• 제목/요약/키워드: electrodeposited

검색결과 340건 처리시간 0.22초

음극전착법을 이용한 Cu2O 막의 광전기 화학적 특성 (Photoelectrochemical Characteristics for Cathodic Electrodeposited Cu2O Film on Indium Tin Oxide)

  • 이은호;정광덕;주오심;최승철
    • 한국세라믹학회지
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    • 제41권3호
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    • pp.183-189
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    • 2004
  • 음극전착법을 이용하여 전도성유리(ITO-glass)위에 Cu$_2$O 막을 제조하였다. Cu$_2$O 막의 특성을 향상시키기 위하여 전착방법, 시간, 전압, 전착 후 열처리 조건을 변화시켰다. 전착 후 열처리를 통해 얻어진 전극에 100mW/$ extrm{cm}^2$의 백색광을 조사하여 광전류밀도를 측정하고 XRD, SEM, UV-visible spectrophotometer를 통해 제조 조건변화에 따른 특성변화를 관찰하였다. 그리고 100mW/$\textrm{cm}^2$의 백색광하에서 bias 전압이 0V인 조건에서 전극의 안정성을 측정하였다 인가전압 -0.7V, 인가시간 300초 전착 조건에서 얻어진 막을 30$0^{\circ}C$에서 1시간 열처리하여 순수한 Cu$_2$O 막을 제조하였으며, 이 전극을 이용 광전류밀도를 측정한 결과 1048 $\mu$A/$\textrm{cm}^2$가 측정되었다. 또한 chemical deposition을 이용 TiO$_2$ 박막을 Cu$_2$O 막 위에 코팅하여 전극의 안정성을 향상시켰다.

Bone-like Apatite Formation on Ultrafine-Structure in Modified Electrolytic Solution

  • Jang, Jae-Myung;Choe, Han-Cheol
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2017년도 춘계학술대회 논문집
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    • pp.155-155
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    • 2017
  • Surface modifications are commonly utilized to adjust the properties of the titanium and its alloy surface to the specific needs of the medical applications, but there are disadvantages such as poor osteoconductive properties and low adhesion of bone cell to implant surface. In order to improve these disadvantages, changes in surface properties have an important effect on osseointegration during implantation. In this paper we applied new technological method for improving a unique surface modification using the characteristic of an electrolytic Solution. Thus, in the electrolyte containing NaF in Na2SO4, TiO2 nanoporous was uniformly formed, and HAp nanoparticles were electrodeposited around the TiO2 nanopores, but in the electrolyte containing NH4F in (NH4)H2PO4, the coarse protrusions including HAp nano particles were regularly deposited onto the TiO2 barrier layer. The surface characteristics and the distributed elements and have been investigated by EDS analysis, and ultra-fine structure of surface are carried out using FE-SEM. To investigate the behavior of the anion, the analysis of chemical states was performed by XPS, and the narrow spectrums for Ti2P, Ca 2p, and P 2p seems to be almost similar depending on the characteristics of the electrolyte solution respectively. In addition, Ca 2p spectrum could be resolved into two peaks for Ca 2p3/2 and 2p1/2 at 347.4 and 351.3 eV, which are related to hydroxyapatite. And, the P peak can also be deconvoluted into two peaks for P1/2 and P3/2 levels with binding energy 134.2 and 133.4 eV, respectively. From the result of soaking test, the apatite morphologys were well-formed onto the modified surface according to the different conditions.

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ALD ZnO 버퍼층 증착 온도가 전착 Cu2O 박막 태양전지 소자 특성에 미치는 영향 (The Influence of Deposition Temperature of ALD n-type Buffer ZnO Layer on Device Characteristics of Electrodeposited Cu2O Thin Film Solar Cells)

  • 조재유;트란 휴 만;허재영
    • Current Photovoltaic Research
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    • 제6권1호
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    • pp.21-26
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    • 2018
  • Beside several advantages, the PV power generation as a clean energy source, is still below the supply level due to high power generation cost. Therefore, the interest in fabricating low-cost thin film solar cells is increasing continuously. $Cu_2O$, a low cost photovoltaic material, has a wide direct band gap of ~2.1 eV has along with the high theoretical energy conversion efficiency of about 20%. On the other hand, it has other benefits such as earth-abundance, low cost, non-toxic, high carrier mobility ($100cm^2/Vs$). In spite of these various advantages, the efficiency of $Cu_2O$ based solar cells is still significantly lower than the theoretical limit as reported in several literatures. One of the reasons behind the low efficiency of $Cu_2O$ solar cells can be the formation of CuO layer due to atmospheric surface oxidation of $Cu_2O$ absorber layer. In this work, atomic layer deposition method was used to remove the CuO layer that formed on $Cu_2O$ surface. First, $Cu_2O$ absorber layer was deposited by electrodeposition. On top of it buffer (ZnO) and TCO (AZO) layers were deposited by atomic layer deposition and rf-magnetron sputtering respectively. We fabricated the cells with a change in the deposition temperature of buffer layer ranging between $80^{\circ}C$ to $140^{\circ}C$. Finally, we compared the performance of fabricated solar cells, and studied the influence of buffer layer deposition temperature on $Cu_2O$ based solar cells by J-V and XPS measurements.

63Ni 밀봉선원용 Ni 전기도금 박막에서 Ni 농도가 잔류응력에 미치는 영향 (Effects of Ni Concentration on Residual Stress in Electrodeposited Ni Thin Film for 63Ni Sealed Source)

  • 윤필근;박덕용
    • 한국표면공학회지
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    • 제50권1호
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    • pp.29-34
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    • 2017
  • Chloride plating solution was fabricated by dissolving metal Ni powders in a mixed solution with HCl and de-ionized water. Effects of $Ni^{2+}$ and saccharin concentrations in the plating baths on current efficiency, residual stress, surface morphology and microstructure of Ni films were studied. In the case of $0.2M\;Ni^{2+}$ concentration, current efficiency was decreased to about 65 % with increasing saccharin concentration, but, in the case of $0.7M\;Ni^{2+}$ concentration, it was shown more than 90 % with the increase of saccharin concentration. Residual stress of Ni thin film was appeared to be about 400 MPa up to 0.0244 M saccharin concentration at the $0.2M\;Ni^{2+}$ concentration and surface morphology with severe cracks was observed in the range of 0.0487~0.0975 M saccharin concentration. Residual stress of Ni thin films was measured to be about 750 MPa without saccharin addition and 114~148 MPa at the range of 0.0097~0.0975 M saccharin concentration for the $0.7M\;Ni^{2+}$ concentration. Relatively low residual stress values (114~148 MPa) of the Ni films at the range of 0.0097~0.0975 M saccharin concentration may be resulted from codeposition of S from saccharin. Ni films at $0.7M\;Ni^{2+}$ concentration showed smooth surface morphology and were independent of saccharin concentration. Ni films at $0.7M\;Ni^{2+}$ concentration consist of FCC(111), FCC(200), FCC(220) and FCC(311) peaks and the intensities of FCC(111) and FCC(200) peaks increased with increasing saccharin concentration. Also, the average grain size decreased with increasing saccharin concentration from about 30 nm to about 15 nm.

Cyclic Voltammetry를 이용한 CuInSe2 박막의 전기화학적 전착 연구 (Cyclic Voltammetry Study on Electrodeposition of CuInSe2 Thin Films)

  • 홍순현;이현주;김양도
    • 한국재료학회지
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    • 제23권11호
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    • pp.638-642
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    • 2013
  • Chalcopyrite $CuInSe_2$(CIS) is considered to be an effective light-absorbing material for thin film photovoltaic solar cells. CIS thin films have been electrodeposited onto Mo coated and ITO glass substrates in potentiostatic mode at room temperature. The deposition mechanism of CIS thin films has been studied using the cyclic voltammetry (CV) technique. A cyclic voltammetric study was performed in unitary Cu, In, and Se systems, binary Cu-Se and In-Se systems, and a ternary Cu-In-Se system. The reduction peaks of the ITO substrate were examined in separate $Cu^{2+}$, $In^{3+}$, and $Se^{4+}$ solutions. Electrodeposition experiments were conducted with varying deposition potentials and electrolyte bath conditions. The morphological and compositional properties of the CIS thin films were examined by field emission scanning electron microscopy (FE-SEM) and energy dispersive spectroscopy (EDS). The surface morphology of as-deposited CIS films exhibits spherical and large-sized clusters. The deposition potential has a significant effect on the film morphology and/or grain size, such that the structure tended to grow according to the increase of the deposition potential. A CIS layer deposited at -0.6 V nearly approached the stoichiometric ratio of $CuIn_{0.8}Se_{1.8}$. The growth potential plays an important role in controlling the stoichiometry of CIS films.

요오드화칼륨 수용액의 양극산화 (제1보) (Anodic Oxidation of Potassium Iodide Solution (Ⅰ))

  • 남종우;김학준
    • 대한화학회지
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    • 제17권5호
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    • pp.378-384
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    • 1973
  • 요오드화칼륨으로부터 요오드산칼륨까지의 양극산화시 그 반응의 내용을 검토키 위하여 전착과산화납 및 백금양극을 사용하여 각종 농도의 요오드화칼륨 수용액중에서 분극곡선을 측정한 결과 요오드화칼륨의 1.5M이하에서 한계전류가 존재하며 0.1M의 수산화칼륨을 가하였을때는 한계전류는 나타나지 않음을 알았다. 한편 백금양극의 경우에는 과산화납양극에서와 같이 희박한 요오드화 칼륨수용액중에서 한계전류가 나타나지 않으며 이는 과산화납양극표면에서 $PbO_2+2I^{-}+2H^+{\to}PbO+I_2+H_{2}O$와 같은 화학반응에 기인함을 알았다. 무격막전해조를 사용하여 요오드화염으로부터 요오드산염까지의 전해제조시 가장 효율적인 전해조건에 관하여서도 검토한 결과, (a)환원방지제인 중크롬산칼륨의 첨가는 0.1g/l의 농도가 적당하였으며, (b)전해온도는 전류효율에 큰 영향을 미치지 않았으며, (c)전류밀도가 증가함에 따라 전류효율은 상승하였고, (d)전해중 전해액의 액성은 약알카리성이 가장 효율적이었다.

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Effect of Ultrasound on the Mechanical Properties of Electrodeposited Ni-SiC Nano Composite

  • Gyawali, Gobinda;Cho, Sung-Hun;Woo, Dong-Jin;Lee, Soo-Wohn
    • 한국재료학회지
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    • 제20권8호
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    • pp.439-443
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    • 2010
  • Nano sized SiC particles (270 nm) are easily agglomerated in nickel sulfamate electrolytic bath during a composite electrodeposition process. The agglomeration of nano particles in composite coatings can significantly reduce the mechanical properties of the composite coatings. In this study, Ni-SiC nano composite coatings were fabricated using a conventional electrodeposition process with the aid of ultrasound. Nano particles were found to be distributed homogeneously with reduced agglomeration in the ultrasonicated samples. Substantial improvements in mechanical properties were observed in the composite coatings prepared in presence of ultrasound over those without ultrasound. Ni-SiC composite coatings were prepared with variable ultrasonic frequencies ranging from 24 kHz to 78 kHz and ultrasonic powers up to 300 watts. The ultrasonic frequency of 38 kHz with ultrasonic power of 200 watt was revealed to be the best ultrasonic conditions for homogeneous dispersion of nano SiC particles with improved mechanical properties in the composite coatings. The microstructures, phase compositions, and mechanical properties of the composite coatings were observed and evaluated using SEM, XRD, Vickers microhardness, and wear test. The Vickers microhardness of composite coatings under ultrasonic condition was significantly improved as compared to the coatings without ultrasound. The friction coefficient of the composite coating prepared with an ultrasonic condition was also smaller than the pure nickel coatings. A synergistic combination of superior wear resistance and improved microhardness was found in the Ni-SiC composite coatings prepared with ultrasonic conditions.

전기증착법으로 제조된 다공성 텅스텐 산화물의 고대비 전기변색 특성 (High-Contrast Electrochromism of Porous Tungsten Oxide Thin Films Prepared by Electrodeposition)

  • 박성혁;모호진;임재근;김상권;최재효;이승현;장세화;차경호;나윤채
    • 한국분말재료학회지
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    • 제25권1호
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    • pp.7-11
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    • 2018
  • In this study, we synthesize tungsten oxide thin films by electrodeposition and characterize their electrochromic properties. Depending on the deposition modes, compact and porous tungsten oxide films are fabricated on a transparent indium tin oxide (ITO) substrate. The morphology and crystal structure of the electrodeposited tungsten oxide thin films are investigated by scanning electron microscopy (SEM) and X-ray diffraction (XRD). X-ray photoelectron spectroscopy is employed to verify the chemical composition and the oxidation state of the films. Compared to the compact tungsten oxides, the porous films show superior electrochemical activities with higher reversibility during electrochemical reactions. Furthermore, they exhibit very high color contrast (97.0%) and switching speed (3.1 and 3.2 s). The outstanding electrochromic performances of the porous tungsten oxide thin films are mainly attributed to the porous structure, which facilitates ion intercalation/deintercalation during electrochemical reactions.

열처리 시간에 따른 Ni-P/Cr 이중 도금 층의 계면 거동에 관한 연구 (Effect of Heat Treatment on Interface Behavior in Ni-P/Cr Double Layer)

  • 최명희;박영배;이병호;변응선;이규환
    • 한국표면공학회지
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    • 제48권6호
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    • pp.260-268
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    • 2015
  • The thermal barrier coating (TBC) for inner wall of liquid-fuel rocket combustor consists of NiCrAlY as bonding layer and $ZrO_2$ as a top layer. In most case, the plasma spray coating is used for TBC process and this process has inherent possibility of cracking due to large difference in thermal expansion coefficients among bonding layer, top layer and metal substrate. In this paper, we suggest crack-free TBC process by using a precise electrodeposition technique. Electrodeposited Ni-P/Cr double layer has similar thermal expansion coefficient to the Cu alloy substrate resulting in superior thermal barrier performance and high temperature oxidation resistance. We studied the effects of phosphorous concentrations (2.12 wt%, 6.97 wt%, and 10.53 wt%) on the annealing behavior ($750^{\circ}C$) of Ni-P samples and Cr double layered electrodeposits. Annealing temperature was simulated by combustion test condition. Also, we conducted SEM/EDS and XRD analysis for Ni-P/Cr samples. The results showed that the band layers between Ni-P and Cr are Ni and Cr, and has no formed with heat treatment. These band layers were solid solution of Cr and Ni which is formed by interdiffusion of both alloy elements. In addition, the P was not found in it. The thickness of band layer was increased with increasing annealing time. We expected that the band layer can improve the adhesion between Cr and Ni-P.

전기도금방법을 이용한 Ni-Diamond 복합도금층 제조에 대한 연구 (The Fabrication of Nickel-Diamond Composite Coating by Electroplating Method)

  • 문윤성;이재호;오태성;변지영
    • 마이크로전자및패키징학회지
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    • 제14권1호
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    • pp.55-60
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    • 2007
  • 니켈-다이아몬드 복합 도금은 회전전극을 이용하여 미세 다이아몬드 입자가 공침된 니켈 복합도금층에 대하여 연구하였다. 복합층의 도금시에 인가한 전류밀도와 전류형태(직류, 펄스)가 도금층의 경도와 표면형상에 미치는 영향에 대하여 알아보았으며 첨가제의 영향에 대하여도 연구하였다. 표면조직을 FESEM을 이용하여 관찰하였으며 Micro Victors를 사용하여 도금층의 경도를 측정하였다. 복합도금층에 다이아몬드가 들어감에 따라 경도는 100%, 마찰저항은 27%까지 증가하였다. 또한 다이아몬드 함량이 20gpl 이상인 경우 경도값이 완만하게 증가하였다.

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