• Title/Summary/Keyword: emitting layer

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The Electroluminescence Properties of Sq-doped Alq3 Organic Thin Films (Sq가 도핑된 Alq3 유기 박막의 발광 특성)

  • 박종관;김형권;김종택;육재호
    • Journal of the Institute of Electronics Engineers of Korea TE
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    • v.37 no.5
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    • pp.1-6
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    • 2000
  • We prepared organic light-emitting-diodes (LEDs) with a squarylium(Sq)-doped aluminum quinoline(Alq3) emission layer by the vapor deposition method. We discussed their electro-luminescence(EL) and electrical properties. The EL from Sq had a peak wavelength of 670nm and a half-width of 30nm. Only the EL from So(purely red) could be observed at the doping concentration of over 15mol%, but the luminance were low (0.21cd/$m^2$, 0.1cd/$m^2$) and EL efficiency was under the $10^{-2}$W. Although Sq molecules seemed to act as trap site in Alq3 molecules, they acted as carrier drafts site at doping concentration of over 5mol%.

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Curing Characteristics for Projection Stereolithography based on LCD and Visible LED (LCD 와 가시광선 LED 기반의 광조형 시스템을 위한 수지의 경화 특성)

  • Kim, Ga Young;Ha, Young Myoung;Park, In Baek;Kim, Min Sub;Jo, Kwang Ho;Lee, Seok Hee
    • Journal of the Korean Society for Precision Engineering
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    • v.30 no.8
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    • pp.878-884
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    • 2013
  • Stereolithography can be classified into two main categories according to the cross-sectional shape: scanning type and projection type. Projection stereolithography has significant advantages when making a layer using a single patterned beam, and results in improved speed and accuracy. To implement relatively low-cost projection stereolithography, we developed a system using a commercially available resin, which cures on exposure to visible light. The optimum photoinitiator was investigated, as well as the mixing ratio. The viscosity, shrinkage, curing depth and tensile strength were evaluated through several experiments on fabricated three-dimensional structures, and thus an optimal resin selection system was developed.

Efficiency Improvement of Green Emitting OLED by Aquaregia Treatment of ITO Substrate (ITO 기판의 Aquaregia 처리에 의한 녹색발광 OLED의 효율 향상 연구)

  • Choi, Gyu-Chae;Kim, Dong-Eun;Kim, Byoung-Sang;Kwon, Young-Soo
    • Proceedings of the KIEE Conference
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    • 2008.07a
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    • pp.1291-1292
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    • 2008
  • ITO is widely used as an anode material in OLED, because of its good transparency, low electrical resistivity, high work function, and efficient hole injection properties. The interface between the electrode and the organic layer in the OLED effects the charge injection process and may influence the electrical and the luminance properties. Surface treatment of ITO, such as an Aquaregia treatment has been shown to enhance the efficiency, and luminance characteristics of the OLED. In this study, we investigated the effect of Aquaregia treatment. The fundamental structures of the OLED were ITO/NPB/$Alq_3$/LiF/Al. The current density-voltage-luminance, efficiency, and lifetime characteristics were measured with untreated and Aquaregia-treated ITO substrates. The Aquaregia treatment was found to enhance the performance of OLED. For the Aquaregia treated device, the maximum luminance and efficiency were increased by about 2 times compared to the untreated device. The mechanism of the Aquaregia treatment is discussed based on AFM analyses.

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Electrical Properties of a-IGZO Thin Films for Transparent TFTs

  • Bang, J.H.;Song, P.K.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.99-99
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    • 2010
  • Recently, amorphous transparent oxide semiconductors (TOS) have been widely studied for many optoelectronic devices such as AM-OLED (active-matrix organic light emitting diodes). The TOS TFTs using a-IGZO channel layers exhibit a high electron mobility, a smooth surface, a uniform deposition at a large area, a high optical transparency, a low-temperature fabrication. In spite of many advantages of the sputtering process such as better step coverage, good uniformity over large area, small shadow effect and good adhesion, there are not enough researches about characteristics of a-IGZO thin films. In this study, therefore, we focused on the electrical properties of a-IGZO thin films as a channel layer of TFTs. TFTs with the a-IGZO channel layers and Y2O3 gate insulators were fabricated. Source and drain layers were deposited using ITO target. TFTs were deposited on unheated non-alkali glass substrates ($5cm{\times}5cm$) with a sintered ceramic IGZO disc (3 inch $\varnothing$, 5mm t), Y2O3 disc (3 inch $\varnothing$, 5mm t) and ITO disc (3 inch $\varnothing$, 5mm t) as a target by magnetron sputtering method. The O2 gas was used as the reactive gas. Deposition was carried out under various sputtering conditions to investigate the effect of sputtering process on the characteristics of a-IGZO thin films. Correlation between sputtering factors and electronic properties of the film will be discussed in detail.

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Fabrication of Organic Thin Film Transistor(OTFT) for Flexible Display by using Microcontact Printing Process (미세접촉프린팅공정을 이용한 플렉시블 디스플레이 유기박막구동소자 제작)

  • Kim K.Y.;Jo Jeong-Dai;Kim D.S.;Lee J.H.;Lee E.S.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.595-596
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    • 2006
  • The flexible organic thin film transistor (OTFT) array to use as a switching device for an organic light emitting diode (OLED) was designed and fabricated in the microcontact printing and low-temperature processes. The gate, source, and drain electrode patterns of OTFT were fabricated by microcontact printing which is high-resolution lithography technology using polydimethylsiloxane(PDMS) stamp. The OTFT array with dielectric layer and organic active semiconductor layers formed at room temperature or at a temperature tower than $40^{\circ}C$. The microcontact printing process using SAM(self-assembled monolayer) and PDMS stamp made it possible to fabricate OTFT arrays with channel lengths down to even nano size, and reduced the procedure by 10 steps compared with photolithography. Since the process was done in low temperature, there was no pattern transformation and bending problem appeared. It was possible to increase close packing of molecules by SAM, to improve electric field mobility, to decrease contact resistance, and to reduce threshold voltage by using a big dielecric.

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Preparation of Polymer Light Emitting Diodes with PVK:Ir(ppy)$_3$ Emission Layer (PVK:Ir(ppy)$_3$ 발광층을 가지는 고분자 발광다이오드의 제작)

  • Lee, Hak-Min;Gong, Su-Cheol;Choi, Jin-Eun;Chang, Ho-Jung
    • Proceedings of the KAIS Fall Conference
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    • 2008.11a
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    • pp.201-203
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    • 2008
  • ITO 투명전극을 양극으로 사용하고 PEDOT:PSS 고분자 물질위에 PVK와 Ir(ppy)3를 각각 host와 dopant로 사용하여 고분자 발광다이오드를 제작하였다. 전자 수송층의 역할로 TPBI, 음극으로 Al을 증착하여 최종적으로 ITO/PEDOT:PSS/PVK:Ir(ppy)3/TPBI/LiF/Al 구조를 갖는 녹색 인광 고분자 유기발광소자(PhPLED)를 제작하였다. 제작 된 소자의 발광부 dopant인 Ir(ppy)3도핑 농도에 따른 전기적 광학적 특성을 평가하였다. PVK:Ir(ppy)3를 host와 dopant system으로 dopant Ir(ppy)3의 도핑 양을 0.5 wt%에서2.5 wt%까지 씩 변화시키면서 최적의 농도를 찾고자 하였다. TPBI를 전자 수송층으로 사용 하였을 경우 최대 휘도는 약 8600 cd/$m^2$ (at 8V)이고, 전류밀도는 337mA/$cm^2$ 를 나타내었다.

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GaN기반 LED 응용을 AZO, Ni/AZO 및 NiOx/AZO의 전기적.광학적 특성

  • Ju, Dong-Hyeok;Lee, Hui-Gwan;Yu, Jae-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.249-249
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    • 2011
  • 투명전도성산화물(transparent conducting oxides, TCOs) 박막은 전기 전도성과 광투과성이 우수하여 유기발광다이오드(organic light-emitting diode, OLED), 태양전지(solar cell), 발광다이오드(LED) 등의 광전자 소자에 널리 응용되고 있다. 특히 LED에서 p-GaN층에서 전류가 층안에서 충분하게 확산되지 않기 때문에, TCO는 균일하게 전류를 흘려보내기 위해서 전류확산층(current spreading layer)으로 사용된다. 그 중 널리 쓰이는 산화인듐주석(indium tin oxide, ITO)은 고가의 indium가격과 인체에 유해한 독성 등이 문제점으로 지적되고 있다. 따라서 indium의 함량을 저감하거나 함유하지 않은 새로운 조성의 친환경적 대체 TCO 개발에 대한 연구가 많이 진행되고 있다. 이러한 반도체 재료 중 하나인 AZO (Al-doped zinc oxide, Al2O3 : 2wt.%)는 3.3 eV의 넓은 에너지 밴드갭을 가지며, 가시광선 및 근적외선 파장영역에서 높은 투과율을 나타낸다. 따라서 본 연구에서는 GaN기반 LED 응용을 위한 전류확산층으로 ITO 대신 AZO의 특성을 연구하였다. 박막 증착율이 높고, 제작과정의 조정이 용이한 RF magnetron 스퍼터를 이용하여 glass기판 위에 AZO, Ni/AZO, NiOx/AZO를 증착하였다. 이어서 $N_2$ 분위기에서 다양한 온도 조건에서 열처리(rapid thermal annealing, RTA)하여 전기적 광학적 특성에 대하여 비교 분석하였다.

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Femtosecond laser pattering of ITO film on flexible substrate (펨토초 레이저를 이용한 플렉시블 ITO 패터닝 연구)

  • Sohn, Ik-Bu;Kim, Young-Seop;Noh, Young-Chul
    • Laser Solutions
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    • v.13 no.1
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    • pp.11-15
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    • 2010
  • Indium tin oxide (ITO) provides high electrical conductivity and transparency in the visible and near IR (infrared) wavelengths. Thus, it is widely used as a transparent electrode for the fabrication of liquid crystal displays (LCDs) and organic light emitting diode displays (OLRDs), photovoltaic devices, and other optical applications. Lasers have been used for removing coating on polymer substrate for flexible display and electronic industry. In selective removal of ITO layer, laser wavelength, pulse energy, scan speed, and the repetition rate of pulses determine conditions, which are efficient for removal of ITO coating without affecting properties of the polymer substrate. ITO coating removal with a laser is more environmentally friendly than other conventional etching methods. In this paper, pattering of ITO film from polymer substrates is described. The Yb:KGW femtosecond laser processing system with a pulse duration of 250fs, a wavelength of 1030nm and a repetition rate of 100kHz was used for removing ITO coating in air. We can remove the ITO coating using a scanner system with various pulse energies and scan speeds. We observed that the amount of debris is minimal through an optical and a confocal microscope, and femtosecond laser pulses with 1030nm wavelength are effective to remove ITO coating without the polymer substrate ablation.

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Electrical Characteristics of Pentacene Thin Film Transistors.

  • Kim, Dae-Yop;Lee, Jae-Hyuk;Kang, Dou-Youl;Choi, Jong-Sun;Kim, Young-Kwan;Shin, Dong-Myung
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.69-70
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    • 2000
  • There are currently considerable interest in the applications of conjugated polymers, oligomers, and small molecules for thin-film electronic devices. Organic materials have potential advantages to be utilized as semiconductors in field-effect transistors and light-emitting diodes. In this study, pentacene thin-film transistors (TFTs) were fabricated on glass substrate. Aluminums were used for gate electrodes. Silicon dioxide was deposited as a gate insulator by PECVD and patterned by reactive ion etching (R.I.E). Gold was used for the electrodes of source and drain. The active semiconductor pentacene layer was thermally evaporated in vacuum at a pressure of about $10^{-8}$ Torr and a deposition rate $0.3{\AA}/s$. The fabricated devices exhibited the field-effect mobility as large as 0.07 $cm^2/V.s$ and on/off current ratio as larger than $10^7$.

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Carbon Nano-structured Films on Chrome Electrodes with Excellent Electron Emission Characteristics

  • Koh, Ken-Ha;Park, Kyung-Ho;Choi, Seung-Ho;Lee, Kyung-Mun;Oh, Soo-Ghee;Lee, Soon-Il
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.55-56
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    • 2000
  • We report the fabrication of carbon nanostureture films with excellent electron-emission characteristics on chrome electrodes using a pre-deposited transition metal catalyst layer. The emission current densities of 1 ${\mu}A/cm^2$ and 1 $mA/cm^2$ were measured at the electric field of 2.5 and 4.8 $V/{\mu}m$, respectively, and the current fluctuation of less than 2.5% was observed at the average current density 211 ${\mu}A/cm^2$ for the measurement duration of 20 minutes. We counted more than ${\sim}10^4$ emission sites per $cm^2$ from the emission images, and also noticed good mechanical stability. Moreover, we were able to fabricate good electron-emitting carbon films on chrome electrodes on Corning glass substrates at the nominal temperature below $650^{\circ}C$.

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