• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.24-25
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• 2011

Molecular self-assembly has several advantages over other nanofabrication methods. Molecular building blocks ensure ultrafine pattern precision, parallel structure formation allows for mass production and a variety of three-dimensional structures are available for fabricating complex structures. Nevertheless, the molecular interaction for self-assembly generally relies on weak forces such as van der Waals force, hydrogen bonding, or hydrophobic interaction. Due to the weak interaction, the structure formation is usually slow and the degree of ordering is low in a self-assembled structure. To promote self-assembly, directed assembly methods employing prepatterned substrates or external fields have been developed and gathered a great deal of technological attention as a next generation nanofabrication process. In this presentation a variety of directed assembly methods for soft nanomaterials including block copolymers, peptides and carbon nanomaterials will be introduced. Block copolymers are representative self-assembling materials extensively utilized in nanofabrication. In contrast to colloid assembly or anodized metal oxides, various shapes of nanostructures, including lines or interconnected networks, can be generated with a precise tunability over their shape and size. Applying prepatterned substrates$^{1,2}$ or introducing thickness modulation$^3$ to block copolymer thin films allowed for the control over the orientational and positional orderings of self-assembled structures. The nanofabrication processes for metals, semiconductors$^4$, carbon nanotubes$^{5,6}$, and graphene$^{6,7}$ templating block copolymer self-assembly will be presented.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.2015-2018
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• 2005

In this paper, we are willing to prepare the reasonable optimization, Combinatorial Optimization and Genetic Algorithm. Thus we define position status of end-effect (or terminative link module) using promised form, (G, M(G), A(G), and so on.). For this preparing step, the reorganizing procedure of Link and Joint Module is necessary, like as enumerating the kinematically identical assembly group of several links and joints. Thus, we draw a G, directed graph in a first step. Because, directed graph contains the path information between adjacent Link Module and Joint Module. From the directed graph,G, we can incite the Incidence Matrix, M(G). The incidence matrix, M(G), contains the contact information of the Link (Joint) Module and the type of Link (Joint). At the end of this paper, we generalize the modular information as a matrix form, A(G). From this matrix, we can make a population of assembly status. That is the finial output of this paper.

• Proceedings of the Materials Research Society of Korea Conference
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• 2007.11a
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• pp.149.1-149.1
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• 2007

• Biotechnology and Bioprocess Engineering:BBE
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• v.3 no.2
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• pp.67-70
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• 1998

In order to understand the influence of ferroxidase center on the protein assembly and solubility of tadpole ferrin, three mutant plasmids, pTH58K, pTH61G, and pTHKG were constructed with the aid of site-directed mutagenesis and mutant proteins were produced in Eshcerichia coli. Mutant ferritin H-subunits produced by the cells carrying plasmids pTH58K and pTHKG were active soluble proteins, whereas the mutant obtained from the plasmid pTH61G was soluble only under osmotic stress in the presence obtained from the plasmid pTH61G was soluble only under osmotic stress in the presence of sorbitol and betaine. Especially, the cells carrying pTH61G together with the plasmid pGroESL harboring the molecular chaperone genes produced soluble ferritin. The mutant ferritin H-subunits were all assembled into ferritin-like holoproteins. These mutant ferritns were capable of forming stable iron cores, which means the mutants are able to accumulate iron with such modified ferroxidase sites. Further functional analysis was also made on the individual amino acid residues of ferroxidase center.

• The Journal of the Korea Contents Association
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• v.8 no.6
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• pp.82-88
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• 2008

ARM processors are being utilized in a variety of embedded systems. It is also that most ARM processor accepts C application, and then generates ARM assembly code using GNU gcc Cross-compiler. For the purpose of improving the quality of code generated and the efficient code generation, the various researches are underway. In this paper, we generates the ARM assembly code from the ANSI C programs using Syntax-directed Translation Techniques, and then the performance evaluation results for our research experimental compare to GNU gcc Cross-compiler are described. The techniques are presented in this research compared to GNU gcc cross-compiler very simple and convenient in extension of the production rules.

• Journal of Korean Institute of Industrial Engineers
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• v.28 no.3
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• pp.264-273
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• 2002

This paper focuses on disassembly sequencing, which is the problem of determining the optimum disassembly level and the corresponding disassembly sequence for a product at its end-of-life with the objective of maximizing the overall profit. In particular, sequence-dependent operation times, which frequently occur in practice due to tool-changeover, part reorientation, etc, are considered in the parallel disassembly environment. To represent the problem, a modified directed graph of assembly states is suggested as an extension of the existing extended process graph. Based on the directed graph, the problem is transformed into the shortest path problem and formulated as a linear programming model that can be solved straightforwardly with standard techniques. A case study on a photocopier was done and the results are reported.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.10a
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• pp.9-9
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• 2011

The transfer of nano-science accomplishments into technology is severely hindered by a lack of understanding of barriers to nanoscale manufacturing. The NSF Center for High-rate Nanomanufacturing (CHN) is developing tools and processes to conduct fast massive directed assembly of nanoscale elements by controlling the forces required to assemble, detach, and transfer nanoelements at high rates and over large areas. The center has developed templates with nanofeatures to direct the assembly of carbon nanotubes and nanoparticles (down to 10 nm) into nanoscale trenches in a short time (in seconds) and over a large area (measured in inches). The center has demonstrated that nanotemplates can be used to pattern conducting polymers and that the patterned polymer can be transferred onto a second polymer substrate. Recently, a fast and highly scalable process for fabricating interconnects from CMOS and other types of interconnects has been developed using metallic nanoparticles. The particles are precisely assembled into the vias from the suspension and then fused in a room temperature process creating nanoscale interconnect. The center has many applications where the technology has been demonstrated. For example, the nonvolatile memory switches using (SWNTs) or molecules assembled on a wafer level. A new biosensor chip (0.02 $mm^2$) capable of detecting multiple biomarkers simultaneously and can be in vitro and in vivo with a detection limit that's 200 times lower than current technology. The center has developed the fundamental science and engineering platform necessary to manufacture a wide array of applications ranging from electronics, energy, and materials to biotechnology.

• Polymer Science and Technology
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• v.19 no.2
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• pp.152-159
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• 2008

• Korean Chemical Engineering Research
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• v.46 no.1
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• pp.1-6
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• 2008

Block copolymers spontaneously assemble into various nanoscale structures such as spheres, cylinders, and lamellar structures according to the relative volumn ratio of each macromolecular block and their overall molecular weights. The self-assembled structures of block copolymer have been extensively investigated for the applications such as nanocomposites, photonic crystals, nanowires, magnetic-storage media, flash memory devices. However, the naturally formed nanostructures of block copolymers contain a high density of defects such that the practical applications for nanoscale devices have been limited. For the practical application of block copolymer nanostructures, a robust process to direct the assembly of block copolymers in thin film geometry is required to be established. To exploit self-assembly of block copolymer for the nanotechnology, it is indispensible to fabricate defect-free self-assembled nanostructure over an arbitrarily large area.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.301-301
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• 2011

We present theoretical investigations of the self-assembled growth of one-dimensional (1D) molecular lines directed across the dimer rows on the H-terminated Si(001) surface [1]. Based on density-functional theory calculations, a new growth mechanism of the 1D acetylacetone line is proposed [2], which involves the radical chain reaction initiated at two dangling-bond sites on one side of two adjacent Si dimers. It is also enabled that, if an H-free Si dimer were employed as the initial reaction site, a 1D acetylacetone line can grow along the dimer row. Our findings represent the first insight into the growth of 1D molecular lines not only across but also along the dimer rows on the H-terminated Si(001) surface.