• Title/Summary/Keyword: energy FWHM

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Collimator Selection in $^{124}Te$ generated $^{123}I$ SPECT imaging ($^{124}Te$ Target로 생산된 $^{123}I$ SPECT 영상에서의 조준기 선택)

  • Kim, H.J.;Son, H.K.;Bong, J.K.;Nam, K.P.;Lee, H.K.
    • Proceedings of the KOSOMBE Conference
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    • v.1996 no.05
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    • pp.45-48
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    • 1996
  • In the case of $^{123}I$ from the $^{124}Te$ (p,2n)reaction, the radionuclidic impurity is the high-energy gamma-emitting $^{124}I$, which interferes greatly with nuclear medicine images. The choice of a collimator can affect the quality of clinical SPECT images of [I-123]MIBG or [I-123]TPT. The tradeoffs that two different collimators make among spatial resolution, sensitivity, and scatter were studied by imaging a line source at 5cm, 10cm, 15cm distance using a number of plexiglass sheets between source and collimator, petri dist two-dimensional Hoffman brain phantom, and Jaszczak phantom after filling with $^{123}I$ (FWHM, FWTM, Sensitivity) for low energy ultra high resolution parallel hole(LEUHRP) collimator and medium energy general purpose (MEGP) collimator were measured as (9.27mm, 61.27mm $129CPM/[\mu}$ Ci) and (10.53m 23.17mm $105CPM/{\mu}$ Ci), respectively. The image quality of two-dimensional Hoffman brain Phantom with LEUHRP looked better than the one with MEGP. However, the image quality of Jasgczak phantom with LEUHRP looked much worse than the one with MEGP, The results suggest that the MEGP is preferable to LEUHRP for SPECT studies of [I-123]MIBG or [I-123]IPT.

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Preparation and characterization of ITO Thin Film By Various Substrate heating temperature (기판온도에 따른 ITO 박막의 제조 및 특성)

  • Kim, Sung Jin;Pak, Hunkyun
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.94.2-94.2
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    • 2010
  • Indium tin oxide (ITO) Thin films were grown on Non-alkarai glass Substrates by PVD method and Subsequently Subjected to ($100^{\circ}C-350^{\circ}C$) Thermal Annealing (TA) In Nitr Oxygen ambinent. Most of all, The effect of TA treatment on the structural properties were studied by using X-Ray diffraction and atomic force microscopy, while optical properties were studied by UV-Transmittance measurements. After TA treatment, the XRD spectra have shown an effective relaxation of the residual compressive stress, As a result, XRD peaks increase of the intensity and narrowing of full width at half-maximun (FWHM). In addtion The microstructure, The surface morphology, the optical transmittance changed and improved, and we investigated The effects of temperature, Time and atmosphere during the TA on the structural and electrical properties of the ITO/glass on TA at $300^{\circ}C$. As a results, the films are highly transparent (80%~89%) in visible region. AFM analysis shows that the films are very smooth with root mean square surface roughness 0.58nm -2.75nm thickness film. It is observed that resistivity of the films drcreases T0 $1.05{\times}10^{-4}{\Omega}cmt$ $6.06{\times}10^{-4}{\Omega}cm$, while mobility increases from $152cm^2/vs$ to $275cm^2/vs$.

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Growth of GaN on sapphire substrate by GSMBE(gas source molecular beam epitaxy) using ammonia as nitrogen source (Nitrogen source로 ammonia를 사용해 GSMBE로 성장된 GaN 박막 특성)

  • Cho Hae-jong;Han Kyo-yong;Suh Young-suk;Misawa Yusuke;Park Kang-sa
    • Proceedings of the IEEK Conference
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    • 2004.06b
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    • pp.501-504
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    • 2004
  • High quality GaN layer was obtained on 0001 sapphire substrate using ammonia($NH_3$) as a nitrogen source by gas source molecular beam epitaxy. As a result, RHEED is used to investigate the relaxation processes which take place during the growth of GaN. In-situ RHEED(reflection high electron energy diffraction) appeared streaky-like pattern. The full Width at half maximum of the x-ray diffraction(FWHM) rocking curve measured from plane of GaN has exhibited as narrow as 8arcmin and surface roughness was 7.83nm. Photoluminescence measurement of GaN was investigated at room temperature, where the intensity of the band edge emission is much stronger than that of deep level emission. The GaN epitaxy layer according to various growth condition was investigated.

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Thermally Adjusted Graphene Oxide as the Hole Transport Layer for Organic Light-Emitting Diodes (열처리된 그래핀 산화물을 정공주입층으로 이용한 유기발광 다이오드)

  • Shin, Seongbeom
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.4
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    • pp.363-367
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    • 2015
  • This paper reports on thermally adjusted graphene oxide (GO) as the hole transport layer (HTL) for organic light-emitting diodes (OLEDs). GO is generally not suitable for HTL of OLEDs because of intrinsic specific resistance. In this paper, the specific resistance of GO is adjusted by the thermal annealing process. The optimum specific resistance of HTL is found to be $10^2{\Omega}{\cdot}m$, and is defined by the maximum current efficiency of OLEDs, 2 cd/A. In addition, the reasons for specific resistance change are identified by x-ray photoelectron spectroscopy (XPS). First, the XPS results show that several functional groups of GO were detached by thermal energy, and the amount of epoxide changed substantially following the temperature. Second, the full width at half maximum (FWHM) of the C-C bond decreased during the process. That means the crystallinity of the graphene improved, which is the scientific basis for the change in specific resistance.

Temperature Dependence of Excitonic Transitions in GaN Grown by MOCVD

  • Guangde Chen;Jingyu Lin;Hongxing Jiang;Kim, Jung-Hwan;Park, Sung-Eul
    • Journal of Photoscience
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    • v.7 no.1
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    • pp.27-30
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    • 2000
  • The Photoluminescence (PL) measurement results of a very good quality GaN sample grown by metalorganic chemical vapor deposition (MOCVD) are reported. The temperature dependences of peak position, emission intensity, and the full width at half maximum (FWHM) of free-exciton (FX) A and B are presented. Our results show the fast thermal quenching of FX transition intensities and predominantly acoustic phonon scattering of emission line broadening. The transition-energy-shift following the Varshni's empirical equation, and by using it to fit the data, E$\_$A1/(T) = 3.4861 eV -6.046 $\times$ 10$\^$-4/T$^2$ (620.3+ T) eV, E$\_$B1/(T) = 3.4928 eV -4.777 $\times$ 10$\^$-4/T$^2$ / (408.2+ T) eV and E$\_$A2/ = 3.4991 eV -4.426 $\times$ 10$\^$-4/ T$^2$ / (430.6+ T) eV for A(n=1), B(n=1), and A(n=2) are obtained respectively.

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Optimal Characteristics of a Long-pulse $CO_2$Laser by Controlling SCR Firing Angle in AC Power Line

  • Noh, Ki-Kyung;Kim, Geun-Yong;Chung, Hyun-Ju;Min, Byoung-Dae;Song, Keun-Ju;Kim, Hee-Je
    • KIEE International Transactions on Electrophysics and Applications
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    • v.2C no.6
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    • pp.304-308
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    • 2002
  • We demonstrate a simple pulsed $CO_2$ laser with millisecond long pulse duration in a tube at a low pressure of less than 30 Torr. The novel power supply for our laser system switches the voltage of the AC power line (60Hz) directly. The power supply doesn't need elements such as a rectifier bridge, energy-storage capacitors, or a current-limiting resistor in the discharge circuit. To control the laser output power, the pulse repetition rate is adjusted up to 60Hz and the firing angle of SCR(Silicon Controlled Rectifier) gate is varied from 30。 to 150。. A ZCS (Zero Crossing Switch) circuit and a PIC one-chip microprocessor are used to control precisely the gate signal of the SCR. The maximum laser output of 35 W is obtained at a total pressure of 18 Torr, a pulse repetition rate of 60 Hz, and a SCR gate firing angle of 90。 . In addition, the resulting laser pulse width is approximately 3㎳(FWHM). This is a relatively long pulse width, compared with other repetitively pulsed $CO_2$ lasers.

Simmyung Laser System and Study on the X-ray Generation (신명 레이저와 X-선 발생 연구)

  • Kong, Hong-Jin;Han, Ki-Gwan;Kim, Nam-Seong;Kim, Hyun-Soo;Um, Ki-Young;Park, Jong-Rak;Lee, Jae-Youg;Shin, Yun-Sup;Han, Ki-Ho
    • Proceedings of the Optical Society of Korea Conference
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    • 1995.06a
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    • pp.185-189
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    • 1995
  • A high-power Nb:glass laser system(Simmyung I) has been contructed and tested. In this system, we used a Nb:YLF laser as a master oscillator, a 4-pass amplifier for pre-amplification, 5 stages of rod amplifiers, and spatial filtering and image reaying usits. The system has demonstrated in excess of 80J(2TW) with 40 psec(FWHM) pulse duration. Output energy, gain and spatial were measured at each amplification stage. With this laser system a preliminary X-ray generation experiment was performed. Pinhole images, X-ray diode signals and X-ray speriment were obtained for the irradiated target of copper. Detailed descriptions of the system performance and the X-tay generation experiment are presented.

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A Synthesis of Spherical Shape $TiO_2-SiO_2$ Complex via Solvothermal Process and Thermal Properties at Non-Isothermal (용매열합성을 이용한 구형 $TiO_2-SiO_2$ 복합체 제조 및 열적특성)

  • Cho Tae-Hwan;Park Seong-Jin
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.2 s.35
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    • pp.141-147
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    • 2005
  • Nanomaterial $TiO_2-SiO_2$ was synthesized by hydrolysis and condensation process using 2-propanol(2-PrOH) and was characterized by FT-IR, DSC, XRD and FE-SEM. FT-IR spectra were measured to investigate Ti-0-Si absorption peak. DSC thermal analysis results appllied to Ozawa equation were used to calculate to activation energy of crystallization. It was found that the changes of X-ray diffraction patterns and FWHM obtained XRD measurement depended on calcination temperature. In FE-SEM analysis, particle size changed by quantity changes of Ti-alkokide.

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Electronic structure of the Au intercalated monolayer graphene on Ni(111)

  • Hwang, H.N.;Jee, H.G.;Han, J.H.;Tai, W.S.;Kim, Y.D.;Hwang, C.C.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.342-342
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    • 2010
  • We have investigated an Au intercalated monolayer graphene on Ni(111) using angle-resolved photoemission spectroscopy (ARPES), high resolution photoemission spectroscopy (HRPES), and low energy electron diffraction (LEED) at the 3A2 ARUPS beamline in Pohang Accelerator Laboratory. We find the monolayer graphene is well grown on the Ni(111) surface by the adsorption of acetylene. However, the graphene does not show the characteristic $\pi$ band near the Fermi level due to its strong interaction with the underlying substrate. When Au is adsorbed on the surface and then annealed at high temperature, we observe that Au is intercalated underneath the monolayer graphene. The process of the Au intercalation was monitored by HRPES of corresponding Au 4f and C 1s core levels as well as the electronic structure of the $\sigma$, $\pi$ states at $\Gamma$, K points. The $\sigma$, $\pi$ bands of graphene shift towards the Fermi level and the $\pi$ band is clearly observed at K point after the intercalation of full monolayer Au. The full width at half maximum (FWHM) of the C 1s peak narrows to approximately 0.42 eV after intercalation. These results imply that the interaction between the graphene and substrate is considerably weakened after the Au intercalation. We will discuss the graphene is really closer to ideal free standing graphene suggested recently.

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Photoluminescence Characteristics of InAs Quantum Dots Grown on AlAs Epitaxial Layer (AlAs 에피층 위에 성장된 InAs 양자점의 Photoluminescence 특성연구)

  • Kim, Ki-Hong;Sim, Jun-Hyoung;Bae, In-Ho
    • Korean Journal of Materials Research
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    • v.19 no.7
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    • pp.356-361
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    • 2009
  • The optical characterization of self-assembled InAs/AlAs Quantum Dots(QD) grown by MBE(Molecular Beam Epitaxy) was investigated by using Photoluminescence(PL) spectroscopy. The influence of thin AlAs barrier on QDs were carried out by utilizing a pumping beam that has lower energy than that of the AlAs barrier. This provides the evidence for the tunneling of carriers from the GaAs layer, which results in a strong QD intensity compared to the GaAs at the 16 K PL spectrum. The presence of two QDs signals were found to be associated with the ground-states transitions from QDs with a bimodal size distribution made by the excitation power-dependent PL. From the temperature-dependent PL, the rapid red shift of the peak emission that was related to the QD2 from the increasing temperature was attributed to the coherence between the QDs of bimodal size distribution. A red shift of the PL peak of QDs emission and the reduction of the FWHM(Full Width at Half Maximum) were observed when the annealing temperatures ranged from 500 $^{\circ}C$ to 750 $^{\circ}C$, which indicates that the interdiffusion between the dots and the capping layer was caused by an improvement in the uniformity size of the QDs.