• 한국환경과학회지
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• 제17권11호
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• pp.1195-1201
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• 2008

Enhancing with non-metallic elemental nitrogen(N) is one of several methods that have been proposed to modify the electronic properties of bulk titanium dioxide($TiO_2$), in order to make $TiO_2$ effective under visible-light irradiation. Accordingly, current study evaluated the feasibility of applying visible-light-induced $TiO_2$ enhanced with N element to cleanse aromatic compounds, focusing on xylene isomers at indoor air quality(IAQ) levels. The N-enhanced $TiO_2$ was prepared by applying two popular processes, and they were coated by applying two well-known methods. For three o-, m-, and p-xylene, the two coating methods exhibited different photocatalytic oxidation(PCO) efficiencies. Similarly, the two N-doping processes showed different PCO efficiencies. For all three stream flow rates(SFRs), the degradation efficiencies were similar between o-xylene and m,p-xylene. The degradation efficiencies of all target compounds increased as the SFR decreased. The degradation efficiencies determined via a PCO system with N-enhanced visible-light induced $TiO_2$ was somewhat lower than that with ultraviolet(UV)-light induced unmodified $TiO_2$, which was reported by previous studies. Nevertheless, it is noteworthy that PCO efficiencies increased up to 94% for o-xylene and 97% for the m,p-xylene under lower SFR(0.5 L $min^{-1}$). Consequently, it is suggested that with appropriate SFR conditions, the visible-light-assisted photocatalytic systems could also become important tools for improving IAQ.

• Asian Journal of Atmospheric Environment
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• 제4권3호
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• pp.177-188
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• 2010

The use of an activated carbon (AC) system alone has the limitation that the pollutants are not eliminated but only transferred to another phase with the consumed AC becoming hazardous waste itself. Therefore, the present study investigated the feasibility of using a combined system of granular AC (GAC) with S-doped visible-light-induced $TiO_2$ (GAC/S-doped $TiO_2$) to clean monocyclic aromatic hydrocarbons (MAHs) with concentrations at $\leq$ 3 mg $m^{-3}$, using a continuous air-flow reactor. This study conducted three different experiments: an adsorption test of pure GAC and GAC/S-doped $TiO_2$; a long-term adsorptional photocatalytic (AP) activity test of GAC/S-doped $TiO_2$; and an AP activity test of GAC/S-doped $TiO_2$ under different conditions. For the AP activity test, three parameters were evaluated: various weights of GAC/S-doped $TiO_2$ (0.9, 4.4, and 8.9 g); various flow rates (FRs) (0.5, 1 and 2 L $min^{-1}$); and various input concentrations (ICs) of the target MAHs (0.1, 1, 2 and 3 mg $m^{-3}$). The adsorption efficiencies were similar for the pure GAC and GAC/S-doped $TiO_2$ reactors, suggesting that S-doped $TiO_2$ particles on GAC surfaces do not significantly interfere with the adsorption capacity of GAC. Benzene exhibited a clear AP activity, whereas no other target MAHs did. In most cases, the AP efficiencies for the target MAHs did not significantly vary with an increase in weight, thereby suggesting that, under the weight range tested in this study, the weights or FRs are not important parameters for AP efficiency. However, ICs did influence the AP efficiencies.

• 한국전기전자재료학회논문지
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• 제28권11호
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• pp.683-689
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• 2015

For the formation of $N^+$ doping, the antimony ions are mainly used for the fabrication of a BJT (bipolar junction transistor), CMOS (complementary metal oxide semiconductor), FET (field effect transistor) and BiCMOS (bipolar and complementary metal oxide semiconductor) process integration. Antimony is a heavy element and has relatively a low diffusion coefficient in silicon. Therefore, antimony is preferred as a candidate of ultra shallow junction for n type doping instead of arsenic implantation. Three-dimensional (3D) profiles of antimony are also compared one another from different tilt angles and incident energies under same dimensional conditions. The diffusion effect of antimony showed ORD (oxygen retarded diffusion) after thermal oxidation process. The interfacial effect of a $SiO_2/Si$ is influenced antimony diffusion and showed segregation effects during the oxidation process. The surface sputtering effect of antimony must be considered due to its heavy mass in the case of low energy and high dose conditions. The range of antimony implanted in amorphous and crystalline silicon are compared each other and its data and profiles also showed and explained after thermal annealing under inert $N_2$ gas and dry oxidation.

• 한국세라믹학회지
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• 제56권2호
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• pp.111-129
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• 2019

Recently, all-solid-state batteries (ASSBs) have attracted increasing interest owing to their higher energy density and safety. As the core material of ASSBs, the characteristics of the solid electrolyte largely determine the performance of the battery. Thus far, a variety of inorganic solid electrolytes have been studied, including the NASICON-type, LISICON-type, perovskite-type, garnet-type, glassy solid electrolyte, and so on. The garnet Li₇La₃Zr₂O₁₂ (LLZO) solid electrolyte is one of the most promising candidates because of its excellent comprehensively electrochemical performance. Both, experiments and theoretical calculations, show that cubic LLZO has high room-temperature ionic conductivity and good chemical stability while contacting with the lithium anode and most of the cathode materials. In this paper, the crystal structure, Li-ion transport mechanism, preparation method, and element doping of LLZO are introduced in detail based on the research progress in recent years. Then, the development prospects and challenges of LLZO as applied to ASSBs are discussed.

• 한국재료학회지
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• 제8권9호
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• pp.860-864
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• 1998

고상 반응법에 의해 제조된 $\textrm{Zn}_{1.98}\textrm{Mn}_{0.02}\textrm{SiO}_{4}$ 녹색 형광체에 Ga 원소를 치환시켜 소성온도 및 Ga의 첨가량에 따른 발광특성과 결정특성을 조사하였으나, $\textrm{Zn}_{1.98}\textrm{Mn}_{0.02}(\textrm{Si_{1-x}\textrm{Ga}_{x})\textrm{O}_{4}$ 형광체에 있어서 Ga을 첨가했을 경우가 첨가하지 않은 샘플에 비해 발광특성이 개선되었으며, 8mol%(x=0.08) Ga을 첨가했을 때 발광세기와 색순도에서 가장 우수한 특성을 보였다. $\textrm{Zn}_{1.98}\textrm{Mn}_{0.02}(\textrm{Si_{1-x}\textrm{Ga}_{x})\textrm{O}_{4}$ 형광체(x=0.08)에 대해서 소성온도를 $1100^{\circ}C$에서 $1400^{\circ}C$로 증가함에 따라 결정성이 개선되었으며 발광강도 역시 약 7배 이상 크게 증가하였다. 잔광시간은 Ga 첨가량에 관계없이 약 24 ms로 거의 변화가 없었다. 입도분석 결과 1-3$\mu\textrm{m}$의 작은 입자가 주로 관찰되었으며 10$\mu\textrm{m}$이상의 큰 응집입자도 소량 존재하였다.

• 한국콘텐츠학회:학술대회논문집
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• 한국콘텐츠학회 2008년도 춘계 종합학술대회 논문집
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• pp.301-305
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• 2008

유기 발광 다이오드(Organic light-emitting diode, OLED)는 저전력 구동, 자체발광, 넓은 시야각, 우수한 고해상도, 풀 칼라, 높은 재현성, 빠른 응답속도, 간편한 제조 공정 등의 장점을 가지고 있으나, 고성능 디스플레이로서 실용화하기 위해서는 아직도 해결되어야 할 과제가 많다. 소자의 저소비전력, 제조공정의 안정성, 대형 기판기술, 봉지 기술, 소자의 수명, 풀 컬러화를 위한 적색, 청색, 발광소자의 고휘도 등이 시급하다. 무엇보다 중요한 것은 유기 발광 소자의 효율을 향상시키는 것이 상용화를 위한 키(key) 이다. 이를 위해서 유기 발광 소자의 구조 개선과 새로운 유기 물질 적용을 통해 구동전압을 낮춤으로써 효율을 향상시킬 수 있다. 따라서 본 연구에서는 유기 발광 소자의 효율을 향상시킬 목적으로 ITO/TPD/Znq2+DCJTB/Znq2/Al의 구조와 ITO/CuPc/N PB/Alq3+DCJTB/Alq3/Al의 구조를 가지는 소자의 발광층에 형광염료를 도포한 적색 발광 소자를 제작하고, 그 전기적 및 광학적인 특성을 평가하였다.

• Mass Spectrometry Letters
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• 제12권2호
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• pp.47-52
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• 2021

Evaluating the impurity concentrations in semiconductor thin films using time of flight secondary ion mass spectrometry (ToF-SIMS) is an effective technique. The mass interference between isotopes and matrix element in data interpretation makes the process complex. In this study, we have investigated the doping concentration of phosphorus in, phosphorus doped silicon thin film on glass using ToF-SIMS in the dynamic mode of operation. To overcome the mass interference between phosphorus and silicon isotopes, the quantitative analysis of counts to concentration conversion was done following two routes, standard relative sensitivity factor (RSF) and SIMetric software estimation. Phosphorus doped silicon thin film of 180 nm was grown on glass substrate using hot wire chemical vapor deposition technique for possible applications in optoelectronic devices. Using ToF-SIMS, the phosphorus-31 isotopes were detected in the range of 10¹~10⁴ counts. The silicon isotopes matrix element was measured from p-type silicon wafer from a separate measurement to avoid mass interference. For the both procedures, the phosphorus concentration versus depth profiles were plotted which agree with a percent difference of about 3% at 100 nm depth. The concentration of phosphorus in silicon was determined in the range of 10¹⁹~10²¹ atoms/cm³. The technique will be useful for estimating distributions of various dopants in the silicon thin film grown on glass using ToF-SIMS overcoming the mass interference between isotopes.

• Journal of Welding and Joining
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• 제9권3호
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• pp.26-33
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• 1991

As it takes very long time for the Transient Liquid Phase(TLP) bonding, we tried to reduce the bonding time by changing insert material for the high diffusivity element. On this study boron powder was doped as a insert material on the bonding surface of Rene 80 superalloy, and diffusion treated at 1150.deg.C under vacuum. On this method differently from the TLP bonding the insert material was not melted during bonding but only the base metal reacted with the boron was inducedly melted. Therefore, as this bonding mechanism is different from the existing ones, it is suggested as a Melting Induced Diffusion Bonding. When this process was used for the diffusion bonding, the bonding time including homogenization decreased greatly compared to the conventional TLP bonding.

• Mass Spectrometry Letters
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• 제12권1호
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• pp.26-30
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• 2021

The impurity concentration is a crucial parameter for semiconductor thin films. Evaluating the impurity distribution in silicon thin film is another challenge. In this study, we have investigated the doping concentration of boron in silicon thin film using time of flight secondary ion mass spectrometry in dynamic mode of operation. Boron doped silicon film was grown on i) p-type silicon wafer and ii) borosilicate glass using hot wire chemical vapor deposition technique for possible applications in optoelectronic devices. Using well-tuned SIMS measurement recipe, we have detected the boron counts 101~104 along with the silicon matrix element. The secondary ion beam sputtering area, sputtering duration and mass analyser analysing duration were used as key variables for the tuning of the recipe. The quantitative analysis of counts to concentration conversion was done following standard relative sensitivity factor. The concentration of boron in silicon was determined 1017~1021 atoms/㎤. The technique will be useful for evaluating distributions of various dopants (arsenic, phosphorous, bismuth etc.) in silicon thin film efficiently.

• 한국환경과학회지
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• 제18권11호
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• pp.1215-1224
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• 2009

This study evaluated the applicability of visible-light-driven N- and S-doped titanium dioxide($TiO_2$) for the control of low-level dimethyl sulfide(DMS) and dimethyl disulfide(DMDS). In addition, a photocatalytic unit(PU)-adsorption hybrid was evaluated in order to examine the removal of DMS and DMDS which exited the PU and a gaseous photocatalytic byproduct($SO_2$) which was generated during the photocatalytic processes. Fourier-Tranform-Infrared(FTIR) spectrum exhibited different surface characteristics among the three-types of catalysts. For the N- and S-doped $TiO_2$ powders, a shift of the absorbance spectrum towards the visible-light region was observed. The absorption edge for both the N- and S-doped $TiO_2$ was shifted to $\lambda$ 720 nm. The N-doped $TiO_2$ was superior to the S-doped $TiO_2$ in regards to DMS degradation. Under low input concentration(IC) conditions(0.039 and 0.027 ppm for DMS and DMDS, respectively), the N-doped $TiO_2$ revealed a high DMS removal efficiency(above 95%), but a gradual decreasing removal efficiency under high IC conditions(7.8 and 5.4 ppm for DMS and DMDS, respectively). Although the hybrid system exhibited a superior characteristic to PU alone regarding the removal efficiencies of both DMS and DMDS, this capability decreased during the course of a photocatalytic process under the high IC conditions. The present study identified the generation of sulfate ion on the catalyst surface and sulfur dioxide(maximum concentrations of 0.0019 and 0.0074 ppm for the photocatalytic processes of DMS and DMDS, respectively) in effluent gas of PU. However, this generation of $TiO_2$ would be an insignificant addition to indoor air quality levels.