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Annealing temperature dependence on the positive bias stability of IGZO thin-film transistors

  • Shin, Hyun-Soo;Ahn, Byung-Du;Rim, You-Seung;Kim, Hyun-Jae
    • Journal of Information Display
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    • v.12 no.4
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    • pp.209-212
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    • 2011
  • The threshold voltage shift (${\Delta}V_{th}$) under positive-voltage bias stress (PBS) of InGaZnO (IGZO) thin-film transistors (TFTs) annealed at different temperatures in air was investigated. The dramatic degradation of the electrical performance was observed at the sample that was annealed at $700^{\circ}C$. The degradation of the saturation mobility (${\mu}_{sat}$) resulted from the diffusion of indium atoms into the interface of the IGZO/gate insulator after crystallization, and the degradation of the subthreshold slope (S-factor) was due to the increase in the interfacial and bulk trap density. In spite of the degradation of the electrical performance of the sample that was annealed at $700^{\circ}C$, it showed a smaller ${\Delta}V_{th}$ under PBS conditions for $10^4$ s than the samples that were annealed at $500^{\circ}C$, which is attributed to the nanocrystal-embedded structure. The sample that was annealed at $600^{\circ}C$ showed the best performance and the smallest ${\Delta}V_{th}$ among the fabricated samples with a ${\mu}_{sat}$ of $9.38cm^2/V$ s, an S-factor of 0.46V/decade, and a ${\Delta}V_{th}$ of 0.009V, which is due to the passivation of the defects by high thermal annealing without structural change.

A Study for Evaluating of Voltage Stability Margin Considering Shunt Capacitor (조상설비를 고려한 전압안정성 여유전력의 평가에 관한 연구)

  • 김세영
    • Journal of Energy Engineering
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    • v.7 no.1
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    • pp.65-72
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    • 1998
  • This paper presents a fast calculation method for evaluating of voltage stability margin (MW) using the line flow equation in polar form. Here, Line flow equations $(P_{ij},\;Q_{ij}$ are comprised of state variable, $V_i,\;{\Delta}_i,\;V_j$ and ${Delta}_j$, and line parameter, r and x. using the feature of polar coordinate, these becomes one equation with two variables, $V_j,;V_j$. Moreover, if bus j is slack or generator bus, which is specified voltage magnitude in load flow calculation, it becomes one equation with one variable $V_ i $ that is, may be formulated with the second-order equation for $V^2_i$. Therefore, multiple load flow solutions may be obtained with simple computation. The obtained load flow multiple solutions are used for evaluating of voltage stability through sensitivity analysis or its closeness. Also, the method is proposed to calculate for voltage stability margin considering shunt capacitor, which is important element for evaluating of voltage stability. The proposed method was validated to sample systems.

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Effect of microwave power on aging dynamics of solution-processed InGaZnO thin-film transistors

  • Kim, Gyeong-Jun;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.256-256
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    • 2016
  • 기존의 디스플레이 기슬은 마스크를 통해 특정 부분에만 유기재료를 증착시키는 방법을 사용하였으나, 기판의 크기가 커짐에 따라 공정조건에 제약이 발생하였다. 이를 해결하기 위해 최근 용액 공정에 대한 연구가 활발히 진행되고 있다. 용액 공정은 기존 진공 증착 방식과 비교하였을 때 상온, 대기압에서 증착이 가능하며 경제적이고, 대면적 균일 증착에 유리하다는 장점이 있다. 반면, 용액 공정으로 제작한 소자는 시간이 지남에 따라 점차 전기적 특성이 변하는 aging effect를 보인다. Aging effect는 용액에 포함된 C기와 OH기 기반의 불순물의 영향으로 시간의 경과에 따라서 문턱전압, subthreshold swing 및 mobility 등의 전기적 특성이 변하는 현상으로 고품질의 박막을 형성하기 위해서는 고온의 열처리가 필요하다. 지금까지 고품질 박막 형성을 위한 열처리는 퍼니스 (furnace) 장비에서 주로 이루어졌는데, 시간이 오래 걸리고, 상대적으로 고온 공정이기 때문에 유리, 종이, 플라스틱과 같은 다양한 기판에 적용하기 어렵다는 단점이 있다. 따라서, 본 연구에서는 $100^{\circ}C$ 이하의 저온에서도 열처리가 가능한 microwave irradiation (MWI) 방법을 이용하여 solution-processed InGaZnO TFT를 제작하였고, 기존의 열처리 방식인 furnace로 열처리한 TFT 소자와 aging effect를 비교하였다. 먼저, solution-processed IGZO TFT를 제작하기 위해 p type Si 기판을 열산화시켜서 100 nm의 SiO2 게이트 산화막을 성장시켰고, 스핀코팅 방법으로 a-IGZO 채널층을 형성하였다. 증착후 열처리를 위하여 1000 W의 마이크로웨이브 출력으로 15분간 MWI를 실시하여 a-IGZO TFT를 제작하였고, 비교를 위하여 furnace N2 gas 분위기에서 $600^{\circ}C$로 30분간 열처리한 TFT를 준비하였다. 제작된 직후의 TFT 특성을 평가한 결과, MWI 열처리한 소자가 퍼니스 열처리한 소자보다 높은 이동도, 낮은 subthreshold swing (SS)과 히스테리시스 전압을 가지는 것을 확인하였다. 한편, aging effect를 평가하기 위하여 제작 후에 30일 동안의 특성변화를 측정한 결과, MWI 열처리 소자는 30일 동안 문턱치 전압(VTH)의 변화량 ${\Delta}VTH=3.18[V]$ 변화되었지만, furnace 열처리 소자는 ${\Delta}VTH=8.56[V]$로 큰 변화가 있었다. 다음으로 SS의 변화량은 MWI 열처리 소자가 ${\Delta}SS=106.85[mV/dec]$인 반면에 퍼니스 열처리 소자는 ${\Delta}SS=299.2[mV/dec]$이었다. 그리고 전하 트래핑에 의해서 발생하는 게이트 히스테리시스 전압의 변화량은 MWI 열처리 소자에서 ${\Delta}V=0.5[V]$이었지만, 퍼니스 열처리 소자에서 ${\Delta}V=5.8[V]$의 큰 수치를 보였다. 결과적으로 MWI 열처리 방식이 퍼니스 열처리 방식보다 소자의 성능이 우수할 뿐만 아니라 aging effect가 개선된 것을 확인할 수 있었고 차세대 디스플레이 공정에 있어서 전기적, 화학적 특성을 개선하는데 기여할 것으로 기대된다.

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Oxygen Ring Formation Reaction of Mono-Oxo-Bridged Binuclear Molybdenum(V) Complex (II). Reaction of $[Mo_2O_3(Phen)_2(NCS)_4]$ with Solvent Water in Water + Co-Solvent Mixtures (한개의 산소다리를 가진 몰리브덴(V) 착물의 산소고리화 반응 (II). 2성분 혼합용매에서 용매물과 $[Mo_2O_3(Phen)_2(NCS)_4]$의 반응)

  • Sang-Oh Oh;Huee-Young Seok
    • Journal of the Korean Chemical Society
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    • v.32 no.3
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    • pp.203-210
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    • 1988
  • Mono-oxo-bridged binuclear molybdenum(V) complex, $[Mo_2O_3(Phen)_2(NCS)_4]$ produces di-oxo-bridged binuclear molybdenum(V) complex, $[Mo_2O_4(Phen)_2(NCS)_2]$ in water + co-solvent, where the co-solvent are acetone, acetonitrile and N,N-dimethylformamide. The rate of conversion of $[Mo_2O_3(Phen)_2(NCS)_4]\;into\;[Mo_2O_4(Phen)_2(NCS)_2]$ has been measured by spectrophotometric method. Temperature was $10^{\circ}C$ to $40^{\circ}C$ and pressure was varied up to 1500 bar. The rate constants are increased with increasing water mole fraction and decreased with increasing concentration of hydrogen ion. The order of oxygen ring formation reaction rate in various cosolvent is as follows, ACT > AN > DMF which is agreed with solvent dielectric constants. The observed negative activation entropy ($[\Delta}S^{\neq}$), activation volume($[\Delta}V^{\neq}$) and activation compressibility coefficient(${\Delta}{\beta}^{\neq}$) values show that the solvent water molecule is strongly attracted to the complex at transition state. From these results, the oxygen ring formation reaction of $[Mo_2O_3(Phen)_2(NCS)_4]$ is believed association mechanism.

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ULG 및 ELA Poly-Si TFTs의 게이트-바이어스 스트레스에 따른 비교 연구

  • Kim, Ji-Ung;Kim, Tae-Yong;Lee, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.264.1-264.1
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    • 2014
  • 현재 디스플레이에서 가장 널리 이용되는 ELA poly-Si TFT의 표면 거칠기 등으로 인한 대면적 문제를 해결하고자 연구 중인 MIC 방식의 ULG poly-Si TFT를 이용한 게이트-바이어스 스트레스에 따른 전기적 특성을 비교하고자 한다. Positive gate bias의 경우 20V의 게이트 전압과 -0.1V의 드레인 전압에서 10,000초 동안 비교 측정하였으며, 이때 ${\Delta}VTH$는 ELA poly-Si TFT가 143.6 mV, ULG poly-Si TFT가 28.8 mV였다. 또한 negative gate bias의 경우 -20 V의 게이트 전압과 -0.1 V의 드레인 전압에서 10,000초 동안 비교 측정하였으며, 이때 ${\Delta}VTH$는 ELA poly-Si TFT가 154.4 mV, ULG poly-Si TFT가 70.8 mV였다. 이는 게이트 절연막과 채널층 사이의 계면에서 높은 표면 거칠기로 인한 전계의 차이에 의해 더 많은 전하의 트랩에 기인한 것이다.

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The Positional Effect of Solute Functional Group among Positional Isomers of Phenylpropanol in Hydroxyl Group-Solvent Specific Interactions in Methanol/Water Mixed Solvents Monitored by HPLC

  • Cheong, Won-Jo;Ko, Joung-Ho;Kang, Gyoung-Won
    • Bulletin of the Korean Chemical Society
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    • v.26 no.8
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    • pp.1246-1250
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    • 2005
  • We have evaluated the hydroxyl group-solvent specific interactions by using a Lichrosorb RP18 stationary phase and by measuring the retention data of carefully selected solutes in 50/50, 60/40, 70/30, 80/20, and 90/10(v/v%) methanol/water eluents at 25, 30, 35, 40, 45, and 50 ${^{\circ}C}$. The selected solutes are 3 positional isomers of phenylpropanol, that is, 1-phenyl-1-propanol, 1-phenyl-2-propanol, and 3-phenyl-1-propanol. There exist clear discrepancies in ${\Delta}H^o$ (solute transfer enthalpy from the mobile to the stationary phase) and $T{\Delta}S^o$ (solute transfer entropy) among positional isomers. The difference in ${\Delta}H^o$ and $T{\Delta}S^o$ between secondary alcohols (1-phenyl-1-propanol and 1-phenyl-2-propanol)is negligible compared to the difference between the primary alcohol (1-phenyl-3-propanol) and secondary alcohols. The $T{\Delta}S^o$ values of 3-phenyl-1-propanol are close to those of butylbenzene while the $T{\Delta}S^o$ values of secondary alcohols are close to those of propylbenzene. The difference in ${\Delta}{\Delta}H^o$ (specific solute-mobile phase interaction enthalpy) between the primary alcohol and the secondary alcohol decreases with increase of methanol content in the mobile phase. A unique observation is an extremum for 1-phenyl-3-propanol in the plot of $T{\Delta}{\Delta}S^o$ vs. methanol volume %. The positive sign of $T{\Delta}{\Delta}S^o$ of 3-phenyl-1-propanol implies that the entropy of 3-phenyl-1-propanol is greater than that of the hypothetical alkylbenzene (the same size and shape as phenylpropanol) in the mobile phase.

Derivation of Some Activation Parameters (새로운 활성화 파라메터의 유도)

  • Lee, Ik-Choon
    • Journal of the Korean Chemical Society
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    • v.12 no.2
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    • pp.61-64
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    • 1968
  • Compressibility and expansibility of activation, ${\Delta}K^{\neq}\;and\;{\Delta}E^{\neq},$ are defined with the use of general principles that an activation parameter is the difference in partial molar quantities of the parameter for the transition and initial state. Two related parameters, (${\partial}{\Delta}H^{\neq}/{\partial}P)_{\gamma}\;and\;{\Delta}W^{\neq}(=P{\Delta}V^{\neq}),$ are also derived. Simpler interpretation of the existing kinetic data are possible with these activation parameters, while other derivations lead to complicated expressions of no practical significance.

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Improvement of Electronic Properties and Amplification of Electron Trapping/Recovery through Liquid Crystal(LC) Passivation on Amorphous InGaZnO Thin Film Transistors

  • Lee, Seung-Hyeon;Kim, Myeong-Eon;Heo, Yeong-U;Kim, Jeong-Ju;Lee, Jun-Hyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.267.1-267.1
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    • 2016
  • 본 연구에서는 nematic 액정의 종류 중 하나인 5CB (4-Cyano-4'-pentylbiphenyl) 물질을 박막 트랜지스터 (TFT)의 passivation 층으로 사용했을 때 그 전기적 특성향상을 확인하였다. RF-magnetron sputtering법으로 증착된 비정질 InGaZnO 박막을 활성층으로 사용한 TFT를 제작하여 그 활성층 위에 drop형식으로 passivation 하였다. 그 결과, drain current (I_DS)가 약 10배 정도 증가하고, linear region(V_D=0.5V)에서 mobility와 subthreshold slope(SS)이 각각 6.7에서 12.2, 0.3에서 0.2로 향상되는 것이 보였다. 이것은 gate bias가 인가되었을 때 freedericksz 전이를 통한 액정의 배향과 이때 형성된 dipole 형성에 의한 것으로 보이며, 이러한 LC의 배향은 편광현미경을 통하여 표면과 수직으로 배향한다는 사실을 확인 할 수 있었고 이 LC-passivation된 a-IGZO TFT의 전기적 특성의 향상에 대한 mechanism을 제시하였다. 그리고 배향한 LC가 가지는 dipole에 의해 bias stress 상황에서 독특한 electron trapping과 recovery의 증폭효과가 나타났다. V_G=+20V의 positive gate bias stress를 1000s동안 가했을 때, passivation되지 않은 a-IGZO TFT의 경우 +4V의 threshold voltage shift(${\Delta}V$_TH)가 발생되었고, 바로 -20V의 negative gate bias를 30s간 가해주었을 때 -2.5V의 ${\Delta}V$_TH가 발생하였다. 반면 LC-passivation된 a-IGZO TFT의 경우 각각 +5V와 -4V의 ${\Delta}V$_TH로 더 큰 변화를 가져왔다. 이러한 LC에 의한 electron trapping/recovery 증폭효과에 대한 model을 제시하였다.

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Analysis of Insulation Quality in Large Generator Stator Windings

  • Kim, Hee-Dong;Kong, Tae-Sik;Ju, Young-Ho;Kim, Byong-Han
    • Journal of Electrical Engineering and Technology
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    • v.6 no.3
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    • pp.384-390
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    • 2011
  • To evaluate the condition of stator winding insulation in generators that have been operated for a long period of time, diagnostic tests were performed on the stator bars of a 500 MW, 22 kV generator under accelerated thermal and electrical aging procedures. The tests included measurements of AC current (${\Delta}I$), dissipation factor ($tan{\delta}$), partial discharge (PD) magnitude, and capacitance (C). In addition, the AC current test was performed on the stator winding of a 350 MW, 24 kV generator under operation to confirm insulation deterioration. The values of ${\Delta}I$, ${\Delta}tan{\delta}$, and PD magnitude in one stator bar indicated serious insulation deterioration. In another stator bar, the ${\Delta}I$ measurements showed that the insulation was in good condition, whereas the values of ${\Delta}tan{\delta}$ and PD magnitude indicated an incipient stage of insulation deterioration. Measurements of ${\Delta}I$ and PD magnitude in all three phases (A, B, C) of the remaining generator stator windings showed that they were in good condition, although the ${\Delta}tan{\delta}$ measurements suggested that the condition of the insulation should be monitored carefully. Overall analysis of the results suggested that the generator stator windings were in good condition. The patterns of PD magnitude in all three phases (A, B, C) were attributed to internal discharge.

Design of Low Power Sigma-delta ADC for USN/RFID Reader (USN/RFID Reader용 저전력 시그마 델타 ADC 변환기 설계에 관한 연구)

  • Kang, Ey-Goo;Hyun, Deuk-Chang;Hong, Seung-Woo;Lee, Jong-Seok;Sung, Man-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.9
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    • pp.800-807
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    • 2006
  • To enhance the conversion speed more fast, we separate the determination process of MSB and LSB with the two independent ADC circuits of the Incremental Sigma Delta ADC. After the 1st Incremental Sigma Delta ADC conversion finished, the 2nd Incremental Sigma Delta ADC conversion start while the 1st Incremental Sigma Delta ADC work on the next input. By determining the MSB and the LSB independently, the ADC conversion speed is improved by two times better than the conventional Extended Counting Incremental Sigma Delta ADC. In processing the 2nd Incremental Sigma Delta ADC, the inverting sample/hold circuit inverts the input the 2nd Incremental Sigma Delta ADC, which is the output of switched capacitor integrator within the 1st Incremental Sigma Delta ADC block. The increased active area is relatively small by the added analog circuit, because the digital circuit area is more large than analog. In this paper, a 14 bit Extended Counting Incremental Sigma-Delta ADC is implemented in $0.25{\mu}m$ CMOS process with a single 2.5 V supply voltage. The conversion speed is about 150 Ksamples/sec at a clock rate of 25 MHz. The 1 MSB is 0.02 V. The active area is $0.50\;x\;0.35mm^{2}$. The averaged power consumption is 1.7 mW.