• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.241-241
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• 2007

We fabricated SmBCO coated conductors(CCs) on IBAD-MgO templates using co-evaporation method. IBAD-MgO templates consist of PLD-LMO/epi-MgO/IBAD-MgO/Ni-alloy and showed good in-plane texture of below FWHM 7 degree. Evaporation rates of Sm, Ba, and Cu were precisely controlled to get the optimum composition ratio after deposition process. To optimize the oxygen partial pressure of reaction region, wide range of the partial pressure was investigated from 1 mTorr to 15 mTorr. By reducing the oxygen partial pressure to 5mTorr, (103)grains in SmBCO layer have been increased. On the other hand, there were only (001)grains in SmBCO layer deposited at 15 mTorr $O_2$. Deposition temperature was also investigated from $600^{\circ}C\;to\;800^{\circ}C$ to make high Ic SmBCO CCs. SmBCO on IBAD MgO template showed that the Ic increased gradually at higher growth temperature to $800^{\circ}C$, which the highest Jc and Ic is $2.6\;MA/cm^2$ and 500 A/cm-w., respectively.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.235-235
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• 2003

The development of a buffer layer is an important issue for the second -generation wire, YBCO coated metal wire. The buffer layer demands not only on the prohibition of the reaction between YBCO and metal substrate, but also the proper lattice match and conductivity for high critical current density (Jc) of YBCO superconductor, In order to satisfy these demands, we suggested CaRuO3 as a useful candidate having that the lattice mismatches with Ni (200) and with YBCO are 8.2% and 8.0%, respectively. The CaRuO3 thin films were deposited on Ni substrates using various methods, such as e-beam evaporation and DC and RF magnetron sputtering. These films were investigated using SEM, XRD, pole-figure and AES. In e-beam evaporation, the deposition temperature of CaRuO3 was the most important since both hi-axial texturing and NiO formation between Ni and CaRuO3 depended on it. Also, the oxygen flow rate had i[n effect on the growth of CaRuO3 on Ni substrates. The optimal conditions of crystal growth and film uniformity were 400$^{\circ}C$, 50 ㎃ and 7 ㎸ when oxygen flow rate was 70∼100sccm In RF magnetron sputtering, CaRuO3 was deposited on Ni substrates with various conditions and annealing temperatures. As a result, the conductivity of CaRuO3 thin films was dependent on CaRuO3 layer thickness and fabrication temperature. We suggested the multi-step deposition, such as two-step deposition with different temperature, to prohibit the NiO formation and to control the hi-axial texture.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.299-299
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• 2008

초전도 응용기기 개발을 위해 필수적인 초전도 박막선재는 길이방향으로 임계전류밀도가 균일한 것이 요구되고 있다. 전체 길이에 대해 가장 임계전류 밀도가 낮은 지점에서 선재의 특성이 제한되기 때문이다. 한편 초전도 박막선재의 경우 높은 임계전류 밀도와 함께 과전류 등의 사고발생시를 고려하여 안정화재를 반드시 초전도층 위에 구성하여야 한다. 고가의 은(Ag)을 두껍게 증착할 수 없으므로 보통은 구리도금 또는 솔더링으로 안정화재를 덧댄다. 본 연구에서는 초전도 박막선재의 대전류화와 길이방향의 전류 균일성 향상, 안정화 특성 항상 등의 목적으로 초전도 박막선재간 확산 접합을 시도하였다. 초전도 박막선재 제조 후 안정화재인 은을 증착 후 따로 구리도금이나 솔더링 없이 선재 2가닥을 서로 포개어서 열처리를 하였다. 이때 선재간의 충분한 확산접합을 위하여 선재를 둥근 SUS 디스크에 감고 외부에 다시 SUS판재로 감아서 열처리 도중 압력을 가하였다. 아울러 포개는 방법도 초전도층의 위치에 따라 3 가지로 하였으며 열처리 후 임계전류를 측정하였다. 각 선재한 가닥에 대한 임계전류는 77K에서 50~60 A 정도의 임계전류를 나타내었으며 선재를 접합한 경우 90~120A의 특성을 나타내었으며 특히 초전도층이 설마주보는 형태에서 가장 높은 임계전류 특성을 나타내었다.