• ETRI Journal
• /
• v.27 no.2
• /
• pp.188-194
• /
• 2005

We report on the improvement of critical dimension (CD) linearity on a photomask by applying the concept of process proximity correction to a laser lithographic process used for the fabrication of photomasks. Rule-based laser process proximity correction (LPC) was performed using an automated optical proximity correction tool and we obtained dramatic improvement of CD linearity on a photomask. A study on model-based LPC was executed using a two-Gaussian kernel function and we extracted model parameters for the laser lithographic process by fitting the model-predicted CD linearity data with measured ones. Model-predicted bias values of isolated space (I/S), arrayed contact (A/C) and isolated contact (I/C) were in good agreement with those obtained by the nonlinear curve-fitting method used for the rule-based LPC.

• Journal of the Korean Society of Manufacturing Process Engineers
• /
• v.2 no.2
• /
• pp.91-97
• /
• 2003

In rigid-plastic finite element method, there is a heavy computation time and convergence problem. In this study, revised rigid-plastic finite element method Will be introduced. This method is the way that restrict the convergence interval. In result, convergence problem and computation time due to large non-linearity in the existing numerical analysis method were no longer a critical problem. It is expected that various results from the numerical analysis will give very useful information for the design of tools in sheet metal forming process.