• The korean journal of orthodontics
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• v.24 no.4 s.47
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• pp.957-967
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• 1994

The purpose of this study was to evaluate the effects of different bases of ceramic brackets on shear bond strength and to observe failure patterns of bracket bondings. Lower bicuspid brackets whose bases designed for the macromechanical and silane treated chemical bonding those for silane treated chemical bonding, those for micromechanical bonding, and those for macromechanical bonding were tested as experimental groups, and foil mesh-backed metal brackets as a control group. All the brackets were bonded with $Mono-Lok\;2^{(TM)}$ on the labial surface of extracted human lower bicuspids after etching the enamel with $38\%$ phosphoric acid solution for 60 seconds. The shear bond strengths were measured on the universal test machine after 24 hours passed in the $37^{\circ}C$ water bath. The gathered data were evaluated and tested by ANOVA and Duncan's multiple range test, and those results were as follows. The shear bond strengths of brackets for macromechanical and chemical bonding, those for chemical bonding, and those for micromechanical bonding were not different (p>0.05), but showed statistically higher than those of metal bracket and those of ceramic bracket for micromechanical bonding(p<0.05). The shear bond strengths of ceramic bracket for micromechanical bonding showed statistically lower than those of metal bracket(p<0.05). The enamel fractures and/or ceramic bracket fractures were observed in the cases of higher bond strength than that of metal bracket. These results supported that silane treated base of ceramic bracket show higher shear bond strength than that of metal bracket, and suggested that micromechanical form of ceramic bracket bases show higher shear bond strength than that of macromechanical form.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.205-205
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• 2007

The SiOC film of carbon centered system was prepared using bistrimethylsilylmethane and oxygen mixed precursor by the chemical vapor deposition. The chemical properties of the SiOC film were analyzed by the I-V measurement and FTIR spectra. The main bond of 950~1200 cm-1 was composed of the Si-C, Si-O-C and Si-O bonds. The leakage current of the SiOC film increased with the increasing of the carbon content, and the drift of the current was similar to the Si-O-C bond content.

• Bulletin of the Korean Chemical Society
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• v.27 no.12
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• pp.2045-2050
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• 2006

The interstitial hydrogen bonding in NiTi solid and its effect on the metal-to-metal bond is investigated by means of the EH tight-binding method. Electronic structures of octahedral clusters $Ti_4Ni_2$ with and without hydrogen in their centers are also calculated using the cluster model. The metal d states that interact with H 1s are mainly metal-metal bonding. The metal-metal bond strength is diminished as the new metal-hydrogen bond is formed. The causes of this bond weakening are analyzed in detail.

• Bulletin of the Korean Chemical Society
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• v.6 no.3
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• pp.162-164
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• 1985

Nucleophilic substitution reaction of dansyl chloride with anilines in various solvents have been investigated. The Bronsted ${\beta}$ and Hammett ${\rho}_N$ values indicated that the bond formation is advanced more than the bond breaking at the transition state. Solvatochromic correlations also predicted the importance of bond formation at the TS, showing a greater contribution of polarity (${\pi}^{\ast}$) compared to hydrogen bond donor acidity (${\alpha}$). The effect of solvent on rate was found to violate the reactivity-selectivity principle.

• The Journal of Korean Academy of Prosthodontics
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• v.45 no.5
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• pp.621-632
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• 2007

Statement of problem: The failure of adhesion between the resilient denture liner and the denture base is a serious problem in clinic. Purpose: The purpose of this study was to evaluate the effect of denture base resin surface pretreatments (mechanical and/or chemical) on the tensile bond strength between a resilient liner and processed denture resin. Material and method. Acrylic-based resilient liners (Soft liner; GC co., Japan & Coe-Soft; GC America Inc. USA) and silicone-based resilient liners (Mucosoft, Parkell Inc., USA & Dentusil; Bosworth co., USA) were used. Specimens in each soft lining material were divided two groups with or without mechanical pretreatment. Each denture base specimen received 1 of 4 chemical pretreatments including: (1) no treatment, (2) 30-s acetone treatment, (3) 15-s methylene chloride treatment, (4) 180-s methyl methacrylate treatment. All specimens were thermocycled and placed under tension until failure in a universal testing machine. Results: 1. Silicone-based resilient liners exhibited significantly higher tensile bond strengths than acrylic-based resilient liners (P<.05). 2. Grinding the denture base resin improved tensile bond strengths of silicone-based resilient liners, but reduced tensile bond strengths of acrylic-based resilient liners (P<.05). 3. In acrylic-based resilient liners, treating with acetone significantly increased the bond strength of Soft liner and treating with methyl methacrylate significantly increased the bond strength of Coe-Soft (P<.05). However they were not effective compared to silicone-based resilient liner. 4. In silicone-based resilient liners, treating with all chemical etchants significantly increased the bond strength of Mucosoft to denture base, and treating with methylene chloride and methyl methacrylate increased the bond strength of Dentusil to denture base (P<.05). Conclusion: Although chemical and mechanical pretreatments were not effective on tensile bond strength of acrylic-based resilent liner to denture base, treating the denture base resin surface with appropriate chemical etchants after mechanical pretreatment significantly increased the tensile bond strength of silicone-based resilient liner to denture base.

• Journal of Photoscience
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• v.8 no.1
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• pp.9-12
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• 2001

The photoisomerization behavior of benzylideneacetophenones, known as chalcones, was studied. We synthesized the chalcone derivatives that have ether groups at 4 and 4＇ positions. Due to the electron donating ability of the ether oxygen, the bond order of the single bond between two phenyl ring of the chalcone strengthened, which eventually increased the rotational barrier of the single bond. The rotational barrier of the single bond is about 20-22 kcal/mole. Thermal recovery of this process took about 1 min. The UV-visible spectra of these chromophores exhibit two characteristic absorption peaks at 276 nm and 340 nm. The relative intensity of the peaks varies depending on the alkyl chain length of the substituent. Photo-irradiation with the 365 nm light monotonously decreases the 340 nm peak. However, the photo-irradiation with 254 nm light induce two competing processes and produced rather complicated absorption profile.

• Bulletin of the Korean Chemical Society
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• v.7 no.3
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• pp.186-190
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• 1986

Effects of substituents in the nucleophile(X), the substrate(Y) and the leaving group(Z) on the structure of $S_N2$ transition states have been analyzed by considering effects of four components, electrostatic($E_{es}$), exchange repulsion ($E_{ex}$), polarization($E)_{pl}$) and charge transfer($E_{ct}$) terms, of interaction between the reactants on the degree of bond making and bond breaking. Prediction of net effects of all substituents(X, Y and Z) on the degree of bond making were found to be clearcut whereas the effect of an electron withdrawing group on the substrate (Y = EWG) on the degree of bond breaking was complex; the substituent(Y = EWG) is normally carbon-leaving group($C^{\ast}$-L) bond tightening($E_{pl}$ dominance) but becomes $C^{\ast}$-L bond loosening when the bond is strongly antibonding ($E_{ct}$ dominance). Our model calculations on the reaction of $CH_2XNH_2$ with $YCH_2COOCH_2Z$ using energy decomposition scheme have confirmed that predictions based on our analysis are correct.

• The korean journal of orthodontics
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• v.22 no.2 s.37
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• pp.449-474
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• 1992

The purpose of this study was to evaluate the in vitro shear bond strengths to enamel and the failure sites of three ceramic brackets and one metal bracket in combination with light cured orthodontic adhesive. The brackets were divided into four groups. Each ceramic bracket group had different bonding mechanisms with adhesive. Group A; metal bracket with foil-mesh base (control group) Group B; ceramic bracket with micromechanical retention Group C; ceramic bracket with chemical bonding Group D; ceramic bracket with mechanical retention and chemical bonding. Forty extracted human lower first premolars were prepared for bonding and 10 brackets for each group were bonded to prepared enamel surfaces with $Transbond^{\circledR}$ light cured ortho dontic adhesive. Twenty four hours after bonding, the Instron universal testing machine was used to test the shear bond strength of brackets to enamel. After debonding, brackets and enamel surfaces were examined under stereoscopic microscope to determine the failure sites, Statistical analysis of the data was carried out with ANOVA test and $Scheff\acute{e}$ test using SPSS PC+. The results were as follows. 1 . There were statistically significant differences in mean shear bond strengths of three ceramic bracket groups (p < 0.05). Shear bond strengths of group C and D were significantly higher than that of group B and shear bond strength of group C was significantly higher than that of group D. 2. Group C and D both had significantly higher shear bond strengths than metal bracket (group A), but there were no significant differences in shear bond strengths between group A and B (p < 0.05). 3. The failure sites of four bracket groups were also different. Group C and D failed primarily at enamel-adhesive interface, but group A and B failed primarily at bracket base-adhesive interface. 4. Among all ceramic bracket groups, group B was very similar to metal bracket in the aspect of shear bond strength and failure site.

• Bulletin of the Korean Chemical Society
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• v.24 no.8
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• pp.1059-1060
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• 2003

• Bulletin of the Korean Chemical Society
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• v.31 no.9
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• pp.2717-2720
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• 2010