• Title/Summary/Keyword: electron beam

Search Result 2,213, Processing Time 0.033 seconds

Dosimetric characterization and commissioning of a superficial electronic brachytherapy device for skin cancer treatment

  • Park, Han Beom;Kim, Hyun Nam;Lee, Ju Hyuk;Lee, Ik Jae;Choi, Jinhyun;Cho, Sung Oh
    • Nuclear Engineering and Technology
    • /
    • v.50 no.6
    • /
    • pp.937-943
    • /
    • 2018
  • Background: This work presents the performance of a novel electronic brachytherapy (EBT) device and radiotherapy (RT) experiments on both skin cancer cells and animals using the device. Methods and materials: The performance of the EBT device was evaluated by measuring and analyzing the dosimetric characteristics of X-rays generated from the device. The apoptosis of skin cancer cells was analyzed using B16F10 melanoma cancer cells. Animal experiments were performed using C57BL/6 mice. Results: The X-ray characteristics of the EBT device satisfied the accepted tolerance level for RT. The results of the RT experiments on the skin cancer cells show that a significant apoptosis induction occurred after irradiation with 50 kVp X-rays generated from the EBT device. Furthermore, the results of the animal RT experiments demonstrate that the superficial X-rays significantly delay the tumor growth and that the tumor growth delay induced by irradiation with low-energy X-rays was almost the same as that induced by irradiation with a high-energy electron beam. Conclusions: The developed new EBT device has almost the same therapeutic effect on the skin cancer with a conventional linear accelerator. Consequently, the EBT device can be practically used for human skin cancer treatment in the near future.

Study on the deposition rate and vapor distribution of Al films prepared by vacuum evaporation and arc-induced ion plating (증착방법에 따른 Al 피막의 증착율 및 증기분포에 관한 연구)

  • 정재인;정우철;손영호;이득진;박성렬
    • Journal of the Korean Vacuum Society
    • /
    • v.9 no.3
    • /
    • pp.207-215
    • /
    • 2000
  • Al films on cold-rolled steel sheet have been prepared by vacuum evaporation and arc-induced ion plating, respectively, and the evaporation rate and vapor distribution (thickness distribution over the substrate) have been investigated according to deposition conditions. The arc-induced ion plating (AIIP) method have been employed, which makes use of arc-like discharge current induced by ionization electrode located near the evaporation source. The AIIP takes advantage of high ionization rate compared with conventional ion plating, and can be carried out at low pressure of less than $10^{-4}$ torr. Very high evaporation rate of more than 2.0 mu\textrm{m}$/min could be achieved for Al evaporation using alumina liner by electron beam evaporation. The geometry factor n for the $cos^{n/\phi}$ vapor distribution, which affects the thickness distribution of films at the substrate turned out to be around 1 for vacuum evaporation, while it features around 2 or higher for ion plating. For the ion plated films, it has been found that the ionization condition and substrate bias are the main parameters to affect the thickness distribution of the films.

  • PDF

Optical properties of epitaxial $Gd_2$O_3:EU^{3+}$luminescent thin films depending on crystallinity ($Gd_2$O_3:EU^{3+}$ 형광체 박막의 결정성에 따른 발광특성 연구)

  • 장문형;최윤기;정권범;황보상우;장홍규;노명근;조만호;손기선;김창해
    • Journal of the Korean Vacuum Society
    • /
    • v.12 no.4
    • /
    • pp.275-280
    • /
    • 2003
  • Epitaxial Gd$_2O_3:Eu^{3+}$luminescent thin films have been grout on Si(III) substrates using ionized Cluster Beam Deposition (ICBD). After the film growing, they were implanted and post annealed to change the crystal structure. The initial growth stage was monitored by using in-situ Reflection High Energy Electron Diffraction (RHEED). The formed crystal structure was identified with X-ray diffraction (XRD) technique and Fourier transform infrared (FT-R) spectroscopy. The electronic states variations were investigated by Near Edge X-ray Absorption Fine Structure (NEXAFS). Photoluminescence (PL), Cathodoluminescence (CL). and Vacuum ultraviolet (VUV) spectrum were used for examining the optical properties. We report the optical property changes depending on crystal structure and the electronic states.

CVD를 이용한 산화아연 (ZnO) 나노구조 형성 및 특성평가

  • Kim, Jae-Su;Jo, Byeong-Gu;Lee, Gwang-Jae;Park, Dong-U;Kim, Hyeon-Jun;Kim, Jin-Su;Kim, Yong-Hwan;Min, Gyeong-In;Jeong, Hyeon;Jeong, Mun-Seok
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2010.02a
    • /
    • pp.179-179
    • /
    • 2010
  • 1차원 나노구조를 갖는 ZnO를 성장하기 위해 Laser ablation, Chemical vapor deposition (CVD), Chemical transport method, Molecular beam epitaxy, Sputtering 등의 다양한 형성법들이 이용되어지고 있다. 특히 대량생산과 경제성 측면에서 많은 장점을 가지고 있는 CVD를 이용한 ZnO 성장 및 응용 연구가 활발하게 수행되고 있다. 본 연구에서는 Thermal CVD를 이용하여 반응물질과 기판 사이의 거리, 기판온도, $O_2$/Zn 비율 등의 성장변수를 변화시켜 ZnO 나노구조를 성장하고 구조 및 광학적 특성을 연구하였다. Scanning electron microscope를 통한 구조 특성평가 결과 반응물질과 기판 사이의 거리가 13 cm 이하의 조건에서 ZnO 나노구조들은 나노판(Nanosheet)과 나노선(Nanowire)이 혼재하여 성장된 것을 보였다. 그리고 반응물질과 기판사이의 거리가 15 cm 이상부터 나노판이 없어지고 수직한 ZnO 나노막대(Nanorod)가 형성되었다. 상온 Photoluminescence 스펙트럼에서 반응물질과 기판사이의 거리가 5에서 15 cm로 증가할수록 결함 (Defect)에 의해 발생된 515 nm 파장의 최대세기 (Maximum intensity)가 10배 이상 감소한 반면, ZnO 나노구조에 의한 378 nm 파장의 NBE발광 (Near band edge emission)은 8배 이상 증가하였다. 이러한 구조 및 광학적 결과로부터, 질서 없이 성장된 것보다 수직 성장된 ZnO 나노구조의 결정질(Crystal quality)이 좋은 것을 확인하였다. 이를 바탕으로 성장변수에 따른 ZnO 나노구조의 형성 메커니즘을 Zn와 O 원자의 성장거동을 기반으로 한 모델을 이용하여 해석하였다.

  • PDF

A Inclined Slot-excited Circular Plasma Source with a Cusp Magnetic Field

  • You, H.J.;Kim, D.W.;Koo, M.;Jang, S.W.;Jung, Y.H.;Lee, B.J.
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2010.02a
    • /
    • pp.435-435
    • /
    • 2010
  • A inclined slot-excited plasma source is newly designed and constructed for higher flux HNB(Hyperthermal Neutral Beam) generation. The present source is different from the vertical SLAN(SLot ANtenna) sources [1] in two aspects. One is that the slots are inclined, and the other is that the magnetic field is configured to a cusp type. These modifications are intended to make the source plasma operated in sub-milli-torr pressure regime and as thin as possible, both of which is to get higher HNB flux by decreasing the re-ionization rate of the reflected atoms from the neutralizer [2]. The plasma is generated in a quartz tube of internal diameter 170 mm enclosed in a aluminum application chamber of larger diameter 250 mm. The microwave power is fed to the plasma chamber by 8 inclined slots cut into the application chamber wall. The slots are coupled the chamber to a WR280 waveguide wound around it to form a ring resonator. In order to make two slots $\lambda_g/2$ apart in phase, the adjacent slots are rotated in opposite directions. The rotation angle of the slots are set to $60^{\circ}$ from the chamber axis. Between the quartz chamber and the aluminum cylindrical chamber 8 NdFeB magnets are equally spaced and fixed to form the cusp magnetic field confinement and ECR (Electron Cyclotron Resonance) field. In this presentation, the magnetic and electromagnetic simulations, and the measured plasma parameters are given for both the inclined and the vertical slot-excited plasma sources. We also discuss how the sources can be tailored to suit better-performing HNB sources.

  • PDF

BPSG 및 PSG CVD 공정 중 발생하는 오염입자 발생특성

  • Na, Jeong-Gil;Mun, Ji-Hun;Choe, Hu-Mi;Kim, Tae-Seong;Choe, Jae-Bung;Im, Seong-Gyu;Park, Sang-Hyeon;Lee, Heon-Jeong;Go, Yong-Gyun;Lee, Sang-Mi;Yun, Ju-Yeong;Gang, Sang-U
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2010.02a
    • /
    • pp.261-261
    • /
    • 2010
  • 본 연구에서는 PBMS (Particle Beam Mass Spectrometer)와 ISPM (In-Situ Particle Monitor)을 연계하여 BPSG (Borophosphosilicate Glass) 및 PSG (Phosphosilicate Glass) 박막 증착을 위한 CVD (chemical vapor deposition) 공정 중 발생하는 오염입자 발생특성에 대해 비교 평가하였다. 소스는 TEB (Triethylborate), TEPO (Triethylphosphate) 및 TEOS (Tetraethoxysilane)를 사용하였고, 운반가스 및 반응가스로 He과 $O_2$$O_3$를 사용하였다. 증착온도와 압력은 각각 $450^{\circ}C$, 200 Torr 이었다. 반응기의 배기라인에 PBMS와 ISPM을 설치하고 500 nm 이하의 입자에 대해 공정단계별 시간에 따른 모니터링 결과 전 공정에 걸쳐 동일한 패턴의 입자발생분포를 보였으며, 특히 PBMS의 경우 ISPM의 입자측정한계인 260 nm 이하의 입자크기도 측정할 수 있었다. 입자발생이 안정적으로 일어나는 증착공정 중 PBMS를 통하여 입자크기를 측정한 결과 BPSG의 경우 약 110 nm, PSG의 경우 약 80 nm의 분포를 나타내었다. 이를 통해 TEB 소스가 배제된 PSG의 경우 BPSG의 경우보다 입자의 성장이 지체됨을 확인하였다. 측정에 대한 신뢰성을 확보하기 위해 PBMS 내의 TEM (Transmission Electron Microscopy) grid를 이용하여 입자를 샘플링 하였고, TEM 분석을 실시한 결과 PBMS 측정결과와 잘 일치하였다. 또한 EDS (Energy Dispersive Spectroscopy) 분석을 통하여 입자성분에 대해 검증하였다.

  • PDF

원자층증착법을 이용한 Y2O3 박막 형성 및 저항 스위칭 특성

  • Jeong, Yong-Chan;Seong, Se-Jong;Lee, Myeong-Wan;Park, In-Seong;An, Jin-Ho;Rao, Venkateswara P.;Dussarrat, Christian;Noh, Wontae
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2013.08a
    • /
    • pp.229.2-229.2
    • /
    • 2013
  • Yttrium oxide (Y2O3)는 band gap이 5.5 eV 정도로 상대적으로 넓고, 굴절상수가 1.8, 유전율이 10~15, Silicon 과의 격자 불일치가 작은 특성을 가지고 있다. 또한 녹는점이 높아 열적으로 안정하기 때문에 전자소자 및 광학소자에 다양하게 응용되는 물질이다. Y2O3 박막은 다양한 방법으로 증착할 수 있는데, 그 방법에는 e-beam evaporation, laser ablation, sputtering, thermal oxidation, metal-organic chemical vapor deposition, and atomic layer deposition (ALD) 등이 있다. ALD는 기판 표면에 흡착된 원자들의 자기 제한적 반응에 의하여 박막이 증착되기 때문에 박막 두께조절이 용이하고 step coverage와 uniformity 측면에서 큰 장점이 있다. 이전에는 Y(thd)3 and Y(CH3Cp)3 와 같은 금속 전구체를 이용하여 ALD를 진행하여, 증착 속도가 낮고 defect이 많아 non-stoichiometric한 조성의 박막이 증착되는 문제점이 있었다. 이번 연구에서는, (iPrCp)2Y(iPr-amd)와 탈이온수를 사용하여 Y2O3 박막을 증착하였다. Y2O3 박막 증착에 사용한 Y 전구체는 상온에서 액체이고 $192^{\circ}C$ 에서 1 Torr의 높은 증기압을 갖는다. Y2O3 박막 증착을 위하여 Y 전구체는 $150^{\circ}C$ 로 가열하여 N2 gas를 이용하여 bubbling 방식으로 공정 챔버 내로 공급하였다. Y2O3 박막의 ALD window는 $250{\sim}350^{\circ}C$ 였으며, Y 전구체의 공급시간이 5초에 다다르자 더 이상 증착 두께가 증가하지 않는 자기 제한적 반응을 확인할 수 있었다. 그리고 증착된 Y2O3 박막의 특성 분석을 위해 Atomic force microscopy (AFM)과 X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) 를 진행하였다. 박막의 Surface morphology 는 매끄럽고 uniform 하였으며, 특히 고체 금속 전구체를 사용했을 때와 비교하여 수산화물이 거의 없는 박막을 얻을 수 있었다. 그리고 조성 분석을 통해 증착된 Y2O3 박막이 stoichiometric하다는 것을 알수 있었다. 또한 metal-insulator-metal (MIM) 구조 (Ru/Y2O3/Ru) 의 resistor 소자를 형성하여 저항 스위칭 특성을 확인하였다.

  • PDF

A Study of Weldability for Pure Titanium by Nd:YAG Laser(II) - Welding Properties of Butt Welding - (순티타늄판의 Nd:YAG 레이저 용접성에 관한 연구(II) - 맞대기 용접 특성 -)

  • Kim, Jong-Do;Kwak, Myung-Sub;Song, Moo-Keun;Park, Seung-Ha
    • Journal of Welding and Joining
    • /
    • v.27 no.6
    • /
    • pp.68-73
    • /
    • 2009
  • Recently, as titanium and titanium alloys are being increasingly used in wide areas, there are on-going researches to obtain high quality weld zone. In particular, growing interest is being drawn to laser welding, which involves low heat input and large aspect ratio in various welding processes and can facilitate shield in atmospheric condition compared with electron beam welding. The first report covered the analysis of embrittlement by the bead color of weld zone through quantitative analysis of oxygen and nitrogen and measurement of hardness as basic experiment to apply laser welding to titanium. Results indicated that the element that affect embrittlement the most was nitrogen, and as embrittlement and oxygenation go on, bead color changed to silver, gold, brown, blue and gray. This study performed butt welding of pure titanium and STS304 by using 1kW CW Nd:YAG laser, and to find out basic physical properties, evaluated welding performance by laser output, welding speed, root gap and misalignment etc, and examined mechanical properties through tensile stress and Erichsen test. The reason particles of pure titanium welded metal and HAZ are greater than STS304 is because they are pure metal and do not include many impure elements that work as nuclei in case of resolidification, thus becoming coarse columnar crystals eventually. In addition, the reason STS304 requires more energy during welding than pure titanium is because the particle size of base metal is smaller.

Microbiological and Physicochemical Quality of Irradiated Ground Beef as Affected by Added Garlic or Onion

  • Rico, Catherine W.;Kim, Gui-Ran;Jo, Cheo-Run;Nam, Ki-Chang;Kang, Ho-Jin;Ahn, Dong-Uk;Kwon, Joong-Ho
    • Food Science of Animal Resources
    • /
    • v.29 no.6
    • /
    • pp.680-684
    • /
    • 2009
  • The effects of garlic and onion on the microbiological and physicochemical properties of irradiated ground beef patties were evaluated. Ground beef was mixed with 0.5%(w/w) minced garlic or 2.5%(w/w) minced onion, vacuum-packed in oxygen-impermeable nylon/PE bags and then electron beam-irradiated at 2.5 kGy. All samples were kept at $4^{\circ}C$ for 8 d. Irradiation resulted in a 2-log CFU/g reduction in both aerobic and coliform bacteria. The microbial counts gradually increased during storage, but those in beef that contained garlic or onion were 1-log CFU/g lower than those of the control samples after 8 d of storage. The pH value decreased during storage in all meat samples, but this decrease was greater in non-irradiated beef than in irradiated beef. The lipid oxidation, volatile basic nitrogen content and Hunter color values of raw patties were generally not affected by irradiation or the addition of garlic and onion. Sensory evaluation of cooked patties showed that the off-odor was less pronounced in samples that contained added garlic or onion than in control samples, and that the overall acceptability of beef formulated with garlic was the highest. Overall, the results of this study indicate that the addition of garlic or onion in combination with irradiation treatment enhanced the microbial quality and improved the sensory quality of irradiated ground beef.

Effects of HA and TiN Coating on the Electrochemical Characteristics of Ti-6Al-4 V Alloys for Bone Plates

  • Oh, Jae-Wook;Choe, Han-Cheol;Ko, Yeong-Mu
    • Journal of the Korean institute of surface engineering
    • /
    • v.37 no.5
    • /
    • pp.249-252
    • /
    • 2004
  • Effects of HA and TiN coating on the electrochemical characteristics of Ti-6AI-4V alloys for bone plates were investigated using various test methods. Ti-6AI-4V alloys were fabricated by using a vacuum induction furnace and bone plates were made by laser cutting and polishing. HA was made of extracted tooth sintered and then tooth ash was used as HA coating target. The TiN and HA film coating on the surface were carried on using electron-beam physical vapor deposition (EB-PVD) method. The corrosion behaviors of the samples were examined through potentiodynamic method in 0.9% NaCI solutions at $36.5\pm$$1^{\circ}C$ and corrosion surface was observed using SEM and XPS. The surface roughness of TiN coated bone plates was lower than that of tooth ash coated plates. The structure of TiN coated layer showed the columnar structure and tooth ash coated layer showed equiaxed and anisotrophic structure. The corrosion potential of the TiN coated specimen is comparatively high. The active current density of TiN and tooth ash coated alloy showed the range of about $1.0xl0^{-5}$ $A\textrm{cm}^2$, whereas that of the non-coated alloy was$ 1.0xl0^{-4}$ $A\textrm{cm}^2$. The active current densities of HA and TiN coated bone plates were smaller than that of non-coated bone plates in 0.9% NaCl solution. The pitting potential of TiN and HA coated alloy is more drastically increased than that of the non-coated alloy. The pit number and pit size of TiN and HA coated alloy decreased in compared with those of non-coated alloy. For the coated samples, corrosion resistance increased in the order of TiN coated, tooth ash coated, and non-coated alloy.