• Composites Research
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• v.36 no.3
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• pp.180-185
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• 2023

This paper investigates the impact of fiber dispersion on the internal structure and mechanical strength of SiC_f/SiC composites manufactured using spread SiC fibers. The fiber volume ratio of the specimen to which spread SiC fiber was applied decreased by 9%p compared to the non-spread specimen, and the resin slurry impregnated between the fibers more smoothly, resulting in minimal matrix porosity. In order to compare the fiber dispersion of each specimen, a method was proposed to quantify and evaluate the separation distance between fibers in composite materials. The results showed that the distance between fibers in the spread specimen increased by 2.23 ㎛ compared to the non-spread specimen, with a significant 42.6% increase in the distance between fiber surfaces. Furthermore, the 3pt bending test demonstrated a 49.3% higher flexural strength in the spread specimen, accompanied by a more uniform deviation in test data. These findings highlight the significant influence of SiC fiber dispersion on achieving uniform densification of the SiC_f/SiC matrix and increasing mechanical strength.

• Journal of the Microelectronics and Packaging Society
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• v.14 no.4
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• pp.43-48
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• 2007

This study is focused on the effect of the surface properties for the post electrode, which is used in pad formation consisted of SMT such as IC, passive component, combined with fired LTCC substrate, We carried out the surface microstructure of sintered electrode and the basic reliability evaluations with sample fired by microwave sintering to solve the problems occurred in post electrode by electric sintering. We evaluated surface densification status of post electrode according to various conditions of microwave sintering. In additions, it is obtained strong effect on blister improvement of post electrode because of over-sintering and the insufficient out gas in bum out process. As a result of adhesion strength, we confirmed $44.3N/mm^2$ in microwave sintering and $34.5N/mm^2$ in electric sintering, respectively. This result will be used for the basic reliability test. Finally, microwave sintering seems to be economic in process time with 30 min compared to electric sintering with 10 hr. In terms of Mass production and efficiency, microwave sintering are excepted to be higher than electric sintering.

• Journal of the Korea institute for structural maintenance and inspection
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• v.21 no.4
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• pp.53-60
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• 2017

Fly ash(FA) which is a byproduct in the coal combustion in thermal power plant contributes to pore structure densification due to pozzolanic reaction, and this leads to long-term strength development and excellent resistance to chloride penetration. In the work, compressive strength and chloride resistance in OPC(Ordinary Portland Cement) and FA-based concrete are evaluated, and the relationships are investigated considering ages. For the work, 3 different W/B (Water to Binder) ratios of 37%, 42%, and 47% are prepared, and 3 substitution ratio of fly ash(0%, 30%, and 50%) are considered as well. At the age of 28 days and 180 days, test results of compressive strength, diffusion coefficients based on Tang's method, and passed charges referred to ASTM C 1202 and KS F 2711 are obtained. With increasing replacement ratio of FA and decreasing W/B, the resistances to chlorides(diffusion coefficient and passed charge) are improved, and the results at the age of 180 days decrease to only 15% level at the age of 28 days due to pozzolanic reaction in FA 50 mixture, which shows that resistance to chloride is much dependent on age effect than strength development. After 180 days, more clear linear relationships are observed between strength and resistance to chloride.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.236-236
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• 2008

(Bi,La)$Ti_3O_{12}$(BLT) thin film is one of the most attractive materials for ferroelectric random access memory (FRAM) applications due to its some excellent properties such as high fatigue endurance, low processing temperature, and large remanent polarization [1-2]. The authors firstly investigated and reported the damascene process of chemical mechanical polishing (CMP) for BLT thin film capacitor on behalf of plasma etching process for fabrication of FRAM [3]. CMP process could prepare the BLT capacitors with the superior process efficiency to the plasma etching process without the well-known problems such as plasma damages and sloped sidewall, which was enough to apply to the fabrication of FRAM [2]. BLT-CMP characteristics showed the typical oxide-CMP characteristics which were related in both pressure and velocity according to Preston's equation and Hernandez's power law [2-4]. Good surface roughness was also obtained for the densification of multilevel memory structure by CMP process [3]. The well prepared BLT capacitors fabricated by CMP process should have the sufficient ferroelectric properties for FRAM; therefore, in this study the electrical properties of the BLT capacitor fabricated by CMP process were analyzed with the process parameters. Especially, the effects of CMP pressure, which had mainly affected the removal rate of BLT thin films [2], on the electrical properties were investigated. In order to check the influences of the pressure in eMP process on the ferroelectric properties of BLT thin films, the electrical test of the BLT capacitors was performed. The polarization-voltage (P-V) characteristics show a decreased the remanent polarization (Pr) value when CMP process was performed with the high pressure. The shape of the hysteresis loop is close to typical loop of BLT thin films in case of the specimen after CMP process with the pressures of 4.9 kPa; however, the shape of the hysteresis loop is not saturated due to high leakage current caused by structural and/or chemical damages in case of the specimen after CMP process with the pressures of 29.4 kPa. The leakage current density obtained with positive bias is one order lower than that with negative bias in case of 29.4 kPa, which was one or two order higher than in case of 4.9 kPa. The high pressure condition was not suitable for the damascene process of BLT thin films due to the defects in electrical properties although the better efficiency of process. by higher removal rate of BLT thin films was obtained with the high pressure of 29.4 kPa in the previous study [2].

• Journal of the Korean institute of surface engineering
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• v.56 no.6
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• pp.412-419
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• 2023

Anion exchange membrane electrolysis is considered a promising next-generation hydrogen production technology that can produce low-cost, clean hydrogen. However, anion exchange membrane electrolysis technology is in its early stages of development and requires intensive research on electrodes, which are a key component of the catalyst-system interface. In this study, we optimized the pressure conditions of the hot-pressing process to manufacture cobalt oxide electrodes for the development of a high uniformity and high adhesion electrode production process for the oxygen evolution reaction. As the pressure increased, the reduction of pores within the electrode and increased densification of catalytic particles led to the formation of a uniform electrode surface. The cobalt oxide electrode optimized for pressure conditions exhibited improved catalytic activity and durability. The optimized electrode was used as the anode in an AEMWE single cell, exhibiting a current density of 1.53 A cm^-2 at a cell voltage of 1.85 V. In a durability test conducted for 100 h at a constant current density of 500 mA cm^-2, it demonstrated excellent durability with a low degradation rate of 15.9 mV kh^-1, maintaining 99% of its initial performance.