• 제목/요약/키워드: dielectric barrier

검색결과 464건 처리시간 0.031초

Structural Properties of Dielectric Barrier Reactor with Hole (DBH) for CF4 Decomposition

  • Jung Jung Gun;Kim Jong Suk;Park Jae Yoon;Kim Kwang Soo;Rim Geun Hie
    • Transactions on Electrical and Electronic Materials
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    • 제4권4호
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    • pp.30-35
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    • 2003
  • In this paper, the $CF_4$ decomposition efficiency is investigated for three simulated plasma reactors that are needle plate reactor, metal particle reactor, and dielectric barrier reactor with hole (DBH). The$CF_4$ decomposition efficiency by DBH is much better than that by needle plate reactor or metal particle reactor. When applied voltage is increased up to the critical voltage for spark formation in the all reactors, the $CF_4$ decomposition efficiency is increased. The $CF_4$ decomposition efficiency in needle plate reactor and metal particle reactor is about $12\%$ and $22\%$ respectively at applied voltage of 23 kV (consumption power: 110 W) and $CF_4$ concentration of 500 ppm, however, the $CF_4$ decomposition efficiency is more than $95\%$ in case of DBH. DBH should be much better than two reactors investigated for $CF_4$ decomposition.

대기압 RF DBD 방전으로 개질된 폴리이미드의 표면특성 (Surface Properties of Polyimide Modified with He/O2/NF3 Atmospheric Pressure RF Dielectric Barrier Discharge)

  • 이수빈;김윤기;김정순
    • 한국재료학회지
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    • 제16권9호
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    • pp.543-549
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    • 2006
  • Polyimides (PI) are treated with $He/O_2$ and $He/O_2/NF_3$ atmospheric pressure rf dielectric barrier discharge in order to investigate the roles of $NF_3$ that is one of the PI etching gases. Surface changes are analyzed by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and contact angle measurement. The surface roughness of PI and the ratio of C=O, which is hydrophilic functional group, is more increased by $He/O_2/NF_3$ discharge than by $He/O_2$ discharge. The C=O species on the PI surface is increased up to 30 percent with rf power. The surface roughness of PI is increased from 0.4 to 11 nm with rf power. The water drop contact angles on PI, however, are reduced from $65^{\circ}\;to\;9^{\circ}$ by plasma treatment independently of $NF_3$.

유전체 장벽 방전 플라즈마 반응기를 이용한 페놀 처리 (Phenol Treatment Plasma Reactor of Dielectric Barrier Discharge)

  • 박영식
    • 한국환경과학회지
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    • 제21권4호
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    • pp.479-488
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    • 2012
  • A Dielectric barrier discharge (DBD) plasma is shown in the present investigation to be effective of phenol degradation in the aqueous solutions in batch reactor with continuous air bubbling. Removal of phenol and effects of various parameters on the removal efficiency in the aqueous solution with high-voltage streamer discharge plasma are studied. The effect of 1st voltage (80 ~ 220 V), air flow rate (3 ~ 7 L/min), pH (3 ~ 11), electric conductivity of solution (4.16 ${\mu}S$/cm, deionized water) ~ 16.57 mS/cm (addition of NaCl 10 g/L) and initial phenol concentration (2.5 ~ 20.0 mg/L) were investigated. The observed results showed that phenol degradation was higher in the basic solution than that of the acidic. The optimum values on the 1st voltage and air flow rate for phenol degradation were 140 V and 6 L/min, respectively. It was considered that absorbance variation of $UV_{254}$ of phenol solution can be use as an indirect indicator of change of the non-biodegradable organic compounds within the treated phenol solution. Electric conductivity was not influenced the phenol degradation. To obtain the removal efficiency of phenol and COD of phenol over 97 % (initial phenol concentration, 10.0 mg/L), 80 min and 120 min were need, respectively. Phenol and COD degradation showed a pseudo-first order kinetics.

활성탄 또는 촉매가 장착된 배리어 유전체 방전 하이브리드. 공기청정 시스템의 나노입자 및 잔류 오존 제거 특성 (Nano Particle Precipitation and Residual Ozone Decomposition of a Hybrid Air Cleaning System Comprising Dielectric Barrier Discharge Plasma and MnO2 Catalyst or Activated Carbon)

  • 변정훈;황정호;지준호;강석훈
    • 대한기계학회논문집B
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    • 제27권4호
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    • pp.524-533
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    • 2003
  • DBD(Dielectric Barrier Discharge) plasma in air is well established for the production of large quantities of ozone and is more recently being applied to aftertreatment processes for HAPs(Hazardous Air Pollutants). Aim of this work is to determine design and operating parameters of a hybrid air cleaning system. DBD and ESP(Electrostatic Precipitator) are used as nano particle charger and collector, respectively. Pelletized MnO$_2$ catalyst or activated carbon is used fer ozone decomposition or adsorption material. AC voltage of 7~10 KV(rms) and 60 Hz is used as DBD plasma source. DC - 8 KV is applied to the ESP for particle collection. The overall particle collection efficiency for the hybrid system is over 85 % under 0.64 m/s face velocity. Ozone decomposition efficiency with pelletized MnO$_2$ catalyst or activated carbon packed bed is over 90 % when the face velocity is under 0.4 m/s in dry air.

대기압 유전체배리어방전의 발광특성 (Optical Emission Characteristics of Atmospheric Pressure Dielectric Barrier Discharge)

  • 김진기;김윤기
    • 한국재료학회지
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    • 제25권2호
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    • pp.100-106
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    • 2015
  • Plasma properties of dielectric barrier discharges (DBDs) at atmospheric pressure were measured and characterized using optical emission spectroscopy. Optical emissions were measured from argon, nitrogen, or air discharges generated at 5-9 kV using 20 kHz power supply. Emissions from nitrogen molecules were markedly measured, irrespective of discharge gases. The intensity of emission peaks was increased with applied voltage and electrode gap. The short wavelength peaks (315.9 nm and 337.1 nm) measured at the middle of DBDs were significantly increased with applied voltage. The optical emission from DBDs decreased with the addition of oxygen gas, which was especially significant in argon discharge. Emission from oxygen molecules cannot be measured from air discharge and argon discharge with 4.8% oxygen. The emission intensity at 337.1 nm and 357.7 nm related with nitrogen molecule was sensitively changed with electrode types and discharge voltages. However, the pattern of argon emission spectrum was nearly the same, irrespective of electrode type, oxygen content, and discharge voltage.

Pulse Density Modulated ZVS High Frequency Inverter with Reverse Blocking Single Switch for Dielectric Barrier Discharge Lamp Dimming

  • Sugimura Hisayuki;Yasui Kenji;Omori Hideki;Lee Hyun-Woo;Nakaoka Mutsuo
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2006년도 전력전자학술대회 논문집
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    • pp.206-209
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    • 2006
  • At present, the cold cathode fluorescent lamp (CCFL) using mercury lamp has been generally used far liquid crystal backlight source of personal computer and car navigation and so on. This kind of lamp is more excellent on luminance performance and cost. However, the requirements of liquid crystal backlight due to a light source without mercury have been strongly increased from a viewpoint of the actual influence on environmental preservation and environmental recycling. As fluorescent lamp without mercury, Dielectric Barrier Discharge based rare gas fluorescent lamp (DBD-FL) using xenon (Xe) gas has been studied so far. This DBD lamp has no influence on the human body and environmental recycle. Its operating life is long because electrode is out. In this paper, the simulation and experimental results of soft switching high frequency inverter with reverse blocking single switch as a high frequency power supply circuit for DBD-FL using Xe gas are comparatively evaluated and discussed from a practical point of view.

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유전체장벽방전 플라즈마에 의한 주요식중독세균의 살균 효과 (Antibacterial Activity of Dielectric Barrier Discharge Plasma against Main Food-borne Bacteria in Suspensions)

  • 최만석;김지윤;전은비;박신영
    • 한국수산과학회지
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    • 제52권6호
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    • pp.617-624
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    • 2019
  • Dielectric barrier discharge (DBD) plasma is one of the promising next generation non-thermal technologies for food sterilization. The present study investigated the effects of DBD plasma on the reduction of most common food-borne pathogenic bacteria (Staphylococcus aureus, Bacillus cereus, Vibrio parahaemolyticus, Salmonella enterica) and sanitary indicative bacteria (Escherichia coli) in the suspension (initial inoculum of approx. 9 log CFU/mL). The bacterial counts were significantly (P<0.05) reduced with the increase in the treatment time (1-30 min) of DBD plasma in the suspension. The D-values (time for 90% reduction) of DBD plasma by first-order kinetics for S. aureus, B. cereus, V. parahaemolyticus, S. enterica, and E. coli were 17.76, 19.96, 32.89, 21.55, and 15.24 min, respectively (R2>0.90). These results specifically showed that 30 min of DBD plasma treatment in > 90% reduction of seafood-borne pathogenic and sanitary indicative bacteria. This suspension study may provide the basic data for use in seafood processing and distribution.

대기압 플라즈마 정밀 Etching 기술 개발

  • 임찬주;김윤환;이상로;악흔
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.263-263
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    • 2011
  • 본 연구에서는 DBD (Dielectric Barrier Discharge)방식의 상압 플라즈마를 이용하여 FPD (flat panel display) 공정에 사용되는 a-Si, Si3N4의 식각 공정 특성을 평가하였다. 사용된 DBD 반응기는 기존의 blank planar plate 형태의 Power가 인가되는 anode 부분과 Dielectric Barrier 사이 공간을 액상의 도전체로 채워 넣은 형태의 전극이 사용 하였으며, 인가 Power는 40kHz AC 최대인가 전압 15 kVp를 사용 하였다. 방전 가스는 N2, 반응가스로는 CDA (Clean Dry Air)와 NF3, 액상의 Etchant를 사용 하였으며 모든 공정은 In-line type으로 시편을 처리 하였다. NF3의 경우 30 mm/sec 이송속도 1회 처리 기준 a-Si 1300${\AA}$, Si3N4 1900${\AA}$의 식각 두께를 보였으며 a-Si : Si3N4 선택비는 N2, CDA의 조절을 통하여 최대 1:2에서 4:1 정도까지 변화가 가능하였다. 균일도는 G2 (370 mm${\times}$470 mm)의 경우 5.8 %의 균일도를 보이고 있다. 이외에도 NF3 공정의 경우 실제 TFT-LCD 공정 중 n+ channel (n+ a-Si:H)식각 공정에 적용하여 5.5 inch LCD panel feasibility를 확인 할 수 있었다. 액상 Etchant (HF수용액, NH4HF2)는 버블러를 사용하여 기화 시켜 플라즈마 소스를 통해 1차적으로 활성화 시키고 기존 DBD 반응기에 공급해 주는 형태로 평가를 진행하였다. 식각 특성은 30mm/sec 이송속도에서 a-Si $25{\AA}$ 정도로 가스 형태의 Etchant에 비해 매우 낮은 수준이나 Etching rate 향상을 위한 factor 파악 및 개선을 위한 연구를 진행 하였다.

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비휘발성 메모리 적용을 위한 $SiO_2/ZrO_2$ 다층 유전막의 전기적 특성 (Electrical characteristic of stacked $SiO_2/ZrO_2$ for nonvolatile memory application as gate dielectric)

  • 박군호;김관수;오준석;정종완;조원주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.134-135
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    • 2008
  • Ultra-thin $SiO_2/ZrO_2$ dielectrics were deposited by atomic layer chemical vapor deposition (ALCVD) method for non-volatile memory application. Metal-oxide-semiconductor (MOS) capacitors were fabricated by stacking ultra-thin $SiO_2$ and $ZrO_2$ dielectrics. It is found that the tunneling current through the stacked dielectric at the high voltage is lager than that through the conventional silicon oxide barrier. On the other hand, the tunneling leakage current at low voltages is suppressed. Therefore, the use of ultra-thin $SiO_2/ZrO_2$ dielectrics as a tunneling barrier is promising for the future high integrated non-volatile memory.

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실린더 내부 유전체 장벽방전에 의해 발생된 추력 측정 (Measurement of Thrust Induced by the Dielectric Barrier Discharge in Cylinder Pipes)

  • 주찬규;김종훈
    • 항공우주시스템공학회지
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    • 제11권6호
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    • pp.56-63
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    • 2017
  • 유전체 장벽방전에 의해 발생되는 추력을 실린더 형상의 파이프 내부에서 여러 조건에 대해 측정하였다. 입력 전압 및 주파수는 각각 2에서 9 kVpp 및 5에서 15 kHz를 적용하였으며, 높이가 50 mm부터 100 mm 범위의 실린더에 대해 실험을 수행하였다. 측정 결과에 따르면, 발생된 추력의 크기는 전압 및 주파수를 증가시킬 경우 각각 증가하였으나 실린더의 높이가 증가하면 감소하였다. 실린더 높이가 증가할 때 발생된 추력의 감소는 벽면과의 마찰로 인한 유동의 에너지 손실이 원인이지만, $Coand\check{a}$ 효과의 감소 등 그 외의 추가적인 원인이 있다고 추정된다.