• Title/Summary/Keyword: etched surface

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REWETTING EFFECT OF WATER-BASED PRIMER ON THE AIR-DRIED DENTIN (공기건조된 상아질에 대한 수분함유 primer의 재습윤효과)

  • Kim, Ki-Young;Park, Jeong-Kil;Hur, Bock
    • Restorative Dentistry and Endodontics
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    • v.28 no.6
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    • pp.498-503
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    • 2003
  • The purpose of this study was to evaluate the rewetting effect of water-based primer on the air-dried dentin. In this in vitro study, freshly extracted non-caries human molars and three-step adhesive system(SBMP) were used. Freshly extracted non-caries human molars and three-step adhesive system(SBMP) were used. Flat occlusal dentin surface were prepared using low-speed diamond saw, Prepared teeth were randomly divided into three groups. Group 1.(W): etched(35% phosphoric acid for 15s) and blot-dried, Group 2.(5D): 5s air-dried, Group 3.(30D): 30s ail-dried, To obtain color contrast in CLSM observation, primer was mixed with rhodamine B and bonding resin was mixed with fluorescein. Microscopic sample of each group were obtained after longitudinal section. Morphological investigation of resin-dentin interface and thickness of hybrid layer measurement using CLSM were done. Microtensile bond strength for each specimen was measured. Specimen were observed under microscope to examine the failure patterns of interface between resin and dentin. The results of this study were as follows: 1. The results(mean) of Thickness of hybrid layer were W:19.67, 5D:20.9, 30D:10$\mu\textrm{m}$. Only 30D had statistically significant differences to Wand 5D(P<0.05). 2. The results(mean) of Microtensile bond strength were W:16.02, 5D:14.69, 30D:11.14MPa. Only 30D had statistically significant differences to Wand 5D(P<0.05). 3. There were positive correlation between Thickness of hybrid layer and microtensile bond strength(P<0.05).

Mechanism of Crack Formation in Pulse Nd:YAG Laser Spot Welding of Al Alloys (Al합금 펄스 Nd:YAG 레이저 점 용접부의 균열 발생기구)

  • 하용수;조창현;강정윤;김종도;박화순
    • Journal of Welding and Joining
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    • v.18 no.2
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    • pp.86-94
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    • 2000
  • This study was performed to investigate types and formation mechanism of cracks in two Al alloy welds, A5083 and A7N01 spot-welded by pulse Nd : YAG laser, using SEM, EPMA and Micro-XRD. In the weld zone, three types of crack were observed : center line crack({TEX}$C_{C}${/TEX}), diagonal crack({TEX}$C_{D}${/TEX}), and U shape crack({TEX}$C_{U}${/TEX}). Also, HAZ crack({TEX}$C_{H}${/TEX}) was observed in the HAZ region, furthermore, mixing crack({TEX}$C_{M}${/TEX}) consisting of diagonal crack and HAZ crack was observed. White film was formed at th hot crack region in the fractured surface after it was immersed to 10% NaOH water. In the case of A5083 alloy, white films in {TEX}$C_{C}${/TEX} crack and {TEX}$C_{D}${/TEX} crack region were composed of low melting phases, {TEX}$Fe_{2}SiAl_{8}${/TEX} and eutectic phases, $Mg_2$Al$_3$ and $Mg_2$Si. Such films observed $CuAl_2$, {TEX}$Mg_{32}(Al,Zn)_{3}${/TEX}, MgZn$_2$, $Al_2$CuMg and $Mg_2$Si were observed in the whitely etched films near {TEX}$C_{C}${/TEX} crack and {TEX}$C_{D}${/TEX} crack regions. The formation of liquid films was due to the segregation of Mg, Si, Fe in the case of A5083 alloy and Zn, Mg, Cu, Sim in the case of A7N01 alloy, respectively. The {TEX}$C_{C}${/TEX} and {TEX}$C_{D}${/TEX} cracks were regarded as a result of the occurrence of tensile strain during the welding process. The formation of {TEX}$C_{M}${/TEX} crack is likely to be due to the presence of liquid film at the grain boundary near the fusion line in the base metal as well as in the weld fusion zone during solidification. The {TEX}$C_{U}${/TEX} crack is considered a result of the collapsed keyhole through incomplete closure during rapid solidification.

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On a Modified Structure of Planar Multiport Power Divider/Combiner at 2 GHz (평면 다수 입출력 전력 분배/결합회로의 2 GHz에서의 구조 수정 연구)

  • Han, Yong-In;Jo, Chi-Sung;Kim, Ihn-Seok
    • Journal of Advanced Navigation Technology
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    • v.6 no.4
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    • pp.279-290
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    • 2002
  • In this paper, tapered shape of multiport power divider/combiner modified for 2 GHz range from the model published by [10] is proposed. Parameters determining electrical property of the circuit structure have been analyzed by HFSS simulation. For input matching, balance of output signals and phase linearity at each output port, one circular hole has been etched out on the circuit surface. 1:2 and 1:3 power dividers/combiners designed by this study have been compared with the same circuits designed by the method of [10] in terms of S-parameters. As a result, it has been found that the modified structure of power divider/combiner have improved return loss more than 20 dB and another 18 dB, respectively, at 2 GHz.

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High Density Inductively Coupled Plasma Etching of InP in BCl3-Based Chemistries (BCl3 기반의 혼합가스들을 이용한 InP 고밀도 유도결합 플라즈마 식각)

  • Cho, Guan-Sik;Lim, Wan-tae;Baek, In-Kyoo;Lee, Je-won;Jeon, Min-hyun
    • Korean Journal of Materials Research
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    • v.13 no.12
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    • pp.775-778
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    • 2003
  • We studied InP etching in high density planar inductively coupled $BCl_3$and $BCl_3$/Ar plasmas(PICP). The investigated process parameters were PICP source power, RIE chuck power, chamber pressure and $BCl_3$/Ar gas composition. It was found that increase of PICP source power and RIE chuck power increased etch rate of InP, while that of chamber pressure decreased etch rate. Etched InP surface was clean and smooth (RMS roughness <2 nm) with a moderate etch rate (300-500 $\AA$/min) after the planar $BCl_3$/Ar ICP etching. It may make it possible to open a new regime of InP etching with $CH_4$$H_2$-free plasma chemistry. Some amount of Ar addition (<50%) also improved etch rates of InP, while too much Ar addition reduced etch rates of InP.

Fabrication and Performance of Electron Cyclotron Resonance Ion Milling System for Etching of Magnetic Film Device (자성박막 소자 에칭용 전자 사이클로트론 공명 이온밀링 시스템 제작과 특성연구)

  • Lee, Won-Hyung;Hwang, Do-Guwn;Lee, Sang-Suk;Rhee, Jang-Roh
    • Journal of the Korean Magnetics Society
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    • v.25 no.5
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    • pp.149-155
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    • 2015
  • The ECR (Electron Cyclotron Resonance) Ar ion milling was manufactured to fabricate the device of thin film. The ECR ion milling system applied to the device etching operated by a power of 600W, a frequency of 2.45 GHz, and a wavelength of 12.24 cm and transferred by a designed waveguide. In order to match one resonant frequency, a magnetic field of 908 G was applied to a cavity inside of ECR. The Ar gas intruded into a cavity and created the discharged ion beam. The surface of target material was etched by the ion beam having an acceleration voltage of 1000 V. The formed devices with a width of $1{\mu}m{\sim}9{\mu}m$ on the GMR-SV (Giant magnetoresistance-spin valve) multilayer after three major processes such as photo lithography, ion milling, and electrode fabrication were observed by the optical microscope.

Decontamination methods to restore the biocompatibility of contaminated titanium surfaces

  • Jin, Seong-Ho;Lee, Eun-Mi;Park, Jun-Beom;Kim, Kack-Kyun;Ko, Youngkyung
    • Journal of Periodontal and Implant Science
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    • v.49 no.3
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    • pp.193-204
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    • 2019
  • Purpose: The reaction of cells to a titanium implant depends on the surface characteristics of the implant which are affected by decontamination. The aim of this study was to evaluate the cytocompatibility of titanium disks treated with various decontamination methods, using salivary bacterial contamination with dental pellicle formation as an in vitro model. Methods: Sand-blasted and acid-etched (SA) titanium disks were used. Three control groups (pristine SA disks [SA group]; salivary pellicle-coated SA disks [pellicle group]; and biofilm-coated, untreated SA disks [NT group]) were not subjected to any decontamination treatments. Decontamination of the biofilm-coated disks was performed by 14 methods, including ultrasonic instruments, rotating instruments, an air-powder abrasive system, a laser, and chemical agents. MG63 cells were cultured in the presence of the treated disks. Cell proliferation assays were performed on days 2 and 5 of cell culture, and cell morphology was analyzed by immunofluorescence and scanning electron microscopy (SEM). A vascular endothelial growth factor (VEGF) assay was performed on day 5 of culture. Results: The cell proliferation assay revealed that all decontaminated disks, except for the 2 groups treated using a plastic tip, showed significantly less cell proliferation than the SA group. The immunofluorescence and SEM analyses revealed that most groups showed comparable cell density, with the exception of the NT group, in which the cell density was lower and bacterial residue was observed. Furthermore, the cells grown with tetracycline-treated titanium disks showed significantly lower VEGF production than those in the SA group. Conclusions: None of the decontamination methods resulted in cytocompatibility similar to that of pristine SA titanium. However, many methods caused improvement in the biocompatibility of the titanium disks in comparison with the biofilm-coated, untreated titanium disks. This suggests that decontamination is indispensable for the treatment of peri-implantitis, even if the original biocompatibility cannot be restored.

Analysis of Si Etch Uniformity of Very High Frequency Driven - Capacitively Coupled Ar/SF6 Plasmas (VHF-CCP 설비에서 Ar/SF6 플라즈마 분포가 Si 식각 균일도에 미치는 영향 분석)

  • Lim, Seongjae;Lee, Ingyu;Lee, Haneul;Son, Sung Hyun;Kim, Gon-Ho
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.4
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    • pp.72-77
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    • 2021
  • The radial distribution of etch rate was analyzed using the ion energy flux model in VHF-CCP. In order to exclude the effects of polymer passivation and F radical depletion on the etching. The experiment was performed in Ar/SF6 plasma with an SF6 molar ratio of 80% of operating pressure 10 and 20 mTorr. The radial distribution of Ar/SF6 plasma was diagnosed with RF compensated Langmuir Probe(cLP) and Retarding Field Energy Analyzer(RFEA). The radial distribution of ion energy flux was calculated with Bohm current times the sheath voltage which is determined by the potential difference between the plasma space potential (measured by cLP) and the surface floating potential (by RFEA). To analyze the etch rate uniformity, Si coupon samples were etched under the same condition. The ion energy flux and the etch rate show a close correlation of more than 0.94 of R2 value. It means that the etch rate distribution is explained by the ion energy flux.

Ti Deposition using Atmospheric Pressure Plasma Technology (상압플라즈마 공정을 이용한 Ti 증착 연구)

  • Kim, Kyoung-Bo
    • Journal of Convergence for Information Technology
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    • v.12 no.2
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    • pp.149-156
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    • 2022
  • In this paper, it was attempted to form a titanium (Ti: Titanium) thin film using the atmospheric pressure plasma process technology for the conductor, which is the main component of the optical sensor. The atmospheric plasma equipment was remodeled. A 4-inch Ti target for sputter was etched using CF4 gas, and the by-product was coated on a glass sample. These by-products were formed up to about 2 cm, and could be divided into 15 areas according to color. Surface shape and constituent elements were analyzed using scanning electron microscopy (SEM) and energy dispersive spectrometer (EDS), respectively. Electrical properties using 4-point probe equipment were also measured. If the process is performed by positioning the sample at about 4.5 mm to 5 mm from the target, a uniform Ti thin film will be deposited. However, it was found that the thin film contained a significant amount of fluorine, which greatly affects the electrical properties of the thin film. Therefore, additional experiments and studies should be performed to remove or minimize fluorine during deposition.

Development of Zinc-Doped Titanium Dioxide Coatings with Enhanced Biocompatibility for Biomedical Application

  • Minseo Yu;Yo Han Song;Mi-Kyung Han
    • Korean Journal of Materials Research
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    • v.34 no.8
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    • pp.377-386
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    • 2024
  • The surface of titanium (Ti) dental implants was modified by applying a zinc (Zn)-doped titanium dioxide (TiO2) coating. Initially, the Ti surfaces were etched with NaOH, followed by a hydrolysis co-condensation using tetrabutyl titanate (TBT, Ti(OC4H9)4) and zinc nitrate hexahydrate (Zn(NO3)2·6H2O), with ammonia water (NH3·H2O) acting as a hydroxide anion source. The morphology and chemical composition of the Zn-doped TiO2-coated Ti plates were characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and scanning electron microscopy (SEM). Synthesis temperatures were carefully adjusted to produce anatase Zn-doped TiO2 nanoparticles with a bipyramidal structure and approximate sizes of 100 nm. Wettability tests and cell viability assays demonstrated the biomedical potential of these modified surfaces, which showed high biocompatibility with a survival rate of over 95 % (p < 0.05) and improved wettability. Corrosion resistance tests using potentiodynamic polarization reveal that Zn-TiO2-treated samples with an anatase crystal structure exhibited a lower corrosion current density and more noble corrosion potential compared to samples coated with a rutile structure. This method offers a scalable approach that could be adapted by the biomaterial industry to improve the functionality and longevity of various biomedical implants.

Shear bond strength of metal orthodontic brackets bonded with Self-Etching Primer (Self-etching primer를 이용하여 접착된 교정용 브라켓의 전단결합강도)

  • Ahn, Yun-Pyo;Kim, Hyo-Young;Jeon, Young-Mi;Kim, Jong-Ghee
    • The korean journal of orthodontics
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    • v.33 no.1 s.96
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    • pp.51-61
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    • 2003
  • The purpose of this study was to evaluate the effects of a self-etching primer on the shear bond strength of orthodontic brackets and on the failure pattern of bracket-adhesive interfaces in dry or wet condition. Brackets were bonded to extracted human teeth according to one of three experimental protocols. In the Group P, teeth were etched with $37\%$ phosphoric acid. After the Transbond XT Primer was applied onto the etched surfaces, the brackets were bonded with Transbond XT(3M, Unitek, Monrovia, Calif) and light cured for 40 seconds. In the Group SD, a self-etching primer(3M, Unitek, Monrovia, Calif) was placed on the enamel for 3 seconds and gently evaporated with air, as suggested by the manufacturer. The brackets were then bonded with Transbond XT as in the Group P In the Group SW, artificial saliva was applied to the enamel surface for 10 seconds to allow complete hydration of the surface before application self-etching primer The brackets were then bonded following the procedures of Group SD. Each group was divided into 2 sub-groups(0.5h, 24h) according to debonding time. Shear bond strengths were measured by Instron universal testing machine. After debonding, the teeth and brackets were examined under scanning electron microscope and assessed with the adhesive remnant index. The result obtained were summarized as follows ; 1. The shear bond strengths were high enough to use clinically in all testing groups, but the shear bond strengths of Group SD and SW were significantly lower than Group P(p<0.05). 2. With respect to comparison of debonding time, 24h debonding samples exhibited heigher shear bond strength than 0.5h debonding samples in Group P, SD and SW(p<0.05). 3. In the self etching primer groups(Group SD and Group SW), there was no significant difference in mean shear bond strength between under dry and wet state(p>0.05). 4. There was a greater frequency of ARI score of 0 and 1 with the Group P. On the other hand, there was a higher frequency of ARI scores of 2 and 3 with Group SD and Group SW(p<0.05).