• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.1323-1324
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• 2008

We developed the Hyper-thermal Neutral Beam (HNB) sputtering process as a plasma damage free process for ITO top anode deposition on inverted Top emission OLED (ITOLED). For examining the effect of the HNB sputtering system, Inverted Bottom emission OLEDs (IBOLED) with ITO top anode electrode were fabricated; the characteristics of IBOLED using HNB sputtering process shows significant suppression of plasma induced damage.

• Proceedings of the KSR Conference
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• 2010.06a
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• pp.546-548
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• 2010

This paper proposes a new baseline-free TR-based SHM method in which the time-reversal (TR) property of the guided Lamb waves is utilized. The new TR-based SHM method has two distinct features when compared with the other existing SHM techniques: (1) The measurement- based backward TR process is replaced by the computation-based process (2) In place of the comparison method most commonly used for SHM, the TOF information of the damage signal extracted from the reconstructed signal is utilized for the damage diagnosis. For the damage diagnosis, the imaging method is adopted to efficiently detect damage by representing the damage as an image. The proposed TR-based SHM technique is then validated through the damage diagnosis experiment for an aluminum plate with a damage at different locations.

• Journal of the Korean Society for Precision Engineering
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• v.27 no.6
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• pp.64-74
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• 2010

This paper proposes a new TR-based baseline-free SHM technique in which the time-reversal (TR) property of the guided Lamb waves is utilized. The new TR-based SHM technique has two distinct features when compared with the other TR-based SHM techniques: (1) The backward TR process commonly conducted by the measurement is replaced by the computation-based process; (2) In place of the comparison method, the TOF information of the damage signal extracted from the reconstructed signal is used for the damage diagnosis in conjunction with the imaging method which enables us to represent the damage as an image. The proposed TR-based SHM technique is then validated through the damage diagnosis experiment for an aluminum plate with a damage at different locations.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

• Computers and Concrete
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• v.16 no.6
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• pp.933-961
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• 2015

Damage by high-speed impact fracture is a dominant mode of failure in several applications of concrete structures. Numerical modelling can play a crucial role in understanding and predicting complex fracture processes. The commonly used mesh-based Finite Element Method has difficulties in accurately modelling the high deformation and disintegration associated with fracture, as this often distorts the mesh. Even with careful re-meshing FEM often fails to handle extreme deformations and results in poor accuracy. Moreover, simulating the mechanism of fragmentation requires detachment of elements along their boundaries, and this needs a fine mesh to allow the natural propagation of damage/cracks. Smoothed Particle Hydrodynamics (SPH) is an alternative particle based (mesh-less) Lagrangian method that is particularly suitable for analysing fracture because of its capability to model large deformation and to track free surfaces generated due to fracturing. Here we demonstrate the capabilities of SPH for predicting brittle fracture by studying a slender concrete structure (column) under the impact of a high-speed projectile. To explore the effect of the projectile material behaviour on the fracture process, the projectile is assumed to be either perfectly-elastic or elastoplastic in two separate cases. The transient stress field and the resulting evolution of damage under impact are investigated. The nature of the collision and the constitutive behaviour are found to considerably affect the fracture process for the structure including the crack propagation rates, and the size and motion of the fragments. The progress of fracture is tracked by measuring the average damage level of the structure and the extent of energy dissipation, which depend strongly on the type of collision. The effect of fracture property (failure strain) of the concrete due to its various compositions is found to have a profound effect on the damage and fragmentation pattern of the structure.

• Proceedings of the Computational Structural Engineering Institute Conference
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• 2004.10a
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• pp.534-541
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• 2004

The modeling of crack initiation and propagation is very important for the failure analysis of concrete. The cracking process in concrete is quite different from that of other materials, such as metal and glass, in that it is not a sudden onset of new free surface but a continuous forming and connecting of microcracks. The failure process of concrete by cracking causes irreversible deformations and stiffness degradation. Those phenomenon can be modeled using plasticity and damage theory in macroscopic aspect. In this study, a plastic-damage model based on homogenized crack model considering velocity discontinuity and damage variable which is a function of plastic strain is proposed for fracture analysis of concrete. Finally, the plastic-damage model is verified with experimental data.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2004.08a
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• pp.184-196
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• 2004

An Eulerian finite element analysis for the steady state rolling process is addressed. This analysis combines the crystal plasticity theory fur texture development as well as the continuum damage mechanics for growth of micro voids. Although an Eulerian analysis for steady state rolling has many advantages, it needs an initial assumption about the shape of control volume. However, the assumed control volume does not match the final shapes. To effectively predict the correct shape in an assumed control volume, a free surface correction algorithm and a streamline technique are introduced. Applications to plate rolling, clad rolling, and shape rolling will be given and the results will be discussed in detail.

• Vacuum Magazine
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• v.1 no.2
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• pp.19-23
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• 2014

Transparent and top emission organic light-emitting device (OLEDs) are the important issues in realizing new display applications such as see-through electronic displays, and flexible displays. The cathode of the transparent and top emission OLEDs should be transparent in the visible light and should not give any damage to the underlying organic layers, in addition to its intrinsic role of injecting electrons into the organic layers. Several authors have investigated the transparent conducting oxide films prepared by sputtering methods. They have introduced the sophisticated sputtering process for reducing the damages. Other groups have developed thermally evaporated transparent cathodes which are believed to be damage free without causing any permanent defect to the organic layers. This review focuses on the vacuum evaporated damage free transparent cathodes.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1715-1718
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• 2007

New ITO thin film of good performance has been developed by brand-new, plasma-damage-free sputtering process at the room temperature. The room temperature-processed ITO films with optimized conditions as neutral beam acceleration bias of -30V and In & Sn composition ratio of 99:01 gives lower resistivity as $4.22{\times}10^{-4}{\Omega}-cm$ and higher transmittance over 90% a wavelength of 550 nm. The transmission electron microscope (TEM) images of the films show a nano-crystalline structure.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.4
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• pp.373-378
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• 2006

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin film transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with Al cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that OLED with Al cathode layer prepared by BCS has much lower leakage current density ($1{\times}10^{-5}\;mA/cm^2$ at -6 V) than that $(1{\times}10^{-2}{\sim}-10^0\;mA/cm^2)$ of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and DC/RF sputtering in fabrication process of organic based optoelectronics.