• Journal of Korea Technical Association of The Pulp and Paper Industry
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• v.30 no.4
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• pp.28-34
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• 1998

Polyvinyl acetate emulsion has been widely used as adhesives for wood and paper, paint additives and binders for fiber, leather, and other materials because it is an excellent adhesive with many advantages including low in toxicity risks and manufacturing cost. It is expected the consumption of polyvinyl acetate emulsion as adhesives will increase in cigarette industry as well as in paperboard coating industry. Recently the operation speed of the cigarette tip wrapper increased so substantially that improvement of the emulsion properties is required including good wet tack development, narrow and controlled particle size distribution, low viscosity, etc. In this study the effects of such polymerization conditions as the type and amount of emulsifier, internal or external plasticizing, and emulsification methods on the viscosity and particle size of polyvinyl acetate emulsions were examined. Results showed that polyvinyl alcohol with a high degree of hydrolysis and low molecular weight and nonionic surfactants are superior to anionic surfactant in improving adhesion and emulsion stability. They also tend to produce emulsions with smaller particle size. External plasticization with dipropylene glycol dibenzoate was more effective in improving flexibility than internal plasticization with butyl acrylate. Monomer emulsification under high shear was more effective in decreasing the particle size.

• KSBB Journal
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• v.24 no.6
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• pp.515-520
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• 2009

This study presented facile method of cell patterning using fabricated PDMS patterns on polyelectrolyte coated surface. This basic principle is the fabrication of functional surface presenting two orthogonal surfaces such as cell adhesive and repellent properties. Cell adhesive surface was firstly fabricated with simple coating of polyelectrolyte multilayer. And then, the desired patterns of PDMS for the prevention of nonspecific binding of cells were transferred onto the previously formed thin film of polyelectrolyte multilayer. Thus, we could prepare novel functional surface simultaneously containing PDMS and polyelectrolyte region. As expected, the PDMS regions showed effective prevention of nonspecific binding of cell and the other region, exposed polyelectrolyte area, provided cell adhesive environment. The height of formed PDMS structure was about 100 nm. Based on this method, cell patterning can be successfully obtained with various pattern shapes and sizes. Therefore, we expect that this simple method will be useful platform technology for the development of cell chip, cell based assay system, and biochip.

• Journal of Surface Science and Engineering
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• v.43 no.6
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• pp.260-265
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• 2010

STD 61 steel has been widely used for tools, metallic mold and die for press working because of its favorable mechanical properties such as high toughness, and creep strength as well as excellent oxidation resistance. The STD 61 tool steel coated with TiN and ZrN by sputtering results in improvement of wear and corrosion resistance. In this study, surface characteristics of TiN and ZrN film coated STD 61 by sputtering were studied by using FE-SEM, EDS, XRD, and XRR and nanoindentation tests. From the results of surface characteristics of coated specimen, the ZrN coated surface showed finer granular than that of TiN coated surface. The coated layer structures of ZrN and TiN were grown to (111) and (200) preferred orientation. From the results of XRR test for surface roughness, density and growth rate of coating film, surface roughness and growth rate of ZrN coated film revealed lower values those of TiN coated film, whereas density of ZrN coated film showed higher values than that of TiN coated film. From the nanohardness and elastic modulus test, nanohardness value and elastic modulus of ZrN coated film became higher than those of TiN coated film.

• Journal of Surface Science and Engineering
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• v.43 no.6
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• pp.266-271
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• 2010

Ternary Mo-Cu-N films were deposited on Si wafer substrates with various copper contents by magnetron sputtering method using Mo target and Cu target in $Ar/N_2$ gaseous atmosphere. As increasing $N_2$ pressure, the microstructure of Mo-N films changed from ${\gamma}-Mo_2N$ of (111) having face-centered-cubic (FCC) structure to $\delta$-MoN of (200) having hexagonal structure. Detailed the microstructures of the Mo-Cu-N coatings were studied by X-ray diffraction, scanning electron microscopy and field emission transmission electron microscope. The results indicated that the incorporation of copper into the growing Mo-N coating led to the $Mo_2N$ and MoN crystallites were more well-distributed and refined and the copper existed in grain boundary. Ternary Mo-Cu-N films had a composite microstructure of the nanosized crystal crystalline ${\gamma}-Mo_2N$ and $\delta$-MoN surrounded by amorphous $Cu_3N$ phase.

• Journal of the Korean Applied Science and Technology
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• v.28 no.1
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• pp.109-117
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• 2011

In this study, we experimented that how influence chain extension to waterborne urethane-epoxy hybrid resin for leather garment coatings. First of all, We had analyzed datas by FT-IR, SEM and machanical properties. By instruments analysis measurement we confirmed that synthesis of epoxy and hybrid resin. In this experiment we knew that polyurethane-epoxy hybrid resin have 5 grades of solvent resistance. Tensile strength measured in the polyurethane-epoxy resin(EDA 5.37g, 2.386 $kg_f/mm^2$) had the most strong strength.. Also polyurethane-epoxy hybrid resin had better result(EDA 5.37g. 37.4 mg. loss) than other hybrid resins. As hight proportion of EDA in hybid resin, we obtained low elongation and low flexibility. In this result, chain extension of waterborne polyurethane-epoxy hybrid resin showed that how effect in leather coating by ratio of EDA.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.211-211
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• 2003

PbTiO$_3$ 씨앗층을 이용하여 완화형 강유전체 Pb(Mg$_{1}$3/Ta$_{2}$3/)O$_3$ (PMT) 박막의 페로브스카이트 상안정화와 열처리 조건에 따른 미세구조변화, 이에 따른 전기적 특성 변화에 관하여 조사하였다. PbTiO$_3$ 박막을 스핀코팅법으로 3000 rpm에서 20초간(111) 방향으로 배향된 Pt / Ti / SiO$_2$/ Si 기판에 증착하여 안정화된 페로브스카이트 박막을 얻었다. 이렇게 제조된 PbTiO$_3$를 Buffer 층으로 사용하고 그 위에 Pb(Mg$_{1}$3/Ta$_{2}$3/)O$_3$를 박막을 Spin coating방법으로 증착한 후, 급속열처리 방법(RTA)으로 550- $650^{\circ}C$ 사이에서 열처리하였다. 제조된 박막의 열처리 온도에 따른 미세구조 변화와 결정성을 XRD, SEM, TEM으로 분석하였고 박막의 저온 강유전 특성을 RT66A를 이용하여 평가하였다. Pb(Mg$_{1}$3/Ta$_{2}$3/)O$_3$ 박막의 경우 씨앗층이 없는 경우에는 pyrochlore상이 주상이었지만 씨앗층을 사용한 경우 페로브스카이트 상이 주상임을 확인하였고 열처리 온도가 증가할수록 페로브스카이트상의 상대적 양이 증가함을 확인하였다. 미세구조와 상의 변화에 따른 전기적 특성 변화에 관하여 자세하게 논의할 것이다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.214-214
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• 2003

제지산업에 경쟁력을 부여할 수 있는 방법의 일환으로 제지용 도공안료의 표면개질을 시도하였다 은(Ag)이 항균력이 있다는 것이 여러 사람에 의해 증명된바 있으므로 이 은의 항균력을 제지용 무기안료에 이산화티탄과 함께 표면개질하고 다기능성 복합 항균분체를 설계하였다. 표면개질장치에 설치한 기상분사장치를 통해 은 용액을 고압기상분사로 TiO$_2$입자 표면에 Coating 하였다 이때의 분무각도는 60$^{\circ}$이고 오리피스 직경은 0.6mm, 분사 압력은 14kgf/$\textrm{cm}^2$ 이다. TiO$_2$에 은 용액을 기상분사하여 코팅시킨 후 표면개질 계산식에 의한 배합비로 모입자(clay, CaCO$_3$, PE)와 자입자(TiO$_2$)를 혼합하였고, 분체의 대전현상을 이용하여 모입자 주위에 자입자를 부착시킨 후, 고속기류중 충격력으로 표면개질처리를 하였다 표면개질 장치를 사용하여 제지용 무기안료 표면에 은용액이 코팅된 TiO$_2$를 개질 시켰다. 각종 물성(항균성, 백색도, 산란도)과 XRD, SEM 측정을 통해 기능성 항균분체의 실용방안 가능성에 대하여 조사하였다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.139-139
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• 2003

많은 압전 후막은 여러 감지소자, 통신 및 사무자동화 기기, 전기 및 전자부품, 의료장비 및 국방산업에 까지 널리 응용되어 왔다. 그 중에서도 압전특성이 뛰어난 PZT 후막은 마이크로 펌프, 밸브, 헤드, 모터, 트랜스듀서 뿐 아니라 최근 바이오칩용 센서와 액추에이터로서 널리 연구되고 있다. 또한 마이크로 센서와 액추에이터 의 제작 및 구동을 위한 MEMS 기술의 도입으로 실리콘 베이스의 소자 개발이 집중되고 있다. 스크린 프린팅 방법은수 마이크론에서 수십 마이크론 후막의 실현이 용이하고 비교적 경제적이며 소자신뢰도가 높고 대량생산에 유리하여 활발한 연구가 진행 중이다. 그러나 후막은 벌크에 비해 기공률이 높고, 또 소자응용에 있어서 고온소결 시 MEMS공정을 위한 실리콘 베이스 기판과의 확산 및 반응에 의 한 계면 및 활물질 성능의 저하가 문제가 되고 있다. 따라서 본 연구에서는 스크린 프린팅과 더불어 졸 코팅 방법의 도입으로 후막의 성형 및 소결 밀도를 높임과 동시에 여러 확산 방지 막의 증착으로 capacitor 형 PZT 후막의 물성 및 전기 적 특성을 향상시키고자 하였다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.7
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• pp.616-621
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• 2009

Reduction of optical losses in crystalline silicon solar cells by surface modification is one of the most important issues of silicon photovoltaics. Porous Si layers on the front surface of textured Si substrates have been investigated with the aim of improving the optical losses of the solar cells, because an anti-reflection coating(ARC) and a surface passivation can be obtained simultaneously in one process. We have demonstrated the feasibility of a very efficient porous Si ARC layer, prepared by a simple, cost effective, electrochemical etching method. Silicon p-type CZ (100) oriented wafers were textured by anisotropic etching in sodium carbonate solution. Then, the porous Si layers were formed by electrochemical etching in HF solutions. After that, the properties of porous Si in terms of morphology, structure and reflectance are summarized. The structure of porous Si layers was investigated with SEM. The formation of a nanoporous Si layer about 100nm thick on the textured silicon wafer result in a reflectance lower than 5% in the wavelength region from 500 to 900nm. Such a surface modification allows improving the Si solar cell characteristics. An efficiency of 13.4% is achieved on a monocrystalline silicon solar cell using the electrochemical technique.

• Journal of radiological science and technology
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• v.14 no.1
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• pp.49-60
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• 1991

Thermoluminescent phosphors, which are now being used widely in radiation dosimetry, have an excellent sensitivity to ionizing radiation. In this study, thermoluminescent phosphors of $CaSO_4$ : Mn, $CaSO_4$ : Dy and $CaSO_4$ : Tm are prepared and their physical properties are investigated by measuring the trapping parameters and their luminescent spectra. By considering the sensitivity to X-ray and fading characteristics, $CaSO_4$ : Dy is most adequate to imaging plate. The imaging plate are prepared by coating the $CaSO_4$ : Dy powder on the Al substrate and its dose dependence is linear within the range of 40 mGy-20 Gy X-ray. The sensitivity of imaging plate depends linearly on the thickness of coated phosphor layer up to $35\;mg/cm^2$ and is independent on the grain size of the phosphor in the range of $70{\sim}250\;{\mu}m$. By photographing the imaging plate, X-ray images of the test object are obtained and better than those of X-ray films.