Influence of DI Water Pressure and Purified $N_2$ Gas on the Inter Level Dielectric-Chemical Mechanical Polishing Process
(탈이온수의 압력과 정제된 $N_2$ 가스가 ILD-CMP 공정에 미치는 영향)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.13 no.10
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- pp.812-816
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- 2000