• Title/Summary/Keyword: electric excitation

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Laser Acceleration of Electron Beams to the GeV-class Energies in Gas Jets

  • Hafz, Nasr A.M.;Jeong, Tae-Moon;Lee, Seong-Ku;Choi, Il-Woo;Pae, Ki-Hong;Kulagin, Victor V.;Sung, Jae-Hee;Yu, Tae-Jun;Cary, John R.;Ko, Do-Kyeong;Lee, Jong-Min
    • Journal of the Optical Society of Korea
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    • v.13 no.1
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    • pp.8-14
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    • 2009
  • In a laser-plasma wakefield accelerator, the ponderomotive force of an ultrashort high intensity laser pulse excites a longitudinal wave or plasma bubble in a way similar to the excitation of a wake wave behind a boat as it propagates on the water surface. Electric fields inside the plasma bubble can be several orders of magnitude higher than those available in conventional RF-based particle accelerator facilities which are limited by material breakdown. Therefore, if an electron bunch is properly phase-locked with the bubble's acceleration field, it can gain relativistic energies within an extremely short distance. Here, in the bubble regime we show the generation of stable and reproducible sub GeV, and GeV-class electron beams. Supported by three-dimensional particle-in-cell simulations, our experimental results show the highest acceleration gradients produced so far. Simulations suggested that the plasma bubble elongation should be minimized in order to achieve higher electron beam energies.

High-k ZrO2 Enhanced Localized Surface Plasmon Resonance for Application to Thin Film Silicon Solar Cells

  • Li, Hua-Min;Zang, Gang;Yang, Cheng;Lim, Yeong-Dae;Shen, Tian-Zi;Yoo, Won-Jong;Park, Young-Jun;Lim, Jong-Min
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.276-276
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    • 2010
  • Localized surface plasmon resonance (LSPR) has been explored recently as a promising approach to increase energy conversion efficiency in photovoltaic devices, particularly for thin film hydrogenated amorphous silicon (a-Si:H) solar cells. The LSPR is frequently excited via an electromagnetic (EM) radiation in proximate metallic nanostructures and its primary con sequences are selective photon extinction and local EM enhancement which gives rise to improved photogeneration of electron-hole (e-h) pairs, and consequently increases photocurrent. In this work, high-dielectric-constant (k) $ZrO_2$ (refractive index n=2.22, dielectric constant $\varepsilon=4.93$ at the wavelength of 550 nm) is proposed as spacing layer to enhance the LSPR for application to the thin film silicon solar cells. Compared to excitation of the LSPR using $SiO_2$ (n=1.46, $\varepsilon=2.13$ at the wavelength of 546.1 nm) spacing layer with Au nanoparticles of the radius of 45nm, that using $ZrO_2$ dielectric shows the advantages of(i) ~2.5 times greater polarizability, (ii) ~3.5 times larger scattering cross-section and ~1.5 times larger absorption cross-section, (iii) 4.5% higher transmission coefficient of the same thickness and (iv) 7.8% greater transmitted electric filed intensity at the same depth. All those results are calculated by Mie theory and Fresnel equations, and simulated by finite-difference time-domain (FDTD) calculations with proper boundary conditions. Red-shifting of the LSPR wavelength using high-k $ZrO_2$ dielectric is also observed according to location of the peak and this is consistent with the other's report. Finally, our experimental results show that variation of short-circuit current density ($J_{sc}$) of the LSPR enhanced a-Si:H solar cell by using the $ZrO_2$ spacing layer is 45.4% higher than that using the $SiO_2$ spacing layer, supporting our calculation and theory.

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Effect of Carrier Confinement and Optical Properties of Two-dimensional Electrons in Al0.3Ga0.7N/GaN and Al0.3Ga0.7N/GaN/Al0.15Ga0.85N/GaN Heterostructures (Al0.3Ga0.7N/GaN 및 Al0.3Ga0.7N/GaN/Al0.15Ga0.85N/GaN 이종접합 구조에서 운반자 구속 효과와 이차원 전자가스의 광학적 특성)

  • Kwack, H.S.;Lee, K.S.;Cho, H.E.;Lee, J.H.;Cho, Y.H.
    • Journal of the Korean Vacuum Society
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    • v.17 no.4
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    • pp.359-364
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    • 2008
  • We have investigated optical and structural properties of $Al_{0.3}Ga_{0.7}N$/GaN and $Al_{0.3}Ga_{0.7}N/GaN/Al_{0.15}Ga_{0.85}N/GaN$ heterostructures (HSs) grown by metal-organic chemical vapor deposition, by means of Hall measurement, high-resolution X-ray diffraction, and temperature- and excitation power-dependent photoluminescence (PL) spectroscopy. A strong GaN band edge emission and its longitudinal optical phonon replicas were observed for all the samples. At 10 K, a 2DEG-related PL peak located at ${\sim}\;3.445\;eV$ was observed for $Al_{0.3}Ga_{0.7}N$/GaN HS, while two 2DEG peaks at ${\sim}\;3.42$ and ${\sim}\;3.445\;eV$ were observed for $Al_{0.3}Ga_{0.7}N/GaN/Al_{0.15}Ga_{0.85}N/GaN$ HS due to the additional $Al_{0.15}Ga_{0.85}N$ layers. Moreover, the emission intensity of the 2DEG peak was higher in $Al_{0.3}Ga_{0.7}N/GaN/Al_{0.15}Ga_{0.85}N/GaN$ HS than in $Al_{0.3}Ga_{0.7}N$/GaN HS probably due to an effective confinement of the photo-excited holes by the additional $Al_{0.15}Ga_{0.85}N$ layers. The 2DEG-related emission intensity decreased with increasing temperature and disappeared at temperatures above 150 K. To investigate the origin of the new 2DEG peaks, the energy-band structure for multiple AlGaN/GaN HSs were simulated and compared with the experimental data. As a result, the observed high- and low-energy peaks of 2DEG can be attributed to the spatially-separated 2DEG emissions formed at different AlGaN/GaN heterointerfaces.