• Title/Summary/Keyword: electron lens

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An Experimental Device for Understanding the Optical Principles of Image/Diffraction Formation (상(이미지)/회절도형 형성의 광학적 원리를 이해하기 위한 실험장치 제작)

  • Kim, Jin-Gyu;Jeong, Jong-Man;Kim, Mun-Chang;Choi, Joo-Hyoung;Kim, Youn-Joong
    • Applied Microscopy
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    • v.37 no.3
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    • pp.199-208
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    • 2007
  • We have made an optical device to study the wave optics phenomena, such as image and diffraction pattern, constructive and destructive interference, by direct operation of laser beam and optical lenses. It consists of laser beam, goniometer, objective lens, intermediate lens, projection lens, CCD system, and computing system. As a result of the performance test, we were able to magnify samples up to 44 times with the resolution of about $5{\mu}m$. It is expected to help EM users understanding more easily principles of transmission electron microscopy (TEM).

New analysis method of electrostatic lens for CRT

  • Seok, J.M.;Ham, Y.S.;Lee, J.I.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.395-398
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    • 2002
  • The spherical aberration and optical integer (f) of the electron gun's main lens in color CRT is obtained, using electron beam trajectory. A spherical aberration is obtained from the relation between the object plane and the image of a beam trajectory. To analyze beam profile, 3rd and 1st order coefficient were obtained and used. It is shown that, in practice, they are applied to electron gun design.

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Establishment of Column Unit for Electron Beam Machining System (전자빔 가공시스템용 경통의 구축)

  • 강재훈;이찬홍;최종호
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.1017-1020
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    • 2004
  • It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with several electo-magnetic lens is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included several electro-magnetic lens and main body which are essentially constructed for column unit are designed and manufactured. And this established column unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

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Numerical Analysis for the Image Evaluation of a Thermionic SEM (열전자형 주사전자현미경 결상특성의 수치해석)

  • Jung, H.U.;Park, M.J.;Kim, D.H.;Jang, D.Y.;Park, K.
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.16 no.6
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    • pp.153-158
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    • 2007
  • The present study covers numerical analysis of a thermionic scanning electron microscope(SEM) column. The SEM column contains an electron optical system in which electrons are emitted and moved to form a focused beam, and this generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system mainly consists of a thermionic electron gun as the beam source, the lens system, the electron control unit, and the vacuum unit. For a systematic design of the electron optical system, the beam trajectories are investigated through numerical analyses by tracing the ray path of the electron beams, and the quality of resulting image is evaluated from the analysis results.

Development of Electron Gun 'S-CXO'

  • Kwon, Yong-Geol;Kim, Deog-Ho;Lee, Yang-Je;Yun, Kwang-Jin;Yoon, Young-Jun
    • Journal of Information Display
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    • v.2 no.1
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    • pp.43-46
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    • 2001
  • To meet the demand of the display market for large, flat, high-resolution screen, the Super Common eXtended field Oval lens (S-CXO) has been developed with resolution improvement of 10% or more compared to a conventional electron gun. A new main lens structure is adopted, to enhance the effectiveness of aperture and the performance. The new main lens can be assembled using an existing assembly system

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Creation of Electron Beam Probe in Scanning Electron Microscopy (주사 전자 현미경에서 전자빔 프르브 생성)

  • Lim, Sun-Jong;Lee, Chan-Hong
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.17 no.5
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    • pp.52-57
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    • 2008
  • Most of the electrons emitted from the filament, are captured by the anode. The portion of the electron current that leaves the gun through the hole in the anode is called the beam current. Electron beam probe is called the focused beam on the specimen. Because of the lenes and aperture, the probe current becomes smaller than the beam current. It generate various signals(backscattered electron, secondary electron) in an interaction with the specimen atoms. Backscattered electron provide an useful signal for composition and local specimen surface inclination. Secondary electron is used far the formation of surface imagination. The steady electron beam probe is very important for the imagination formation and the brightness. In this paper, we show the results of developed elements that create electron beam probe and the measured beam probe in various acceleration voltages by Faraday cup. These data are used to analysis and improve the performance of the system in the development.

Analysis of Ceramics Using Scanning Electron Microscopy (주사전자현미경을 활용한 세라믹의 분석)

  • Lee, Sujeong
    • Ceramist
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    • v.22 no.4
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    • pp.368-380
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    • 2019
  • A ceramic is used as a key material in various fields. Accordingly, the use of scanning electron microscopy is increased for the purpose of evaluating the reliability and defects of advanced ceramic materials. The scanning electron microscope is developed to overcome the limitations of optical microscopy and uses accelerated electrons for imaging. Various signals such as SE, BSE and characteristic X-rays provide useful information about the surface microstructure of specimens and, the content and distribution of chemical components. The development of electron guns, such as FEG, and the improved lens system combined with the advanced in-lens detectors and STEM-in-SEM system have expanded the applications of SEM. Automated SEM-EDS analysis also greatly increases the amount of data, enabling more statistically reliable results. In addition, X-ray CT, XRF, and WDS, which are installed in scanning electron microscope, have transformed SEM a more versatile analytical equipment. The performance and specifications of the scanning electron microscope to evaluate ceramics were reviewed and the selection criteria for SEM analysis were described.

The development of scanning electron microscopy (전자현미경 개발)

  • Oh H. J.;Chang D. Y.;Yang H. N.;Kim D. H.;Park M, J.;Shim C. H.;Kim C. S.
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2005.05a
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    • pp.15-18
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    • 2005
  • We have designed and fabricated a thermal scanning electron microscopy. It includes an electron source, two condenser lenses, one objective lens, a scanning coil and a stigmator coil for focusing in column and also have a secondary electron detector for constructing the image in chamber with a high vacuum condition and control part for operating the SEM. Especially, in order for us to find out the optical characteristics, our attention and studies have been concentrated on the effects of two condenser lenses and one objective lens for high resolution with SEM. Finally, we developed a high resolution thermal scanning electron microscopy.

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A Design of Improved 100 GHz Lens Antennas for the ECEI System (ECEI 장치를 위한 향상된 성능의 100 GHz 렌즈 안테나 설계)

  • Lee, Gwan-Hee;Kim, Sung-Kyun;Mohyuddin, Wahab;Choi, Hyun-Chul;Kim, Kang Wook
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.27 no.9
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    • pp.817-824
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    • 2016
  • In this paper, a modified elliptical lens antenna design is proposed to improve the performance of 100 GHz mini-lens antennas used in the ECEI(Electron Cyclotron Emission Imaging) module at KSTAR. A hemispherical lens is added on the bottom plate of the conventional elliptic lens antenna, and a 100 GHz dipole antenna is located on the end point of the hemispherical lens. Using geometrical optics, antenna radiated EM fields are designed to be totally reflected from the inner surface of the hemispherical lens, and thereby the antenna patterns are more focused toward the main beam. The validity of the proposed design is confirmed by the 3D EM simulator. The modified elliptical lens antenna provides 23.8 dB maximum gain, which is 2.2 dB gain improvement as compared with the conventional elliptic lens. Also, the side love levels of E- and H-planes are decreased by 2.6 dB and 3.4 dB, respectively.