• 제어로봇시스템학회:학술대회논문집
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• 1994.10a
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• pp.1.2-6
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• 1994

A state or the arts in Japanese chemical process control is reviewed based on experience in applying advanced process control schemes to several industrial chemical processes. The applications validate model predictive control (MPC), the most popular advanced control scheme in the process control community, as, indeed, a powerful and practical control algorithm. However, at the same time, it is elucidated that MPC can solve only the control algorithm part of the problem and one needs chemical and systems engineering aspects to solve the entire problem. By illustrating several industrial process control problems, the need for chemical engineering aspects as well as the future direction for process control are addressed, especially in light or current attitudes toward product quality.

• 제어로봇시스템학회:학술대회논문집
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• 1988.10b
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• pp.879-884
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• 1988

For more economical operation of chemical plants, optimal operating conditions are to be set and maintained as far as possible. For this purpose, optimizing control is applied to chemical plants. In this study, a process optimizer composed of a process simulator and an optimization routine using Successive Quadratic Programming as optimization technique is developed and the effect of optimizing control is tested on an example process, and a new process optimization strategy based on modified Jacobian matrix is developed.

• 제어로봇시스템학회:학술대회논문집
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• 1991.10b
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• pp.1950-1955
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• 1991

A fuzzy dynamic learning controller is proposed and applied to control of time delayed, non-linear and unstable chemical processes. The proposed fuzzy dynamic learning controller can self-adjust its fuzzy control rules using the external dynamic information from the process during on-line control and it can create th,, new fuzzy control rules autonomously using its learning capability from past control trends. The proposed controller shows better performance than the conventional fuzzy logic controller and the fuzzy self organizing controller.

• Korean Journal of Chemical Engineering
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• v.35 no.12
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• pp.2336-2347
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• 2018

The azeotrope of methyl acetate methanol and water was isolated using extractive distillation with water as entrainer. The pressure-swing extractive distillation (PSED) process and vapor side-stream distillation column (VSDC) with the rectifier process were designed to separate the methyl acetate, methanol and water mixture. It was revealed that the VSDC with the rectifier process had a reduction in energy consumption than the PSED process. Four control schemes of the two process were investigated: Double temperature control scheme (CS1), $Q_R/F$ feedforward control of reboiler duty scheme for PESD (CS2), $Q_R/F$ feedback control scheme for VSDC (CS3), the feedback control scheme of sensitive plate temperature of side-drawing distillation column to dominate the compressor shaft speed (CS4). Feed flow and composition disturbance were used to evaluate the dynamic performance. As a result, CS4 is a preferable choice for separation of methyl acetate-methanol-water mixture. A control scheme combining the operating parameters of dynamic equipment with the control indicators of static equipment was proposed in this paper. It means using the sensitive plate temperature of side-drawing column to control the compressor shaft speed. This is a new control scheme for extractive distillation.

• Korean Journal of Chemical Engineering
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• v.36 no.3
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• pp.356-367
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• 2019

This work presents an advanced and systematic approach to analytically design the optimal parameters of a two parameter second-order internal model control (IMC) filter that satisfies operational constraints on the output process, the manipulated variable as well as rate of change of the manipulated variable, for a first-order plus dead time (FOPDT) process. The IMC parameters are designed to minimize a control objective function composed of the weighted sum of the error between the process variable and the set point, and the rate of change of the manipulated variable, and to satisfy the desired constraints. The feasible region of the constrained IMC control parameters was graphically analyzed, as the process parameters and the constraints varied. The resulting constrained IMC control parameters were also used to find the corresponding industrial proportional-integral controller parameters of a Smith predictor structure.

• 제어로봇시스템학회:학술대회논문집
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• 1987.10b
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• pp.652-657
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• 1987

The Dynamic Matrix Control(DMC) technique was applied to nonlinear and nonminimum phase system. System model was identified by using Least Square method. Desired output trajectory was prespecified and input suppression parameter was also introduced. It was shown that DMC technique worked with great success in solving both nonminimum phase system and nonlinear system.

• 제어로봇시스템학회:학술대회논문집
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• 1986.10a
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• pp.560-565
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• 1986

For the control of chemical process, optimal value of the process should be known at first. And process simulation is the previous step of optimal value calculation. However it is not a simple work to analyze chemical process system. Especially for the large scale chemical process system, many difficulties such as non-linearity and complexity caused by recycle streams should be overcome. In this paper, three strategies of large scale chemical process analysis were explained and discussed with case studies.

• Journal of Institute of Control, Robotics and Systems
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• v.21 no.9
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• pp.875-880
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• 2015

Traditional semiconductor process control has been performed through statistical process control techniques in a constant process-recipe conditions. However, the complexity of the interior of the etching apparatus plasma physics, quantitative modeling of process conditions due to the many difficult features constraints apply simple SISO control scheme. The introduction of the Advanced Process Control (APC) as a way to overcome the limits has been using the APC process control methodology run-to-run, wafer-to-wafer, or the yield of the semiconductor manufacturing process to the real-time process control, performance, it is possible to improve production. In addition, it is possible to establish a hierarchical structure of the process control made by the process control unit and associated algorithms and etching apparatus, the process unit, the overall process. In this study, the research focused on the methodology and monitoring improvements in performance needed to consider the process management of future developments in the semiconductor manufacturing process in accordance with the age of the APC analysis in real applications of the semiconductor manufacturing process and process fault diagnosis and control techniques in progress.

• Journal of the Korean Chemical Society
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• v.54 no.2
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• pp.181-182
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• 2010

• Transactions on Control, Automation and Systems Engineering
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• v.2 no.3
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• pp.196-200
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• 2000

A neural controller for process control is proposed that combines a conventional multi-loop PID controller with a neural network. The concept of target signal based on feedback error is used fur on-line learning of the neural network. This controller is applied to distillation column control to illustrate its effectiveness. The result shows that the proposed neural controller can cope well with disturbance, strong interactions, time delays without any prior knowledge of the process.