• Title/Summary/Keyword: emitter

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Monte carlo analysis of InAlGaAs/InGaAs HBT (InAlGaAs/InGaAs HBT의 Monte carlo 해석)

  • 황성범;김용규;송정근
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.405-408
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    • 1998
  • Due to the large conduction band discontinuity between emitter base, OmGaAs HBT has an advantge to enable the hot electrons to inject into the base. In this paper, InAlGaAs/InGaAs HBT with the various emitter junction gradings and the modified collectors are simulated and analyzed by HMC(hybrid monte carlo) simulator in order to find a optimal structure for the shortest transit time. A minium base transit time (.tau.$_{b}$ ) of 0.21 ps was obtained for HBT with the grading layer, which is parabolically graded from x=1.0 to x=0.5. The minimum collector transit time (.tau.$_{c}$ ) of 0.31ps was found when the collector was modified by inserting p$^{[-10]}$ and p$^{+}$ layers. Thus HBT in combination with the emitter grading and the modified collector layer showed the cut-off frequency (f$_{T}$) of 183GHz.z.z.

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Fabrication of the silicon field emitter araays with H$_{2}$O densified oxide as a gate insulator (H$_{2}$O 분위기에서 치밀화시킨 (densified) 산화막을 게이트 절연막으로 갖는 실리콘 전계방출소자의 제작)

  • 정호련;권상직;이종덕
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.7
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    • pp.171-175
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    • 1996
  • Gate insulator for Si field emitter is usually formed by e-beam evaporation. However, the evaported oxide requires densification for a stable process and a reduction of gate leakage which results from its Si-rich and nonstoicheiometric structure. In this study, we have developed the process technology able to densify the evaporated oxide in H$_{2}$O ambient. Using this process, we have fabricted thefield emitter array with 625 emitters per pixel, of which gate hole diameter is 1.4.mu.m, for the pixel, anode current of 14.3.mu.A was extracted at a gate bias of 100V and gate leakage was about 0.27% of the total emission current.

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A novel in-situ vacuu encapsulted lateral field emitter triode (자체적으로 진공을 갖는 수평형 전계 방출 트라이오드)

  • 임무섭;박철민;한민구;최연익
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.12
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    • pp.65-71
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    • 1996
  • A novel lateral field emitter triode has been designed and fabricated. It has self-vacuum environmets and low turn-on voltage, so that the chief problems of previous field emission devices such as additional vacuum sealing process and high turn-on voltage are settled. An in-situ vaccum encapsulation empolying recessed cavities by isotropic RIE (reactive ion etch) method and an electron beam evaporated molybdenum vacuum seals are implemented to fabricate the new field emitter triode. The device exhibits low turn-on voltage of 7V, stabel current density of 2.mu.A/tip at V$_{AC}$ = 30V, and high transconductance (g$_{m}$) of 1.7$\mu$S at V$_{AC}$ = 22V. The superb device characteristics are probably due to sub-micron dimension device structure and the pencil type lateral cathode tip employing upper and lower LOCOS oxidation.

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Performance Comparison of LOB-based Emitter Localization Algorithms (방위각을 이용한 신호원 위치 추정 알고리즘의 성능 비교)

  • Lee, Joon-Ho;Kim, Min-Cheol;Cho, Seong-Woo;Jin, Yong-Ki;Lee, Dong-Keun
    • Journal of the Korea Institute of Military Science and Technology
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    • v.12 no.4
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    • pp.437-445
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    • 2009
  • In this paper, we present the performance of the LOB(line of bearing) - based emitter localization algorithm. The linear LSE(least-squared error) algorithm, nonlinear LSE algorithm and Stansfield algorithm are considered. In addition, we focus on the performance improvement of the weighted estimation compared with the unweighted estimation. Each estimation algorithm is briefly introduced, and the performance of the algorithm is illustrated using the numerical results.

Fabrication of InP/InGaAs HPT's with ITO Emitter Contacts (ITO 에미터 투명전극을 갖는 InP/InGaAs HPT 제작)

  • Kang, Min-Su;Han, Kyo-Yong
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.51 no.11
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    • pp.546-550
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    • 2002
  • In this paper, Heterojunction phototransistors(HPT's) with an optically transparent ITO emitter contacts were fabricated. The ITO ohmic contacts were realized by employing thin imdium layer between the ITO and $n^+$-InP layers. The ITO contact was annealed at $250^{\circ}C$. The specific contact resistance of about $6.6{\times}10^{-4}{\Omega}cm^2$ was measured by use of the transmission line model (TLM). Heterojunction bipolar transistors (HBTs) having the same device layout were fabricated to compare with HPTs. The DC characteristics of the InP/InGaAs HPT showed the similar electrical characteristics of the HBT. Emitter contact resistance($R_E$) of about $6.4{\Omega}$ was extracted, which was very similar to that of the HBT. The optical characteristics of HPT's were generated by illuminating the device with light from $1.3{\mu}m$ light. It showed that HPT's can be controlled optically.

Improvement of the Field Emission Stability of Carbon Nanotube Paste Emitter by Post-treatments

  • Choi, Young-Chul;Jeong, Mun-Seok
    • Carbon letters
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    • v.10 no.3
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    • pp.234-238
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    • 2009
  • The field emitters were fabricated by screen-printing of carbon nanotube paste, and their emission stabilities were evaluated. It was found that the emission stability measured in a sealed device is much higher than that measured in a vacuum chamber in spite of similar pressure. This was because oxygen gas was scarcely remained in the sealed device, while the gas is continuously supplied into the vacuum chamber during the stability measurement. It was found that the plasma treatment etched the protruded CNTs, resulting in the uniform height of CNT tips. As a result, the stability was increased remarkably. It was also found that the stability of CNT paste emitter was improved by electrical aging and that the optimum condition for the aging was varied with the size of emitter.

Design and Fabrication of 1700 V Emitter Switched Thyristor (1700 V급 EST소자의 설계 및 제작에 관한 연구)

  • Kang, Ey-Goo;Ahn, Byoung-Sub;Nam, Tae-Jin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.3
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    • pp.183-189
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    • 2010
  • In this paper, the trench gate emitter switched thyristor(EST) withl trench gate electrode is proposed for improving snap-back effect which leads to a lot of problems in device applications. The parasitic thyristor which is inherent in the conventional EST is completely eliminated in this structure, allowing higher maximum controllable current densities for ESTs. The dual trench gate allows homogenous current distribution in the EST and preserves the unique feature of the gate controlled current saturation of the thyristor current. The characteristics of the 1700 V forward blocking EST obtained from two-dimensional numerical simulations (MEDICI) is described and compared with that of a conventional EST. we carried out layout, design and process of EST devices.

TCO Workfunction Engineering with Oxygen Reactive Sputtering Method for Silicon Heterojunction Sola Cell Application

  • Bong, Seong-Jae;Kim, Seon-Bo;An, Si-Hyeon;Park, Hyeong-Sik;Lee, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.492-492
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    • 2014
  • On account of the good conductivity and optical properties, TCO is generally used in silicon heterojunction solar cell since the emitter material, hydrogenated amorphous silicon (a-Si:H), of the solar cell has low conductivity compare to the emitter of crystalline silicon solar cell. However, the work function mismatch between TCO layer and emitter leads to band-offset and interfere the injection of photo-generated carriers. In this study, work function engineering of TCO by oxygen reactive sputtering method was carried out to identify the trend of band-offset change. The open circuit voltage and short circuit current are noticeably changed by work function that effected from variation of oxygen ratio.

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Formation of an Aluminum Parting Layer in the Fabrication of Field Emitter Arrays Using Reflow Method

  • Kang, Seung-Youl;Jung, Moon-Youn;Cho, Young-Rae;Song, Yoon-Ho;Lee, Sang-Kyun;Kim, Do-Hyung;Lee, Jin-Ho;Cho, Kyoung-Ik
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.219-220
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    • 2000
  • We propose a new method for the formation of an aluminum parting layer in the fabrication of field emitter arrays, in which we used a reflow property of aluminum at a lower temperature than the deformation point of glass. After the sputtered aluminum layer on the gate metal was etched for the formation of gate holes, we carried out a rapid thermal annealing process, by which the aluminum slightly diffused into the gate hole. This reflowed aluminum could be used as a parting layer and emitter arrays were easily fabricated using this method.

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Fabrication of the Hihg Power SiGe Heterojunction Bipolar Transistors using APCVD (상압 화학 기상 증착기를 이용한 고출력 SiGe HBT제작)

  • 한태현;이수민;조덕호;염병령
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.11a
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    • pp.26-28
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    • 1996
  • A high power SiGe HBT has been fabricated using APCVD(Atmospheric Pressure Chemical Vapor Deposition) and its perfermanoe has been analysed. The composition of Ge in the SiGe base was graded from 0% at the emitter-base junction to 20% at the base-collector junction. As a base electrode, titanium disilicide(TiSi$_2$) was used to reduce the extrinsic base resistance. The SiGe HBT with an emitter area of 2$\times$8${\mu}{\textrm}{m}$$^2$typically has a cutoff frequency(f$_{T}$) of 7.0GHz and a maximun oscillation frequency(f$_{max}$) of 16.1GHz with a pad de-embedding. The packaged high power SiGe HBT with an emitter area of 2xBx80${\mu}{\textrm}{m}$$^2$typically shows a cutoff frequency of 4.7GHz and a maximun oscillation frequency of 7.1GHz at Ic of 115mA.A.A.

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