as temperature, pressure, electric field, etc[1]. We have fabricated pure $PbPdO_2$, Co- and Mn-doped $PbPdO_2$ thin films using the pulsed laser deposition. Because of the volatile element of Pb, it is very difficult to grow the films. Note that in case of $MgB_2$, Mg is also volatile element. So in order to enhance the quality of $MgB_2$, some experiments are carried out in annealing with Mg-rich atmosphere [2]. This annealing process with volatile element plays an important role in making smooth surface. Thus, we applied such process to our studies of $PbPdO_2$ thin films. As a result, we found the optimal condition of ex-situ annealing temperature ${\sim}650^{\circ}C$ and time ~12 hrs. The ex-situ annealing brought the extreme change of surface morphology of thin films. After ex-situ annealing with PbO-rich atmosphere, the grain size of thin film was almost 100 times enlarged for all the thin films and also the PbO impurity phase was smeared out. And from X-ray diffraction measurements, we determined highly crystallized phases after annealing. So, we measured electrical and magnetic properties. Because of reduced grain boundary, the resistivity of ex-situ annealed samples changed smaller than no ex-situ sample. And the carrier densities of thin films were decreased with ex-situ annealing time. In this case, oxygen vacancies were removed by ex-situ annealing. Furthermore, we will discuss the transport and magnetic properties in pure $PbPdO_2$, Co- and Mn-doped $PbPdO_2$ thin films in detail.

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기계적 합금화 및 in-situ와 ex-situ의 혼합공정을 통한 C 도핑된 ex-situ $MgB_2$ 선재 제조 (Mechanical Alloying and Combined Process of in-situ and ex-situ to Fabricate the ex-situ C-doped $MgB_2$ Wire)

  • 황수민;이창민;임준형;최준혁;박진현;주진호;전병혁;김찬중
    • Progress in Superconductivity
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    • 제10권2호
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    • pp.79-86
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    • 2009
  • We successfully fabricated C-doped ex-situ $MgB_2$ wires using two different methods such as mechanical alloying(MA) and combined process(CP) of in-situ and ex-situ. In the MA, the precursor powder was prepared with a mixture of $MgB_2$ and 1 at% C powders by planetary ball milling for 0-100 h. In the CP, on the other hand, C-doped $MgB_2$ powder was prepared with Mg, B, and C powders by in-situ process via compaction, sintering, and crushing. The powders prepared by two methods were loaded into Fe tube and then the assemblages were drawn by a conventional powder-in-tube technique. The MA treatment of C-added $MgB_2$ decreased the particles/grains size and resulted in C-doping into $MgB_2$ after sintering, improving the critical current density($J_c$) in high external magnetic field. For the C-doped $MgB_2$ wire by MA for 25 h, the $J_c$ was $4.1{\times}10^3A/cm^2$ at 5 K and 6.4 T, which was 5.9 times higher than that of pure and untreated $MgB_2$ wire. The CP also provided C-doping into $MgB_2$ and improved the $J_c$ in high magnetic field; the C-doped $MgB_2$ wire fabricated by CP exhibited a $J_c$ being 2.3 times higher than that of the ex-situ wire used commercial $MgB_2$ powder at 5 K and 6.0 T($2.7{\times}10^3A/cm^2\;vs.\;1.2{\times}10^3A/cm^2$).

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Ex-situ Reductive Dechlorination of Carbon Tetrachloride by Iron Sulfide in Batch Reactor

  • Choi, Kyung-Hoon;Lee, Woo-Jin
    • Environmental Engineering Research
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    • 제13권4호
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    • pp.177-183
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    • 2008
  • Ex-situ reductive dechlorination of carbon tetrachloride (CT) by iron sulfide in a batch reactor was characterized in this study. Reactor scaled-up by 3.5 L was used to investigate the effect of reductant concentration on removal efficiency and process optimization for ex-situ degradation. The experiment was conducted by using both liquid-phase and gas-phase volume at pH 8.5 in anaerobic condition. For 1 mM of initial CT concentration, the removal of the target compound was 98.9% at 6.0 g/L iron sulfide. Process optimization for ex-situ treatment was performed by checking the effect of transition metal and mixing time on synthesizing iron sulfide solution, and by determining of the regeneration time. The effect of Co(II) as transition metal was shown that the reaction rate was slightly improved but the improvement was not that outstanding. The result of determination on the regeneration time indicated that regenerating reductant capacity after $1^{st}$ treatment of target compound was needed. Due to the high removal rates of CT, ex-situ reductive dechlorination in batch reactor can be used for basic treatment for the chlorinated compounds.

Utilizing Advanced Pad Conditioning and Pad Motion in WCMP

  • Kim, Sang-Yong;Chung, Hun-Sang;Park, Min-Woo;Kim, Chang-Il;Chang, Eui-Goo
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.171-175
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    • 2001
  • Chemical mechanical polishing(CMP) process has been widely used to planarize dielectrics and metal, which can apply to employed in integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of free-defects in inter level dielectrics and metal. Especially, defects like (micro-scratch) lead to severe circuit failure, and affects yield. Current conditioning method - bladder type, orbital pad motion- usually provides unsuitable pad profile during ex-situ conditioning near the end of pad life. Since much of the pad wear occurs by the mechanism of bladder type conditioning and its orbital motion without rotation, we need to implement new ex-situ conditioner which can prevent abnormal regional force on pad caused by bladder-type and also need to rotate the pad during conditioning. Another important study of ADPC is related to the orbital scratch of which source is assumed as diamond grit dropped from the strip during ex-situ conditioning. Scratch from diamond grit damaged wafer severely so usually scraped. Figure 1 shows the typical shape of scratch damaged from diamond. e suspected that intensive forces to the edge area of bladder type stripper accelerated the drop of Diamond grit during conditioning. so new designed Flat stripper was introduced.

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In-situ magnetization measurements and ex-situ morphological analysis of electrodeposited cobalt onto chemical vapor deposition graphene/SiO2/Si

  • Franco, Vinicius C. De;Castro, Gustavo M.B.;Corredor, Jeaneth;Mendes, Daniel;Schmidt, Joao E.
    • Carbon letters
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    • 제21권
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    • pp.16-22
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    • 2017
  • Cobalt was electrodeposited onto chemical vapor deposition (CVD) graphene/Si/$SiO_2$ substrates, during different time intervals, using an electrolyte solution containing a low concentration of cobalt sulfate. The intention was to investigate the details of the deposition process (and the dissolution process) and the resulting magnetic properties of the Co deposits on graphene. During and after electrodeposition, in-situ magnetic measurements were performed using an (AGFM). These were followed by ex situ morphological analysis of the samples with ${\Delta}t_{DEP}$ 30 and 100 s by atomic force microscopy in the non-contact mode on pristine CVD graphene/$SiO_2$/Si. We demonstrate that it is possible to electrodeposit Co onto graphene, and that in-situ magnetic measurements can also help in understanding details of the deposition process itself. The results show that the Co deposits are ferromagnetic with decreasing coercivity ($H_C$) and demonstrate increasing magnetization on saturation ($M_{SAT}$) and electric signal proportional to remanence ($M_r$), as a function of the amount of the electrodeposited Co. It was also found that, after the end of the dissolution process, a certain amount of cobalt remains on the graphene in oxide form (this was confirmed by X-ray photoelectron spectroscopy), as suggested by the magnetic measurements. This oxide tends to exhibit a limited asymptotic amount when cycling through the deposition/dissolution process for increasing deposition times, possibly indicating that the oxidation process is similar to the graphene surface chemistry.

한국 담수어류의 보존 및 복원 전략 (Strategies for Conservation and Restoration of Freshwater Fish Species in Korea)

  • 강언종;;양현
    • 한국어류학회지
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    • 제21권sup1호
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    • pp.29-37
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    • 2009
  • The tiny fragment of freshwater body is providing home for huge biodiversity and resources for the existence of human. The competing demand for freshwater have been increased rapidly and it caused the declination of biodiversity in recent decades. Unlike the natural process of extinction in gradual progress, the current species extinction is accelerated by human activity. As a result many fish species are already extinct or alive only in captivity in the world and about fifty eight animal species are in endangered in Korea including eighteen freshwater species. Conservation of biodiversity is the process by which the prevention of loss or damage is attained, and is often associated with management of the natural environment. The practical action is classified into in-situ, or ex-situ depending on the location of the conservation effort. Recovery means the process by which the status of endangerment is improved to persist in the wild by re-introduction of species from ex-situ conservation population into nature or translocation of some population. However there are a lot of restrictions to complete it and successful results are known very rare in case. In this article the authors explore some strategies for conservation and restoration of freshwater fish species conducted in Korea for few years. The major causes are discussed in relation with the decline of freshwater fish diversity during few decades and some strategies are evaluated to advance the process of conservation. A study on the Korean bullhead, Pseudobagrus brevicorpus, is introduced as a case for ex-situ conservation and restoration in freshwater ecosystem.

Effect of Brush Treatment and Brush Contact Sequence on Cross Contaminated Defects during CMP in-situ Cleaning

  • Kim, Hong Jin
    • Tribology and Lubricants
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    • 제31권6호
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    • pp.239-244
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    • 2015
  • Chemical mechanical polishing (CMP) is one of the most important processes for enabling sub-14 nm semiconductor manufacturing. Moreover, post-CMP defect control is a key process parameter for the purpose of yield enhancement and device reliability. Due to the complexity of device with sub-14 nm node structure, CMP-induced defects need to be fixed in the CMP in-situ cleaning module instead of during post ex-situ wet cleaning. Therefore, post-CMP in-situ cleaning optimization and cleaning efficiency improvement play a pivotal role in post-CMP defect control. CMP in-situ cleaning module normally consists of megasonic and brush scrubber processes. And there has been an increasing effort for the optimization of cleaning chemistry and brush scrubber cleaning in the CMP cleaning module. Although there have been many studies conducted on improving particle removal efficiency by brush cleaning, these studies do not consider the effects of brush contamination. Depending on the process condition and brush condition, brush cross contamination effects significantly influence post-CMP cleaning defects. This study investigates brush cross contamination effects in the CMP in-situ cleaning module by conducting experiments using 300mm tetraethyl orthosilicate (TEOS) blanket wafers. This study also explores brush pre-treatment in the CMP tool and proposes recipe effects, and critical process parameters for optimized CMP in-situ cleaning process through experimental results.

질산염 전구체 원료로 Ex-situ 공정에 의한 GdBCO 박막 제조 (Preparation of GdBCO Thin Film by Ex-situ Process using Nitrate Precursors)

  • 김병주;이철선;이종범;이재훈;문승현;이희균;홍계원
    • Progress in Superconductivity
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    • 제13권2호
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    • pp.127-132
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    • 2011
  • Many research groups have been manufacturing coated conductor by various processes such as PLD, MOD, and MOCVD, but the methods with production cost suitable for wide and massive application of coated conductor did not develop yet. Spray pyrolysis method adopting ultrasonic atomization was tried as one of the possible option. GdBCO precursor films have been deposited on IBAD substrate by spray pyrolysis method at low temperature and converted to GdBCO by post heat treatment. Ultrasonic atomization was used to generate fine droplets from precursor solution of Gd, Ba, and Cu nitrate dissolved in water. Primary GdBCO films were deposited at $500^{\circ}C$ and oxygen partial pressure of 1 torr. After that, the films were converted at various temperatures and low oxygen partial pressures. C-Axis oriented films were obtained IBAD substrates at conversion temperature of around $870^{\circ}C$ and oxygen partial pressures of 500 mtorr ~ 1 torr in a vacuum. Thick c-axis epitaxial film with the thickness of 0.4 ~ 0.5 ${\mu}m$ was obtained on IBAD substrate. C-axis epitaxial GdBCO films were successfully prepared by ex-situ methods using nitrate precursors on IBAD metal substrate. Converted GdBCO films have very dense microstructures with good grain connectivity. EDS composition analysis of the film showed a number of Cu-rich phase in surface. The precursor solution having high copper concent with the composition of Gd : Ba : Cu = 1 : 2 : 4 showed the better grain connectivity and electrical conductivity.