• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.154-155
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• 2010

최근 Stranski-Krastanov (SK) 성장법을 이용한 자발형성 (Self-assembled) InAs/GaAs 양자점 (Quantum Dot) 연구가 기초 물리학뿐만 아니라 응용에 있어 활발하게 진행되고 있다. 그러나 기존 보고에 따르면 SK 성장법을 통한 InAs/GaAs 양자점은 크기, 균일도, 및 밀도 등의 성장거동 제어에 한계가 있다. 예로, 성장속도 및 증착양이 감소하더라도 상대적으로 크기가 큰 InAs/GaAs 클러스터 (Cluster)를 형성하여 크기분포의 불균일 및 결함을 야기하여 결과적으로 전기/광학적 특성을 저해하는 요인이 된다. 이를 개선하기 위한 방안으로 SK 성장법을 변형한 다양한 수정자발형성법이 제안되어 연구되고 있다. 본 논문에서는 기존 SK 성장법과 Arsenic-interruption Technique(AIT), In Pre-deposition (IPD)법을 각각 접목한 수정자발형성법을 이용하여 상대적으로 크기가 큰 InAs/GaAs 양자점 또는 클러스터 형성을 감소시켜 공간적 크기 균일도 및 밀도를 제어한 결과를 보고한다. 성장된 InAs/GaAs 양자점 시료의 구조 및 광학적 특성을 원자력간현미경 (Artomic Force Microscopy, AFM)과 Photoluminescence (PL) 분광법을 이용하여 분석하였다. 기존 SK 성장법을 이용하여 형성한 기준시료의 AFM 이미지에서 InAs/GaAs 양자점과 클러스터의 공간밀도는 각각 6.4*1010/cm2와 1.4*109/cm2로 관찰되었다. 그러나, AIT를 이용한 양자점 시료의 경우 상대적으로 크기가 큰 InAs/GaAs 클러스터는 관찰되어지지 않았고, 양자점 밀도는 8.4*1010/cm2로 SK 양자점에 비하여 30% 정도 개선되었다. 또한, InAs/GaAs 클러스터를 제외한 공간 균일도는 SK-InAs/GaAs 양자점의 15.6%에 비하여 8%로 크게 개선된 결과를 얻었다. AIT 성장법을 이용한 InAs/GaAs 양자점에서 원자의 이동거리 (Migration Length)의 제어로 양자점의 형성특성이 개선된 것으로 설명할 수 있으며, Arsenic 차단 시간이 임계점 이상으로 길어지면 다시 InAs/GaAs 클러스터들이 형성되는 것을 관찰할 수 있었다. InAs/GaAs 양자점과 클러스터 형성 특성이 초기 표면 조건에 어떻게 영향을 받는지 분석하기 위해, InAs 양자점 성장 이전에 V족 물질 공급 없이 Indium의 공급시간을 1초(IPDT1S 시료), 2초 (IPDT2S 시료), 3초 (IPDT1S 시료)로 변화시키면서 증착하고 기존 SK 성장법으로 양자점을 성장하였다 (IPD성장법). 그 결과 IDP1S 양자점 시료의 공간밀도가 10*1010/cm2로 SK InAs/GaAs 양자점 시료에 비해 약 60% 정도 증가하였고, 클러스터도 관찰 할 수 없었다. 그러나 IPD 시간이 증가할수록 다시 InAs/GaAs 클러스터들이 형성되는 것을 관찰할 수 있었다. 이러한 결과는 InAs/GaAs 양자점 성장초기에 InAs 핵생성 사이트 (Nucleation site)의 크기 및 상태를 제어하는 것이 양자점의 밀도 및 균일도를 제어하는 중요한 요소임을 알 수 있다.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.36 no.4
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• pp.361-371
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• 2012

In order to improve the efficiency of the branch-and-bound method for mixed-discrete nonlinear programming, a nonuniform convergence tolerance scheme is proposed for the continuous subproblem optimizations. The suggested scheme assigns the convergence tolerances for each continuous subproblem optimization according to the maximum constraint violation obtained from the first iteration of each subproblem optimization in order to reduce the total number of function evaluations needed to reach the discrete optimal solution. The proposed tolerance scheme is integrated with five branching order options. The comparative performance test results using the ten combinations of the five branching orders and two convergence tolerance schemes show that the suggested non-uniform convergence tolerance scheme is obviously superior to the uniform one. The results also show that the branching order option using the minimum clearance difference method performed best among the five branching order options. Therefore, we recommend using the "minimum clearance difference method" for branching and the "non-uniform convergence tolerance scheme" for solving discrete optimization problems.

• Journal of Korea Technical Association of The Pulp and Paper Industry
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• v.40 no.5
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• pp.60-69
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• 2008

The principal reasons for applying a pigment coating to paper are to improve appearance and printability. The pigment coating provides a surface that is more uniform and more receptive to printing ink than are the uncoated fibers and, in turn, both facilitates the printing process and enhances the graphic reproduction. The improvement in print quality is readily apparent, especially in image areas or when multiple colors are involved. Although pigment coating of paper is to improve the printability, coated paper is not completely free from printing defects. Actually there are a number printing defects that are observed only with the coated papers. Among the printing defects that are commonly observed for coated papers, print mottle during multi-color offset printing is one of the most concerned defects, and it appears not only on solid tone area but also half dot print area. There are four main causes of print mottle ranging from printing inks, dampening solution, paper, and printing press or its operation. These indicates that almost every factors associated with lithographic printing can cause print mottle. Among these variation of paper quality influences most significantly on print mottle problems in multicolor offset printing, and this indicates that paper is most often to be blamed for its product deficiency as far as print mottle problems are concerned. Furthermore, most of the print mottle problems associated with paper is observed when coated papers are printed. Uncoated papers rarely show mottling problems. This indicates that print mottle is the most serious quality problems of coated paper products. Overcoming the print mottle is becoming more difficult because the operating speeds of coating and printing machines are increasing, coating weights are decreasing, and the demands on high-quality printing are increasing. Print mottle in offset printing is caused by (a) nonuniform back trap of ink caused by a nonuniform rate of ink drying, referred as "back trap mottle, and (b) nonuniform absorption of the dampening solution. Furthermore, both forms of print mottle have some relationship to the structure of the coated layer. The surest way of eliminating ink mottling is to eliminate unevenness in the base paper. Coating solutions, often easier to put into practice, should, however, be considered. In this paper the principal factors influencing print mottle of coated papers will be discussed. Especially the importance of base paper roughness, binder migration, even consolidation of coating layers, control of the drying rate, types of binders, etc. will be described.

• Journal of the Korean Vacuum Society
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• v.18 no.5
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• pp.352-357
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• 2009

The InAs multi-quantum dots (MQDs) solar cell and InGaAs multi-quantum wells (MQWs) solar cell to cover 1.1 eV and 1.3 eV were designed by 1D poisson, respectively. The MQDs and MQWs of 5, 10, 15 layers were grown by molecular beam epitaxy. The photo luminescence results showed that the 5 period stacked MQDs have the highest intensity at around 1.1 eV with 57.6 meV full width at half maximum (FWHM). Also we can observe 10 period stacked MQWs peak position which has highest intensity at 1.31 eV with 12.37 meV FWHM. The density and size of QDs were observed by reflection high energy electron diffraction pattern and atomic force microscope. Futhermore, AlGaAs/GaAs sandwiched tunnel junctions were modified according to the width of GaAs layer on p-type GaAs substrates. The structures with GaAs width of 30 nm and 50 nm have backward diode characteristics. In contrast, tunnel diode characteristics were observed in the 20 nm of that of sample.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.441-441
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• 2012

Franz Keldysh Oscillation (FKO)은 p-n 접합 구조의 Photoreflectance (PR) spectra에서 표면 및 계면의 전기장(electric field) 특성을 반영한다. InAs/GaAs 양자점 태양전지(Quantum Dot Solar Cell, QDSC) 구조에서 InAs 양자점 층 전후에 AlGaAs 층을 삽입하여 퍼텐셜 장벽(potential barrier) 두께에 따른 PR spectra 및 GaAs-matrix에서 FKO 주파수 특성을 비교 분석하였다. InAs/GaAs 양자점 태양전지는 p-i-n 구조의 i-GaAs에 2.0 monolayer (ML), 8주기의 InAs 양자점 층을 삽입하여 Molecular Beam Epitaxy (MBE) 방법으로 성장하였다. 각 양자점 층 전후에 두께가 각각 0.0, 1.6, 2.8, 6.0 nm인 AlGaAs 층을 삽입하여 퍼텐셜 장벽 두께에 따른 FKO 주파수 변화를 관측하였다. 또한 태양전지 구조의 전기장 분포를 좀 더 용이하게 관측하기 위해 여기 광의 세기(power intensity)를 충분히 낮추어 Photovoltaic effect에 의한 내부 전기장의 변화를 최소화하여 비교 분석하였다. InAs/GaAs 양자점 태양전지 구조에서 AlGaAs 장벽층이 없는 경우, PR spectra의 Fast Fourier Transform 결과에 반영되는 FKO 주파수 특성은 p-i-n 구조 계면에서 공핍층(depletion region)의 space charge field보다 양자점 층의 내부 전기장에 의한 FKO 주파수가 더 큰 진폭(amplitude)을 보였다. 반면에, AlGaAs 장벽층이 삽입되면 두께가 커짐에 따라 p-i-n 구조 계면의 space charge field에 의해 더 큰 진폭의 FKO 주파수가 관측되었다. 이는 AlGaAs 장벽층이 삽입됨으로써 양자점 층 내 양자 상태 수 및 여기광에 의한 캐리어의 수와 관련이 있음을 확인하였으며, 결과적으로 GaAs-matrix에서 p-i-n 구조 계면의 space charge field에 영향을 미치게 됨을 알 수 있다. 이러한 PR 특성 결과들을 InAs/GaAs 양자점 태양전지의 설계 및 제조에 반영함으로써 양자효율 증대에 기여할 것으로 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.213-213
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• 2012

It has been known that quantum confinement effect of CdSe nanocrystal was observed by increasing the number of deposition cycle using successive ionic layer adsorption and reaction (SILAR) method. Here, we report on thermally-induced quantum confinement effect of CdSe at the given cycle number using spin-coating technology. A cation precursor solution containing $0.3\;M\;Cd(NO_3)_2{\cdot}4H_2O$ is spun onto a $TiO_2$ nanoparticulate film, which is followed by spinning an anion precursor solution containing $0.3\;M\;Na_2\;SeSO_3$ to complete one cycle. The cycle is repeated up to 10 cycles, where the spin-coated $TiO_2$ film at each cycle is heated at temperature ranging from $100^{\circ}C$ to $250^{\circ}C$. The CdSe-sensitized $TiO_2$ nanostructured film is contacted with polysulfide redox electrolyte to construct photoelectrochemical solar cell. Photovoltaic performance is significantly dependent on the heat-treatment temperature. Incident photon-to-current conversion efficiency (IPCE) increases with increasing temperature, where the onset of the absorption increases from 600 nm for the $100^{\circ}C$- to 700 nm for the $150^{\circ}C$- and to 800 nm for the $200^{\circ}C$- and the $250^{\circ}C$-heat treatment. This is an indicative of quantum size effect. According to Tauc plot, the band gap energy decreases from 2.09 eV to 1.93 eV and to 1.76 eV as the temperature increases from $100^{\circ}C$ to $150^{\circ}C$ and to $200^{\circ}C$ (also $250^{\circ}C$), respectively. In addition, the size of CdSe increases gradually from 4.4 nm to 12.8 nm as the temperature increases from $100^{\circ}C$ to $250^{\circ}C$. From the differential thermogravimetric analysis, the increased size in CdSe by increasing the temperature at the same deposition condition is found to be attributed to the increase in energy for crystallization with $dH=240cal/^{\circ}C$. Due to the thermally induced quantum confinement effect, the conversion efficiency is substantially improved from 0.48% to 1.8% with increasing the heat-treatment temperature from $100^{\circ}C$ to $200^{\circ}C$.

• Korean Journal of Environmental Agriculture
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• v.1 no.1
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• pp.1-13
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• 1982

Composite soil samples from 236 sites representing paddy field, up-land, orchard and plastic film house were examined for organochlorine residues by GLC-ECD. Detection frequencies and residual levels of most persistent organochlorine residues in the soil samples were found to depend on the cropping practices. Highest organochlorine residues were found in orchard soils and followed, in decreasing order, plastic film house, up-land and paddy field soils. ${\alpha}-Endosulfan$, dieldrin, p,p'-DDD and p,p'-DDT were responsible for the observed high organochlorine residues in the orchard soils. ${\alpha}-BHC$ and ${\gamma}-BHC$ were detected in all 236 soil samples. The mean residue levels of both BHC isomers were, however, remained fairly low. Residues of PCNB and ${\alpha}-endosulfan$ in native soils are reported, for the first time, in present work. PCNB was present in up-land plastic film house soils while ${\alpha}-endosulfan$ was found in all agricultural soils studied. High levels of p,p'-DDT and dieldrin were discussed in relation to crops cultivated, amount and duration of the pesticides usage. Need for continued observations on the persistent residue of pesticides in soils, already banned for general use, is emphasized.

• Journal of Radiation Protection and Research
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• v.30 no.2
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• pp.69-75
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• 2005

Gas avalanche microdetectors, such as micro-strip gas chamber (MSGC), micro-gap chamber (MGC), micro-dot chamber (MDOT), etc., are operated under high voltage to induce large electron avalanche signal around micro-size anodes. Therefore, the anodes are highly exposed to electrical damage, for example, sparking because of the interaction between high electric field strength and charge multiplication around the anodes. Gas electron multiplier (GEM) is a charge preamplifying device in which charge multiplication can be confined, so that it makes that the charge multiplication region can be separate from the readout micro-anodes in 9as avalanche microdetectors possible. Primary electron collection efficiency is an important measure for the GEM performance. We have defined that the primary electron collection efficiency is the fractional number of electron trajectories reaching to the collection plane from the drift plane through the GEM holes. The electron trajectories were estimated based on 3-dimensional (3D) finite element method (FEM). In this paper, we present the primary electron collection efficiency with respect to various GEM operation parameters. This simulation work will be very useful for the better design of the GEM.

• Journal of Aquaculture
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• v.19 no.3
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• pp.157-165
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• 2006

Expression of major antioxidant enzyme (AOE) including Cu/Zn superoxide dismutase (Cu/Zn-SOD), catalase (CAT), glutathione-S-transferase (GST) and 3 glutathione peroxidase isotypes (GPXs) at mRNA levels during heat stress was examined in mud loach (Misgurnus mizolepis) liver. Based on the semi-quantitative RT-PCR, real-time RT-PCR and/or northern dot blot hybridization, the antioxidant enzyme genes were generally up-regulated during elevation of water temperature from $23^{\circ}C$ up to $32^{\circ}C$. GPXs and SOD displayed the most significant elevation of mRNA levels (up to 3 and 2 folds, respectively) while CAT showed the steady-state expression irrespective of thermal conditions. GST represented the relatively moderate response (1.3-fold increase) in its transcription to thermal stress. The transcriptional activation of AOE genes was not significant at the treatment temperature lower than $29^{\circ}C$. Increased mRNA levels of GPX (extracellular form) and SOD genes in the fish exposed to $32^{\circ}C$ was readily detectable 1 day after exposure to heat stress.

• Korean Journal of Optics and Photonics
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• v.17 no.3
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• pp.278-284
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• 2006

We have fabricated and measured electrooptic modulator using coupled stack InAs/InGaAs quantum dots. The height of the quantum dot is 16 nm and quantum dots are stacked including an InGaAs capping layer. The peak wavelength of photoluminescence is 1260 nm at room temperature and 1158 nm at 12 K. The operation characteristics of the quantum dots show high modulation efficiency of electrooptic modulator at 1550 nm compared to that of existing III-V bulk and MQW type semiconductor. The measured switching voltage ($V\pi$) is 540 and 600 mV, for TE mode and TM mode, respectively. From the results, the modulation efficiency can be determined as 333.3 and $300^{\circ}/V{\cdot}mm$ for TE and TM modes. The results reported here may lead to the design and fabrication of a novel electrooptic modulator with low switching voltage and high efficiency.