• 한국전자파학회논문지
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• 제20권1호
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• pp.1-11
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• 2009

본 논문에서는 플라즈마 응용을 위 한 고효율 및 고안정성을 가지는 RF 발생기용 1 kW급 전력증폭기를 설계 및 제작하였다. 전력증폭기는 푸쉬풀 MOSFET 1개와 고전류 구동 IC로 구성하였으며, E급 증폭기의 구조를 사용함으로써 효율을 개선하였다. 플라즈마 응용에 적합하도록 전력증폭기에 선택적 감쇠기를 사용하여 3가지 모드로 동작하게 함으로써 효율과 안정성을 선택적으로 고려할 수 있도록 하였다. 초기 방전 구간의 불안정성을 개선하기 위하여 RF 발생기의 출력 안정영역을 선택적 감쇠기를 사용하여 전압정재파비(VSWR)를 3.8:1 미만보다 개선된 4.5:1 미만으로 확장하였다. 또한 기존에 적용되는 증폭기에 비하여 크기를 30 % 줄였으며, 주파수 13.56 MHz, 출력 1 kW에서 효율 80 %를 얻으므로 기존에 비하여 효율을 약 13 % 개선하였다.

• 한국전기전자재료학회논문지
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• 제11권7호
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• pp.527-534
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• 1998

Thin film deposition of InN, which is a less-studied III-nitride compound semiconductor because of the difficulty if crystal growth, was performed by rf reactive sputtering method using In target and $N_2$reactive gas. The structrual, electrical, and optical properties of the produced films were measured and disussed according to the sputtering parameters such as deposition pressure, rf power, and substrate temperature. From the result of deposition pressure, rf power, and substrate temperature, we could obtain optimal conditions of 5m Torr, 60W, $60^{\circ}C$ for preparing InN thin film with high crystallinity, low carrier concentration, and high Hall mobility. The carrier concentration, Hall mobility, and optical bandgap of the fabricated InN thin films at optimal condition were $6.242\times10^{18}cm^{-3}, 212.526cm^2/V\cdot$ｓ, and 1.912eV, respectively.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.1480-1483
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• 2005

Transparent thin composite films (TCFs) were deposited on OLED devices by means of RF sputtering method and their passivation-properties were evaluated by comparing to the e-beam evaporating method. This composite film formed by mixed ratio of MgO (3wt %): $SiO_2$ (1wt %) was developed from pallet as a source of e-beam evaporator to 6-inch size target for sputtering in order to apply for large-sized organic display devices. Water Vapor Transmission Rates (WVTR) of the deposited films were measured as a function of thickness to assess the effectiveness of this film as a passivation layer and it applied to real devices. From this study, we can confirm that the passivation layer formed by TCFs using RF sputtering method sufficiently shows the potentiality of application to passivation layer for organic display devices.

• Journal of electromagnetic engineering and science
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• 제17권4호
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• pp.169-177
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• 2017

The role of electromagnetic (EM) waves in magnetic fusion plasma-ranging from radio frequency (RF) to microwaves-has been extremely important, and understanding of EM wave propagation and related technology in this field has significantly advanced magnetic fusion plasma research. Auxiliary heating and current drive systems, aided by various forms of high-power RF and microwave sources, have contributed to achieving the required steady-state operation of plasmas with high temperatures (i.e., up to approximately 10 keV; 1 eV=10000 K) that are suitable for future fusion reactors. Here, various resonance values and cut-off characteristics of wave propagation in plasmas with a nonuniform magnetic field are used to optimize the efficiency of heating and current drive systems. In diagnostic applications, passive emissions and active sources in this frequency range are used to measure plasma parameters and dynamics; in particular, measurements of electron cyclotron emissions (ECEs) provide profile information regarding electron temperature. Recent developments in state-of-the-art 2D microwave imaging systems that measure fluctuations in electron temperature and density are largely based on ECE. The scattering process, phase delays, reflection/diffraction, and the polarization of actively launched EM waves provide us with the physics of magnetohydrodynamic instabilities and transport physics.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.341-344
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• 1999

The effects of post annealing treatments of ferroelectrlclty in PZT(P $b_{1.05}$(Z $r_{0.52}$, $Ti_{0.48}$) $O_3$ thin film deposited on Pt/ $SiO_2$/Si substrate by RF-Magnetron sputtering methode was Investigated. Analyses by RTA(Rapid Thermal Annealing) treatments reveled that the crystallization process strongly depend on the healing temperature. The Perovskite structure with strong PZT (101) plan was obtained by RTA treatments at 75$0^{\circ}C$ With increasing RTA temperature of PZI thin films, the coercive field and remanent Polarization decreased, while saturation polarization( $P_{r}$) was decreased. P-E curves of Pt/PZT/Pt capacitor structures demonstrate typical hysteresiss loops. The measure values of $P_{r}$,. $E_{c}$ and dielectric constants by post annealed at 75$0^{\circ}C$ were 38 $\mu$C/$\textrm{cm}^2$ 35KV/cm and 974, respectively. Switching polarization versus fatigue characteristic showed 12% degradation up to 10$^{7}$ cycles.s.s.s.s.s.s.

• 한국재료학회지
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• 제11권10호
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• pp.889-894
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• 2001

2wt% $Al_2O_3-doped$ ZnO (AZO) thin films were deposited on sapphire (0001) single crystal substrate by parellel type rf magnetron sputtering at 55$0^{\circ}C$. The as-grown AZO thin films was polycrystalline and showed only broad deep defect-level photoluminescence (PL). In order to examine the change of PL property, AZO thin films were annealed in $N_2$ (N-AZO) and $H_2$ (H-AZO) at the temperature of $600^{\circ}C$~$1000^{\circ}C$ through rapid thermal annealing. After annealed at $800^{\circ}C$, N-AZO shows near band edge emission (NBE) with very small deep-level emission, and then N-AZO annealed at $900^{\circ}C$ shows only sharp NBE with 219 meV FWHM. In Comparison with N-AZO, H-AZO exhibits very interesting PL features. After $600^{\circ}C$ annealing, deep defect-level emission was quire quenched and NBE around 382 nm (3.2 eV) was observed, which can be explained by the $H_2$passivation effect. At elevated temperature, two interesting peaks corresponding to violet (406 nm, 3.05 eV) and blue (436 nm, 2.84 eV) emission was firstly observed in AZO thin films. Moreover, peculiar PL peak around 694 nm (1.78 eV) is also firstly observed in all the H-AZO thin films and this is believed good evidence of hydrogenation of AZO. Based on defect-level scheme calculated by using the full potential linear muffin-tin orbital (FP-LMTO), the emission 3.2 eV, 3.05 eV, 3.84 eV and 1.78 eV of H-AZO are substantially deginated as exciton emission, transition from conduction band maximum to $V_{ Zn},$ from $Zn_i$, to valence band maximum $(V_{BM})$ and from $V_{o} to V_BM}$, respectively.

• 한국안광학회지
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• 제12권3호
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• pp.77-81
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• 2007

금속테의 황색도금물질로 사용되는 티타늄질화물(titanium nitride: $TiN_x$)의 단일박막을 질소가스의 양을 달리 공급 하여 Si(100) 기판위에 초고진공 RF 마그네트론 스퍼터링(ultra high vacuum radio frequency magnetron sputtering) 방법으로 증착하였다. 박막 증착 후 가변입사각분광타원계를 사용하여 1.5-5.0 eV 에너지 영역에서 타원 각 ${\Delta}$와 ${\Psi}$를 측정하였다. 이 측정결과들을 Drude+Lorentz oscillator 분산관계식을 사용하여 최적 맞춤하고, 매개변수들을 구하여 박막의 광학상수인 굴절계수 $n({\lambda})$과 소광계수 $k({\lambda})$를 각각 결정하였다.

• 한국수자원학회:학술대회논문집
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• 한국수자원학회 2023년도 학술발표회
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• pp.179-179
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• 2023

This study suggests a new approach of water level forecasting for extended lead times using original data preprocessing with variational mode decomposition (VMD). Here, two machine learning algorithms including light gradient boosting machine (LGBM) and random forest (RF) were considered to incorporate extended lead times (i.e., 5, 10, 15, 20, 25, 30, 40, and 50 days) forecasting of water levels. At first, the original data at two water level stations (i.e., SW173 and SW269 in Bangladesh) and their decomposed data from VMD were prepared on antecedent lag times to analyze in the datasets of different lead times. Mean absolute error (MAE), root mean squared error (RMSE), and mean squared error (MSE) were used to evaluate the performance of the machine learning models in water level forecasting. As results, it represents that the errors were minimized when the decomposed datasets were considered to predict water levels, rather than the use of original data standalone. It was also noted that LGBM produced lower MAE, RMSE, and MSE values than RF, indicating better performance. For instance, at the SW173 station, LGBM outperformed RF in both decomposed and original data with MAE values of 0.511 and 1.566, compared to RF's MAE values of 0.719 and 1.644, respectively, in a 30-day lead time. The models' performance decreased with increasing lead time, as per the study findings. In summary, preprocessing original data and utilizing machine learning models with decomposed techniques have shown promising results for water level forecasting in higher lead times. It is expected that the approach of this study can assist water management authorities in taking precautionary measures based on forecasted water levels, which is crucial for sustainable water resource utilization.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.307.1-307.1
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• 2016

Amorphous zinc tin oxide (ZTO) thin films are being widely studied for a variety electronic applications such as the transparent conducting oxide (TCO) in the field of photoelectric elements and thin film transistors (TFTs). Thin film transistors (TFTs) with transparent amorphous oxide semiconductors (TAOS) represent a major advance in the field of thin film electronics. Examples of TAOS materials include zinc tin oxide (ZTO), indium gallium zinc oxide (IGZO), indium zinc oxide, and indium zinc tin oxide. Among them, ZTO has good optical and electrical properties (high transmittance and larger than 3eV band gap energy). Furthermore ZTO does not contain indium or gallium and is relatively inexpensive and non-toxic. In this study, ZTO thin films were formed by UHV RF magnetron co-sputter deposition on silicon substrates and sapphires. The films were deposited from ZnO and SnO2 target in an RF argon and oxygen plasma. The deposition condition of ZTO thin films were controlled by RF power and post anneal temperature using rapid thermal annealing (RTA). The deposited and annealed films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), ultraviolet and visible light (UV-VIS) spectrophotometer.

• 한국표면공학회지
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• 제46권1호
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• pp.16-21
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• 2013

CIGS (Cu-In-Ga-Se) films were deposited on the Mo coated soda lime glass (Mo/SLG) by RF magnetron sputtering using a single sintered target with different chemical compositions. Heat treatment of the CIGS films were carried out under three different conditions, 1step ($350^{\circ}C$ for 2 hour and $550^{\circ}C$ for 2 hour) and 2step ($350^{\circ}C$ for 1 hour and $550^{\circ}C$ for 1 hour). In the case of CIGS films post-annealed on 2step method, grain size remarkably increased compared to other methods, indicating that chemical composition [Cu/(Ga+In) = 1] of CIGS films was same as CIGS target. After heat treatment by 2step method, band gap energy of the CIGS film deposited at RF 80 W showed 1.4 eV which is broadly similar to identical band gap energy (1.2 eV) of CIGS film prepared by evaporation method. Therefore, 2step heat treatment method could be expected to low temperature process.