• Title/Summary/Keyword: energy gap

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The Research about Free Piston Linear Engine Fueled with Hydrogen using Numerical Analysis (수소를 연료로 사용한 프리피스톤 리니어 엔진의 수치해석에 관한 연구)

  • Nguyen, Ba Hung;Oh, Yong-Il;Lim, Ock-Taeck
    • Journal of Hydrogen and New Energy
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    • v.23 no.2
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    • pp.162-172
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    • 2012
  • This paper presents a research about free piston linear engine (FPLE) fueled with hydrogen, in which, the numerical models are built to simulate the operation during the full stroke of the engine. Dynamic model, linear alternator model and thermodynamic model are used as the numerical models to predict piston velocity, in-cylinder pressure and electric power of FPLE. The spark timing and air gap length are changed to provide information for the prediction. Beside, the heat transfer problem is also investigated in the paper. The results of research are divided by two parts, including motoring mode and firing mode. The result of motoring mode showed that there is validation between simulation and experiment for volume and pressure in cylinder. For firing mode, by increasing spark timing, the velocity of piston, peak pressure and electric power also increase respectively. Beside, when increasing air gap length, the electric power increases accordingly while the motion of piston is not symmetric. The effect of heat transfer also observed clearly by reducing of the peak pressure, velocity of piston and electric power.

CdSe Sensitized ZnO Nanorods on FTO Glass for Hydrogen Production under Visible Light Irradiation (가시광 수소생산용 CdSe/ZnO nanorod 투명전극)

  • Kim, Hyun;Yang, Bee Lyong
    • Journal of Hydrogen and New Energy
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    • v.24 no.2
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    • pp.107-112
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    • 2013
  • The ZnO is able to produce hydrogen from water however it can only absorb ultraviolet region due to its 3.37eV of wide band gap. Therefore efficiency of solar hydrogen production is low. In this work we report investigation results of improved visible light photo-catalytic properties of CdSe quantum dots(QDs) sensitized ZnO nanorod heterostructures. Hydrothermally vertically grown ZnO nanorod arrays on FTO glass were sensitized with CdSe by using SILAR(successive ionic layer adsorption and reaction) method. Morphology of grown ZnO and CdSe sensitized ZnO nanorods had been investigated by FE-SEM that shows length of $2.0{\mu}m$, diameter of 120~150nm nanorod respectively. Photocatalytic measurements revealed that heterostructured samples show improved photocurrent density under the visible light illumination. Improved visible light performance of the heterostructures is resulting from narrow band gap of the CdSe and its favorable conduction band positions relative to potentials of ZnO band and water redox reaction.

Photocurrent Study on the Splitting of the Valence Band and Growth of $CdIn_2Te_4$ Single Crystal by Bridgman method (Bridgman법에 의해 성장된 $CdIn_2Te_4$ 단결정의 가전자 갈라짐에 대한 광전류 연구)

  • Baek, Seung-Nam;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.347-351
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    • 2003
  • A p-$CdIn_2Te_4$ single crystal has been grown by the Bridgman method without a seed crystal in a tree-stage vertical electric furnace. From photocurrent measurements, it was found that three peaks, A, B, and C, corresponded to an intrinsic transition due to the band-to-band transition from the valence band states ${\Gamma}_7(A),\;{\Gamma}_6(B),\;and\;{\Gamma}_7(C)$ to the conduction band state ${\Gamma}_6$, respectively. Also, the valence band splitting of the $CdIn_2Te_4$ crystal has been confirmed by photocurrent spectroscopy. The crystal field splitting and the spin orbit splitting were obtained to be 0.2360 and 0.1119 eV, respectively. Also, the temperature dependence of the band gap energy of the $CdIn_2Te_4$ crystal has been driven as the following equation of $E_g(T)\;=E_g(0)\;-\;(9.43\;{\times}\;10^{-3})T^2/(2676\;+\;T)$. In this equation, the Eg(0) was estimated to be 1.4750, 1.7110, and 1.8229 eV at the valence band state A, B, and C, respectively. The band gap energy of the p-$CdIn_2Te_4$ at room temperature was determined to be 1.2023 eV.

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Hall Effect of $FeSi_2$ Thin Film by Temperture ($FeSi_2$ 박막 홀 효과의 온도의존성)

  • Lee, Woo-Sun;Kim, Hyung-Gon;Kim, Nam-Oh;Chung, Hun-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.230-233
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    • 2001
  • FeSi2/Si Layer were grown using FeSi2, Si wafer by the chemical transport reactio nmethod. The directoptical energy gap was found to be 0.871eV at 300 K. The Hall effect is a physical effect arising in matter carrying electric current inthe presence of a magnetic field. The effect is named after the American physicist E. H. Hall, who discovered it in 1879. IN this paper, we study electrical properties of FeSi2/Si layer. And then we measured Hall coefficient Hall mobility, carrier density and Hall voltage according to variation magnetic field and temperature, Because of important part for it applicationVarious phase of silicide is formed at the metal-Si interface when transition metal contacts to Si. Silicides belong to metallic or semiconducting according to their electrical and optical properties. Metallic silicides are used as gate electrodes or interconnections in VLSI devices. Semiconducting silicides can be used as a new material for IR detectors because of their narrow energy band gap.

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Hall Effect of $FeSi_2$ Thin Film by Magnetic Field ($FeSi_2$ 박막 홀 효과의 자계의존성)

  • Lee, Woo-Sun;Kim, Hyung-Gon;Kim, Nam-Oh;Seo, Yong-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.234-237
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    • 2001
  • FeSi2/Si Layer were grown using FeSi2, Si wafer by the chemical transport reactio nmethod. The directoptical energy gap was found to be 0.871eV at 300 K. The Hall effect is a physical effect arising in matter carrying electric current inthe presence of a magnetic field. The effect is named after the American physicist E. H. Hall, who discovered it in 1879. IN this paper, we study electrical properties of FeSi2/Si layer. And then we measured Hall coefficient Hall mobility,carrier density and Hall voltage according to variation magnetic field and temperature, Because of important part for it applicationVarious phase of silicide is formed at the metal-Si interface when transition metal contacts to Si. Silicides belong to metallic or semiconducting according to their electrical and optical properties. Metallic silicides are used as gate electrodes or interconnections in VLSI devices. Semiconducting silicides can be used as a new material for IR detectors because of their narrow energy band gap.

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The Single Crystal Growth Method of undoped and Co-doped $Zn_4SnSe_6$ ($Zn_4SnSe_6:Co^{2+}$ 단결정의 성장방법에 관한 연구)

  • Kim, D.T.;Park, K.H.;Hyun, S.C.;Bang, T.H.;Kim, N.O.;Kim, H.G.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.05a
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    • pp.27-30
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    • 2006
  • In this paper, the undoped and Co-doped $Zn_4SnSe_6$ single crystals grown by the chemical transporting reaction(CTR) method using iodine as a transporting agent are investigated. For the crystal growth, the temperature gradient of the CTR furnace was kept at $680^{\circ}C$ for the source zone and at $780^{\circ}C$ for the growth zone for 7days. It was found from the analysis of x-ray diffraction that the $Zn_4SnSe_6$ and $Zn_4SnSe_6Co^{2+}$ compounds have a monoclinic structure. The direct optical energy band gap of the $Zn_4SnSe_6$ and $Zn_4SnSe_6Co^{2+}$ single crystals at 300K were found to be 2.146eV and 2.042eV.

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A Study on the Change of Si Thin Film Characteristics to Find Design Rules for Sputtering Equipment (스퍼터 장비의 설계 룰을 찾기 위한 Si박막 특성 변화 연구)

  • Kim, Bo-Young;Kang, Seo Ik
    • Journal of the Semiconductor & Display Technology
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    • v.19 no.3
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    • pp.100-105
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    • 2020
  • Recently, as display and semiconductor devices have been miniaturized and highly integrated, there is a demand for optimization of the structural characteristics of the thin film accordingly. The sputtering device has the advantage of stably obtaining a desired thin film depending on the material selected for the target. However, due to the structural characteristics of the sputtering equipment, the structural characteristics of the film may be different depending on the incidence angle of the sputtering target material to the substrate. In this study, the characteristics of the thin film material according to the scattering angle of the target material and the incidence position of the substrate were studied to find the optimization design rule of the sputtering equipment. To this end, a Si thin film of 1 ㎛ or less was deposited on the Si(100) substrate, and then the microstructure, reflectance, surface roughness, and thin film crystallinity of the thin film formed for each substrate location were investigated. As a result of the study, it was found that as the sputter scattering angle increased and the substrate incident angle decreased, the gap energy along with the surface structure of the thin film increased from 1.47 eV to 1.63 eV, gradually changing to a non-conductive tendency.

Characteristic of the Sputtered CIGS Films in Relation to Heat Treatment Condition (스퍼터링법으로 제작한 CIGS 박막의 후열처리에 따른 물성 평가)

  • Jung, Jae-Heon;Cho, Sang-Hyun;Song, Pung-Keun
    • Journal of Surface Science and Engineering
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    • v.46 no.1
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    • pp.16-21
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    • 2013
  • CIGS (Cu-In-Ga-Se) films were deposited on the Mo coated soda lime glass (Mo/SLG) by RF magnetron sputtering using a single sintered target with different chemical compositions. Heat treatment of the CIGS films were carried out under three different conditions, 1step ($350^{\circ}C$ for 2 hour and $550^{\circ}C$ for 2 hour) and 2step ($350^{\circ}C$ for 1 hour and $550^{\circ}C$ for 1 hour). In the case of CIGS films post-annealed on 2step method, grain size remarkably increased compared to other methods, indicating that chemical composition [Cu/(Ga+In) = 1] of CIGS films was same as CIGS target. After heat treatment by 2step method, band gap energy of the CIGS film deposited at RF 80 W showed 1.4 eV which is broadly similar to identical band gap energy (1.2 eV) of CIGS film prepared by evaporation method. Therefore, 2step heat treatment method could be expected to low temperature process.

Study on Electrical Properties and Temperature Dependence of Energy Band Gap for $ZnIn_2Se_4$ Single Crystal Thin Film Grown by Hot Wall Epitaxy (뜨겨운 곁쌓기법에 의해 성장된 $ZnIn_2Se_4$ 단결정 박막의 전기적 특성과 에너지 갭의 온도 의존성)

  • Park, Hyang-Sook
    • Journal of Integrative Natural Science
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    • v.3 no.1
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    • pp.54-59
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    • 2010
  • A stoichiometric mixture of evaporating materials for $ZnIn_2Se_4$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $ZnIn_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C$ and $400^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $ZnIn_2Se_4$ single crystal thin films measured from Hall effect by van der Pauw method are $9.41{\times}10^{16}cm^{-3}$ and $292cm^2/v{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $ZnIn_2Se_4$ obtained from the absorption spectra was well described by the Varshni's relation, $Eg(T)=1.8622eV-(5.23{\times}10^{-4}eV/K)T^2/(T+775.5K)$.

Optical characterization of doped ZnO thin films

  • Kim, Jin-Su;Jo, Seong-Hun;Seong, Tae-Yeon;Kim, Won-Mok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.426-426
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    • 2008
  • ZnO 박막과 Al이 도핑된 ZnO 다결정질 박막을 rf magnetron sputtering 방법을 이용하여 Si(100) 기판과 코닝글라스 기판에 증착하여 박막의 광학적 특성을 Spectro-scopic Ellipsometry (SE, Woollam사)와 UV-VIR-NIR Sphectrophotometry (SP, Varian사)를 사용하여 분석하였다. SE 측정은 입사각도 55도에서 75도까지 5도 간격으로 파장범위 250 - 1700 nm 에서 3 nm 간격으로 측정하였으며, SP 측정은 수직입사로 250-3000 nm 파장범위에서 1 nm 간격으로 투과도와 반사도를 측정하였다. 측정된 데이터들은 Lorentz Oscillator 모델과 Drude free electron 모델이 결합된 분산관계식을 사용하여 전산 맞춤을 하여 분석하였다. ZnO 박막의 optical band gap energy 는 3.3 eV로 측정되었으며, Al 도핑에 따른 자유전하농도가 증가에 의하여 Burstein-Moss 효과에 따르는 optical band gap energy의 증가 거동을 보였다. 또한 자유전하농도 증가에 따라 band edge 부근에서 나타나는 excitonic transition 에 기인하는 유전함수 피크의 broadening이 관찰되었으며, high frequency dielectric constant는 자유 전하농도에 관계없이 3.689${\pm}$0.05 eV 의 값을 가졌다. Drude free electron 모델을 사용하여 plasma frequency를 구하고 이로부터 얻어진 optical mobility 와 Hall mobility를 비교하여 ZnO계 다결정질 박막에서의 결정립계가 이동도에 미치는 영향을 고찰하고자 한다.

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