A study on Etch Characteristics of {Y-2}{O_3}$ Thin Films in Inductively Coupled Plasma
(유도 결합 플라즈마를 이용한 {Y-2}{O_3}$ 박막의 식각 특성 연구)
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- Journal of the Institute of Electronics Engineers of Korea SD
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- v.38 no.9
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- pp.611-615
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- 2001