• Applied Microscopy
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• 제36권spc1호
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• pp.63-69
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• 2006

By utilizing a field emission gun and a biprism installed on a transmission electron microscope (TEM), electron holography is extensively carried out to visualize the electric and magnetic fields of nanomaterials. In the electric field analysis, the distribution of electric potential in a sharp tip made of W coated with $ZrO_2$ is visualized by applying the voltage to the tip. Denser contour lines due to the electric potential are observed with an increase in the bias voltage. In the magnetic field analysis by producing the strong magnetic field with a sharp magnetic needle made of a permanent magnet, the in situ experiment is carried out to investigate the magnetization of hard magnetic materials. The results of these experiments clearly demonstrate that electron holography is a promising advanced transmission electron microscopy technique to characterize the electric and magnetic properties of nanomaterials.

• Applied Microscopy
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• 제45권4호
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• pp.189-194
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• 2015

Backside Ar ion milling technique for the preparation of cross-sectional transmission electron microscopy (TEM) specimens, and backside-ion milling combined with focused ion beam (FIB) operation for electron holography were introduced in this paper. The backside Ar ion milling technique offers advantages in preparing cross-sectional specimens having thin, smooth and uniform surfaces with low surface damages. The back-side ion milling combined with the FIB technique could be used to observe the two-dimensional p-n junction profiles in semiconductors with the sample quality sufficient for an electron holography study. These techniques have useful applications for accurate TEM analysis of the microstructure of materials or electronic devices such as arrayed hole patterns, three-dimensional integrated circuits, and also relatively thick layers (> $1{\mu}m$).

• Applied Microscopy
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• 제42권3호
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• pp.158-163
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• 2012

Detailed comparison of low-voltage scanning electron microscopy and electron holography techniques for two-dimensional (2D) dopant profiling was carried out with using the same multilayered p-n junction specimen. The dopant profiles obtained from two methods are in good agreement with each other. It demonstrates that reliability of dopant profile measurement can be increased through precise comparison of 2D profiles obtained from various microscopic techniques.

• 한국전자현미경학회:학술대회논문집
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• 한국현미경학회 2002년도 제33차 춘계학술대회
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• pp.17-18
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• 2002

• 대한금속재료학회지
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• 제47권5호
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• pp.311-315
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• 2009

2-dimensional (2D) dopant profiling in semiconductor device was carried out by electron holography and scanning capacitance microscopy methods with the same multi-layered p-n junction sample. The dopant profiles obtained from two methods are in good agreement with each other. It demonstrates that reliability of dopant profile measurement can be increased through precise comparison of 2D profiles obtained from various techniques.

• Bulletin of the Korean Chemical Society
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• 제34권3호
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• pp.892-898
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• 2013

A field emission projection microscope was constructed to investigate the atomic and chemical-bonding structure of molecules using electron in-line holography. Fringes of carbon nanotube images were found to be interferograms equivalent to those created by the electron biprism in conventional electron microscopy. By exploiting carbon nanotubes as the filament of the electron biprism, we measured the transverse coherence length of the electron beam from tungsten field emitters. The measurements revealed that a partially coherent electron-beam was emitted from a finite area.

• Journal of the Optical Society of Korea
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• 제4권1호
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• pp.48-53
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• 2000

In Optical Scanning Holography(OSH), 3-D holographic information of an object is generated by 2-D active optical scanning. The optical scanning beam can be a time-dependent Gaussian apodized Fresnel zone plate. In this technique, the holographic information manifests itself as an electric signal which can be sent to an electron-beam-addressed spatial light modulator for coherent image reconstruction. In this paper, we briefly review optical scanning holography and analyze the resolution achievable with the system. We also present mathmatical expressions of real and virtual images which are responsible for holographic image reconstruction. We then show the twin-image noise effect on the reconstruction in conjunction with the size of the Fresnel zone pattern through computer simulation.

• 비파괴검사학회지
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• 제36권1호
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• pp.18-26
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• 2016

반도체 산업은 우리나라 주력산업중 하나로 매년 꾸준한 성장세를 보이며 지속적인 성장을 하고 있다. 이러한 반도체 산업에서의 중요한 기술은 소자의 고 집적화이다. 이는 면적당 메모리 용량을 증가시키는 것으로 핵심역할을 하는 것이 바로 포토리소그래피 기술이다. 포토리소그래피란 마스크의 표면에 빛을 쬐어 생기는 그림자를 웨이퍼 상에 인쇄하는 기술이며 반도체 제조공정에서의 가장 중요한 공정이다. 이러한 공정을 통해 나온 패터닝을 분석 시에 폭과 단차의 균일성을 측정한다. 이에 따라 본 논문은 포토리소그래피 공정이 적용된 시험편 패터닝에 폭과 판 사이와의 단차를 투과형 디지털 홀로그래피를 구성하여 측정하고자 한다. 투과형 디지털 홀로그래피 간섭계를 구성하고 시험편에 임의의 9포인트를 설정하여 각 포인트를 측정하고 상용장비인 SEM (scanning electron microscopy)과 alpha step으로 측정한 결과와 비교하고자 한다. 투과형 디지털 홀로그래피는 측정시간이 타 기법에 비에 짧다는 장점과 배율렌즈를 사용하기 때문에 저 배율에서 고 배율로 변경하여 측정할 수 있는 장점을 가지고 있다. 실험 결과로부터 투과형 디지털 홀로그래피가 포토 리소그래피가 적용된 패터닝 측정에 유용한 기술임을 확인할 수 있었다.

• 한국항행학회논문지
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• 제2권2호
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• pp.126-131
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• 1998

광학적 스캐닝 홀로그래피에 있어서, 물체의 3차원 홀로그래픽 정보는 2차원적 광스캐닝에 의해서 생성되며, 광스캐닝 광선은 time-dependent한 Gaussian 형태의 Fresnel 윤대판(zone plate)이다. 본 기술에서 홀로그래픽 정보는 그 자체로서 전기적인 신호로서 발생하기 때문에 전자광선 addressed - spatial light modulator을 사용하여 영상 재생이 가능하다. 이 기법의 응용분야로서 3-차원 원거리 광 센서로서 사용될 수 있으며, 특히 비행물체 확인에 응용될 수 있다. 본 논문에서, 우리는 먼저 광스캐닝 홀로그래피에 대해 간략한 기술과 본 기술 시스템에 있어서 광스캐닝 빔의 해상도를 먼저 유도하고, 그 다음으로 Gaussian 원리를 이용하여 홀로그래픽 image 재생을 위해 필요한 실상(real image) 및 허상(virtual image)에 대한 수학적 표현을 제시하고자 한다.

• 한국재료학회지
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• 제13권8호
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• pp.485-490
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• 2003

We have developed a new way of the constant growth technique to maintain a grating height of originally-etched V-groove of submicron gratings up to 1.5 $\mu\textrm{m}$ thickness by a low pressure metalorganic chemical vapor deposition. The constant growth technique is well performed on two kinds of submicron gratings that made by holography and electron (e)-beam lithography GaAs buffer layer grown on thermally deformed submicron gratings has an important role in recovering the deformed grating profile from sinusoidal to V-shaped by reducing mass transport effects. The thermal deformation effect on submicron gratings made by e-beam lithography is less than that on submicron gratings made by holography. The constant growth technique is an important step to realize complex optoelectronic devices such as one-step grown distributed feedback lasers and two-dimensional photonic crystals.