• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.2 no.2
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• pp.87-96
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• 2004

Studies were conducted to select the candidate buffer material for a high-level waste (HLW) repository in Korea. This paper presents the hydraulic properties, the swelling properties, the thermal properties, and the mechanical properties as well as the radionuclide release-retarding capacity of Kyungju bentonite as part of those studies. Experimental results showed that the hydraulic conductivities of the compacted bentonite were very low and less than $10^{-11}$m/s. The values decreased with increasing the dry density of the compacted bentonite. The swelling pressures were in the range of 0.66 MPa to 14.4 ㎫ and they increased with increasing the dry density. The thermal conductivities were in the range of 0.80 ㎉/m $h^{\circ}C$ to 1.52 ㎉/m $h^{\circ}C$. The unconfined compressive strength, Young's modulus and Poison's ratio showed the range of 0.55 ㎫ to 8.83 ㎫, 59 ㎫ to 1275 ㎫, and 0.05 to 0.20, respectively, when the dry densities of the compacted bentonite were 1.4 Ms/㎥ to 1.8 Mg/㎥. The diffusion coefficients in the compacted bentonite were measured under an oxidizing condition. The values were $1.7{\times}10^{-10}$m^2$/s to 3.4{\times}10^{-10}$m^2$/s for electrically neutral tritium (H-3), 8.6{\times}10^{-14}$m^2$/s to 1.3{\times}10^{-12}$m^2$/s for cations (Cs, Sr, Ni), 1.2{\times}10^{-11}$m^2$/s to 9.5{\times}10^{-11}$m^2$/s for anions (I, Tc), and 3.0{\times}10^{-14} $m^2$/s to 1.8{\times}10^{-13}$m^2$/s $for actinides (U, Am), when tile dry densities were in the range of 1.2 Mg/㎥ to 1.8 Mg/㎥. The obtained results will be used in assessing the barrier properties of Kyungju bentonite as a buffer material of a repository in Korea.n Korea.

• Applied Chemistry for Engineering
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• v.8 no.4
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• pp.560-567
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• 1997

A new approach to obtain stable $W_1/O/W_2$ multiple emulsions has been studied ; The basis of the interfacial interaction between a PCL-PEO-PCL triblock copolymer and a lipophilic emulsifier in the dispersed oil phase was examined. $W_1/O/W_2$ multiple emulsions were prepared by the two-step method. Arlacel P-l35 was used as a liphophilic emulsifier and Synperonic PE/F 127 as a hydrophilic one. Eutanol-G was used as an oil phase. NaCl was encapsulated within the multiple emulsion droplets as the internal marker and its release rate studies were carried out. The suability of the multiple emulsions have been assessed by measuring Separation Ratios(%) and microscopic observations. The release of NaCl was significantly reduced in $W_1/O/W_2$ multiple emulsions containing PCL-PEO-PCL triblock copolymer(2k-4k-2k or 6k-4k-6k) in the oil phase. It may be concluded that the copolymer and the emulsifier form effective interfacial complex to enhance stability and to control the release rate. The effective diffusion coefficients of the NaCl were estimated as $2.64{\times}10^{-15}s$and $3.23{\times}10^{-16}gcm^2/s$ for the $W_1/O/W_2$ multiple emulsion containing 1.2 wt % of PCL-PEO-PCL triblock copolymers with compositions of 2k-4k-2k and 6k-4k-2k, respectively. The rate of release decreased with the increase of the initial concentration of NaCl. The results were examined in view of Higuchi mechanism. A kinetic model which is similar to the model for release of dispersed drugs from a polymeric matrix was found to be suitable for the release of NaCl from $W_1/O/W_2$ multiple emulsions.

• Journal of Soil and Groundwater Environment
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• v.11 no.6
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• pp.53-60
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• 2006

Single well injection withdrawal tracer tests with bromide were carried out at two wells developed in a horizontally heterogeneous fractured rock. The hydraulic conductivity of TW-1 well was 5 times larger than TW-2 well, and the average linear velocity of TW-2 well was 1.8 times faster than TW-1 well. The difference of hydrodynamic dispersions of two wells in the fractured rock was studied with the analysis of concentration breakthrough curves and cumulative mass recovery curves of bromide with withdrawal time, and the estimation of average travel distance, pore velocity, longitudinal dispersivity and longitudinal dispersion coefficient. The average travel distances of bromide were estimated to be 3.00 m in TW-1 well and 5.62 m in TW-2 well. The average pore velocities for the injection/withdrawal phase were estimated to be $4.31\;{\times}\;10^{-4}\;m/sec$ in TW-1 well and $8.08\;{\times}\;10^{-4}\;m/sec$ in TW-2 well. Average travel distance and pore velocity were higher in TW-2 well because of small effective porosity. Longitudinal dispersivities were estimated to be 28.73 cm in TW-1 well and 18.49 cm in TW-2 well, and bromide transport was 1.55 times faster in TW-1 well. Longitudinal dispersion coefficients were estimated to be $5.14\;{\times}\;10^{-6}\;m^2/sec$ in TW-1 well and $6.06\;{\times}\;10^{-6}\;m^2/sec$ in TW-2 well, and diffusion area was 1.18 times larger in TW-2 well.

• Journal of the Korean Chemical Society
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• v.33 no.1
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• pp.55-64
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• 1989

Reduction and equilibrium of vanadium-DTPA (DTPA = diethylenetriaminepentaacetic acid, $H_5A$) complexes at mercury electrodes are studied in 0.5M $NaClO_4$ aqueous solution at 3.2 < pH < 10.5 and 25$^{\circ}$C. At 3.2 < pH < 5.9, the reduction reaction is $V{\cdot}A^{2-}+H^-+e^-=V{\cdot}HA^{2-}$, while at 5.9 < pH < 10.5 it is $V{\cdot}A^{2-}+H^-+e^-=V{\cdot}A^{3-}$. The stability constants of $V{\cdot}HA^{2-}$ and $V{\cdot}A^{3-}$ are found to be $6.46{\times}10^{9}$ and $3.09{\times}10^{14}$, respectively. V(IV)-DTPA undergoes stepwise complexation as $VO^{2+}+H_2A^{3-}=VO{\cdot}HA^{2+}H^{+}$ and $VO{\cdot}HA^{2-}=VO{\cdot}A^{3+}+H$, where acidity constant of $VO{\cdot}HA^{2-}$- is pKa = 7.15. Stability constants of $VO{\cdot}HA^{2-}$ and $VO{\cdot}A^{3-}$ are found to be $1.41{\times}10^{14}$ and $3.80{\times}10^{17}$, respectively. It is detected that $VO^{2+}-DATA$ is reduced irreversibly to $VO^{2-}$ with the transfer coefficient of $\alpha$ = 0.43. At more cathodic overpotential, the reduction is stepwise as V(IV)${\to}$V(III)${\to}$V(II). The first one corresponds to $VO{\cdot}HA^{2-}+e^{-}{\to}VO{\cdot}HA{3+}$ at 3.2 < pH < 7.2 and $VO{\cdot}A^{3-}+e^{-}{\to}VO{\cdot}A^{4-}$ at 7.2 < pH < 10.5. The second is identical to that of V(III). Diffusion coefficients of $VO{\cdot}HA^{2-}$ and $VO{\cdot}A^{3-}$ are found to be $(9.0{\pm}0.3){\times}10^{-6}cm^2/s$ and $(5.9{\pm}0.4){\times}10^{-6}cm^2/ses$, respectively.

• Journal of the Microelectronics and Packaging Society
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• v.31 no.2
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• pp.54-62
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• 2024

SICM (Scanning Ion Conductivity Microscopy) is a technique for measuring surface topography in an environment where electrochemical reactions occur, by detecting changes in ion conductivity as a nanopipette tip approaches the sample. This study includes an investigation of the current response curve, known as the approach curve, according to the distance between the tip and the sample. First, a simulation analysis was conducted on the approach curves. Based on the simulation results, then, several measuring experiments were conducted concurrently to analyze the difference between the simulated and measured approach curves. The simulation analysis confirms that the current squeezing effect occurs as the distance between the tip and the sample approaches half the inner radius of the tip. However, through the calculations, the decrease in current density due to the simple reduction in ion channels was found to be much smaller compared to the current squeezing effect measured through actual experiments. This suggests that ion conductivity in nano-scale narrow channels does not simply follow the Nernst-Einstein relationship based on the diffusion coefficients, but also takes into account the fluidic hydrodynamic resistance at the interface created by the tip and the sample. It is expected that SICM can be combined with SECM (Scanning Electrochemical Microscopy) to overcome the limitations of SECM through consecutive measurement of the two techniques, thereby to strengthen the analysis of electrochemical surface reactivity. This could potentially provide groundbreaking help in understanding the local catalytic reactions in electroless plating and the behaviors of organic additives in electroplating for various kinds of patterns used in semiconductor damascene processes and packaging processes.