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Effect of Doping State on Photoresponse Properties of Polypyrrole

  • Choi, Jongwan
    • Elastomers and Composites
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    • v.56 no.4
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    • pp.250-253
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    • 2021
  • Polypyrrole is an organic thermoelectric material which has been receiving extensive attention in recent years. Polypyrrole is applicable in various fields because its electrical properties are controllable by its doping concentration. In this study, the effects of the polypyrrole doping state on its photoresponse were investigated. The degree of doping was controlled by ammonia solution treatment. Then, the chemical structure as a function of the doping states was observed by Raman analysis. Moreover, the photocurrent and photovoltage characteristics for various doping states were measured by an asymmetrically irradiated light source. As the degree of doping increased, the electrical conductivity increased, which affected the photocurrent. Meanwhile, the photovoltage was related to the temperature gradient caused by light irradiation.

Unusual Non-magnetic Metallic State in Narrow Silicon Carbon Nanoribbons by Electron or Hole Doping

  • Lou, Ping;Lee, Jin-Yong
    • Bulletin of the Korean Chemical Society
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    • v.33 no.3
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    • pp.763-769
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    • 2012
  • We investigated the width (N) dependence on the magnetization of N-ZSiC NR with electron and hole doping on the basis of systematic DFT calculations. The critical values of the upper and down critical concentration to give the maximum and zero magnetic moment at edge Si/C atoms by electron/hole doping ($x_{up,e}$, $x_{down,e}$, $x_{up,h}$, and $x_{down,h}$) depend on the width of N-ZSiC NR. Moreover, due to $x_{up,e}\;{\neq}\;x_{up,h}$ and $x_{down,e}\;{\neq}\;x_{down,h}$, the electron and hole doping effect are asymmetry, i.e, the critical electron doping value ($x_{down,e}$) is smaller than the critical hole doping value ($x_{down,h}$) and is almost independent of the width of NZSiC NR though the other critical values of the electron and hole doping that influence the magnetization of N-ZSiC NR depend on the width. It was also found that at $x_{down,e}$ or $x_{down,h}$ doping, the N-ZSiC NR turns into unusual non-magnetic metallic state. The magnetic behavior was discussed based on the band structures and projected density of states (PDOS) under the effect of electron/hole doping.

SOME CHARACTERISTICS OF THE CERAMIC SUPERCONDUCTORS PHYSICS PROERTIES AND CHEMICAL ASPECTS

  • Escudero, Roberto
    • Proceedings of the Materials Research Society of Korea Conference
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    • 1992.05a
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    • pp.17-17
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    • 1992
  • The ceramic high transition temperature superconducting materials present many interesting characteristics that will be analysed from two points of view: physical behavior, and chemical aspects. From the first point of view, these materials display an enormous variety of different physical properties. At low doping levels the normal state shows antiferromagnetism and insulating behavior. At intermediate doping levels, an anomalous metallic state appears and, the optimum Tc in the superconducting state is generated. With increasing doping a normal metallic state develops and superconductivity starts to disappear. Many of the physical phenomena that describe the overall behavior when doping levels are changed will be discussed. From the poing of view of the chemical aspects. we well discuss some of the problems involved in the methods of preparation with particular emphasis on defects, crystal structures, critical currrents, and applications in technology.

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Effect of Al and Nb Doping on the Electrochemical Characteristics of Garnet-type Li7La3Zr2O12 Solid Electrolytes

  • Ahmed Tarif;Chan-Jin Park
    • Corrosion Science and Technology
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    • v.22 no.6
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    • pp.408-418
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    • 2023
  • In this study, we synthesized and characterized garnet-type Li7-xAlxLa3Zr2-(5/4)yNbyO12 (LALZN) solid electrolytes for all-solid-state battery applications. Our novel approach focused on enhancing ionic conductivity, which is crucial for battery efficiency. A systematic examination found that co-doping with Al and Nb significantly improved this conductivity. Al3+ and Nb5+ ions were incorporated at Li+ and Zr4+ sites, respectively. This doping resulted in LALZN electrolytes with optimized properties, most notably enhanced ionic conductivity. An optimized mixture with 0.25 mol each of Al and Nb dopants achieved a peak conductivity of 1.32 × 10-4 S cm-1. We fabricated symmetric cells using these electrolytes and observed excellent charge-discharge profiles and remarkable cycling longevity, demonstrating the potential for long-term application in battery systems. The garnet-type LALZN solid electrolytes, with their high ionic conductivity and stability, show great potential for enhancing the performance of all-solid-state batteries. This study not only advances the understanding of effective doping strategies but also underscores the practical applicability of the LALZN system in modern energy storage solutions.

Graphene Doping by Ammonia Plasma Surface Treatment (암모니아 플라즈마 표면처리를 통한 그래핀의 질소도핑)

  • Lee, Byeong-Joo;Jeong, Goo-Hwan
    • Journal of the Korean institute of surface engineering
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    • v.48 no.4
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    • pp.163-168
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    • 2015
  • Graphene has attracted much attention due to its remarkable physical properties and potential applications in many fields. In special, the electronic properties of graphene are influenced by the number of layer, stacking sequence, edge state, and doping of foreign elements. Recently, many efforts have been dedicated to alter the electronic properties by doping of various species, such as hydrogen, oxygen, nitrogen, ammonia and etc. Here, we report our recent results of plasma doping on graphene. We prepared mechanically exfoliated graphene, and performed the plasma treatment using ammonia gas for nitrogen doping. The direct-current plasma system was used for plasma ignition. The doping level was estimated from the number of peak shift of G-band in Raman spectra. The upshift of G-band was observed after ammonia plasma treatment, which implies electron doping to graphene.

A Study on Characteristic Improvement of IGBT with P-floating Layer

  • Kyoung, Sinsu;Jung, Eun Sik;Kang, Ey Goo
    • Journal of Electrical Engineering and Technology
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    • v.9 no.2
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    • pp.686-694
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    • 2014
  • A power semiconductor device, usually used as a switch or rectifier, is very significant in the modern power industry. The power semiconductor, in terms of its physical properties, requires a high breakdown voltage to turn off, a low on-state resistance to reduce static loss, and a fast switching speed to reduce dynamic loss. Among those parameters, the breakdown voltage and on-state resistance rely on the doping concentration of the drift region in the power semiconductor, this effect can be more important for a higher voltage device. Although the low doping concentration in the drift region increases the breakdown voltage, the on-state resistance that is increased along with it makes the static loss characteristic deteriorate. On the other hand, although the high doping concentration in the drift region reduces on-state resistance, the breakdown voltage is decreased, which limits the scope of its applications. This addresses the fact that breakdown voltage and on-state resistance are in a trade-off relationship with a parameter of the doping concentration in the drift region. Such a trade-off relationship is a hindrance to the development of power semiconductor devices that have idealistic characteristics. In this study, a novel structure is proposed for the Insulated Gate Bipolar Transistor (IGBT) device that uses conductivity modulation, which makes it possible to increase the breakdown voltage without changing the on-state resistance through use of a P-floating layer. More specifically in the proposed IGBT structure, a P-floating layer was inserted into the drift region, which results in an alleviation of the trade-off relationship between the on-state resistance and the breakdown voltage. The increase of breakdown voltage in the proposed IGBT structure has been analyzed both theoretically and through simulations, and it is verified through measurement of actual samples.

Tunable doping sites and the impacts in photocatalysis of W-N codoped anatase TiO2

  • Choe, Hui-Chae;Sin, Dong-Bin;Yeo, Byeong-Cheol;Song, Tae-Seop;Han, Sang-Su;Park, No-Jeong;Kim, Seung-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.246-246
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    • 2016
  • Tungsten-nitrogen (W-N) co-doping has been known to enhance the photocatalytic activity of anatase titania nanoparticles by utilizing visible light. The doping effects are, however, largely dependent on calcination or annealing conditions, and thus, the massive production of quality-controlled photocatalysts still remains a challenge. Using density functional theory (DFT) thermodynamics and time-dependent DFT (TDDFT) computations, we investigate the atomic structures of N doping and W-N co-doping in anatase titania, as well as the effect of the thermal processing conditions. We find that W and N dopants predominantly constitute two complex structures: an N interstitial site near a Ti vacancy in the triple charge state and the simultaneous substitutions of Ti by W and the nearest O by N. The latter case induces highly localized shallow in-gap levels near the conduction band minimum (CBM) and the valence band maximum (VBM), whereas the defect complex yielded deep levels (1.9 eV above the VBM). Electronic structures suggest that substitutions of Ti by W and the nearest O by N improves the photocatalytic activity of anatase by band gap narrowing, while defective structure degrades the activity by an in-gap state-assisted electron-hole recombination, which explains the experimentally observed deep level-related photon absorption. Through the real-time propagation of TDDFT (rtp-TDDFT), we demonstrate that the presence of defective structure attracts excited electrons from the conduction band to a localized in-gap state within a much shorter time than the flat band lifetime of titania. Based on these results, we suggest that calcination under N-rich and O-poor conditions is desirable to eliminate the deep-level states to improve photocatalysis.

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Redox doping in OLEDs and other organic electronics applications

  • Birnstock, Jan;Werner, Ansgar;Blochwitz-Nimoth, Jan;Canzler, Tobias;Murano, Sven;Huang, Qiang;Lux, Andrea
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1315-1318
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    • 2008
  • It is well-known that PIN technology is beneficial for numerous OLED applications, e.g. active and passive matrix displays, lighting and signage. Furthermore, it can be used for other organic electronic applications such as OTFTs and organic solar cells. Here, the state of the art of the PIN technology and the latest results from the different application fields are presented.

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Phenomenal study on the dopant activation behavior in polysilicon thin films doped by non-mass separated ion mass doping technique (비질량 분리 이온 질량 주입법으로 도핑시킨 다결정 박막의 도판트 활성화 거동)

  • Yoon, Jin-Young;Choi, Duck-Kyun
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.7 no.1
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    • pp.143-150
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    • 1997
  • The electrical properties of polysilicon thin films implanted with $B_2H_6$ diluted in $H_2$ as dopant source using ion mass doping technique and the effect of radiation damage on the dopant activation behavior were investigated. Comparing the SIMS profiles of boron in polysilicon films with that obtained from computer simulation using TRIM92 the most probable ion species were $B_2H_x\;^+$(x=1, 2, 3‥‥) type molecular ions. As a result of the Implantation of energetic massive ions, a continuous amorphized layer was created in polysilicon films where the fraction of amorphized layer varied with doping time. This amorphization comes from the fact that mass separation of implanting species is not employed in this ion mass doping technique. In the dopant activation behavior, reverse annealing phenomenon appeared in the intermediate annealing temperature range for a severely damaged specimen. The experimental result showed that the off-state current of the p-channel polysilicon thin film transistor is dependent on the degree of radiation damage.

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Optimization of $Nd^{3+}$ ion co-doping in $CaAl_2O_4:\;Eu^{2+}$ blue phosphor ($CaAl_2O_4:Eu^{2+}$ 청색(靑色) 형광체(螢光體)의 $Nd^{3+}$ 도핑 최적화(最適化)에 관한 연구(硏究))

  • Bartwal, Kunwar Singh;Ryu, Ho-Jin
    • Resources Recycling
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    • v.16 no.5
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    • pp.46-50
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    • 2007
  • Blue phosphor calcium aluminate, $CaAl_2O_4:Eu^{2+}$ co-doped with $Nd^{3+}$ was prepared by solid state synthesis method. Phosphor materials with 1 mol% $Eu^{2+}$ and varying compositions of $Nd^{3+}$ show high brightness and long persistent luminescence. The synthesized phosphor materials were investigated by powder x-ray diffraction (XRD), SEM, TEM, photoluminescence excitation and emission studies. Broad band UV excited luminescence of the $CaAl_2O_4:Eu^{2+}:Nd^{3+}$ was observed in the blue region (${\lambda}_{max}=440\;nm$) due to transitions from the $4f^65d^1$ to the $4f^7$ configuration of the $Eu^{2+}$ ion. $Nd^{3+}$ ion doping in the phosphor results in long afterglow phosphorescence when the excitation light is cut off.