Photo-Induced Chemical Vapor Deposition of $SiO_2$ Thin Film by Direct Excitation Process
(직접 광여기 Photo-CVD에 의한 이산화실리콘 박막의 증착 특성)
-
- Journal of the Korean Institute of Telematics and Electronics
- /
- v.26 no.7
- /
- pp.73-82
- /
- 1989